公开(公告)号：US20140336099A1

公开(公告)日：2014-11-13

申请号：US14340127

申请日：2014-07-24

申请人： Ecolab USA Inc.

发明人： Erik C. Olson ,  Carter M. Silvernail

IPC分类号： C11D3/22 ,  C11D3/08

CPC分类号： C11D3/221 ,  C11D3/08 ,  C11D3/10 ,  C11D3/2065 ,  C11D3/3761 ,  C11D7/04 ,  C11D7/14 ,  C11D7/262 ,  C11D17/0047 ,  C11D17/0056

摘要： Solid detergent compositions according to the present invention include at least one alkali metal silicate, at least one polycarboxylic acid, at least one saccharide or sugar alcohol and water. Suitable saccharides include sucrose, fructose, inulin, maltose and lactulose, and may be present in the composition in a concentration of at least 0.5 wt %. Compositions according to certain embodiments form stable solid block detergent compositions that do not swell significantly even when subjected to elevated temperatures.

摘要翻译： 根据本发明的固体洗涤剂组合物包括至少一种碱金属硅酸盐，至少一种多元羧酸，至少一种糖或糖醇和水。 合适的糖包括蔗糖，果糖，菊粉，麦芽糖和乳果糖，并且可以以至少0.5重量％的浓度存在于组合物中。 根据某些实施方案的组合物形成稳定的固体块状洗涤剂组合物，即使经历升高的温度也不会显着膨胀。

公开(公告)号：US20080132740A1

公开(公告)日：2008-06-05

申请号：US11792467

申请日：2005-11-08

申请人： Tomoyuki Hirano ,  Masaaki Yoshida

发明人： Tomoyuki Hirano ,  Masaaki Yoshida

IPC分类号： C07C31/125 ,  C07C31/12

CPC分类号： C11D7/5022 ,  C11D7/261 ,  C11D7/262 ,  C11D11/0047

摘要： A cleaning solvent is disclosed for removing residual resin compositions. The cleaning solvent contains at least an alcohol solvent having a boiling point of at least 100° C. The alcohol solvent having a boiling point of at least 100° C. is preferably constituted of at least one solvent selected from n-butyl alcohol, isobutyl alcohol, n-pentanol, 4-methyl-2-pentanol, and 2-octanol. It is more preferable that the alcohol solvent is an isobutyl alcohol.

摘要翻译： 公开了用于除去残留树脂组合物的清洁溶剂。 清洗溶剂至少含有沸点为至少100℃的醇溶剂。沸点至少为100℃的醇溶剂优选由至少一种选自正丁醇，异丁基 醇，正戊醇，4-甲基-2-戊醇和2-辛醇。 醇溶剂更优选为异丁醇。

公开(公告)号：US20070207938A1

公开(公告)日：2007-09-06

申请号：US11783344

申请日：2007-04-09

申请人： Wai Lee

发明人： Wai Lee

IPC分类号： C11D3/30

CPC分类号： B24B37/042 ,  C09D9/00 ,  C11D3/2058 ,  C11D3/2065 ,  C11D3/2086 ,  C11D3/30 ,  C11D3/3427 ,  C11D3/3472 ,  C11D3/43 ,  C11D7/04 ,  C11D7/261 ,  C11D7/262 ,  C11D7/263 ,  C11D7/265 ,  C11D7/267 ,  C11D7/32 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/3227 ,  C11D7/3245 ,  C11D7/3254 ,  C11D7/3263 ,  C11D7/3272 ,  C11D7/3281 ,  C11D7/34 ,  C11D7/5013 ,  C11D11/0047 ,  C11D11/0052 ,  C23G1/103 ,  C23G1/18 ,  C23G1/205 ,  G03F7/42 ,  G03F7/423 ,  G03F7/425 ,  G03F7/426 ,  H01L21/02052 ,  H01L21/02063 ,  H01L21/02071 ,  H01L21/31133 ,  H01L21/76814 ,  H01L21/76885

摘要： A remover composition and method for removing resists from substrates containing nucleophilic amine and at least one solvent is described. Optionally, a chelating agent can also be included in the remover composition. The remover composition is especially suitable for removing a variety of resists from substrates at different stages in the process of manufacturing integrated circuits.

