公开(公告)号：US09045933B2

公开(公告)日：2015-06-02

申请号：US13153601

申请日：2011-06-06

申请人： Kanti Jain ,  Linus Jang

发明人： Kanti Jain ,  Linus Jang

IPC分类号： G02B27/42 ,  E06B9/24

CPC分类号： E06B9/24 ,  E06B2009/2417 ,  G02B27/4277 ,  G02B27/4294

摘要： Energy-efficient windows incorporating spectrally selective optical elements capable of providing desirable optical characteristics (transmission, reflection, refraction or diffraction) for different wavelengths are disclosed herein. More specifically, energy-efficient windows incorporating suitably designed diffraction gratings to optimize the efficiency of the utilization of different spectral components of the solar radiation are disclosed.

摘要翻译： 本文公开了能够提供能够提供用于不同波长的期望光学特性（透射，反射，折射或衍射）的光谱选择性光学元件的节能窗口。 更具体地，公开了包括适当设计的衍射光栅的能量效率窗口以优化太阳辐射的不同光谱分量的利用效率。

公开(公告)号：US08610986B2

公开(公告)日：2013-12-17

申请号：US12419210

申请日：2009-04-06

申请人： Kanti Jain ,  Junghun Chae ,  Kevin Lin ,  Hyunjong Jin

发明人： Kanti Jain ,  Junghun Chae ,  Kevin Lin ,  Hyunjong Jin

IPC分类号： G02B26/08 ,  G02B26/10 ,  G02B26/12

CPC分类号： G02B26/0833 ,  G02B5/0833 ,  G02B5/0858 ,  G03F7/70291

摘要： Micromirrors and micromirror arrays described herein are useful, for example in maskless photolithography systems and methods and projection display devices and methods. According to one aspect, the micromirrors comprise a polymer structural layer and a reflective dielectric multilayer for selective reflection and/or redirection of incoming electromagnetic radiation. According to another aspect, incorporation of a reflective dielectric multilayer allows for use of polymer structural materials in micromirrors and prevents damage to such polymer materials due to excessive heating from absorption of electromagnetic radiation, as the reflective dielectric multilayers are highly reflective and minimize heating of the micromirror components. According to yet a further aspect, top down fabrication methods are described herein for making a micromirror comprising a polymer structural layer and a reflective dielectric multilayer.

摘要翻译： 本文所述的微镜和微镜阵列是有用的，例如在无掩模光刻系统和方法以及投影显示装置和方法中。 根据一个方面，微镜包括用于选择性反射和/或重定向输入电磁辐射的聚合物结构层和反射电介质多层。 根据另一方面，引入反射电介质多层允许在微反射镜中使用聚合物结构材料，并且防止由于电磁辐射的吸收导致的过度加热而损坏这种聚合物材料，因为反射电介质多层是高度反射性的并且最小化 微镜组件。 根据又一方面，本文描述了自顶向下的制造方法，用于制造包括聚合物结构层和反射电介质多层的微镜。

公开(公告)号：US08546067B2

公开(公告)日：2013-10-01

申请号：US12052980

申请日：2008-03-21

申请人： Kanti Jain ,  Junghun Chae

发明人： Kanti Jain ,  Junghun Chae

IPC分类号： G03F7/20

CPC分类号： H01L21/3213 ,  B23K26/0006 ,  B23K26/18 ,  B23K26/352 ,  B23K26/40 ,  B23K2103/08 ,  B23K2103/42 ,  B23K2103/50 ,  B23K2103/52 ,  B23K2103/56 ,  B81C1/00634 ,  B82Y20/00 ,  B82Y30/00 ,  G03F7/202 ,  Y10T428/24802

摘要： This invention provides photoablation—based processing techniques and materials strategies for making, assembling and integrating patterns of materials for the fabrication of electronic, optical and opto-electronic devices. Processing techniques of the present invention enable high resolution and/or large area patterning and integration of porous and/or nano- or micro-structured materials comprising active or passive components of a range of electronic devices, including integrated circuits (IC), microelectronic and macroelectronic systems, microfluidic devices, biomedical devices, sensing devices and device arrays, and nano- and microelectromechanical systems.

