公开(公告)号：US10559448B2

公开(公告)日：2020-02-11

申请号：US16210531

申请日：2018-12-05

Applicant: FEI Company

Inventor： Alexander Henstra ,  Peter Christiaan Tiemeijer

IPC: H01J37/10 ,  H01J37/147 ,  H01J37/21 ,  H01J37/22 ,  H01J37/26 ,  H01J49/06 ,  H01J49/44

Abstract: A method of using a Transmission Charged Particle Microscope comprising: A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; An imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a sensing device; A controller, for controlling at least some operational aspects of the microscope, in which method the sensing device is chosen to be an EELS/EFTEM module comprising: An entrance plane; An image plane, where in EELS mode an EELS spectrum is formed and in EFTEM mode an EFTEM image is formed; A slit plane between said entrance plane and image plane, where in EFTEM mode an energy dispersed focus is formed; A dispersing device, between said entrance plane and slit plane, for dispersing an incoming beam into an energy-dispersed beam with an associated dispersion direction; A first series of quadrupoles between said dispersing device and slit plane; A second series of quadrupoles between said slit plane and image plane, which dispersing device and quadrupoles are arranged along an optical axis, whereby, for a Cartesian coordinate system (X,Y,Z) in which said optical axis is disposed along Z, said dispersion direction is defined as being parallel to X, comprising the following steps: In said first quadrupole series, exciting one or more quadrupoles so as to deflect an off-axis non-dispersive YZ ray leaving said dispersing device onto a path paraxial to said optical axis from said slit plane to said image plane; In said second quadrupole series, exciting either: (a) A single quadrupole; or (b) A pair of adjacent quadrupoles, so as to focus said energy-dispersed beam onto said image plane.

公开(公告)号：US10460903B2

公开(公告)日：2019-10-29

申请号：US15387388

申请日：2016-12-21

Applicant: KLA-Tencor Corporation

Inventor： Arjun Hegde ,  Luca Grella ,  Christopher Sears

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/18 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

Abstract: A scanning electron microscopy system is disclosed. The system includes a sample stage configured to secure a sample having conducting structures disposed on an insulating substrate. The system includes an electron-optical column including an electron source configured to generate a primary electron beam and a set of electron-optical elements configured to direct at least a portion of the primary electron beam onto a portion of the sample. The system includes a detector assembly configured to detect electrons emanating from the surface of the sample. The system includes a controller communicatively coupled to the detector assembly. The controller is configured to direct the electron-optical column and stage to perform, with the primary electron beam, an alternating series of image scans and flood scans of the portion of the sample, wherein each of the flood scans are performed sequential to one or more of the imaging scans.

公开(公告)号：US10340118B2

公开(公告)日：2019-07-02

申请号：US15824047

申请日：2017-11-28

Applicant: JEOL Ltd.

Inventor： Ryusuke Sagawa

IPC: H01J37/28 ,  G01N23/20058 ,  H01J37/244 ,  H01J37/10 ,  H01J37/147 ,  H01J37/26

Abstract: There is provided a scanning transmission electron microscope capable of producing plural types of STEM (scanning transmission electron microscopy) images using a single detector. The electron microscope (100) has an electron source (10) emitting an electron beam, a scanning deflector (13) for scanning the beam over a sample (S), an objective lens (14) for focusing the beam, an imager (22) placed at a back focal plane of the objective lens (14) or at a plane conjugate with the back focal plane, and a scanned image generator (40) for generating scanned images on the basis of images captured by the imager. The scanned image generator (40) operates to form electron diffraction patterns from the electron beam passing through positions on the sample by the scanning of the electron beam, to capture the electron diffraction patterns by the imager so that plural images are produced, to integrate the intensity of each pixel over an integration region that is set based on the size of an image of a transmitted wave in a respective one of the produced images for each of the produced images such that the signal intensity at each position on the sample is found, and to generate the scanned images on the basis of the signal intensities at the positions on the sample.

公开(公告)号：US10262830B2

公开(公告)日：2019-04-16

申请号：US15529281

申请日：2014-11-26

Applicant: HITACHI, LTD.

Inventor： Daisuke Bizen ,  Hideo Morishita ,  Michio Hatano ,  Hiroya Ohta

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/10 ,  H01J37/285 ,  H01J37/28 ,  H01J37/05 ,  H01J37/21 ,  H01J37/244

Abstract: To provide a scanning electron microscope having an electron spectroscopy system to attain high spatial resolution and a high secondary electron detection rate under the condition that energy of primary electrons is low, the scanning electron microscope includes: an objective lens 105; primary electron acceleration means 104 that accelerates primary electrons 102; primary electron deceleration means 109 that decelerates the primary electrons and irradiates them to a sample 106; a secondary electron deflector 103 that deflects secondary electrons 110 from the sample to the outside of an optical axis of the primary electrons; a spectroscope 111 that disperses secondary electrons; and a controller that controls application voltage to the objective lens, the primary electron acceleration means and the primary electron deceleration means so as to converge the secondary electrons to an entrance of the spectroscope.

