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公开(公告)号:US20050138874A1
公开(公告)日:2005-06-30
申请号:US11022337
申请日:2004-12-22
Applicant: Roger O'Shaughnessy , Annette Krisko , Klaus Hartig
Inventor: Roger O'Shaughnessy , Annette Krisko , Klaus Hartig
IPC: C03C17/245 , C03C17/34 , C23C14/08 , B32B17/06 , C23C14/34
CPC classification number: C23C14/086 , C03C17/245 , C03C17/3417 , C03C2217/216 , C03C2217/229 , C03C2218/154 , C03C2218/355 , C23C14/568
Abstract: A substrate carrying a temporary protective cover and related methods of producing and processing substrates are described. In one embodiment, a substrate has a durable exterior surface bearing a temporary protective cover that protects the durable surface against contamination but that can readily be readily removed from the durable surface by washing with a given washing fluid.
Abstract translation: 描述了携带临时保护盖的基板和相关的基板的制造和处理方法。 在一个实施例中,衬底具有耐用的外表面,其具有临时保护盖,其保护耐用表面免受污染,但是通过用给定的洗涤流体洗涤可以容易地从耐用表面去除。
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公开(公告)号:US20050137084A1
公开(公告)日:2005-06-23
申请号:US11021482
申请日:2004-12-22
Applicant: Annette Krisko , Klaus Hartig
Inventor: Annette Krisko , Klaus Hartig
CPC classification number: C23C14/3464 , C03C17/3417 , C03C2217/71 , C03C2217/91 , C03C2218/154 , C03C2218/365 , C23C14/0084 , C23C14/024 , C23C14/027 , C23C14/083
Abstract: The invention provides graded photocatalytic coatings. In one aspect, the invention provides a substrate carrying a photocatalytic coating that includes a first graded film region and a second graded film region. The first graded film region has a substantially continuously decreasing concentration of a first transparent dielectric material and a substantially continuously increasing concentration of a second transparent dielectric material. The second graded film region has a substantially continuously decreasing concentration of the second transparent dielectric material and a substantially continuously increasing concentration of a third transparent dielectric material. In certain embodiments, the first transparent dielectric material comprises silicon dioxide, the second transparent dielectric material comprises zirconium oxide, and the third transparent dielectric material comprises titanium oxide. The invention also provides methods and equipment for depositing graded photocatalytic coatings.
Abstract translation: 本发明提供渐变的光催化涂层。 在一个方面,本发明提供一种承载光催化涂层的基底,其包括第一渐变膜区域和第二渐变膜区域。 第一渐变膜区域具有基本上连续降低的第一透明电介质材料的浓度和第二透明介电材料的基本连续增加的浓度。 第二梯度膜区域具有基本上连续降低的第二透明介电材料的浓度和第三透明介电材料的基本连续增加的浓度。 在某些实施例中,第一透明介电材料包括二氧化硅,第二透明介电材料包括氧化锆,第三透明电介质材料包括氧化钛。 本发明还提供了用于沉积渐变光催化涂层的方法和设备。
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公开(公告)号:US5382126A
公开(公告)日:1995-01-17
申请号:US39865
申请日:1993-03-30
Applicant: Klaus Hartig , Joachim Szczyrbowski
Inventor: Klaus Hartig , Joachim Szczyrbowski
CPC classification number: C23C14/568
Abstract: A transport car open at the top and supported on rollers moves a substrate from a first coating chamber to a second coating chamber separated by a gate 7 running transversely of the direction of movement of the transport car 5. The gate 7 is formed of an upper gate part 8 and a lower gate part 9 forming a slot 10 which is adaptable to the cross section of the car. A cover associated with the top gate part and parallel to the direction of movement has an area greater than the car in order to minimize gas transfer between chambers.
Abstract translation: 在顶部打开并支撑在辊上的运输车将基材从第一涂料室移动到第二涂料室,该第二涂料室由与输送汽车5的运动方向横向延伸的闸门7分开。闸门7由上部 闸门部分8和下门部分9,形成适于轿厢横截面的槽10。 与顶部门部分相关联并且平行于运动方向的盖具有大于轿厢的面积,以便最小化室之间的气体传递。
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公开(公告)号:US5340454A
公开(公告)日:1994-08-23
申请号:US98751
申请日:1993-07-28
Applicant: Christian Schaefer , Klaus Hartig
Inventor: Christian Schaefer , Klaus Hartig
CPC classification number: C23C14/568
Abstract: Method and apparatus for the coating of substrates (1, 1', . . . ), preferably by cathode sputtering in a vacuum apparatus consisting of at least one sputtering chamber (6) in which different coating systems can be applied to the preferably curved substrates to be coated (1, 1', . . . ), the substrates (1, 1', . . . ) can be moved in a direction B through the vacuum apparatus and pass through the sputtering chamber (6) repeatedly in direction B as well as in the opposite direction in the so-called multipass mode, the uncoated substrates (1, 1', . . . ) or substrate carriers (12, 11', . . . ) being combined before entering the sputtering chamber into groups of several, preferably two substrates (1, 1', . . . ) each, and these run simultaneously through the sputtering chamber (6) in the so-called dual multipass mode.