摘要翻译： 本发明提供了用于制造，组装和集成用于制造电子，光学和光电子器件的材料的图案的基于光消息的处理技术和材料策略。 本发明的加工技术能够实现高分辨率和/或大面积图案化和多孔和/或纳米或微结构材料的整合，包括一系列电子器件的有源或无源元件，包括集成电路（IC），微电子和 宏观电子系统，微流体装置，生物医学装置，感测装置和装置阵列以及纳米和微机电系统。

公开(公告)号：US20100255426A1

公开(公告)日：2010-10-07

申请号：US12419210

申请日：2009-04-06

申请人： Kanti JAIN ,  Junghun Chae ,  Kevin Lin ,  Hyunjong Jin

发明人： Kanti JAIN ,  Junghun Chae ,  Kevin Lin ,  Hyunjong Jin

IPC分类号： G03F7/20 ,  B32B37/02 ,  G02B5/08 ,  G02B1/10 ,  G02B26/00 ,  G02B26/02

CPC分类号： G02B26/0833 ,  G02B5/0833 ,  G02B5/0858 ,  G03F7/70291

摘要： Micromirrors and micromirror arrays described herein are useful, for example in maskless photolithography systems and methods and projection display devices and methods. According to one aspect, the micromirrors comprise a polymer structural layer and a reflective dielectric multilayer for selective reflection and/or redirection of incoming electromagnetic radiation. According to another aspect, incorporation of a reflective dielectric multilayer allows for use of polymer structural materials in micromirrors and prevents damage to such polymer materials due to excessive heating from absorption of electromagnetic radiation, as the reflective dielectric multilayers are highly reflective and minimize heating of the micromirror components. According to yet a further aspect, top down fabrication methods are described herein for making a micromirror comprising a polymer structural layer and a reflective dielectric multilayer.

摘要翻译： 本文所述的微镜和微镜阵列是有用的，例如在无掩模光刻系统和方法以及投影显示装置和方法中。 根据一个方面，微镜包括用于选择性反射和/或重定向输入电磁辐射的聚合物结构层和反射电介质多层。 根据另一方面，引入反射电介质多层允许在微反射镜中使用聚合物结构材料，并且防止由于电磁辐射的吸收导致的过度加热而损坏这种聚合物材料，因为反射电介质多层是高度反射性的并且使得 微镜组件。 根据又一方面，本文描述了自顶向下的制造方法，用于制造包括聚合物结构层和反射电介质多层的微镜。

公开(公告)号：US20100143848A1

公开(公告)日：2010-06-10

申请号：US12331131

申请日：2008-12-09

申请人： Kanti Jain ,  Kevin Lin

发明人： Kanti Jain ,  Kevin Lin

IPC分类号： G03F7/20

CPC分类号： H05K1/0283 ,  B23K26/40 ,  B23K2103/172 ,  B81B2201/0292 ,  B81B2203/0109 ,  B81B2207/07 ,  B81C1/0019 ,  H05K3/0032 ,  H05K3/007 ,  H05K2201/09109 ,  H05K2203/0554 ,  H05K2203/308

摘要： Described herein are processing techniques for fabrication of stretchable and/or flexible electronic devices using laser ablation patterning methods. The laser ablation patterning methods utilized herein allow for efficient manufacture of large area (e.g., up to 1 mm2 or greater or 1 m2 or greater) stretchable and/or flexible electronic devices, for example manufacturing methods permitting a reduced number of steps. The techniques described herein further provide for improved heterogeneous integration of components within an electronic device, for example components having improved alignment and/or relative positioning within an electronic device. Also described herein are flexible and/or stretchable electronic devices, such as interconnects, sensors and actuators.