公开(公告)号：US20050234270A1

公开(公告)日：2005-10-20

申请号：US10513360

申请日：2003-03-25

申请人： Alfred Kaizik ,  Walter Totsch ,  Wilhelm Droste ,  Wilfried Buschken ,  Dirk Rottger ,  Klaus-Diether Wiese

发明人： Alfred Kaizik ,  Walter Totsch ,  Wilhelm Droste ,  Wilfried Buschken ,  Dirk Rottger ,  Klaus-Diether Wiese

IPC分类号： C07H15/04 ,  C07B61/00 ,  C07C29/141 ,  C07C29/16 ,  C07C31/125 ,  C07C41/03 ,  C07C43/13 ,  C07C45/50 ,  C07C67/08 ,  C07C69/003 ,  C07C69/44 ,  C07C69/75 ,  C07C69/80 ,  C07C303/24 ,  C07C305/04 ,  C07C305/10 ,  C07F9/09 ,  C08B37/00 ,  C08K5/00 ,  C11D3/00 ,  C11D7/26 ,  C07C29/15

CPC分类号： C11D7/262 ,  C07C29/141 ,  C07C45/50 ,  C08K5/0016 ,  C11D3/001 ,  C11D7/261 ,  C11D7/266 ,  C07C47/02 ,  C07C31/125

摘要： The present invention relates to a process for preparing a C13-alcohol mixture which is suitable, in particular, as precursor for the preparation of compounds having surfactant properties and of plasticizers.

摘要翻译： 本发明涉及一种制备C 13 - 醇混合物的方法，其特别适用于制备具有表面活性剂的化合物和增塑剂的前体。

公开(公告)号：US20050037937A1

公开(公告)日：2005-02-17

申请号：US10948496

申请日：2004-09-23

申请人： Luigi Pace ,  Luca Sarcinelli ,  Melanie Tromeur

发明人： Luigi Pace ,  Luca Sarcinelli ,  Melanie Tromeur

IPC分类号： C11D3/00 ,  C11D3/02 ,  C11D3/12 ,  C11D3/20 ,  C11D3/43 ,  C11D7/06 ,  C11D7/10 ,  C11D7/26 ,  C11D7/32 ,  C11D7/36 ,  C11D7/50 ,  C11D11/00 ,  C11D1/00

CPC分类号： C11D3/0052 ,  C11D3/0031 ,  C11D3/0042 ,  C11D3/042 ,  C11D3/044 ,  C11D3/128 ,  C11D3/2075 ,  C11D3/43 ,  C11D7/06 ,  C11D7/10 ,  C11D7/261 ,  C11D7/262 ,  C11D7/263 ,  C11D7/264 ,  C11D7/3209 ,  C11D7/3227 ,  C11D7/3245 ,  C11D7/3263 ,  C11D7/3281 ,  C11D7/36 ,  C11D7/50 ,  C11D11/0017 ,  C11D11/007

摘要： The present invention relates to a process of treating a fabric with a composition comprising an activated zeolite.

摘要翻译： 本发明涉及一种用包含活化沸石的组合物处理织物的方法。

公开(公告)号：US20050031847A1

公开(公告)日：2005-02-10

申请号：US10483633

申请日：2002-07-12

申请人： Nicholas Martens ,  Achim Ansmann ,  Matthias Hauser ,  Ulrich Issberner ,  Bettina Jackwerth ,  Mark Leonard

发明人： Nicholas Martens ,  Achim Ansmann ,  Matthias Hauser ,  Ulrich Issberner ,  Bettina Jackwerth ,  Mark Leonard

IPC分类号： A61K8/00 ,  A61F13/15 ,  A61K8/02 ,  A61K8/06 ,  A61K8/30 ,  A61K8/31 ,  A61K8/34 ,  A61K8/36 ,  A61K8/37 ,  A61L15/00 ,  A61Q19/00 ,  A61Q19/10 ,  C11D1/66 ,  C11D3/20 ,  C11D7/26 ,  C11D17/04

CPC分类号： A61K8/0208 ,  A61K8/342 ,  A61K8/375 ,  A61Q19/00 ,  A61Q19/10 ,  C11D1/667 ,  C11D3/201 ,  C11D3/2013 ,  C11D3/2093 ,  C11D7/261 ,  C11D7/262 ,  C11D7/266 ,  C11D17/049 ,  Y10T428/249997 ,  Y10T428/31504

摘要： This invention concerns products for cleansing and other applications that comprise a sheet of absorbent material, in particular of non-woven material, such as a wipe, to which are applied a lipid and an aqueous phase. The invention further concerns the manufacture and use of such products.

摘要翻译： 本发明涉及用于清洁和其它应用的产品，其包括吸收材料片材，特别是非织造材料，例如擦拭物，其中施加有脂质和水相。 本发明还涉及这种产品的制造和使用。

公开(公告)号：US20040173246A1

公开(公告)日：2004-09-09

申请号：US10804338

申请日：2004-03-18

发明人： Gene R. Damaso ,  James E. Schulte ,  Timothy L. Racette

IPC分类号： B08B003/00

CPC分类号： C11D7/262 ,  B08B3/12 ,  B08B7/0021 ,  C11D7/261 ,  C11D7/263 ,  C11D7/264 ,  C11D7/266 ,  C11D7/5004 ,  C11D7/5022 ,  C11D11/0064 ,  D06F43/007 ,  D06L1/02 ,  D06L1/08

