公开(公告)号：US20020166978A1

公开(公告)日：2002-11-14

申请号：US10115496

申请日：2002-04-02

发明人： Katsumi Momose ,  Masatoshi Asami

IPC分类号： G01B013/19

CPC分类号： H05K3/4679 ,  G03F9/7038 ,  G03F9/7065 ,  H05K3/0008 ,  H05K3/0082 ,  H05K3/4652 ,  H05K2201/09918

摘要： The invention provides an aligner enabling to perform high accuracy positioning at manufacturing a multi-layered circuit board. A board alignment mark is photographed by a CCD camera by irradiating X-ray from an X-ray generator at the state removing a photo mask, and position of the board alignment mark is memorized. Then, the photo mask is set on a print circuit board, a mask alignment mark is photographed, and positioning of the mask alignment mark and the print circuit board is performed by comparing with position of memorized board alignment mark and by moving a platen so that the gap becomes zero.

摘要翻译： 本发明提供一种能够在制造多层电路板时执行高精度定位的对准器。 在去除光掩模的状态下，通过从X射线发生器照射X射线，通过CCD照相机拍摄板对准标记，并记忆板对准标记的位置。 然后，将光掩模设置在印刷电路板上，拍摄掩模对准标记，并且通过与记忆板对准标记的位置进行比较并通过移动压板来进行掩模对准标记和印刷电路板的定位，使得 间隙变为零。

公开(公告)号：US06469793B1

公开(公告)日：2002-10-22

申请号：US09371337

申请日：1999-08-10

申请人： Stuart T. Stanton

发明人： Stuart T. Stanton

IPC分类号： G01B902

CPC分类号： G03F9/7065 ,  G03F9/70 ,  G03F9/7092

摘要： An alignment sensor having a fixed reference grating and a movable wafer grating receiving electromagnetic radiation from a coherent illumination source. The illumination source is split into two beams by a beamsplitter. One beam is directed to a fixed reference grating and the diffracted orders are collected. The other beam from the beamsplitter is directed to a movable wafer grating. The diffracted orders from the movable wafer grating are collected and caused to interfere with the diffracted orders from the fixed reference grating, causing a phase shift indicative of the wafer movement or misalignment with respect to the fixed reference grating. Multiple channels having discrete wavelengths or colors are used to optimize detection and alignment irrespective of wafer processing variables. A polarization fixture on the illumination source and a central polarizing portion on the beamsplitter is used to provide contrast optimization, or alternately a latent image metrology mode. The alignment sensor improves alignment accuracy irrespective of processing variables and provides flexibility improving efficiency in the manufacture of semiconductor devices.

摘要翻译： 具有固定参考光栅的对准传感器和从相干照明光源接收电磁辐射的可移动晶片光栅。 照明源由分束器分成两束。 一个光束被引导到固定的参考光栅，并且收集衍射级。 来自分束器的另一个光束被引导到可移动的晶片光栅。 来自可移动晶片光栅的衍射级被收集并且导致干扰来自固定参考光栅的衍射级，引起指示相对于固定参考光栅的晶片运动或未对准的相移。 使用具有离散波长或颜色的多个通道用于优化检测和对准，而与晶片处理变量无关。 照明源上的偏振夹具和分束器上的中心偏振部分用于提供对比度优化，或者替代地潜像测量模式。 无论处理变量如何，对准传感器都能提高对准精度，提供提高半导体器件制造效率的灵活性。

公开(公告)号：US5684595A

公开(公告)日：1997-11-04

申请号：US720212

申请日：1996-09-26

申请人： Masaki Kato ,  Hideo Mizutani ,  Masashi Tanaka

发明人： Masaki Kato ,  Hideo Mizutani ,  Masashi Tanaka

IPC分类号： G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/00

CPC分类号： G03F9/70 ,  G03F9/7065 ,  G03F9/7088

摘要： An alignment apparatus for aligning a first object (reticle) with a second object (wafer) when irradiating a projection light on the first object to project a pattern of the first object onto the second object through a projection optical system. The apparatus includes an illumination optical system for illuminating a plurality marks on the second object with an alignment light having a wavelength band different from the projection light, a detection optical system for receiving the alignment light from the illuminated mark through the projection optical system to detect an image of the mark formed by the alignment light, and a compensating optical system arranged within the detection optical system for compensating a chromatic aberration of magnification caused by the projection optical system due to the differences among the wavelengths within the wavelength band of the alignment light.