摘要翻译： 这里描述了使用激光烧蚀图案化方法制造可拉伸和/或柔性电子器件的处理技术。 本文使用的激光烧蚀图案化方法允许有效地制造大面积（例如，高达1mm 2或更大或1m 2或更大）的可拉伸和/或柔性电子器件，例如允许减少步数的制造方法。 本文描述的技术进一步提供了改进的电子设备内的组件的异构集成，例如具有电子设备内的改进的对准和/或相对定位的组件。 本文还描述了柔性和/或可拉伸的电子设备，例如互连，传感器和致动器。

公开(公告)号：US20090296188A1

公开(公告)日：2009-12-03

申请号：US12201522

申请日：2008-08-29

申请人： Kanti Jain ,  Linus Jang ,  Yoon Soo Han

发明人： Kanti Jain ,  Linus Jang ,  Yoon Soo Han

IPC分类号： G02F1/21 ,  G02B27/44 ,  G02F1/1333

CPC分类号： G02B5/1871 ,  E06B9/24 ,  E06B2009/2464 ,  G02F1/13306 ,  G02F1/1334 ,  G02F2201/086 ,  G02F2201/305 ,  G02F2202/40 ,  G02F2203/11

摘要： In an aspect, described herein is a dynamically controllable optoelectronic smart window which utilizes a diffraction grating for selective transmission or rejection of a specific region of the electromagnetic spectrum, for example the infrared, near-infrared and/or visible regions. Window embodiments described herein may further utilize a selectively controlled and/or patterned total internal reflection layer to assist with the selective rejection of a specific spectral region while allowing for transmission of another specific spectral region. In another aspect, the present invention provides methods for dynamically controlling the transmission or rejection of solar near-infrared and/or visible radiation.

摘要翻译： 在一方面，本文所描述的是动态可控的光电智能窗，其利用衍射光栅来选择性地传输或拒绝电磁光谱的特定区域，例如红外线，近红外和/或可见光区域。 本文描述的窗口实施例可以进一步利用选择性控制和/或图案化的全内反射层来辅助特定光谱区域的选择性抑制，同时允许另一个特定光谱区域的传输。 另一方面，本发明提供了用于动态地控制太阳能近红外和/或可见光辐射的传输或抑制的方法。

公开(公告)号：US20090023098A1

公开(公告)日：2009-01-22

申请号：US11847134

申请日：2007-08-29

申请人： Kanti Jain ,  Uttam Reddy

发明人： Kanti Jain ,  Uttam Reddy

IPC分类号： G03F7/20 ,  G03F7/22

CPC分类号： H05K3/107 ,  H01L21/0277 ,  H01L21/31144 ,  H01L21/76807 ,  H01L21/76813 ,  H01L2221/1021

摘要： This invention provides processing steps, methods and materials strategies for making patterns of structures for integrated electronic devices and systems. Processing methods of the present invention are capable of making micro-and nano-scale structures, such as Dual Damascene profiles, recessed features and interconnect structures, having non-uniform cross-sectional geometries useful for establishing electrical contact between device components of an electronic device. The present invention provides device fabrication methods and processing strategies using sub pixel-voting lithographic patterning of a single layer of photoresist useful for fabricating and integrating multilevel interconnect structures for high performance electronic or opto-electronic devices, particularly useful for Very Large Scale Integrated (VLSI) and Ultra large Scale Integrated (ULSI) devices. Processing methods of the present invention are complementary to conventional microfabrication and nanofabrication methods for making integrated electronics, and can be effectively integrated into existing photolithographic, etching, and thin film deposition patterning systems, processes and infrastructure.