摘要： A cleaning system that utilizes an organic cleaning solvent and pressurized fluid solvent is disclosed. The system has no conventional evaporative hot air drying cycle. Instead, the system utilizes the solubility of the organic solvent in pressurized fluid solvent as well as the physical properties of pressurized fluid solvent. After an organic solvent cleaning cycle, the solvent is extracted from the textiles at high speed in a rotating drum in the same way conventional solvents are extracted from textiles in conventional evaporative hot air dry cleaning machines. Instead of proceeding to a conventional drying cycle, the extracted textiles are then immersed in pressurized fluid solvent to extract the residual organic solvent from the textiles. This is possible because the organic solvent is soluble in pressurized fluid solvent. After the textiles are immersed in pressurized fluid solvent, pressurized fluid solvent is pumped from the drum. Finally, the drum is de-pressurized to atmospheric pressure to evaporate any remaining pressurized fluid solvent, yielding clean, solvent free textiles. The organic solvent is preferably selected from terpenes, halohydrocarbons, certain glycol ethers, polyols, ethers, esters of glycol ethers, esters of fatty acids and other long chain carboxylic acids, fatty alcohols and other long-chain alcohols, short-chain alcohols, polar aprotic solvents, siloxanes, hydrofluoroethers, dibasic esters, and aliphatic hydrocarbons solvents or similar solvents or mixtures of such solvents and the pressurized fluid solvent is preferably densified carbon dioxide.

摘要翻译： 公开了一种利用有机清洗溶剂和加压流体溶剂的清洁系统。 该系统没有常规的蒸发热风干燥循环。 相反，该系统利用有机溶剂在加压流体溶剂中的溶解度以及加压流体溶剂的物理性质。 在有机溶剂清洗循环之后，以与传统蒸发式热风干燥机中的纺织品中提取常规溶剂相同的方式，在旋转滚筒中以高速从织物中提取溶剂。 代替进行常规的干燥循环，然后将提取的纺织品浸入加压流体溶剂中以从纺织品中提取残留的有机溶剂。 这是可能的，因为有机溶剂可溶于加压流体溶剂。 将纺织品浸入加压流体溶剂中后，从鼓中泵送加压流体溶剂。 最后，将滚筒减压至大气压力以蒸发任何剩余的加压流体溶剂，产生干净，无溶剂的纺织品。 有机溶剂优选选自萜烯，卤代烃，某些二醇醚，多元醇，醚，二醇醚的酯，脂肪酸和其它长链羧酸的酯，脂肪醇和其它长链醇，短链醇，极性 非质子溶剂，硅氧烷，氢氟醚，二元酯和脂族烃溶剂或类似溶剂或这些溶剂的混合物和加压流体溶剂优选是致密化的二氧化碳。

公开(公告)号：US06689734B2

公开(公告)日：2004-02-10

申请号：US10191280

申请日：2002-07-10

申请人： Kyle J. Doyel ,  Michael L. Bixenman ,  Scotty S. Sengsavang ,  Arthur J. Thompson ,  Valerie G. Porter ,  Patricia D. Overstreet ,  Kristie L. Gholson

发明人： Kyle J. Doyel ,  Michael L. Bixenman ,  Scotty S. Sengsavang ,  Arthur J. Thompson ,  Valerie G. Porter ,  Patricia D. Overstreet ,  Kristie L. Gholson

IPC分类号： C11D344

CPC分类号： C11D7/5018 ,  C11D7/261 ,  C11D7/262 ,  C11D7/266 ,  C11D7/28 ,  C11D7/30 ,  C11D7/504 ,  C11D7/5068

摘要： Chemical solvating, degreasing, stripping and cleaning agents. The agents are cleaning and solvating mixtures of mono brominated compounds with highly fluorinated compounds and/or other agents that improve and enhance the properties of the original mixture. The addition of these agents to the composition will modify the physical and/or cleaning characteristics of the monobrominated compound and/or monobrominated compound-fluorinated compound mixture to accomplish is desired cleaning or solvating task. These other agents are one or more of the following materials: alcohols, esters, ethers, cyclic ethers, ketones, alkanes, terpenes, dibasic esters, glycol ethers, pyrollidones, or low or non ozone depleting chlorinated and chlorinated/fluorinated hydrocarbons. These mixtures are useful in a variety of solvating, vapor degreasing, photoresist stripping, adhesive removal, aerosol, cold cleaning, and solvent cleaning applications including defluxing, drycleaning, degreasing, particle removal, metal and textile cleaning.

