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    Acidic hard surface cleaners
    391.
    发明申请
    Acidic hard surface cleaners 有权
    酸性硬表面清洁剂

    公开(公告)号：US20060100128A1

    公开(公告)日：2006-05-11

    申请号：US10525291

    申请日：2003-08-15

    Applicant: Karen McCue ,  Diane Neiman

    Inventor： Karen McCue ,  Diane Neiman

    IPC: C11D3/20

    CPC classification number: C11D11/0023 ,  C11D1/143 ,  C11D1/72 ,  C11D1/83 ,  C11D3/2003 ,  C11D3/201 ,  C11D3/2068 ,  C11D3/2075 ,  C11D3/2086 ,  C11D3/43

    Abstract: The present invention is directed to an acidic hard surface treatment composition which provides a cleaning and disinfecting benefit comprising: an acidic constituent which comprises water soluble organic acid; at least one anionic surfactant constituent; at least one nonionic surfactant constituent; at least one organic solvent constituent; optionally one or more further constituents and the balance, water. The compositions exhibit surprising efficacy against various gram positive and gram negative type pathogenic bacteria, as well as against fungi in the absence of known cationic quaternary ammonium compounds known to be effective against pathogenic bacteria, as well as other known-art antimicrobial constituents and bleach are excluded

    Abstract translation: 本发明涉及提供清洁和消毒益处的酸性硬表面处理组合物，其包括：酸性成分，其包含水溶性有机酸; 至少一种阴离子表面活性剂组分; 至少一种非离子表面活性剂组分; 至少一种有机溶剂成分; 任选地一种或多种另外的组分，余量为水。 该组合物对于各种革兰氏阳性和革兰氏阴性型致病菌以及已知的已知对病原菌有效的阳离子季铵化合物以及其它已知的抗微生物成分和漂白剂不存在令人惊奇的功效 排除

    Removal of particle contamination on a patterned silicon/silicon dioxide using dense fluid/chemical formulations
    395.
    发明申请
    Removal of particle contamination on a patterned silicon/silicon dioxide using dense fluid/chemical formulations 审中-公开
    使用致密流体/化学配方去除图案化硅/二氧化硅上的颗粒污染

    公开(公告)号：US20060019850A1

    公开(公告)日：2006-01-26

    申请号：US11224214

    申请日：2005-09-12

    Applicant: Michael Korzenski ,  Chongying Xu ,  Thomas Baum

    Inventor： Michael Korzenski ,  Chongying Xu ,  Thomas Baum

    IPC: C11D7/32

    CPC classification number: C11D1/004 ,  B08B7/0021 ,  C11D1/83 ,  C11D3/042 ,  C11D3/046 ,  C11D3/201 ,  C11D3/2034 ,  C11D3/24 ,  C11D11/0047 ,  H01L21/02063 ,  H01L21/02101

    Abstract: A cleaning composition for cleaning particulate contamination from small dimensions on microelectronic device substrates. The cleaning composition contains dense CO2 (preferably supercritical CO2 (SCCO2)), alcohol, fluoride source, anionic surfactant source, non-ionic surfactant source, and optionally, hydroxyl additive. Such cleaning composition overcomes the intrinsic deficiency of SCCO2 as a cleaning reagent, viz., the non-polar character of SCCO2 and its associated inability to solubilize species such as inorganic salts and polar organic compounds that are present in particulate contamination on wafer substrates and that must be removed from the microelectronic device substrate for efficient cleaning. The cleaning composition enables damage-free, residue-free cleaning of substrates having particulate contamination on Si/SiO2 substrates.

    Abstract translation: 一种用于从微电子器件基底上的小尺寸清洁颗粒污染物的清洁组合物。 清洁组合物含有致密的CO 2（优选超临界CO 2（SCCO 2 2）），醇，氟化物源，阴离子表面活性剂源， 离子表面活性剂源和任选的羟基添加剂。 这种清洁组合物克服了作为清洁试剂的SCCO 2 N的固有缺陷，即SCCO 2的非极性特征，并且其不溶于物质如无机物 盐和极性有机化合物，其存在于晶片衬底上的颗粒污染中，并且必须从微电子器件衬底移除以进行有效的清洁。 清洁组合物能够对Si / SiO 2基体上具有颗粒污染物的基材进行无损伤，无残留的清洗。

    Low VOC cleaning compositions for hard surfaces
    398.
    发明授权
    Low VOC cleaning compositions for hard surfaces 有权
    用于硬表面的低VOC清洁组合物

    公开(公告)号：US06881711B1

    公开(公告)日：2005-04-19

    申请号：US10046867

    申请日：2001-10-26

    Applicant: Aleksei V. Gershun ,  Mark V. Alexander ,  Colin M. Dilley

    Inventor： Aleksei V. Gershun ,  Mark V. Alexander ,  Colin M. Dilley

    IPC: C11D3/02 ,  C11D3/20 ,  C11D3/30 ,  C11D1/86 ,  C11D3/44

    CPC classification number: C11D3/044 ,  C11D3/201 ,  C11D3/2024 ,  C11D3/2068 ,  C11D3/30

    Abstract: The present invention relates generally to compositions and methods for cleaning hard surfaces. More particularly, the present invention relates to cleaning compositions which can be used in automotive applications for removing organic soils that accumulate on automotive surfaces without causing surface paint damage. Such cleaning compositions of the present invention are environmentally safe and contain no or low amounts of volatile organic compounds.

    Abstract translation: 本发明一般涉及用于清洁硬表面的组合物和方法。 更具体地说，本发明涉及可用于汽车应用中去除积聚在汽车表面上而不引起表面油漆损坏的有机污垢的清洁组合物。 本发明的这种清洁组合物是环境安全的，并且不含或少量的挥发性有机化合物。

    Compositions to reduce textile contaminants and associated processing methods
    400.
    发明授权
    Compositions to reduce textile contaminants and associated processing methods 失效
    减少纺织污染物和相关加工方法的组合物

    公开(公告)号：US06844307B1

    公开(公告)日：2005-01-18

    申请号：US10067109

    申请日：2002-02-04

    Applicant: Jeffrey Todd Sumner

    Inventor： Jeffrey Todd Sumner

    IPC: C11D1/52 ,  C11D1/66 ,  C11D1/72 ,  C11D3/20 ,  C11D3/32 ,  C11D3/34 ,  C11D3/36 ,  C11D3/37 ,  C11D3/44

    CPC classification number: C11D3/2093 ,  C11D1/525 ,  C11D1/667 ,  C11D1/72 ,  C11D3/201 ,  C11D3/32 ,  C11D3/3409 ,  C11D3/362 ,  C11D3/3749

    Abstract: Contaminant solubilizing compositions are provided that are suitable for use in a variety of textile applications, including dyeing applications. The contaminant solubilizing compositions generally include at least one C1 to C4 ester of lactic acid, at least one surfactant and at least one solvent. The contaminant solubilizing compositions may be used either alone or within larger textile cleaning compositions to remove contaminants from the surfaces of textile articles or the manufacturing equipment used to process textile articles, including dyeing equipment.

    Abstract translation: 提供了适用于各种纺织应用（包括染色应用）的污染物增溶组合物。 污染物增溶组合物通常包括至少一种乳酸的C1-C4酯，至少一种表面活性剂和至少一种溶剂。 污染物增溶组合物可以单独使用或在更大的织物清洁组合物内使用，以从织物制品的表面或用于加工纺织制品（包括染色设备）的制造设备中除去污染物。

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