公开(公告)号：US07851129B2

公开(公告)日：2010-12-14

申请号：US11718091

申请日：2005-09-30

申请人： Daiju Shiono ,  Taku Hirayama ,  Toshiyuki Ogata ,  Hideo Hada

发明人： Daiju Shiono ,  Taku Hirayama ,  Toshiyuki Ogata ,  Hideo Hada

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/114

摘要： This resist composition is a resist composition containing a compound in which a portion or all of hydrogen atoms of phenolic hydroxyl groups in a polyhydric phenol compound (a) having two or more phenolic hydroxyl groups and having a molecular weight of 300 to 2,500 are substituted with at least one selected from the group consisting of acid dissociable dissolution inhibiting groups represented by the following general formulas (p1) and (p2) wherein R1 and R2 each independently represents a branched or cyclic alkyl group, and may contain a hetero atom in the structure; R3 represents a hydrogen atom or a lower alkyl group; and n′ represents an integer of 1 to 3.

摘要翻译： 该抗蚀剂组合物是含有下述化合物的抗蚀剂组合物，其中具有两个以上酚羟基并且分子量为300〜2,500的多元酚化合物（a）中的酚羟基的一部分或全部氢原子被取代为 选自由以下通式（p1）和（p2）表示的酸解离溶解抑制基团中的至少一种，其中R 1和R 2各自独立地表示支链或环状烷基，并且可以在结构中含有杂原子 ; R3表示氢原子或低级烷基; n'表示1〜3的整数。

公开(公告)号：US07807328B2

公开(公告)日：2010-10-05

申请号：US10588866

申请日：2005-01-20

申请人： Toshiyuki Ogata ,  Syogo Matsumaru ,  Hideo Hada

发明人： Toshiyuki Ogata ,  Syogo Matsumaru ,  Hideo Hada

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： G03F7/0046 ,  C08G61/08 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397

摘要： The present invention provide a polymer compound whereby the alkali solubility greatly changes before and after exposure in a chemically amplified positive resist, and a photoresist composition including the polymer compound and a resist pattern formation method which can form a fine pattern with high resolution. The photoresist composition and the resist pattern formation method use the polymer compound including at least one substituent group selected from an alcoholic hydroxyl group, a phenolic hydroxyl group, or a carboxyl group as an alkali soluble group (i), wherein the substituent group is protected by an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1): —CH2—O—R  (1) (wherein R represents an organic group containing no more than 20 carbon atoms and at least one hydrophilic group).

摘要翻译： 本发明提供了一种聚合物化合物，其中碱溶解度在化学放大的正性抗蚀剂中暴露之前和之后剧烈变化，以及包含高分子化合物的光致抗蚀剂组合物和能够以高分辨率形成精细图案的抗蚀剂图案形成方法。 光致抗蚀剂组合物和抗蚀图案形成方法使用包含至少一个选自醇羟基，酚羟基或羧基的取代基的聚合物化合物作为碱溶性基团（i），其中取代基被保护 由通式（1）表示的酸解离的溶解抑制基团（ⅱ）：-CH 2 -O-R（1）（其中R表示含有不超过20个碳原子的有机基团和至少一个亲水基团） 。

公开(公告)号：US07771911B2

公开(公告)日：2010-08-10

申请号：US10536047

申请日：2003-12-18

申请人： Hideo Hada ,  Takeshi Iwai ,  Masaaki Shimazaki ,  Masaaki Muroi ,  Kota Atsuchi ,  Hiroaki Tomida ,  Hirokazu Ozaki

发明人： Hideo Hada ,  Takeshi Iwai ,  Masaaki Shimazaki ,  Masaaki Muroi ,  Kota Atsuchi ,  Hiroaki Tomida ,  Hirokazu Ozaki

IPC分类号： G03C1/00 ,  C02F1/44

CPC分类号： B01D61/58 ,  B01D69/02 ,  B01D71/26 ,  B01D71/56 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/162

摘要： A technique to acquire a photoresist composition which can reduce occurrence of defects of a resist pattern after development is provided. Further, a technique to obtain a photoresist composition having excellent storage stability characteristics as a resist solution (storage stability); and a technique to obtain a photoresist composition which reduces the change of sensitivity and resist pattern size after treatment almost completely are provided. A photoresist composition containing a resin component (A), an acid-generating component (B) for generating an acid under exposure, and an organic solvent (C) is passed through a first filter 2a equipped with a first membrane having zeta potential of more than −20 mV but no more than 15 mV in distilled water of pH 7.0.

