公开(公告)号：US20050240717A1

公开(公告)日：2005-10-27

申请号：US10709296

申请日：2004-04-27

Applicant: Kevin Lin

Inventor： Kevin Lin

IPC: G06F12/00 ,  G06F12/06 ,  G06F12/08

CPC classification number: G06F12/0607

Abstract: A method for storing data into a SRDAM. The method comprises the following steps: receiving a plurality of blocks of data; labeling said blocks successively from 1 in step of 1; dividing the label of each of said blocks by M and acquiring a corresponding remainder for each of said block, wherein M is the number of banks in said SRDAM and a positive integer; and storing said blocks in said SRDAM in according to the following rule: any logical adjacent said blocks are located physically at different banks of said SRDAM. Herein, one said block has a remainder I is stored in the (I+1) bank in said SRDAM, I being a non-positive integer. Moreover, wherein a plurality of blocks in the same backs could be stored in sequence, and said blocks are arranged in the order of corresponding remainder.

Abstract translation: 一种将数据存储到SRDAM中的方法。 该方法包括以下步骤：接收多个数据块; 从1的步骤1连续地标记所述块; 将每个所述块的标签除以M，并为每个所述块获取相应的余数，其中M是所述SRDAM中的组的数量和正整数; 并且根据以下规则将所述块存储在所述SRDAM中：与所述SRDAM的物理位置物理地位于所述SRDAM的不同组中的任何逻辑相邻的所述块。 这里，一个所述块具有剩余部分I存储在所述SRDAM中的（I + 1）组中，I是非正整数。 此外，其中相同背部中的多个块可以按顺序存储，并且所述块按照相应余数的顺序排列。

公开(公告)号：US20050202359A1

公开(公告)日：2005-09-15

申请号：US10801345

申请日：2004-03-15

Applicant: Tony Lin ,  Kevin Lin

Inventor： Tony Lin ,  Kevin Lin

IPC: F23D11/36 ,  F23D14/28 ,  F23D14/46

CPC classification number: F23D14/465 ,  F23D14/36 ,  F23Q2/287

Abstract: A safety switch device for gas gun comprises a safety lever, the safety lever has a stopping block, and at an end of the safety lever is defined with an elastic element which is used to make the safety lever return to its original position, a spark lever is defined with an abutting portion, the stopping block of the safety lever abuts against the lower portion of the abutting portion of the spark lever, such that the spark lever cannot be pressed down directly, so as to produce a passive protection mode.

Abstract translation: 用于气枪的安全开关装置包括安全杆，安全杆具有止动块，并且在安全杆的端部限定有用于使安全杆回到其初始位置的弹性元件，火花 杆被限定有抵接部分，安全杆的止动块抵靠火花杆的抵接部分的下部，使得火花杆不能被直接按压，以产生被动保护模式。

公开(公告)号：US20050036453A1

公开(公告)日：2005-02-17

申请号：US10824440

申请日：2004-04-15

Applicant: Kevin Lin ,  Morris Chu

Inventor： Kevin Lin ,  Morris Chu

IPC: G06F3/00 ,  G06F3/06 ,  G06F9/45 ,  G06F9/455 ,  G06F11/00 ,  G06F12/00 ,  G06F13/38 ,  G06F13/40 ,  G06F17/50 ,  G06K19/07 ,  G11B20/10 ,  G11C5/06 ,  G11C16/02 ,  G11C29/00 ,  H04L12/28

CPC classification number: G06F3/061 ,  G06F3/0656 ,  G06F3/0674 ,  G06F13/385 ,  G06F13/387 ,  G06F13/4081 ,  G06F17/5022 ,  G11C5/06 ,  G11C29/56004

Abstract: A controlling method and device for data transmission including the steps of providing a system bus for connecting a first transmission channel and a second transmission channel with a command processor, adjusting a transmitting direction of the system bus according to a transmitting direction of the second transmission channel, and proceeding the data processing procedures of the second transmission channel, wherein parts of data processing procedures of the first transmission channel will last during a interval between the system bus adjusting the transmitting direction and the data processing procedures of the second transmission channel start on. The present invention ensure that the independence between every data caching and processing reduces the times of flushing the cached data from the data transmission channel and re-seeking through the source, shortening the transmission time, increasing facileness and improving the efficiency of the data transmission.