摘要翻译： 一种对准装置，用于当通过投影光学系统照射第一物体上的投影光以将第一物体的图案投影到第二物体上时，使第一物体（光罩）与第二物体（晶片）对准。 该装置包括：照射光学系统，用于利用具有与投射光不同的波长带的对准光来照射第二物体上的多个标记;检测光学系统，用于通过投影光学系统接收来自照明标记的对准光，以检测 由对准光形成的标记的图像和布置在检测光学系统内的补偿光学系统，用于补偿由于对准光的波长带内的波长之间的差异而由投影光学系统引起的倍率色像差 。

公开(公告)号：US5684565A

公开(公告)日：1997-11-04

申请号：US304586

申请日：1994-09-12

申请人： Yoshitada Oshida ,  Hisafumi Iwata ,  Yasuhiro Yoshitake ,  Minoru Yoshida ,  Yukihiro Shibata

发明人： Yoshitada Oshida ,  Hisafumi Iwata ,  Yasuhiro Yoshitake ,  Minoru Yoshida ,  Yukihiro Shibata

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F9/7065

摘要： A method and apparatus is disclosed for detecting a pattern image of each of a plurality of patterns on the surface of an object. Light emitted from either a light source including a wide wavelength or a light source including a plurality of monowavelengths is applied to the object. The object includes a layered structure having a plurality of layers, wherein at least a part of an uppermost layer of the object is optically transparent. Spectral illumination intensity characteristics of the light emitted from the light source is varied, depending on information about both the layered structure of the object, and a material of the object to obtain a desired spectral illumination intensity, and a pattern image of each of patterns is detected as either a one-dimensional or a two-dimensional image based on light reflected from the object.

摘要翻译： 公开了一种用于检测物体表面上的多个图案中的每一个的图案图像的方法和装置。 从包括宽波长的光源或包括多个单波长的光源发射的光被施加到物体。 该物体包括具有多个层的分层结构，其中物体的最上层的至少一部分是光学透明的。 根据关于物体的分层结构和物体的材料的信息，从光源发射的光的光谱照度强度特性是变化的，以获得期望的光谱照度，并且每个图案的图案图像是 基于从对象反射的光被检测为一维或二维图像。

公开(公告)号：US5118953A

公开(公告)日：1992-06-02

申请号：US528244

申请日：1990-05-24

申请人： Kazuya Ota ,  Nobutaka Magome ,  Hideo Mizutani ,  Kouichiro Komatsu

发明人： Kazuya Ota ,  Nobutaka Magome ,  Hideo Mizutani ,  Kouichiro Komatsu

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7065 ,  G03F9/7049

摘要： An alignment apparatus is provided with a first beam receiving device arranged to receive an interference beam which is produced at a diffraction grating of a substrate as a result of illumination with a pair of beams which intersect each other on the substrate, and a second beam receiving device arranged to receive a reference beam which is produced by the interference between regularly reflected beams of the pair of beams occurring on the substrate, wherein the positional offset of the substrate is obtained on the basis of a comparison between the output signal of the first beam receiving device and the output signal of the second beam receiving device. Since a beam transmitting path for transmitting a measurement beam is substantially common to a beam transmitting path for a reference beam, even if the fluctuations of air occur, both the measurement beam and the reference beam substantially equally reflect the influence of the fluctuations, whereby it is possible to cancel the same.

