公开(公告)号：US11194258B2

公开(公告)日：2021-12-07

申请号：US16838139

申请日：2020-04-02

Applicant: ASML NETHERLANDS B. V.

Inventor： Léon Maria Albertus Van Der Logt ,  Bart Peter Bert Segers ,  Simon Hendrik Celine Van Gorp ,  Carlo Cornelis Maria Luijten ,  Frank Staals

IPC: G03F7/00 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic process is one that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. During the lithographic process, the focus needs to be controlled. There is disclosed a method for determining a fingerprint of a performance parameter associated with a substrate, such as a focus value to be used during the lithographic process. A reference fingerprint of the performance parameter is determined for a reference substrate. A reference substrate parameter of the reference substrate is determined. A substrate parameter for a substrate, such as a substrate with product structures, is determined. Subsequently, the fingerprint of the performance parameter is determined based on the reference fingerprint, reference substrate parameter and the substrate parameter. The fingerprint may then be used to control the lithographic process.

公开(公告)号：US20210172891A1

公开(公告)日：2021-06-10

申请号：US17020574

申请日：2020-09-14

Applicant: ASML Netherlands B. V.

Inventor： Guochong Weng ,  Youjin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

IPC: G01N23/2251 ,  H05F3/02 ,  H01J37/20 ,  H01J37/02 ,  H01J37/28

Abstract: A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EU mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

公开(公告)号：US20210003928A1

公开(公告)日：2021-01-07

申请号：US17028287

申请日：2020-09-22

Applicant: ASML Netherlands B,V,

Inventor： Arie Jeffrey Den Boef ,  Ronald Joseph Antonius Van Den Oetelaar

IPC: G03F7/20 ,  G01N21/21 ,  G03F9/00 ,  G01N21/47

Abstract: A metrology apparatus for and a method of determining a characteristic of interest relating to at least one structure on a substrate. The metrology apparatus comprises a sensor and an optical system. The sensor is for detecting characteristics of radiation impinging on the sensor. The optical system comprises an illumination path and a detection path. The optical system is configured to illuminate the at least one structure with radiation received from a source via the illumination path. The optical system is configured to receive radiation scattered by the at least one structure and to transmit the received radiation to the sensor via the detection path.

公开(公告)号：US20180210348A1

公开(公告)日：2018-07-26

申请号：US15935670

申请日：2018-03-26

Applicant: ASML NETHERLANDS B. V.

Inventor： Takeshi KANEKO ,  Kornelis Tijmen Hoekerd

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925 ,  G03F7/7095 ,  G03F7/70975

Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.

公开(公告)号：US20170329218A1

公开(公告)日：2017-11-16

申请号：US15666489

申请日：2017-08-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Klaus SIMON

IPC: G03F7/00 ,  B82Y40/00 ,  B82Y10/00

CPC classification number: G03F9/7042 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.

公开(公告)号：US20170315450A1

公开(公告)日：2017-11-02

申请号：US15653380

申请日：2017-07-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Heine Melle MULDER ,  Johannes Jacobus Matheus BASELMANS ,  Adrianus Franciscus Petrus ENGELEN ,  Markus Franciscus Antonius EURLINGS ,  Hendrikus Robertus Marie VAN GREEVENBROEK ,  Paul VAN DER VEEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Wilfred Edward ENDENDIJK

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70216

Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

公开(公告)号：US20090296081A1

公开(公告)日：2009-12-03

申请号：US12536301

申请日：2009-08-05

Applicant: Reinder Teun PLUG ,  Arie Jeffrey Den Boef ,  Karel Diederick Van Der Mast

Inventor： Reinder Teun PLUG ,  Arie Jeffrey Den Boef ,  Karel Diederick Van Der Mast

IPC: G01N21/00

CPC classification number: G03F7/70758 ,  G03F7/70766

Abstract: A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table, a sensor, a displacement system, a balance mass, and a bearing. The substrate table is constructed and arranged to hold the substrate. The sensor is constructed and arranged to measure a parameter of the substrate. The displacement system is configured to displace the substrate table or the sensor with respect to the other in a first direction. The bearing is configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.