Abstract translation: 用于在由至少一个溅射室(6)组成的真空装置中优选通过阴极溅射涂覆基板(1,1')的方法和装置,其中可以将不同的涂层系统施加到优选弯曲的基板 (1,1'),基板(1,1')可以通过真空装置沿方向B移动,并沿方向B反复穿过溅射室(6) 以及在所谓的多通道模式的相反方向上,将未涂覆的基板(1,1',...)或基板载体(12,11'...)在进入溅射室之前组合成组 几个,优选两个基板(1,1',...),并且它们以所谓的双重多通道模式同时穿过溅射室(6)运行。
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公开(公告)号:US5213672A
公开(公告)日:1993-05-25
申请号:US744511
申请日:1991-08-13
Applicant: Klaus Hartig , Joachim Szczyrbowski
Inventor: Klaus Hartig , Joachim Szczyrbowski
CPC classification number: H01J37/3441 , C23C14/3407 , H01J37/3405 , H01J37/342 , H01J37/3455
Abstract: An apparatus is presented, with a rotating target (18, 15), which is tubularly configured, with a stationary magnet unit (2) disposed within the tube, of a magnetron cathode, which produces a stationary plasma hose provided essentially with two long straight lines in front of the surface of the rotating target, which exercises an erosive action on the surface of the rotating target (18, 15), whereby the formation occurs of a narrowing of the diameter of the tubular rotating target (18, 15) in the middle portion of the tubular rotating target and the formation of margins at the two ends (14, 15) of the tubular rotating target be provided each with a dark-space shield (16, 17) which cover the margins of the tubular rotating target.
Abstract translation: 本发明提供了一种具有旋转靶(18,15)的旋转靶(18,15),该转动靶(18,15)由设置在管内的固定磁体单元(2)管状地构成,该磁控管阴极产生基本上具有两条长直线 在旋转靶的表面前面的线,其对旋转靶(18,15)的表面进行侵蚀作用,由此形成管状旋转靶(18,15)的直径变窄的形成 管状旋转靶的中间部分和在管状旋转靶的两端(14,15)处形成边缘,每个都设有覆盖管状旋转靶的边缘的暗空间护罩(16,17) 。
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公开(公告)号:US5011745A
公开(公告)日:1991-04-30
申请号:US301199
申请日:1989-01-24
Applicant: Anton Dietrich , Klaus Hartig , Hans-Christian Schaefer , Joachim Szczyrbowski
Inventor: Anton Dietrich , Klaus Hartig , Hans-Christian Schaefer , Joachim Szczyrbowski
CPC classification number: B32B17/10761 , B32B17/10036 , B32B17/10174 , C03C17/36 , C03C17/3613 , C03C17/3644 , C03C17/3655 , C03C17/3673 , C03C17/3681 , H05B3/84 , H05B3/86 , H05B2203/013 , H05B2203/016 , Y10T428/12597 , Y10T428/12611 , Y10T428/24802 , Y10T428/24917 , Y10T428/24926
Abstract: Process for the production of contact strips on substrates, especially on plates of mineral glass. These substrates are provided with an electrically conductive surface coating which is coated on the side facing away from the substrate with at least one surface layer of a dielectric material. For the production of the contact strips, a noble metal suspension in a liquid is deposited according to the invention on the surface layer in the pattern of the contact strips. Then the substrate with the pack of layers is exposed to a heat treatment at at least 100.degree. C. until a lowered total resistance occurs through the conductive surface coating between the contact strips.
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公开(公告)号:US4885070A
公开(公告)日:1989-12-05
申请号:US197040
申请日:1988-05-20
Applicant: Gregor A. Campbell , Robert W. Conn , Dan M. Goebel , Rolf Adam , Hans Aichert , Hans Betz , Anton Dietrich , Gonde Dittmer , Klaus Hartig , Friedrich Hass , Rainer Ludwig , Max Mayr , Alfred Thelen
Inventor: Gregor A. Campbell , Robert W. Conn , Dan M. Goebel , Rolf Adam , Hans Aichert , Hans Betz , Anton Dietrich , Gonde Dittmer , Klaus Hartig , Friedrich Hass , Rainer Ludwig , Max Mayr , Alfred Thelen
CPC classification number: C23C14/46 , C23C14/0036 , H01J37/3402
Abstract: An apparatus to apply materials to a substrate disposed in a vacuum chamber is disclosed. A separate generator chamber containing an electron emitter is connected to the vacuum chamber by a process chamber so that a plasma of controllable cross-sectional shape and large area is formed and guided by magnets toward a target system. Positive ions may be accelerated against the target by applying an adjustable negative voltage.
