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公开(公告)号：US08654350B2
公开(公告)日：2014-02-18
申请号：US13672742
申请日：2012-11-09
Applicant: Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
Inventor： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
IPC: G01B11/30
CPC classification number: G01B11/303 , G01N21/47 , G01N21/94 , G01N21/9501
Abstract: An inspecting method and apparatus for inspecting a substrate surface includes illuminating a light to the substrate surface having a film, detection of a scattered light or reflected light from a plurality of positions of the substrate surface to obtain a plurality of electrical signals, comparison of the plurality of electrical signals and a database which indicates a relationship between the electrical signals and surface roughness, and calculation of a surface roughness value based on the result of comparison.
Abstract translation: 用于检查基板表面的检查方法和装置包括将光照射到具有膜的基板表面，从基板表面的多个位置检测散射光或反射光以获得多个电信号， 多个电信号和指示电信号和表面粗糙度之间的关系的数据库，以及基于比较结果的表面粗糙度值的计算。
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公开(公告)号：US08482727B2
公开(公告)日：2013-07-09
申请号：US13366704
申请日：2012-02-06
Applicant: Toshiyuki Nakao , Yoshimasa Oshima , Yuta Urano
Inventor： Toshiyuki Nakao , Yoshimasa Oshima , Yuta Urano
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01N2021/887
Abstract: A method and apparatus of inspecting a defect of a surface of a sample in which a laser beam is irradiated on a sample surface so that at least a part of an illumination field of the laser beam illuminates a first area of the sample surface, a plurality of scattered light rays from the first area caused by the irradiation is detected with a plurality of detectors, detection errors of inclination of an illumination apparatus and a sensor for the plurality of scattered light rays detected by the plurality of detectors are corrected, at least one of adding and averaging the corrected plurality of scattered light rays, and a defect on the sample surface is determined based on the plurality of scattered light rays in accordance with the correction of errors of inclination of the illumination apparatus and the sensor.
Abstract translation: 一种检查样品表面的缺陷的方法和装置，其中激光束照射在样品表面上，使得激光束的照明场的至少一部分照射样品表面的第一区域，多个 利用多个检测器检测来自由照射引起的第一区域的散射光线，校正由多个检测器检测的用于多个散射光线的照明装置和传感器的倾斜检测误差，至少一个 根据照明装置和传感器的倾斜误差的校正，基于多个散射光线来确定样本表面上的缺陷。
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公开(公告)号：US08314929B2
公开(公告)日：2012-11-20
申请号：US13107637
申请日：2011-05-13
Applicant: Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima
Inventor： Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01N21/9503
Abstract: A defect inspection apparatus is capable of inspecting an extremely small defect present on the top and edge surfaces of a sample such as a semiconductor substrate or a thin film substrate with high sensitivity and at high speed. The defect inspection apparatus has an illumination optical system, a plurality of detection optical units and a signal processor. One or more of the detection optical units receives either light diffracted from an edge portion of the sample or light diffracted from an edge grip holding the sample. The one or more of the detection optical units shields the diffracted light received by the detection optical unit based on a signal obtained by monitoring an intensity of the diffracted light received by the detection optical unit in order to inspect a sample portion located near the edge portion and a sample portion located near the edge grip.
Abstract translation: 缺陷检查装置能够以高灵敏度和高速检查诸如半导体衬底或薄膜衬底的样品的顶部和边缘表面上存在的极小缺陷。 缺陷检查装置具有照明光学系统，多个检测光学单元和信号处理器。 一个或多个检测光学单元接收从样品的边缘部分衍射的光或从夹持样品的边缘把手衍射的光。 一个或多个检测光学单元基于通过监视由检测光学单元接收的衍射光的强度而获得的信号来屏蔽由检测光学单元接收的衍射光，以便检查位于边缘部分附近的样本部分 以及位于边缘把手附近的样品部分。
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公开(公告)号：US08264679B2
公开(公告)日：2012-09-11
申请号：US13368764
申请日：2012-02-08
Applicant: Yoshimasa Oshima , Yuta Urano , Toshiyuki Nakao
Inventor： Yoshimasa Oshima , Yuta Urano , Toshiyuki Nakao
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/94 , G01N2021/4707 , G01N2021/4709 , G01N2021/8864
Abstract: An inspection apparatus and method for detecting defects and haze on a surface of a sample includes illumination optics which emit light to illuminate an inspection region on the surface of the sample from an oblique direction relative to the inspection region, first detection optics which detect first scattered light from the inspection region and having a beam analyzer through an optical path, second detection optics which detect second scattered light from the inspection region, the second scattered light being scattered from a direction different than a direction of the first scattered light, and a signal-processing unit which treats different processings for a first signal of the detected first scattered light and for a second signal of the detected second scattered light and detecting defects and haze on the surface of the sample on the basis of at least one of the first signal and the second signal.
