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公开(公告)号：US11373838B2
公开(公告)日：2022-06-28
申请号：US16163263
申请日：2018-10-17
发明人： Alan D. Brodie
IPC分类号： H01J37/10 , H01J37/147 , H01J37/244 , H01J37/06 , H01J37/28 , H01J37/12
摘要： A multi-beam electron source is disclosed. The multi-beam source includes an electron source, a grid lens assembly, and a multi-lens array assembly. The multi-lens array assembly includes a set of lenses disposed across a substrate. The grid lens assembly is configured to cause a primary electron beam from the electron beam source to land on the multi-lens array assembly telecentrically. The multi-lens array assembly is configured to split the electron beam from the electron beam source into a plurality of primary electron beams. The grid lens assembly includes a first lens element and a second lens element, wherein the first lens element and the second lens element are separated by a gap of a selected distance. The grid lens assembly further includes a grid element including a set of apertures, wherein the grid element is disposed within the gap between the first lens element and the second lens element.
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公开(公告)号：US20190227010A1
公开(公告)日：2019-07-25
申请号：US15879611
申请日：2018-01-25
发明人： Alan D. Brodie , Christopher Sears
IPC分类号： G01N23/2251 , G01N23/2255
摘要： A multi-beam metrology system includes an illumination source configured to generate a beam array, an illumination sub-system to direct the beam array to a sample at an array of measurement locations, an imaging sub-system to image the array of measurement locations as an array of imaged spots in a detection plane, and a detection assembly to generate detection signal channels associated with each of the imaged spots. The detection assembly includes an array of detection elements configured to receive the imaged spots with separate detection elements, and one or more position detectors to measure positions of the imaged spots in the detection plane. The detection assembly further generates feedback signals for the imaging sub-system based on the measured positions of the imaged spots to adjust the positions of one or more of the imaged spots in the detection plane to maintain alignment of the array of detection elements.
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公开(公告)号：US08957394B2
公开(公告)日：2015-02-17
申请号：US13679072
申请日：2012-11-16
发明人： Alan D. Brodie , Joseph Maurino , Mark A. McCord , Paul F. Petric
IPC分类号： H01J23/06 , H01J23/08 , G21K5/08 , H01J37/065 , H01J29/48
CPC分类号： H01J23/06 , G21K5/08 , H01J23/08 , H01J29/48 , H01J29/488 , H01J37/065 , H01J2237/038 , H01J2237/06341 , H01J2237/06375 , H01J2237/3175
摘要： One embodiment relates to a high-voltage electron gun including an insulator stand-off having a resistive layer. The resistive layer is at least on an interior surface of the insulator stand-off. A cathode holder is coupled to one end of the insulator 115 stand-off, and an anode is coupled to the other end. The resistive layer advantageously increases the surface breakdown field strength for the insulator stand-off and so enables a compact design for the high-voltage electron gun. Other embodiments, aspects and feature are also disclosed.
摘要翻译： 一个实施例涉及一种包括具有电阻层的绝缘体支架的高压电子枪。 电阻层至少在绝缘体支架的内表面上。 阴极保持器联接到绝缘体115的一端，并且阳极耦合到另一端。 电阻层有利地增加了用于绝缘体间隔的表面击穿场强，因此能够实现高压电子枪的紧凑设计。 还公开了其它实施例，方面和特征。
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公开(公告)号：US20180323034A1
公开(公告)日：2018-11-08
申请号：US15587720
申请日：2017-05-05
发明人： Alan D. Brodie
CPC分类号： H01J37/045 , H01J37/10 , H01J2237/0435
摘要： Performance of a multi-electron-beam system can be improved by reducing Coulomb effects in the illumination path of a multi-beam inspection system. A beam-limiting aperture with multiple holes can be positioned between an electron beam source and a multi-lens array, such as in a field-free region. The beam-limiting aperture is configured to reduce Coulomb interactions between the electron beam source and the multi-lens array. An electron beam system with the beam-limiting aperture can be used in a scanning electron microscope.
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公开(公告)号：US09214344B1
公开(公告)日：2015-12-15
申请号：US14296960
申请日：2014-06-05
发明人： Alan D. Brodie , Yehiel Gotkis , Allen Carroll , Leonid Baranov
IPC分类号： H01L21/20
CPC分类号： H01L21/20 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3177 , H01J2237/0437 , H01J2237/1205 , Y10T156/10
摘要： One embodiment relates to a pillar-supported array of micro electron lenses. The micro-lens array includes a base layer on a substrate, the base layer including an array of base electrode pads and an insulating border surrounding the base electrode pads so as to electrically isolate the base electrode pads from each other. The micro-lens array further includes an array of lens holes aligned with the array of base electrode pads and one or more stacked electrode layers having openings aligned with the array of lens holes. The micro-lens array further includes one or more layers of insulating pillars, each layer of insulating pillars supporting a stacked electrode layer. Another embodiment relates to a method of fabricating a pillar-supported array of micro electron lenses. Other embodiments, aspects and features are also disclosed.