Abstract translation: 一种用于数据传输的控制方法和装置，包括以下步骤：提供用于与命令处理器连接第一传输信道和第二传输信道的系统总线，根据第二传输信道的传输方向调整系统总线的传输方向 并且进行第二传输信道的数据处理过程，其中第一传输信道的数据处理过程的一部分将在调整发射方向的系统总线与第二传输信道的数据处理过程开始之间的间隔期间持续。 本发明确保了每个数据高速缓存与处理之间的独立性，减少了从数据传输通道冲洗缓存数据，通过源重新寻找，缩短传输时间，提高易用性，提高数据传输效率的时间。

公开(公告)号：US06496334B1

公开(公告)日：2002-12-17

申请号：US09579663

申请日：2000-05-26

Applicant: Song Pang ,  Lijun Tong ,  Zi-Wen Dong ,  Kevin Lin ,  Joyce Hsiang

Inventor： Song Pang ,  Lijun Tong ,  Zi-Wen Dong ,  Kevin Lin ,  Joyce Hsiang

IPC: G11B539

CPC classification number: B82Y25/00 ,  B82Y10/00 ,  G11B5/11 ,  G11B5/3146 ,  G11B5/3909 ,  G11B5/3912 ,  G11B5/398 ,  G11B2005/3996

Abstract: In at least one embodiment, the apparatus of the invention is a read sensor comprising a shield, a sensor element, an extra shield between the shield and the sensor element, an extra gap between the shield and the sensor and adjacent the extra shield, and a gap layer between the sensor element and the extra shield. The sensor element is positioned in a sensor layer. With the extra shield adjacent to the sensor element and separated by only the relatively thin gap layer, high areal recording density and excellent instability of the sensor element is obtained. At the same time, by fabricating the extra shield to be not significantly wider than the sensor element, the potential for shorting is minimized by placing both the gap and the thicker extra gap between the sensor lead elements and the shield. In at least one embodiment, the method of the invention is for fabricating a read sensor and comprises depositing an extra gap layer onto a shield, removing a portion of the extra gap layer to form a cavity, depositing an extra shield into the cavity, planarizing the extra gap and the extra shield, depositing a gap layer onto the extra gap and the extra shield, and depositing a sensor element onto the gap layer and adjacent to the extra shield.

Abstract translation: 在至少一个实施例中，本发明的装置是一种读取传感器，其包括屏蔽件，传感器元件，屏蔽件和传感器元件之间的额外的屏蔽层，屏蔽件和传感器之间的额外间隙，并且与附加屏蔽件相邻，以及 传感器元件和额外屏蔽之间的间隙层。 传感器元件位于传感器层中。 利用与传感器元件相邻并且仅由相对薄的间隙层隔开的附加屏蔽件，获得传感器元件的高面积记录密度和优异的不稳定性。 同时，通过将额外的屏蔽制造成不比传感器元件明显更宽，通过在传感器引线元件和屏蔽之间放置间隙和更厚的额外间隙，可以使短路的可能性最小化。 在至少一个实施例中，本发明的方法用于制造读取传感器，并且包括在屏蔽上沉积额外的间隙层，去除一部分额外的间隙层以形成空腔，向腔内沉积额外的屏蔽物，平坦化 额外的间隙和额外的屏蔽，将间隙层沉积到额外的间隙和额外的屏蔽上，以及将传感器元件沉积到间隙层上并与额外屏蔽件相邻。

公开(公告)号：US20160329438A1

公开(公告)日：2016-11-10

申请号：US15151381

申请日：2016-05-10

Applicant: Chytra Pawashe ,  Kevin Lin ,  Anurag Chaudhry ,  Raseong Kim ,  Seiyon Kim ,  Kelin Kuhn ,  Sasikanth Manipatruni ,  Rafael Rios ,  Ian A. Young

Inventor： Chytra Pawashe ,  Kevin Lin ,  Anurag Chaudhry ,  Raseong Kim ,  Seiyon Kim ,  Kelin Kuhn ,  Sasikanth Manipatruni ,  Rafael Rios ,  Ian A. Young

IPC: H01L29/84 ,  H01H59/00 ,  H01L29/161 ,  H01L29/06 ,  H01L29/04

CPC classification number: H01L29/84 ,  B82Y10/00 ,  H01H1/0094 ,  H01H9/0271 ,  H01H59/0009 ,  H01L29/045 ,  H01L29/0673 ,  H01L29/161

Abstract: Nanowire-based mechanical switching devices are described. For example, a nanowire relay includes a nanowire disposed in a void disposed above a substrate. The nanowire has an anchored portion and a suspended portion. A first gate electrode is disposed adjacent the void, and is spaced apart from the nanowire. A first conductive region is disposed adjacent the first gate electrode and adjacent the void, and is spaced apart from the nanowire.