Abstract translation: 公开了一种将材料施加到设置在真空室中的基板的装置。 包含电子发射器的单独的发生器室通过处理室连接到真空室,使得具有可控横截面形状和大面积的等离子体由磁体形成并被引导到目标系统。 通过施加可调节的负电压,正离子可以相对于目标加速。
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公开(公告)号:US4548691A
公开(公告)日:1985-10-22
申请号:US584639
申请日:1984-02-29
Applicant: Anton Dietrich , Klaus Hartig , Werner Lenz , Michael Scherer
Inventor: Anton Dietrich , Klaus Hartig , Werner Lenz , Michael Scherer
CPC classification number: C03C17/3618 , C03C17/36 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C23C14/0036 , G02B5/282
Abstract: A method of producing glass sheets having good transmission behavior in the visible spectrum range and having good reflection behavior as regards heat radiation. A transparent substrate S is coated by cathodic atomization with, successively, a first oxide layer 1 comprising indium oxide, tin oxide or mixtures thereof, a layer 2 consisting of silver in a thickness of 5 to 50 n, a metallic layer 3 selected from aluminium, titanium, tantalum, chromium, manganese and zirconium in a thickness ranging from 1 to 5 nm and applied directly to the silver layer 2 for the purpose of maintaining the condition thereof, and a final protective oxide layer 4 of indium oxide, tin oxide or mixtures thereof.
Abstract translation: 一种制造在可见光谱范围内具有良好透射性能并具有良好的热辐射反射性能的玻璃板的方法。 通过阴极雾化,依次包含氧化铟,氧化锡或其混合物的第一氧化物层1,厚度为5-50n的银组成的层2,选自铝的金属层3, ,钛,钽,铬,锰和锆,厚度范围为1至5nm,并直接施加于银层2以保持其状态,以及最终的氧化铟保护氧化物层4,氧化锡或 其混合物。
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49.
公开(公告)号:US4534841A
公开(公告)日:1985-08-13
申请号:US592907
申请日:1984-03-23
Applicant: Klaus Hartig , Anton Dietrich , Michael Scherer
Inventor: Klaus Hartig , Anton Dietrich , Michael Scherer
IPC: E06B9/24 , C03C15/00 , C03C17/34 , C23C14/00 , C23C14/06 , C23C14/34 , G02B5/26 , G02B5/28 , C23C15/00
CPC classification number: C03C17/3435 , C23C14/0036 , Y10T428/31627
Abstract: Solar-controlled glazing having a transmission of between 5 and 40% in the visible spectrum range and having heat-reflection properties is produced by applying an oxide layer having an optical thickness of between 20 and 280 nm directly to a transparent substrate by cathodic evaporation in an oxygen-containing atmosphere to form a first layer. A chromium nitride layer having a geometric thickness of between 10 and 40 nm is then applied in an atmosphere consisting of inert gas and nitrogen to provide a second layer. An optical third dielectric layer may be applied to the second layer. The oxide layer is selected from oxides of tin, titanium and aluminium.
Abstract translation: 通过将具有20至280nm光学厚度的氧化物层直接涂覆到透明基底上,通过阴极蒸发来生产在可见光谱范围内具有5至40%透射率并具有热反射特性的太阳能控制玻璃, 含氧气氛形成第一层。 然后在由惰性气体和氮气组成的气氛中施加几何厚度为10至40nm的氮化铬层,以提供第二层。 光学第三介质层可以施加到第二层。 氧化物层选自锡,钛和铝的氧化物。
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公开(公告)号:US20120132261A1
公开(公告)日:2012-05-31
申请号:US13171987
申请日:2011-06-29
Applicant: Benyamin Buller , Douglas Dauson , Scott Mills , Dale Roberts , Yu Yang , Zhibo Zhao , Keith Burrows , Klaus Hartig , Annette Krisko
Inventor: Benyamin Buller , Douglas Dauson , Scott Mills , Dale Roberts , Yu Yang , Zhibo Zhao , Keith Burrows , Klaus Hartig , Annette Krisko
IPC: H01L31/048 , H01L31/0224
CPC classification number: C23C14/3414 , C23C14/086 , H01L31/022466 , H01L31/03925 , H01L31/073 , H01L31/1884 , Y02E10/543 , Y02P70/521
Abstract: A structure includes a barrier layer which can include a silicon aluminum oxide, and a transparent conductive oxide layer which can include a layer of cadmium and tin.
Abstract translation: 结构包括可以包括硅氧化铝的阻挡层和可以包括镉和锡层的透明导电氧化物层。
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