摘要翻译： 提供了获得能够减少显影后的抗蚀剂图案的缺陷发生的光致抗蚀剂组合物的技术。 此外，获得具有优异的储存稳定性特性的光致抗蚀剂组合物作为抗蚀剂溶液的技术（保存稳定性）; 并且提供了一种获得光刻胶组合物的技术，其提供了几乎完全降低了处理后的灵敏度变化和抗蚀剂图案尺寸的技术。 含有树脂组分（A），产生暴露酸的产酸组分（B）和有机溶剂（C）的光致抗蚀剂组合物通过配备有具有更多ζ电位的第一膜的第一过滤器2a 在pH 7.0的蒸馏水中为-20mV，但不超过15mV。

公开(公告)号：US07713679B2

公开(公告)日：2010-05-11

申请号：US12251327

申请日：2008-10-14

申请人： Keita Ishiduka ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takehiro Seshimo ,  Hideo Hada

发明人： Keita Ishiduka ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takehiro Seshimo ,  Hideo Hada

IPC分类号： G03F7/004

CPC分类号： G03F7/0045 ,  C07C309/10 ,  C07C381/12 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

摘要： There is provided a compound represented by a general formula (B1-1) shown below, an acid generator composed of the above compound, a resist composition containing an acid generator composed of the above compound, and a method of forming a resist pattern: (wherein RX represents a hydrocarbon group which may contain a substituent group; Q1 represents an alkylene group of 1 to 12 carbon atoms which may contain a substituent group, or a single bond; n represents an integer of 0 or 1; Y1 represents an alkylene group of 1 to 4 carbon atoms, or a fluorinated alkylene group of 1 to 4 carbon atoms; and A+ represents an organic cation which contains a nitrogen atom).

摘要翻译： 提供由下述通式（B1-1）表示的化合物，由上述化合物组成的酸产生剂，含有由上述化合物组成的酸发生剂的抗蚀剂组合物和形成抗蚀剂图案的方法：（ 其中RX表示可以含有取代基的烃基; Q1表示可以含有取代基的1〜12个碳原子的亚烷基或单键; n表示0或1的整数; Y1表示亚烷基 1〜4个碳原子的氟化亚烷基或1〜4个碳原子的氟化亚烷基，A +表示含有氮原子的有机阳离子。

公开(公告)号：US20090269698A1

公开(公告)日：2009-10-29

申请号：US12439149

申请日：2007-08-03

申请人： Daiju Shiono ,  Hideo Hada

发明人： Daiju Shiono ,  Hideo Hada

IPC分类号： G03F7/20 ,  C07C69/708 ,  G03F7/004

CPC分类号： G03F7/0045 ,  C07C69/712 ,  G03F7/0392 ,  G03F7/0397

摘要： The present invention provides a compound that can be used within a resist composition, an intermediate compound for the compound, a positive resist composition, and a method for forming a resist pattern.The present invention discloses a compound represented by a general formula (A-1) shown below [wherein, R′ represents a hydrogen atom or an acid dissociable, dissolution inhibiting group, provided that at least one of the plurality of R′ groups represents an acid dissociable, dissolution inhibiting group; R″ represents an alkyl group of 1 to 10 carbon atoms; R11 to R17 each independently represents an alkyl group of 1 to 10 carbon atoms or an aromatic hydrocarbon group, which may include a hetero atom within the structure; g and j each independently represents an integer of 1 or greater, and k and q each represents an integer of 0 or greater; a represents an integer of 1 to 3; b represents an integer of 1 or greater, and l and m each independently represents an integer of 0 or greater; c represents an integer of 1 or greater, and n and o each independently represents an integer of 0 or greater; and A represents a group represented by a general formula (Ia) shown below, a group represented by a general formula (Ib) shown below, or an aliphatic cyclic group].