Abstract translation: 描述了基于纳米线的机械开关装置。 例如，纳米线继电器包括布置在衬底上方的空隙中的纳米线。 纳米线具有锚固部分和悬挂部分。 第一栅电极邻近空隙设置，并与纳米线隔开。 第一导电区域邻近第一栅电极设置并邻近空隙，并与纳米线隔开。

公开(公告)号：US20160104642A1

公开(公告)日：2016-04-14

申请号：US14965734

申请日：2015-12-10

Applicant: Robert L. Bristol ,  Kevin Lin ,  Kanwal Jit Singh ,  Alan M. Myers ,  Richard E. Schenker

Inventor： Robert L. Bristol ,  Kevin Lin ,  Kanwal Jit Singh ,  Alan M. Myers ,  Richard E. Schenker

IPC: H01L21/768

CPC classification number: H01L21/76897 ,  H01L21/0274 ,  H01L21/31111 ,  H01L21/31144 ,  H01L21/76802 ,  H01L21/76808 ,  H01L21/76816 ,  H01L21/76825 ,  H01L23/522 ,  H01L23/5226 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Self-aligned via and plug patterning with photobuckets for back end of line (BEOL) interconnects is described. In an example, an interconnect structure for an integrated circuit includes a first layer of the interconnect structure disposed above a substrate, the first layer having a first grating of alternating metal lines and dielectric lines in a first direction. The dielectric lines have an uppermost surface higher than an uppermost surface of the metal lines. The integrated circuit also includes a second layer of the interconnect structure disposed above the first layer of the interconnect structure. The second layer includes a second grating of alternating metal lines and dielectric lines in a second direction, perpendicular to the first direction. The dielectric lines have a lowermost surface lower than a lowermost surface of the metal lines of the second grating. The dielectric lines of the second grating overlap and contact, but are distinct from, the dielectric lines of the first grating. The integrated circuit also includes a region of dielectric material disposed between the metal lines of the first grating and the metal lines of the second grating, and in a same plane as upper portions of the dielectric lines of the first grating and lower portions of the dielectric lines of the second grating. The region of dielectric material is composed of a cross-linked photolyzable material.

公开(公告)号：US08610986B2

公开(公告)日：2013-12-17

申请号：US12419210

申请日：2009-04-06

Applicant: Kanti Jain ,  Junghun Chae ,  Kevin Lin ,  Hyunjong Jin

Inventor： Kanti Jain ,  Junghun Chae ,  Kevin Lin ,  Hyunjong Jin

IPC: G02B26/08 ,  G02B26/10 ,  G02B26/12

CPC classification number: G02B26/0833 ,  G02B5/0833 ,  G02B5/0858 ,  G03F7/70291

Abstract: Micromirrors and micromirror arrays described herein are useful, for example in maskless photolithography systems and methods and projection display devices and methods. According to one aspect, the micromirrors comprise a polymer structural layer and a reflective dielectric multilayer for selective reflection and/or redirection of incoming electromagnetic radiation. According to another aspect, incorporation of a reflective dielectric multilayer allows for use of polymer structural materials in micromirrors and prevents damage to such polymer materials due to excessive heating from absorption of electromagnetic radiation, as the reflective dielectric multilayers are highly reflective and minimize heating of the micromirror components. According to yet a further aspect, top down fabrication methods are described herein for making a micromirror comprising a polymer structural layer and a reflective dielectric multilayer.

Abstract translation: 本文所述的微镜和微镜阵列是有用的，例如在无掩模光刻系统和方法以及投影显示装置和方法中。 根据一个方面，微镜包括用于选择性反射和/或重定向输入电磁辐射的聚合物结构层和反射电介质多层。 根据另一方面，引入反射电介质多层允许在微反射镜中使用聚合物结构材料，并且防止由于电磁辐射的吸收导致的过度加热而损坏这种聚合物材料，因为反射电介质多层是高度反射性的并且最小化 微镜组件。 根据又一方面，本文描述了自顶向下的制造方法，用于制造包括聚合物结构层和反射电介质多层的微镜。

公开(公告)号：US20130079376A1

公开(公告)日：2013-03-28

申请号：US13543760

申请日：2012-07-06

Applicant: Bijan Almassian ,  Martin J. Sadowski ,  Xu Kevin Lin

Inventor： Bijan Almassian ,  Martin J. Sadowski ,  Xu Kevin Lin

IPC: C07D235/30 ,  C07D213/53 ,  C07D213/38

CPC classification number: C07D235/30 ,  C07D213/38 ,  C07D213/53

Abstract: Compounds are provided according to formula I: where R, R′, R3, R4, R5, and R6 are as defined herein. Provided compounds and pharmaceutical compositions thereof are useful for the prevention and treatment of a variety of conditions in mammals including humans, including by way of non-limiting example, Alzheimer' s Disease, Down's syndrome, Parkinson's Disease, and others.