摘要翻译： 化学溶剂化，脱脂，剥离和清洗剂。 这些试剂是将单溴化化合物与高度氟化的化合物和/或改善和增强原始混合物的性质的其它试剂的混合物进行清洗和溶剂化。 将这些试剂加入到组合物中将改变单溴化化合物和/或一溴化合物 - 氟化合物混合物的物理和/或清洁特性以达到所需的清洁或溶剂化任务。 这些其他试剂是以下材料中的一种或多种：醇，酯，醚，环醚，酮，烷烃，萜烯，二元酯，二醇醚，吡咯烷酮，或低或非臭氧消耗氯化和氯化/氟化烃。 这些混合物可用于各种溶剂化，蒸气脱脂，光致抗蚀剂剥离，粘合剂去除，气溶胶，冷清洁和溶剂清洁应用，包括去焊，干洗，脱脂，除尘，金属和纺织品清洁。

公开(公告)号：US6140286A

公开(公告)日：2000-10-31

申请号：US865125

申请日：1997-05-30

申请人： Keiji Watanabe ,  Masayuki Ochiai ,  Yasuo Yamagishi ,  Ei Yano ,  Nobuo Igusa ,  Isamu Takachi

发明人： Keiji Watanabe ,  Masayuki Ochiai ,  Yasuo Yamagishi ,  Ei Yano ,  Nobuo Igusa ,  Isamu Takachi

IPC分类号： B08B3/08 ,  B23K1/00 ,  B23K1/20 ,  C11D7/24 ,  C11D7/26 ,  C11D7/32 ,  C11D7/50 ,  C11D7/60 ,  C11D11/00 ,  C23G5/02 ,  C23G5/024 ,  C23G5/032 ,  C23G5/04 ,  H05K3/26 ,  C11D9/04 ,  C03C23/00 ,  C23G1/02

CPC分类号： C11D7/262 ,  B23K1/203 ,  C11D11/0047 ,  C11D7/261 ,  C11D7/263 ,  C11D7/264 ,  C11D7/266 ,  C11D7/3227 ,  C11D7/5022 ,  C11D7/5027 ,  C23G5/024 ,  C23G5/032 ,  C23G5/04 ,  H05K3/26 ,  C11D7/24 ,  C11D7/265 ,  H05K2203/0257 ,  H05K2203/0783 ,  H05K2203/086 ,  H05K2203/1518

摘要： The defluxing agent for flux residue after soldering contains an acid (preferably an organic acid, and particularly an acid stronger than abietic acid; for example, acrylic acid, acetic acid, propionic acid, benzoic acid) and an organic solvent (for example, xylene, benzyl acetate, methyl .alpha.-hydroxyisobutyrate, cyclohexanone, methyl .beta.-methoxyisobutyrate), and if necessary it further contains a monohydric alcohol, a surfactant and a corrosion inhibitor. Rinsing is preferably performed after the cleaning, using a solvent which is miscible with the defluxing agent, in order to completely remove the acid. There is also disclosed a cleaning apparatus which may be generally used for this and other cleaning.

摘要翻译： 焊接后的助焊剂残渣的脱焊剂含有酸（优选为有机酸，特别是比松香酸强的酸），例如丙烯酸，乙酸，丙酸，苯甲酸）和有机溶剂（例如二甲苯 ，乙酸苄酯，α-羟基异丁酸甲酯，环己酮，β-甲氧基异丁酸甲酯），如果需要，它还含有一元醇，表面活性剂和缓蚀剂。 优选在使用与脱流剂混溶的溶剂进行清洗之后进行冲洗以完全除去酸。 还公开了一般可用于这种和其他清洁的清洁装置。

公开(公告)号：US6060439A

公开(公告)日：2000-05-09

申请号：US939437

申请日：1997-09-29

申请人： Kyle J. Doyel ,  Michael L. Bixenman ,  Scotty S. Sengsavang ,  Kristie L. Gholson ,  Patricia D. Overstreet ,  Arthur J. Thompson ,  Valerie G. Porter

发明人： Kyle J. Doyel ,  Michael L. Bixenman ,  Scotty S. Sengsavang ,  Kristie L. Gholson ,  Patricia D. Overstreet ,  Arthur J. Thompson ,  Valerie G. Porter

IPC分类号： C11D3/00 ,  C11D7/24 ,  C11D7/26 ,  C11D7/28 ,  C11D7/32 ,  C11D7/50 ,  C11D11/00

CPC分类号： C11D7/262 ,  C11D11/0035 ,  C11D11/007 ,  C11D3/0078 ,  C11D7/261 ,  C11D7/3209 ,  C11D7/3281 ,  C11D7/5013 ,  C11D7/24 ,  C11D7/263 ,  C11D7/264 ,  C11D7/265 ,  C11D7/266 ,  C11D7/267 ,  C11D7/28 ,  C11D7/32 ,  C11D7/3218

摘要： Compositions and methods for cleaning, solvating, and/or removing plastic resins and polymers or other contaminants from manufactured articles or manufacturing equipment, particularly in the production of optical lenses. The compositions contain at least one nitrogen containing compound as well as other optional solvents and additives. The compositions can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present.