Abstract translation: 用于检测样品表面的缺陷和雾度的检查装置和方法包括发射光的照明光学器件，以从相对于检查区域的倾斜方向照射样品表面上的检查区域，第一检测光学器件检测第一散射 来自检查区域的光并且具有通过光路的光束分析器，第二检测光学器件检测来自检查区域的第二散射光，第二散射光从不同于第一散射光的方向的方向散射，以及信号 处理单元，其针对检测到的第一散射光的第一信号和检测到的第二散射光的第二信号处理不同的处理，并且基于第一信号中的至少一个检测样品的表面上的缺陷和雾度 和第二个信号。
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公开(公告)号：US08218138B2
公开(公告)日：2012-07-10
申请号：US13172233
申请日：2011-06-29
Applicant: Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
Inventor： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
CPC classification number: G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
Abstract: A defect inspection apparatus and method includes utilizing an irradiation optical system that focuses a beam flux emitted from a laser light source and formed into a slit-shaped beam so as to irradiate the beam onto the surface of the substrate to be inspected, utilizing a detection optical system that detects light from the substrate that has been irradiated with the slit-shaped beam, and utilizing a signal processor that processes a signal output from the detection optical system. The irradiation optical system includes a cylindrical lens for focusing the beam that has been emitted from the laser light source onto the substrate to be inspected, as the slit-shaped beam, wherein the cylindrical lens is disposed so as to obtain a distance between an incidence surface or emitting surface thereof and the slit-shaped beam upon the substrate to be inspected to be equal to a focal distance of the cylindrical lens.
Abstract translation: 缺陷检查装置和方法包括利用照射光学系统，其将从激光源发射的光束束聚焦并形成为狭缝状光束，以便将光束照射到待检查的基板的表面上，利用检测 光学系统，其检测来自已经被狭缝形光束照射的基板的光，以及利用处理从检测光学系统输出的信号的信号处理器。 照射光学系统包括用于将从激光光源发射的光束聚焦到待检查的基板上的柱面透镜作为狭缝状光束，其中，设置柱面透镜以获得入射光 表面或发射表面以及待检查的基板上的狭缝状光束等于柱面透镜的焦距。
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Patent Agency Ranking
公开(公告)号：US20120133926A1
公开(公告)日：2012-05-31
申请号：US13366704
申请日：2012-02-06
Applicant: Toshiyuki Nakao , Yoshimasa Oshima , Yuta Urano
Inventor： Toshiyuki Nakao , Yoshimasa Oshima , Yuta Urano
CPC classification number: G01N21/9501 , G01N2021/887
Abstract: A method and apparatus of inspecting a defect of a surface of a sample in which a laser beam is irradiated on a sample surface so that at least a part of an illumination field of the laser beam illuminates a first area of the sample surface, a plurality of scattered light rays from the first area caused by the irradiation is detected with a plurality of detectors, detection errors of inclination of an illumination apparatus and a sensor for the plurality of scattered light rays detected by the plurality of detectors are corrected, at least one of adding and averaging the corrected plurality of scattered light rays, and a defect on the sample surface is determined based on the plurality of scattered light rays in accordance with the correction of errors of inclination of the illumination apparatus and the sensor.
Abstract translation: 一种检查样品表面的缺陷的方法和装置，其中激光束照射在样品表面上，使得激光束的照明场的至少一部分照射样品表面的第一区域，多个 利用多个检测器检测来自由照射引起的第一区域的散射光线，校正由多个检测器检测的用于多个散射光线的照明装置和传感器的倾斜检测误差，至少一个 根据照明装置和传感器的倾斜误差的校正，基于多个散射光线来确定样本表面上的缺陷。
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公开(公告)号：US08120766B2
公开(公告)日：2012-02-21
申请号：US12506421
申请日：2009-07-21
Applicant: Yoshimasa Oshima , Yuta Urano , Toshiyuki Nakao
Inventor： Yoshimasa Oshima , Yuta Urano , Toshiyuki Nakao
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/94 , G01N2021/4707 , G01N2021/4709 , G01N2021/8864
Abstract: Scattered light that originates from the surface roughness of silicon or other metallic films is distributed more strongly at positions closer to the starting position of the scattering. Of all scattered-light detection signals obtained during multi-directional detection, therefore, only a detection signal of forward scattered light can be used to detect micro-defects, and only a detection signal of backward scattered light can be used to detect the surface roughness very accurately.
