公开(公告)号：US11850638B2

公开(公告)日：2023-12-26

申请号：US17208166

申请日：2021-03-22

申请人： Amfomed AG

发明人： Claude Marchand

IPC分类号： B08B9/093 ,  B05B3/02 ,  B05B3/06 ,  B08B5/02 ,  B08B5/04 ,  B08B9/087 ,  B08B9/28 ,  B08B9/34 ,  B08B9/36

CPC分类号： B08B9/0936 ,  B01L13/02 ,  B05B3/025 ,  B05B3/06 ,  B08B5/02 ,  B08B5/04 ,  B08B9/087 ,  B08B9/283 ,  B08B9/34 ,  B08B9/36 ,  B08B2209/08

摘要： The invention relates to an apparatus and to a method for cleaning vessels. The vessel cleaning apparatus (10) has a suction lance (20) and a flushing lance (40). The flushing lance (40) is configured to receive fluid, such as cleaning liquid and/or compressed air, and to expel it against an inner wall of a vessel to be cleaned. The suction lance (20) is configured to suck off and lead off fluids present in the vessel as well as cleaning liquid supplied through the flushing lance (40) from the vessel, preferably against the direction of effect of gravity.

公开(公告)号：US20230397782A1

公开(公告)日：2023-12-14

申请号：US18033202

申请日：2021-10-27

申请人： LG Chem, Ltd.

发明人： Kyutae Park ,  Youngsoo Song ,  Sungdong Kim ,  Sangkee Seo ,  Ye Hoon Im ,  Sung Tae Hwang

IPC分类号： A47L5/14 ,  B08B5/04 ,  B08B5/02 ,  H01M10/04

CPC分类号： A47L5/14 ,  B08B5/04 ,  B08B5/02 ,  H01M10/0404 ,  H01M2220/20

摘要： The present invention relates to an foreign matter removal device, and more particularly, to an foreign matter removal device, in which a length of a main body portion is increased to correspond to a size of a large-scale cell for a vehicle, and a plurality of suction channels each having a swoosh shape is provided, thereby efficiently removing foreign substances produced during a process of manufacturing a cell for a vehicle.

公开(公告)号：US11839907B2

公开(公告)日：2023-12-12

申请号：US16542014

申请日：2019-08-15

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

发明人： Chia-Ling Pai ,  Yu-Min Chang

IPC分类号： H01L21/02 ,  B08B7/04 ,  B08B3/08 ,  B08B5/02 ,  B08B7/02 ,  B08B3/04 ,  B08B1/00

CPC分类号： B08B7/04 ,  B08B3/041 ,  B08B3/08 ,  B08B5/023 ,  B08B7/028 ,  H01L21/02052 ,  B08B1/005

摘要： A method of cleaning wafer-cleaning brushes includes passing a wafer having a first polished main side and an opposing unpolished backside between a pair of substantially cylindrical shaped wafer-cleaning brushes are rotated about an axial direction of the brushes while passing the wafer between the pair of wafer-cleaning brushes. A cleaning solution is applied to the brushes while passing the wafer between the pair of wafer-cleaning brushes. While passing between the pair of brushes, the first polished main side of the wafer faces a first direction, the first direction is an opposite direction to which a polished side of a production wafer faces during a subsequent polished wafer cleaning operation. The substantially cylindrical shaped wafer-cleaning brushes include a plurality of protrusions on an external surface of the brushes, and the brushes contact the wafer at least a portion of time the wafer is passing between the pair of brushes.

公开(公告)号：US20230381827A1

公开(公告)日：2023-11-30

申请号：US18143135

申请日：2023-05-04

申请人： Raytheon Technologies Corporation

发明人： Raymond Hayes

IPC分类号： B08B3/02 ,  B08B5/02 ,  B08B13/00

CPC分类号： B08B3/02 ,  B08B5/02 ,  B08B13/00 ,  B08B2203/0211 ,  B08B2203/0282

摘要： A washer including a cabinet with a washing zone accessible through a doorway; a door with an inflatable door seal for sealing the doorway, the door seal coupled to a pneumatic air system; a clamp for securing a part within the washing zone; a wash nozzle and air nozzle are located within the washing zone and fluidly coupled to a process water system, pneumatic system respectively for washing and drying the part; a safety controller operatively coupled to the door, the pneumatic system and the process water system; and a process controller operatively coupled to the door, the pneumatic system, the process water system and the clamp, the process controller configured to wash the part.