摘要翻译： 一个实施例涉及一种立柱支撑的微电子透镜阵列。 微透镜阵列包括在基板上的基底层，基底层包括基极电极焊盘的阵列和围绕基极电极焊盘的绝缘边界，以将基极电极彼此电隔离。 微透镜阵列还包括与基极阵列阵列对准的透镜孔阵列和一个或多个具有与透镜孔阵列对准的开口的堆叠电极层。 微透镜阵列还包括一层或多层绝缘柱，每层绝缘柱支撑堆叠的电极层。 另一实施例涉及一种制造支柱支撑的微电子透镜阵列的方法。 还公开了其它实施例，方面和特征。
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6.发明授权公开(公告)号：US11410830B1
公开(公告)日：2022-08-09
申请号：US16421004
申请日：2019-05-23
发明人： Hong Xiao , Lawrence Muray , Nick Petrone , John Gerling , Abdurrahman Sezginer , Alan D. Brodie , Kuljit Virk , Qiang Q. Zhang , Grace Hsiu-Ling Chen
IPC分类号： H01J37/244 , H01J37/22 , H01J37/28
摘要： A system is disclosed. In one embodiment, the system includes a scanning electron microscopy sub-system including an electron source configured to generate an electron beam and an electron-optical assembly including one or more electron-optical elements configured to direct the electron beam to the specimen. In another embodiment, the system includes one or more grounding paths coupled to the specimen, the one or more grounding paths configured to generate one or more transmission signals based on one or more received electron beam-induced transmission currents. In another embodiment, the system includes a controller configured to: generate control signals configured to cause the scanning electron microscopy sub-system to scan the portion of the electron beam across a portion of the specimen; receive the transmission signals via the one or more grounding paths; and generate transmission current images based on the transmission signals.
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7.发明申请公开(公告)号：US20180068825A1
公开(公告)日：2018-03-08
申请号：US15645863
申请日：2017-07-10
发明人： Alan D. Brodie
IPC分类号： H01J37/153 , H01J37/28 , G01N23/225
CPC分类号： H01J37/153 , G01N23/2251 , H01J37/28 , H01J2237/2813
摘要： A multi-beam scanning electron microscopy (SEM) system is disclosed. The system includes an electron beam source configured to generate a source electron beam. The system includes a set of electron-optical elements configured to generate a flood electron beam from the source electron beam. The system includes a multi-beam lens array with a plurality of electron-optical pathways configured to split the flood electron beam into a plurality of primary electron beams, and a plurality of electrically-charged array layers configured to adjust at least some of the plurality of primary electron beams. The system includes a set of electron-optical elements configured to direct at least some of the plurality of primary electron beams onto a surface of a sample secured by a stage. The system includes a detector array configured to detect a plurality of electrons emanated from the surface of the sample in response to the plurality of primary electron beams.
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公开(公告)号：US10338013B1
公开(公告)日：2019-07-02
申请号：US15879611
申请日：2018-01-25
发明人： Alan D. Brodie , Christopher Sears
IPC分类号： G01N23/22 , H01J37/10 , G01N23/2251 , G01N23/2255
CPC分类号： G01N23/2251 , G01N23/2255 , G01N2223/6116
摘要： A multi-beam metrology system includes an illumination source configured to generate a beam array, an illumination sub-system to direct the beam array to a sample at an array of measurement locations, an imaging sub-system to image the array of measurement locations as an array of imaged spots in a detection plane, and a detection assembly to generate detection signal channels associated with each of the imaged spots. The detection assembly includes an array of detection elements configured to receive the imaged spots with separate detection elements, and one or more position detectors to measure positions of the imaged spots in the detection plane. The detection assembly further generates feedback signals for the imaging sub-system based on the measured positions of the imaged spots to adjust the positions of one or more of the imaged spots in the detection plane to maintain alignment of the array of detection elements.
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公开(公告)号：US10242839B2
公开(公告)日：2019-03-26
申请号：US15587720
申请日：2017-05-05
发明人： Alan D. Brodie
摘要： Performance of a multi-electron-beam system can be improved by reducing Coulomb effects in the illumination path of a multi-beam inspection system. A beam-limiting aperture with multiple holes can be positioned between an electron beam source and a multi-lens array, such as in a field-free region. The beam-limiting aperture is configured to reduce Coulomb interactions between the electron beam source and the multi-lens array. An electron beam system with the beam-limiting aperture can be used in a scanning electron microscope.
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公开(公告)号：US10072334B2
公开(公告)日：2018-09-11
申请号：US15786358
申请日：2017-10-17
发明人： William M. Tong , Alan D. Brodie , Jeffrey Elam , Anil Mane
IPC分类号： H01J37/02 , C23C16/455 , C23C16/40 , C23C16/32 , C23C16/34 , H01J37/12 , H01J37/317 , B81B3/00
CPC分类号： C23C16/45529 , B81B3/0008 , C23C16/32 , C23C16/34 , C23C16/40 , C23C16/402 , C23C16/403 , C23C16/405 , H01J37/026 , H01J37/06 , H01J37/12 , H01J37/3174 , H01J2237/1205 , H01J2237/31794
摘要： A digital pattern generator has a MEMS substrate with a plurality of doping layers and a plurality of insulating layers between respective doping layers. A plurality of lenslets are formed as holes through the substrate. A charge drain coating is applied to the inner surfaces of the lenslets. The charge drain coating drains electrons that come into contact with the charge drain coating so that the performance of the digital pattern generator will not be hindered by electron charge build-up. The charge drain coating includes a doping material that coalesces into clusters that are embedded within a high dielectric insulating material.
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