Base-catalyzed silylation of terminal alkyne C—H bonds
    41.
    发明授权
    Base-catalyzed silylation of terminal alkyne C—H bonds 有权
    末端炔烃C-H键的碱催化甲硅烷基化

    公开(公告)号:US09556206B2

    公开(公告)日:2017-01-31

    申请号:US14841964

    申请日:2015-09-01

    Abstract: The present invention is directed to a mild, efficient, and general direct C(sp)-H bond silylation. Various embodiments includes methods, each method comprising or consisting essentially of contacting at least one organic substrate comprising a terminal alkynyl C—H bond, with a mixture of at least one organosilane and an alkali metal hydroxide, under conditions sufficient to form a silylated terminal alkynyl moiety. The methods are operable in the substantially absence of transition-metal compounds. The systems associated with these methods are also disclosed.

    Abstract translation: 本发明涉及温和,有效和通用的直接C(sp)-H键甲硅烷基化。 各种实施方案包括方法,每种方法包括或基本上包括使至少一种包含末端炔基C-H键的有机底物与至少一种有机硅烷和碱金属氢氧化物的混合物在足以形成甲硅烷基化的末端炔基的条件下 部分。 所述方法在基本上不存在过渡金属化合物的情况下是可操作的。 还公开了与这些方法相关联的系统。

    Photoinitiated olefin methathesis polymerization
    45.
    发明授权
    Photoinitiated olefin methathesis polymerization 有权
    光引发的烯烃异构聚合

    公开(公告)号:US09207532B2

    公开(公告)日:2015-12-08

    申请号:US14044974

    申请日:2013-10-03

    CPC classification number: G03F7/0042 G03F7/029 G03F7/20

    Abstract: The present invention provides photosensitive compositions and methods of patterning a polymeric image on a substrate, said methods comprising; (a) depositing a layer of photosensitive composition of any one of claims 15 to 22 on the substrate; and (b) irradiating a portion of the layer of photosensitive composition with a light comprising a wavelength in a range of from about 220 to about 440 nm. The invention also relates to methods of metathesizing an unsaturated organic precursor comprising irradiating Fischer-type carbene ruthenium catalysts with at least one wavelength of light in the presence of at least one unsaturated organic precursor so as to metathesize at least one alkene or one alkyne bond.

    Abstract translation: 本发明提供光敏组合物和在基底上图案化聚合物图像的方法,所述方法包括: (a)在所述基底上沉积权利要求15至22中任一项所述的光敏组合物层; 和(b)用包含波长在约220至约440nm范围内的光照射光敏组合物层的一部分。 本发明还涉及使不饱和有机前体复元的方法,其包括在存在至少一种不饱和有机前体的情况下用至少一种波长的光照射费歇尔型卡宾钌催化剂,以便使至少一种烯烃或一个炔烃折析。

    Transition-metal-free silylation of aromatic compounds
    48.
    发明授权
    Transition-metal-free silylation of aromatic compounds 有权
    芳香族化合物的无金属过渡的甲硅烷基化

    公开(公告)号:US09000167B2

    公开(公告)日:2015-04-07

    申请号:US14043929

    申请日:2013-10-02

    Abstract: The present invention describes chemical systems and methods for silylating aromatic organic substrates, said system comprising a mixture of (a) at least one organosilane and (b) at least one strong base, said system being substantially free of a transition-metal compound, and said methods comprising contacting a quantity of the organic substrate with a mixture of (a) at least one organosilane and (b) at least one strong base, under conditions sufficient to silylate the aromatic substrate; wherein said system is substantially free of a transition-metal compound.

    Abstract translation: 本发明描述了用于甲硅烷基化芳族有机基质的化学体系和方法,所述体系包含(a)至少一种有机硅烷和(b)至少一种强碱的混合物,所述体系基本上不含过渡金属化合物, 所述方法包括在足以使芳族底物甲硅烷基化的条件下使一定量的有机底物与(a)至少一种有机硅烷和(b)至少一种强碱的混合物接触; 其中所述体系基本上不含过渡金属化合物。

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