公开(公告)号：US11830725B2

公开(公告)日：2023-11-28

申请号：US17153450

申请日：2021-01-20

申请人： Applied Materials, Inc.

发明人： Naomi Yoshida ,  He Ren ,  Hao Jiang ,  Chenfei Shen ,  Chi-Chou Lin ,  Hao Chen ,  Xuesong Lu ,  Mehul B. Naik

IPC分类号： H01L21/02 ,  H01L21/28 ,  B08B5/02 ,  H01L29/66 ,  H01L21/3205

CPC分类号： H01L21/02057 ,  B08B5/02 ,  H01L21/28026 ,  H01L21/32051 ,  H01L29/66795

摘要： Embodiments of the present disclosure generally relate to methods of cleaning a structure and methods of depositing a capping layer in a structure. The method of cleaning a structure includes suppling a cleaning gas, including a first gas including nitrogen (N) and a second gas including fluorine (F), to a bottom surface of a structure. The cleaning gas removes unwanted metal oxide and etch residue from the bottom surface of the structure. The method of depositing a capping layer includes depositing the capping layer over the bottom surface of the structure. The methods described herein reduce the amount of unwanted metal oxides and residue, which improves adhesion of deposited capping layers.

公开(公告)号：US11826800B2

公开(公告)日：2023-11-28

申请号：US17174360

申请日：2021-02-12

申请人： Emack Industries, LLC

发明人： Kevin M. Guckenberger

IPC分类号： B08B9/032 ,  B08B7/04 ,  A61B90/70 ,  B08B5/02

CPC分类号： B08B9/0328 ,  A61B90/70 ,  B08B5/02 ,  B08B7/04 ,  B08B2209/032

摘要： A cleaning system and process for cleaning a medical system comprising at least one air source at least one cleaning solution source at least one rinsing solution source and at least one switch for switching between the at least one air source, the at least one cleaning solution source, and said at least one rinsing solution source. The process is configured to selectively provide the cleaning solution from the cleaning solution source, selectively provide the rinsing solution source, and selectively providing the air pressure to purge the lines of a medical/dental system.

公开(公告)号：US20230378417A1

公开(公告)日：2023-11-23

申请号：US18030392

申请日：2022-04-01

申请人： LG Energy Solution, Ltd.

发明人： Jung Hyun Park ,  Tae Su Kim ,  Seo Jun Lee ,  Hyo Jin Lee ,  Gil Woo Kim ,  Hyuk Soo Lee ,  Byung Hee Lee

IPC分类号： H01M4/04 ,  B08B5/02 ,  B08B5/04 ,  B08B13/00 ,  B21D28/02 ,  G06T7/70

CPC分类号： H01M4/04 ,  B08B5/023 ,  B08B5/043 ,  B08B13/00 ,  B21D28/02 ,  G06T7/70 ,  H04N23/90

摘要： It is preferred that the foreign material removal device for notching a secondary battery according to one example of the present invention comprises: a foreign material confirmation part provided so that in a transport path of an electrode film through a notching process, the upper and lower surfaces of the notched electrode pattern are photographed, and a position of a foreign material present in the electrode pattern is calculated based on the photographed image; and a foreign material removal process part provided so that air is sprayed to the position of the foreign material and a vacuum pressure is applied thereto according to the foreign material position information calculated by the foreign material confirmation part.

公开(公告)号：US11806765B2

公开(公告)日：2023-11-07

申请号：US17993209

申请日：2022-11-23

申请人： Baranko Environmental LLC

发明人： Darren K. Fike

IPC分类号： B08B7/00 ,  B08B5/02 ,  B08B13/00 ,  E21B17/10 ,  E21B37/00

CPC分类号： B08B7/0035 ,  B08B5/023 ,  B08B13/00 ,  E21B17/1071 ,  E21B37/00

摘要： A sucker rod cleaning system includes an inductive heating device, a feed mechanism, a first support and a second support. An electromagnet of inductive heating device includes a wire coil head that is configured to inductively heat a sucker rod positioned within a heating zone. The feed mechanism is configured to feed a sucker rod through the heating zone in a feed direction. The first support is positioned on an upstream side of the wire coil head, and is configured to support a portion of a sucker rod as it is fed through the heating zone by the teed mechanism. The second support is positioned on a downstream side of the wire coil head, and is configured to support a portion of a sucker rod as it is fed through the heating zone by the feed mechanism.