摘要翻译： 对准装置设置有第一光束接收装置，该第一光束接收装置被布置成接收在基板的衍射光栅处产生的干涉光束，所述干涉光束是由于在基板上彼此相交的一对光束照明的结果而产生的，并且第二光束接收 该设备被布置为接收由基板上出现的一对光束的规则反射光束之间的干涉产生的参考光束，其中基于第一光束的输出信号之间的比较获得基板的位置偏移 接收装置和第二光束接收装置的输出信号。 由于用于发送测量光束的光束传输路径对于参考光束的光束传输路径基本上是共同的，所以即使发生空气的波动，测量光束和参考光束都基本上等同地反映了波动的影响，由此 有可能取消相同的。

公开(公告)号：US5072126A

公开(公告)日：1991-12-10

申请号：US606260

申请日：1990-10-31

申请人： Christopher J. Progler

发明人： Christopher J. Progler

IPC分类号： G02B7/28 ,  G02B13/00 ,  G02B27/32 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7065 ,  G02B13/0095 ,  G02B27/32 ,  G03F9/7069 ,  G03F9/7076

摘要： Alignment of two objects such as a mask and a wafer is achieved using crossed polarizer imaging and polarization sensitive targets to enhance signal contrast in proximity alignment. Two linearly polarized illumination beams with electric field polarization axes at oblique angles to each other illuminate and interact with mask and wafer marks. The marks are oriented to induce a partial depolarization of each incident illumination at each plane, i.e. the marks make some of the light visible upon passing through filters and a polarization analyzer. When marks are viewed through a polarization analyzer stray light is rejected and mark contrast greatly improved.

摘要翻译： 使用交叉偏振器成像和偏振敏感目标来实现诸如掩模和晶片的两个对象的对准，以增强接近对准中的信号对比度。 具有彼此倾斜角的电场偏振轴的两个线性偏振照明光束照射并与掩模和晶片标记相互作用。 标记被定向以在每个平面处引起每个入射照明的部分去极化，即，标记使得一些光在通过滤光器和偏振分析器时可见。 当通过偏振分析仪观察标记时，杂散光被拒绝，并且标记对比度大大提高。

公开(公告)号：US4764014A

公开(公告)日：1988-08-16

申请号：US91315

申请日：1987-08-31

申请人： Gunter Makosch ,  Franz J. Schedewie

发明人： Gunter Makosch ,  Franz J. Schedewie

IPC分类号： G01B11/02 ,  G01B11/30 ,  G03F7/20 ,  G03F9/00 ,  G01B9/02

CPC分类号： G03F9/7065 ,  G01B11/028 ,  G01B11/30 ,  G03F7/70616 ,  G03F9/7049

摘要： A surface to be tested is illuminated with two beams polarized perpendicularly to each other, extending symmetrically to an optical axis and focussed on the surface by a lens. The light scattered at the surface is separated from the directly reflected light by a reflecting diaphragm, and by means of electro-optical compensation (with an electro-optical modulator and photodetector) the scattered light is tested for phase difference which is a function of the distance of a scattering element of the surface from the optical axis. The phase difference within the illuminated spot is a unique function of the distance of the scattering element from the optical axis, if a diffraction-limited optical system is used.

摘要翻译： 待测试的表面被两个彼此垂直偏振的光束照射，对称地延伸到光轴并由透镜聚焦在表面上。 在表面散射的光通过反射膜与直接反射的光分离，通过电光补偿（使用电光调制器和光电检测器），测量散射光的相位差，该相位差是 表面散射元件距光轴的距离。 如果使用衍射极限光学系统，照明光斑内的相位差是散射元件与光轴的距离的独特功能。

公开(公告)号：US4685805A

公开(公告)日：1987-08-11

申请号：US706970

申请日：1985-03-01

申请人： Kenichi Kodama ,  Akikazu Tanimoto ,  Hisao Izawa ,  Yoichi Hamashima ,  Junji Hazama

发明人： Kenichi Kodama ,  Akikazu Tanimoto ,  Hisao Izawa ,  Yoichi Hamashima ,  Junji Hazama