Abstract translation: 根据式I提供化合物：其中R，R'，R 3，R 4，R 5和R 6如本文所定义。 提供的化合物及其药物组合物可用于预防和治疗包括人在内的哺乳动物中的各种病症，包括非限制性实例，阿尔茨海默病，唐氏综合症，帕金森病等。

公开(公告)号：US20100255426A1

公开(公告)日：2010-10-07

申请号：US12419210

申请日：2009-04-06

Applicant: Kanti JAIN ,  Junghun Chae ,  Kevin Lin ,  Hyunjong Jin

Inventor： Kanti JAIN ,  Junghun Chae ,  Kevin Lin ,  Hyunjong Jin

IPC: G03F7/20 ,  B32B37/02 ,  G02B5/08 ,  G02B1/10 ,  G02B26/00 ,  G02B26/02

CPC classification number: G02B26/0833 ,  G02B5/0833 ,  G02B5/0858 ,  G03F7/70291

Abstract: Micromirrors and micromirror arrays described herein are useful, for example in maskless photolithography systems and methods and projection display devices and methods. According to one aspect, the micromirrors comprise a polymer structural layer and a reflective dielectric multilayer for selective reflection and/or redirection of incoming electromagnetic radiation. According to another aspect, incorporation of a reflective dielectric multilayer allows for use of polymer structural materials in micromirrors and prevents damage to such polymer materials due to excessive heating from absorption of electromagnetic radiation, as the reflective dielectric multilayers are highly reflective and minimize heating of the micromirror components. According to yet a further aspect, top down fabrication methods are described herein for making a micromirror comprising a polymer structural layer and a reflective dielectric multilayer.

Abstract translation: 本文所述的微镜和微镜阵列是有用的，例如在无掩模光刻系统和方法以及投影显示装置和方法中。 根据一个方面，微镜包括用于选择性反射和/或重定向输入电磁辐射的聚合物结构层和反射电介质多层。 根据另一方面，引入反射电介质多层允许在微反射镜中使用聚合物结构材料，并且防止由于电磁辐射的吸收导致的过度加热而损坏这种聚合物材料，因为反射电介质多层是高度反射性的并且使得 微镜组件。 根据又一方面，本文描述了自顶向下的制造方法，用于制造包括聚合物结构层和反射电介质多层的微镜。

公开(公告)号：US20100143848A1

公开(公告)日：2010-06-10

申请号：US12331131

申请日：2008-12-09

Applicant: Kanti Jain ,  Kevin Lin

Inventor： Kanti Jain ,  Kevin Lin

IPC: G03F7/20

CPC classification number: H05K1/0283 ,  B23K26/40 ,  B23K2103/172 ,  B81B2201/0292 ,  B81B2203/0109 ,  B81B2207/07 ,  B81C1/0019 ,  H05K3/0032 ,  H05K3/007 ,  H05K2201/09109 ,  H05K2203/0554 ,  H05K2203/308

Abstract: Described herein are processing techniques for fabrication of stretchable and/or flexible electronic devices using laser ablation patterning methods. The laser ablation patterning methods utilized herein allow for efficient manufacture of large area (e.g., up to 1 mm2 or greater or 1 m2 or greater) stretchable and/or flexible electronic devices, for example manufacturing methods permitting a reduced number of steps. The techniques described herein further provide for improved heterogeneous integration of components within an electronic device, for example components having improved alignment and/or relative positioning within an electronic device. Also described herein are flexible and/or stretchable electronic devices, such as interconnects, sensors and actuators.

Abstract translation: 这里描述了使用激光烧蚀图案化方法制造可拉伸和/或柔性电子器件的处理技术。 本文使用的激光烧蚀图案化方法允许有效地制造大面积（例如，高达1mm 2或更大或1m 2或更大）的可拉伸和/或柔性电子器件，例如允许减少步数的制造方法。 本文描述的技术进一步提供了改进的电子设备内的组件的异构集成，例如具有电子设备内的改进的对准和/或相对定位的组件。 本文还描述了柔性和/或可拉伸的电子设备，例如互连，传感器和致动器。