摘要翻译： 本发明提供了用于制造集成电子设备和系统的结构图案的处理步骤，方法和材料策略。 本发明的加工方法能够制造具有非均匀横截面几何形状的微尺度和纳米级结构，例如双镶嵌型材，凹形特征和互连结构，其用于建立电子设备的装置部件之间的电接触 。 本发明提供了使用用于制造和集成用于高性能电子或光电子器件的多层互连结构的单层光致抗蚀剂的子像素投影光刻图案的器件制造方法和处理策略，特别适用于超大规模集成（VLSI ）和超大规模集成（ULSI）设备。 本发明的加工方法与用于制造集成电子学的常规微细加工和纳米制造方法互补，并且可以有效地集成到现有的光刻，蚀刻和薄膜沉积图案化系统，工艺和基础设施中。

公开(公告)号：US20070110774A1

公开(公告)日：2007-05-17

申请号：US11650782

申请日：2007-01-08

申请人： Shirin Asina ,  Kanti Jain ,  Albert Rubin ,  Barry Smith ,  Kurt Stenzel

发明人： Shirin Asina ,  Kanti Jain ,  Albert Rubin ,  Barry Smith ,  Kurt Stenzel

IPC分类号： A61K39/00

CPC分类号： A61K35/22 ,  A61K39/0011 ,  A61K2035/126 ,  A61K2035/128 ,  C12N5/0693 ,  C12N11/04

摘要： Compositions of matter are described which contain restricted cancer cells. When so restricted, the cells produce an unexpectedly high amount of material which suppresses cancer cell proliferation. The phenomenon crosses cancer type and species lines. Processes for making these compositions, and their use, are also described.

摘要翻译： 描述了含有限制性癌细胞的物质组成。 当受限制时，细胞产生意想不到的高量的抑制癌细胞增殖的材料。 这种现象跨越癌症类型和种类。 还描述了制备这些组合物的方法及其用途。

公开(公告)号：US07106415B2

公开(公告)日：2006-09-12

申请号：US10731187

申请日：2003-12-09

申请人： Sivarama K. Kuchibhotla ,  Kanti Jain ,  Marc A. Klosner

发明人： Sivarama K. Kuchibhotla ,  Kanti Jain ,  Marc A. Klosner

IPC分类号： G03B27/68 ,  G03B27/58 ,  G03B27/42

CPC分类号： G03F7/703 ,  G03B27/58

摘要： A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.

摘要翻译： 安装在投影光路中的零功率相同的一对相反方向的弯月透镜元件用作弯曲的掩模支撑，同时补偿光学异常，例如由弯曲掩模的其他透明支撑产生的光束偏移和光束偏移。 零功率弯月透镜对，不影响透射光束特性，使得光束像普通的平面掩模一样有效地衍射，从而保持投影光刻的部分相干效应和分辨率概念。 这种简单但新颖的光学器件不仅预期能够清除弯曲掩模投影光刻的几个障碍，而且还可以发现在其中准直或会聚光束必须行进额外路径而没有显着像差的其他应用场合。

公开(公告)号：US20060012766A1

公开(公告)日：2006-01-19

申请号：US10890498

申请日：2004-07-13

申请人： Marc Klosner ,  Kanti Jain

发明人： Marc Klosner ,  Kanti Jain

IPC分类号： G03B27/54

CPC分类号： G03F7/70275 ,  G03F7/70291

摘要： A versatile maskless patterning system with capability for selecting rapidly among a plurality of projection lenses mounted on a turret. This provides the ability to rapidly select multiple choices for resolution and enables optimization of the combination of the imaging resolution and exposure throughput, making possible cost-effective fabrication of microelectronics packaging products. A preferred embodiment uses a digital micromirror device array spatial light modulator as a virtual mask. Another preferred embodiment use multiple closely spaced digital micromirror device array spatial light modulators to enhance throughput.

摘要翻译： 一种多用途无掩模图案化系统，具有在安装在转台上的多个投影透镜之间快速选择的能力。 这提供了快速选择多个选择以进行分辨率的能力，并且能够优化成像分辨率和曝光量的组合，从而使得可能具有成本效益的微电子封装产品的制造。 优选实施例使用数字微镜器件阵列空间光调制器作为虚拟掩模。 另一个优选实施例使用多个紧密间隔的数字微镜器件阵列空间光调制器来增加吞吐量。