IPC分类号： G01B11/14 ,  G03F9/00 ,  G01B11/00

CPC分类号： G03F9/7065 ,  G03F9/7026

摘要： An apparatus for optically measuring the very small gap between a reference plane and a substrate parallel to the reference plane. A beam of energy converging on the reference plane is reflected by the substrate and a spot of reflected beam is formed on a detecting plane at a different position. An array of detecting elements for detecting the size of the spot on the detecting plane is adjusted in position in such a manner that the center of the spot coincides with the center of any one of the detecting elements, thereby preventing any error of the in-focus detecting position due to the deviation between the center of the spot and the center of the detecting element.

摘要翻译： 一种用于光学测量参考平面与平行于参考平面的基板之间的非常小间隙的装置。 会聚在参考平面上的能量束被衬底反射，并且在不同位置的检测平面上形成反射光束点。 用于检测检测平面上的斑点尺寸的检测元件的阵列被调整到位置，使得斑点的中心与任何一个检测元件的中心一致，从而防止任何误差， 由于点的中心与检测元件的中心之间的偏差导致的焦点检测位置。

公开(公告)号：US4611122A

公开(公告)日：1986-09-09

申请号：US554630

申请日：1983-11-23

申请人： Shigeki Nakano ,  Masao Totsuka

发明人： Shigeki Nakano ,  Masao Totsuka

IPC分类号： H01L21/30 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/68 ,  G01N21/86

CPC分类号： G03F9/7065 ,  G03F9/7076

摘要： A signal detection apparatus comprises a device for forming with separable lights illumination areas extending in different plural directions, a scanner for causing the illumination areas to scan bar-like marks extending in different directions on an object, and a photoreceptor for separately receiving signal lights corresponding to the respective different directions from the rays reflected by the marks.

摘要翻译： 信号检测装置包括用于形成具有沿不同的多个方向延伸的可分离的照明区域的装置，用于使照明区域扫描在物体上沿不同方向延伸的棒状标记的扫描仪和用于分别接收对应的信号灯的感光体 到由标记反射的光线到各个不同的方向。

公开(公告)号：US4577968A

公开(公告)日：1986-03-25

申请号：US694576

申请日：1985-01-24

申请人： Gunter Makosch

发明人： Gunter Makosch

IPC分类号： G01B11/00 ,  G01B11/06 ,  G01D5/38 ,  G03F7/20 ,  G03F9/00 ,  G01B9/02

CPC分类号： G03F9/7065 ,  G01B11/00 ,  G01B11/0608 ,  G01D5/38 ,  G03F7/70633 ,  G03F9/7049

摘要： A method and apparatus is described for making absolute and relative distance measurements optically. A grating, or gratings, is located on the object whose displacement is to be measured, or on a surface in contact with the object. Two perpendicularly polarized light beams interact with the grating to produce a phase difference therebetween. This phase difference is a measure of the displacement of the object, and can be compensated for in order to determine the exact displacement of the object. The relative displacement between two objects can be measured in a similar way, there being gratings on the two objects. One of the light beams strikes one grating while the other strikes the second grating. If there is perfect alignment between the gratings on the two objects, there will be no phase difference in the diffracted light from the gratings. If there is misalignment between the objects, a phase difference between the diffracted signals will be produced indicative of this misalignment.

摘要翻译： 描述了用于进行绝对和相对距离测量的方法和装置。 光栅或光栅位于要测量其位移的物体上，或位于与物体接触的表面上。 两个垂直偏振光束与光栅相互作用以产生它们之间的相位差。 该相位差是物体的位移的度量，并且可以被补偿以便确定物体的精确位移。 两个物体之间的相对位移可以以类似的方式测量，两个物体上有光栅。 一个光束撞击一个光栅，而另一个击中第二个光栅。 如果在两个物体之间的光栅之间存在完美的对准，则衍射光与光栅之间将没有相位差。 如果对象之间存在未对准，将产生衍射信号之间的相位差，表示该未对准。