Abstract translation: 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 测量工具包括底架，底座台，传感器，排量系统，平衡块和轴承。 衬底台被构造和布置成保持衬底。 传感器被构造和布置以测量衬底的参数。 位移系统构造成在第一方向相对于另一个移动衬底台或传感器。 轴承构造成可移动地支撑第一平衡块，以便在与第一方向相反的方向上基本上自由地平移，以抵消基板台或传感器在第一方向上的位移。

公开(公告)号：US20090094005A1

公开(公告)日：2009-04-09

申请号：US12247371

申请日：2008-10-08

Applicant: Arie Jeffrey DEN BOEF ,  Hugo Augustinus Joseph Cramer ,  Jouke Krist ,  Willem Jan Grootjans

Inventor： Arie Jeffrey DEN BOEF ,  Hugo Augustinus Joseph Cramer ,  Jouke Krist ,  Willem Jan Grootjans

IPC: G06F17/10

CPC classification number: G03F7/70625 ,  G01B11/24 ,  G01N21/255 ,  G01N21/47 ,  G01N21/95607 ,  G06F17/10 ,  G06F17/5009

Abstract: A set of parameters used in a model of a spectrometer includes free parameters and fixed parameters. A first set of values for the parameters is set and the model is used to generate a first spectrum. A value of one of the fixed parameters is changed and a second spectrum is generated. An inverse of the model of the spectrometer is then applied to the second spectrum to generate a set of values for the parameters, the values being the same as the first set of values except for one or more of the free parameters. If the free parameter has significantly changed the fixed parameter is designated a free parameter.

Abstract translation: 在光谱仪模型中使用的一组参数包括自由参数和固定参数。 设置参数的第一组值，并使用该模型生成第一个频谱。 固定参数中的一个的值被改变并产生第二个频谱。 然后将光谱仪的模型的反相应用于第二光谱以生成参数的一组值，该值与除了一个或多个空闲参数之外的第一组值相同。 如果自由参数明显改变，则固定参数被指定为空闲参数。

公开(公告)号：US20080148978A1

公开(公告)日：2008-06-26

申请号：US11643954

申请日：2006-12-22

Applicant: Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

Inventor： Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC: G03B27/52 ,  B41M5/00

CPC classification number: G03F7/70291 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70558

Abstract: An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an ablation material and encloses a volume. The assembly further has an ablation generation device. The ablation generation device is arranged to ablate at least a portion of the ablation material upon reception of a blocking signal. The assembly has a control unit, which is arranged to control the ablation generation device.

Abstract translation: 提供用于阻挡辐射束的组件。 组件具有布置成透射辐射束的至少一部分的管。 管道具有设置有消融材料并包围体积的内表面。 组件还具有消融产生装置。 消融产生装置被布置成在接收到阻塞信号时烧蚀消融材料的至少一部分。 组件具有控制单元，其被布置成控制消融产生装置。

公开(公告)号：US20070243329A1

公开(公告)日：2007-10-18

申请号：US11404108

申请日：2006-04-14

Applicant: Silvester De Graaf

Inventor： Silvester De Graaf

IPC: B05D5/00 ,  G03B27/00

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus has a barrier member surrounding a space between the projection system and the substrate so as to at least partly confine liquid in the space. A jet of liquid is directed radially inwardly in a gap between the barrier member and the substrate and/or between the barrier member and the projection system, to help prevent escape of liquid.

Abstract translation: 浸没式光刻设备具有围绕投影系统和基板之间的空间的屏障构件，以至少部分地将液体限制在该空间中。 液体射流径向向内定向在阻挡构件和基底之间的间隙中和/或在阻挡构件和投影系统之间，以有助于防止液体逸出。