公开(公告)号：US20190088446A1

公开(公告)日：2019-03-21

申请号：US16154350

申请日：2017-05-05

Applicant: Weiwei Xu

Inventor： Weiwei Xu

IPC: H01J37/26 ,  H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/21

Abstract: An apparatus includes at least one electron beam column, with an electron emitter source, a gun lens focusing electrons from the electron emitter source into an electron beam, and a final beam forming aperture. Each electron beam column includes one or more of a double Wein filter disposed along a trajectory of the electron beam between the gun lens and the final beam forming aperture, and a dispersion corrector disposed along a trajectory of the electron beam after the final beam forming aperture.

公开(公告)号：US10224174B1

公开(公告)日：2019-03-05

申请号：US15803642

申请日：2017-11-03

Applicant: FEI Company

Inventor： Bert Henning Freitag ,  Peter Christiaan Tiemeijer ,  Maarten Bischoff

IPC: H01J37/147 ,  H01J37/26 ,  H01J37/10

Abstract: A method, includes, with an illumination system, directing a first charged particle beam along a particle-optical axis to a specimen position, with an imaging system, receiving a second charged particle beam from the specimen position and directing the second charged particle beam to a detector, recording a first output of the detector, varying an excitation of an optical element of the imaging system with a controller so as to rotate the second charged particle beam at the detector through a yaw angle about the particle-optical axis, and recording a second output of the detector at the yaw angle.

公开(公告)号：US20190019648A1

公开(公告)日：2019-01-17

申请号：US16128441

申请日：2018-09-11

Applicant: Purdue Research Foundation

Inventor： Liang Pan ,  Xianfan Xu

IPC: H01J37/10 ,  H01J37/317 ,  H01J37/12 ,  H01J37/06 ,  G02B5/00 ,  H01J37/073

Abstract: A system for generating an electron beam array, comprising a light source, a first substrate having a plurality of plasmonic lenses mounted thereon, the plasmonic lenses configured to received light from the light source and produce an electron emission, and a plurality of electrostatic microlenses configured to focus the electron emissions into a beam for focusing on a wafer substrate. A light source modulator and digital micro mirror may be included which captures light from the light source and projects light beamlets on the plasmonic lenses.

公开(公告)号：US20180374671A1

公开(公告)日：2018-12-27

申请号：US16007276

申请日：2018-06-13

Applicant: JEOL Ltd.

Inventor： Kazuki Yagi ,  Takeo Sasaki ,  Ichiro Onishi ,  Shuichi Yuasa ,  Masashi Shimizu

IPC: H01J37/20 ,  H01J37/10 ,  H01J37/244 ,  H01J37/09 ,  H01J37/28

Abstract: A sample holder capable of limiting X-rays accepted into an X-ray detector is provided. The sample holder is for use in an electron microscope equipped with a polepiece assembly and a semiconductor detector. The sample holder includes: a sample stage on which a sample is held; and a shield plate. When the sample stage has been introduced in the sample chamber of the electron microscope, the shield plate is located between the polepiece assembly and the semiconductor detector.

公开(公告)号：US10157722B2

公开(公告)日：2018-12-18

申请号：US15195665

申请日：2016-06-28

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: H01J37/09 ,  H01J37/073 ,  G01N23/2251 ,  H01J37/20 ,  H01J37/26 ,  H01J37/28 ,  H01J37/29 ,  G01N23/22 ,  G01N23/223 ,  H01J37/10 ,  H01J37/22

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

公开(公告)号：US20180323034A1

公开(公告)日：2018-11-08

申请号：US15587720

申请日：2017-05-05

Applicant: KLA-Tencor Corporation

Inventor： Alan D. Brodie

IPC: H01J37/04 ,  H01J37/10

CPC classification number: H01J37/045 ,  H01J37/10 ,  H01J2237/0435

Abstract: Performance of a multi-electron-beam system can be improved by reducing Coulomb effects in the illumination path of a multi-beam inspection system. A beam-limiting aperture with multiple holes can be positioned between an electron beam source and a multi-lens array, such as in a field-free region. The beam-limiting aperture is configured to reduce Coulomb interactions between the electron beam source and the multi-lens array. An electron beam system with the beam-limiting aperture can be used in a scanning electron microscope.