Abstract:
A semiconductor device using a magnetic domain wall movement and a method of manufacturing the semiconductor device are provided. The semiconductor device includes a magnetic layer that is formed on a substrate and has a plurality of magnetic domains, and a unit that supplies energy to move a magnetic domain wall in the magnetic layer. The magnetic layer is formed parallel to the substrate, and includes a plurality of prominences and a plurality of depressions alternately formed along a lengthwise direction thereof. The magnetic layer has a stepped form that secures a reliable movement of the magnetic domain wall in units of one bit.
Abstract:
A heater for heating a reformer of a fuel cell system includes a combustion chamber having a combustion catalyst layer; a distributor having an inner space and uniformly distributing a combustion fuel and an oxidant flowing along the inner space to the combustion catalyst layer of the combustion chamber; and an igniter igniting the combustion fuel and the oxidant, wherein the igniter is placed in the inner space of the distributor. Thus, the igniter is protected from combustion heat of the combustion catalyst layer and thus has improved durability.
Abstract:
A fuel reforming system and a fuel cell system including the same, the fuel reforming system including: a fuel reformer adapted to produce a reformed gas having hydrogen as a main component from a fuel containing hydrogen; a carbon monoxide (CO) remover adapted to remove carbon monoxide from the reformed gas; a heat source adapted to supply heat energy to the reformer and the CO remover; and a moving unit adapted to move the heat source between the fuel reformer and the CO remover. With this configuration, the fuel reformer and the CO remover can be directly heated by a heat source. Then, when the temperature of the CO remover reaches a catalyst activation temperature, the heat source can be moved to directly heat only the fuel reformer, thereby enhancing a reforming effect and a power generation efficiency of the fuel reforming system.
Abstract:
A fuel reforming apparatus which generates a reformed gas containing hydrogen by reforming a fuel and supplies the reformed gas to a fuel cell body is provided. The fuel reforming apparatus is constructed with a burner which generates a flame by burning the fuel together with the atmospheric air, a reforming reactor which receives thermal energy of the flame and generates the reformed gas through a reforming reaction between the fuel and steam, an evaporator in which a pipeline for allowing the fuel and water to flow is disposed in the direction of the flame sprayed from the burner, with the water being evaporated by using the flame and the fuel and steam being supplied to the reforming reactor, and a spraying unit which is disposed in a direction of the sprayed flame to spray additional air into the evaporator.
Abstract:
A fuel reformer including a first pipe, a second pipe which is disposed in the first pipe, a main heat source, which includes an oxidation catalyst, filling the second pipe adapted to generate thermal energy with a predetermined temperature range through an oxidation reaction of a fuel using the oxidation catalyst; an auxiliary heat source which includes a torch connected to the second pipe to ignite and burn the gaseous fuel, thereby preheating the oxidation catalyst to within a reaction starting temperature range, and a reforming reaction unit which includes a reforming catalyst filling a space between the first and second pipes to generate a reforming gas containing hydrogen through the reforming reaction of the fuel using the reforming catalyst by using the thermal energy generated by the main heat source.
Abstract:
A fuel reforming apparatus in constructed with a main body including a first pipe and a second pipe disposed in the first pipe and a heat source installed in the second pipe and adapted to generate thermal energy in the second pipe. A reforming reaction unit is formed by filling a reforming catalyst in a space defined between the first and second pipes and is adapted to generate a reformed gas containing hydrogen through a reforming reaction of the fuel. A housing encloses the main body and allows a combustion gas generated from the heat source to flow along an outer circumference of the reforming reaction unit.
Abstract:
A method of manufacturing a nonvolatile memory device having a self-aligned structure includes the steps of forming a gate insulating film on a semiconductor substrate of a first conductivity type. A semiconductor layer is formed on the gate insulating film and etched to form floating gates and a semiconductor pattern between the floating gates. Impurity ions of a second conductivity type are implanted into the same side of the substrate as the floating gate is formed, to form a drain region. A planarizing film is deposited on the substrate and etched until the upper surfaces of the floating gates and the semiconductor pattern are exposed. The semiconductor pattern is removed and impurity ions of the second conductivity type are implanted into the substrate, to form a source region. The planarizing film is removed to expose the floating gate, and a dielectric film is formed thereon. Finally, a control gate is formed on the substrate.
Abstract:
Magnetoresistive structures, magnetic random-access memory devices including the same, and methods of manufacturing the magnetoresistive structure, include a first magnetic layer having a magnetization direction that is fixed, a second magnetic layer corresponding to the first magnetic layer, wherein a magnetization direction of the second magnetic layer is changeable, and a magnetoresistance (MR) enhancing layer and an intermediate layer both between the first magnetic layer and the second magnetic layer.
Abstract:
A method of fabricating a solar cell includes forming a doped portion having a first conductive type on a semiconductor substrate, growing an oxide layer on the semiconductor substrate, forming a plurality of recess portions in the oxide layer, further growing the oxide layer on the semiconductor substrate, forming a doped portion having a second conductive type on areas of the semiconductor substrate corresponding to the recess portions, forming a first conductive electrode electrically coupled to the doped portion having the first conductive type, and forming a second conductive electrode on the semiconductor substrate and electrically coupled to the doped portion having the second conductive type, wherein a gap between the doped portions having the first and second conductive types corresponds to a width of the oxide layer formed by further growing the oxide layer.
Abstract:
Provided is a magnetic memory device. The magnetic memory device includes a first magnetization layer, a tunnel barrier disposed on the first magnetization layer, a second magnetization layer disposed on the tunnel barrier, and a spin current assisting layer disposed on at least a portion of a sidewall of the second magnetization layer.