公开(公告)号：US11787385B2

公开(公告)日：2023-10-17

申请号：US17334165

申请日：2021-05-28

申请人： CNH Industrial America LLC

发明人： Brent David Bast ,  Nathan Paul Brooks ,  Steven Winkel ,  John Patrick Greifzu

IPC分类号： B60W10/103 ,  B60W10/18 ,  B60W30/18 ,  B67D7/36 ,  B67D7/02 ,  G01M3/32 ,  A01M7/00 ,  A01C23/00 ,  G05D1/00 ,  G07C5/00 ,  G07C5/08 ,  A01D41/127 ,  A01D69/00 ,  B05B15/55 ,  A01C23/04 ,  B05B12/08 ,  B67D7/38 ,  B67D7/78 ,  B67D99/00 ,  B05B12/14 ,  A01B59/00 ,  E02F3/46 ,  E02F9/22 ,  B05B15/65 ,  B05B12/16 ,  B05B1/20 ,  B05B12/02 ,  B08B3/02 ,  B08B5/02 ,  B60W40/076 ,  B05B14/00 ,  G01F23/70

CPC分类号： B60W10/103 ,  A01B59/002 ,  A01C23/007 ,  A01C23/008 ,  A01C23/047 ,  A01D41/1274 ,  A01D69/00 ,  A01M7/0042 ,  A01M7/0057 ,  A01M7/0085 ,  A01M7/0089 ,  B05B1/20 ,  B05B12/02 ,  B05B12/081 ,  B05B12/085 ,  B05B12/14 ,  B05B12/16 ,  B05B15/55 ,  B05B15/65 ,  B08B3/02 ,  B08B5/02 ,  B60W10/18 ,  B60W10/182 ,  B60W30/18118 ,  B60W40/076 ,  B67D7/02 ,  B67D7/0294 ,  B67D7/36 ,  B67D7/362 ,  B67D7/38 ,  B67D7/78 ,  B67D99/00 ,  E02F3/46 ,  E02F9/2271 ,  E02F9/2275 ,  G01M3/3245 ,  G05D1/0016 ,  G07C5/008 ,  G07C5/08 ,  B05B14/00 ,  B08B2203/0205 ,  B60W2520/10 ,  G01F23/70 ,  G05D2201/0201

摘要： An agricultural method for preventing roll-back of an agricultural vehicle may include receiving a roll-back prevention input from a speed setting device indicative of a command to increase the transmission speed of the hydrostatic transmission while a service brake of the agricultural vehicle is engaged. Further, the method may include adjusting a speed mapping for the speed setting device from a predetermined speed mapping to a roll-back speed mapping in response to the roll-back prevention input, with the roll-back speed mapping being associated with a reduced speed range. Additionally, the method may include determining a transmission control command associated with a current position of the speed setting device based on the roll-back speed mapping and controlling an operation of the hydrostatic transmission to adjust the transmission speed based at least in part on the transmission control command.

公开(公告)号：US11769660B2

公开(公告)日：2023-09-26

申请号：US17541925

申请日：2021-12-03

申请人： NCC NANO, LLC

发明人： David Alex Rose ,  Kurt A. Schroder

IPC分类号： H01L21/02 ,  B08B3/04 ,  B08B7/00 ,  H01L21/687 ,  B08B7/04 ,  B08B3/08 ,  B08B5/02

CPC分类号： H01L21/02057 ,  B08B3/041 ,  B08B3/08 ,  B08B5/023 ,  B08B7/0035 ,  B08B7/0042 ,  B08B7/04 ,  H01L21/68764

摘要： A method for removing particles from a semiconductor wafer surface is disclosed. A wafer is being spun on a spin coater contained within a condensing environment. Liquid vapor is then infused into the condensing environment to allow some of the liquid vapor to be condensed onto a surface of the wafer on which particles may adhere while the wafer is being spun. Next, a set of light pulses is applied to the surface of the spinning wafer. Finally, an air stream is utilized to carry the particles off the surface of the wafer.