Abstract translation: 源于硅或其他金属膜的表面粗糙度的散射光在更靠近散射开始位置的位置分布得更强。 因此，在多方向检测中获得的所有散射光检测信号中，只能使用前向散射光的检测信号来检测微缺陷，只能使用后向散射光的检测信号来检测表面粗糙度 非常准确。
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公开(公告)号：US08115915B2
公开(公告)日：2012-02-14
申请号：US13021076
申请日：2011-02-04
Applicant: Toshiyuki Nakao , Yoshimasa Oshima , Yuta Urano
Inventor： Toshiyuki Nakao , Yoshimasa Oshima , Yuta Urano
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01N2021/887
Abstract: A method and apparatus for inspecting a defect of a surface of a sample in which a laser beam is irradiated on a sample surface so that at least a part of an illumination field of the laser beam illuminates a first area of the sample surface, a plurality of scattered light rays from the first area caused by the irradiation in the irradiating is detected, errors of inclination of an illumination apparatus and a sensor for the plurality of scattered light rays detected are corrected, the plurality of scattered light rays corrected is at least one of added and averaged, a defect on the sample surface based on the plurality of scattered light rays in accordance with the correcting of errors of inclination of the illumination apparatus and the sensor is determined.
Abstract translation: 一种用于检查其中激光束照射在样品表面上的样品表面的缺陷的方法和装置，使得激光束的照明场的至少一部分照射样品表面的第一区域，多个 检测由照射中的照射引起的来自第一区域的散射光线，校正了用于所检测的多个散射光线的照明装置和传感器的倾斜误差，校正的多个散射光线为至少一个 并且根据照明装置和传感器的倾斜误差的校正，基于多个散射光线在样品表面上的缺陷被确定。
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公开(公告)号：US20110255074A1
公开(公告)日：2011-10-20
申请号：US13172233
申请日：2011-06-29
Applicant: Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
Inventor： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
CPC classification number: G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
Abstract: A defect inspection apparatus and method includes utilizing an irradiation optical system that focuses a beam flux emitted from a laser light source and formed into a slit-shaped beam so as to irradiate the beam onto the surface of the substrate to be inspected, utilizing a detection optical system that detects light from the substrate that has been irradiated with the slit-shaped beam, and utilizing a signal processor that processes a signal output from the detection optical system. The irradiation optical system includes a cylindrical lens for focusing the beam that has been emitted from the laser light source onto the substrate to be inspected, as the slit-shaped beam, wherein the cylindrical lens is disposed so as to obtain a distance between an incidence surface or emitting surface thereof and the slit-shaped beam upon the substrate to be inspected to be equal to a focal distance of the cylindrical lens.
Abstract translation: 缺陷检查装置和方法包括利用照射光学系统，其将从激光源发射的光束束聚焦并形成为狭缝状光束，以便将光束照射到待检查的基板的表面上，利用检测 光学系统，其检测来自已经被狭缝形光束照射的基板的光，以及利用处理从检测光学系统输出的信号的信号处理器。 照射光学系统包括用于将从激光光源发射的光束聚焦到待检查的基板上的柱面透镜作为狭缝状光束，其中，设置柱面透镜以获得入射光 表面或发射表面以及待检查的基板上的狭缝状光束等于柱面透镜的焦距。
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公开(公告)号：US07970199B2
公开(公告)日：2011-06-28
申请号：US11757458
申请日：2007-06-04
Applicant: Minoru Yoshida , Yoshimasa Oshima
Inventor： Minoru Yoshida , Yoshimasa Oshima
CPC classification number: G01B9/02067 , G01B9/02002 , G01B11/2441 , G01B2290/70 , G01N21/45 , G01N21/95 , G01N21/9501 , G01N2021/95676
Abstract: A surface inspection apparatus is provided based on an optical interference scheme using a wide-band laser light source, such as diode laser, for an interferometer. In the apparatus, a diode laser with a large spectrum width having a short coherence length is used as an emitted light source; modulation optical elements for performing modulation with slightly different frequencies, and optical path length varying optical elements for adjusting the optical path length are located in each of two optical paths between a branching optical element and a combining optical element; and the above-mentioned optical path length varying optical elements are adjusted, while measuring an interference intensity, so as to maximize the interference intensity.
Abstract translation: 基于使用诸如二极管激光器的宽带激光光源作为干涉仪的光学干涉方案来提供表面检查装置。 在该装置中，使用具有短相干长度的具有大光谱宽度的二极管激光器作为发射光源; 用于执行具有稍微不同频率的调制的调制光学元件和用于调整光程长度的光路长度变化光学元件位于分支光学元件和组合光学元件之间的两个光路中的每一个中; 并且在测量干涉强度的同时调节上述光程长度变化光学元件，以使干涉强度最大化。
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