摘要翻译： 本发明提供可用于抗蚀剂组合物中的化合物，化合物的中间体化合物，正性抗蚀剂组合物和形成抗蚀剂图案的方法。 本发明公开了由下述通式（A-1）表示的化合物[其中，R'表示氢原子或酸解离，溶解抑制基团，条件是多个R'基团中的至少一个表示 酸解离，溶解抑制组; R“表示1〜10个碳原子的烷基; R 11〜R 17各自独立地表示1〜10个碳原子的烷基或芳香族烃基，其可以在结构内包含杂原子; g和j各自独立地表示1或更大的整数，并且k和q各自表示0或更大的整数; a表示1〜3的整数， b表示1或更大的整数，l和m各自独立地表示0或更大的整数; c表示1或更大的整数，n和o各自独立地表示0或更大的整数; A表示由下述通式（Ia）表示的基团，由下述通式（Ib）表示的基团或脂族环基]表示。

公开(公告)号：US07592122B2

公开(公告)日：2009-09-22

申请号：US10553315

申请日：2004-04-15

申请人： Toshiyuki Ogata ,  Kotaro Endo ,  Hiromitsu Tsuji ,  Masaaki Yoshida ,  Mitsuru Sato ,  Syogo Matsumaru ,  Hideo Hada

发明人： Toshiyuki Ogata ,  Kotaro Endo ,  Hiromitsu Tsuji ,  Masaaki Yoshida ,  Mitsuru Sato ,  Syogo Matsumaru ,  Hideo Hada

IPC分类号： G03F7/004 ,  C08C19/28

CPC分类号： C07C43/126 ,  C07C43/162 ,  C07C43/1747 ,  C07C69/96 ,  C07C2601/14 ,  C07C2602/42 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0757 ,  Y10S430/108

摘要： A high-molecular compound and a low-molecular compound or both having an alkali-soluble site (i) wherein at least a part of the alkali-soluble site (i) is protected with (ii) a halogen atom-containing acetal type acid-dissociative, dissolution inhibiting group, as well as a photoresist composition comprising the same. The photoresist composition is highly stable during storage and can give a resist pattern excellent in sectional rectangular shape and having high transparency to an exposure light, particularly a light having a wavelength of 300 nm or less.

摘要翻译： 具有碱溶性部位（i）的高分子化合物和低分子化合物或二者，其中至少一部分碱溶性部位（i）用（ⅱ）含卤原子的缩醛型酸 - 解离，溶解抑制基团，以及包含其的光致抗蚀剂组合物。 光致抗蚀剂组合物在保存期间高度稳定，并且可以得到截面矩形形状优异并且对曝光光，特别是波长为300nm以下的光具有高透明度的抗蚀剂图案。

公开(公告)号：US20090162788A1

公开(公告)日：2009-06-25

申请号：US12338661

申请日：2008-12-18

申请人： Hideo Hada ,  Yoshiyuki Utsumi ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Fumitake Kaneko ,  Kyoko Ohshita ,  Hiroaki Shimizu ,  Yasuhiro Yoshii

发明人： Hideo Hada ,  Yoshiyuki Utsumi ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Fumitake Kaneko ,  Kyoko Ohshita ,  Hiroaki Shimizu ,  Yasuhiro Yoshii

IPC分类号： G03F7/004 ,  G03F7/20 ,  C07C69/753 ,  C07C305/04

CPC分类号： C07C381/12 ,  C07C303/32 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C309/19 ,  C07C2603/74 ,  C07D333/46 ,  C07D493/18 ,  C08K5/19 ,  C08K5/42 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/123

摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).

摘要翻译： 一种抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸发生剂 （B1）由下述通式（b1-1）表示的化合物组成：其中RX表示可以具有不包括氮原子的取代基的烃基; Q2和Q3各自独立地表示单键或二价连接基团; Y1表示1〜4个碳原子的亚烷基或氟代烷基; Z +表示除通式（w-1）表示的离子的有机阳离子。

公开(公告)号：US20090130597A1

公开(公告)日：2009-05-21

申请号：US12265607

申请日：2008-11-05

申请人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Hideo Hada ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

发明人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Hideo Hada ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

IPC分类号： G03F7/031 ,  G03F7/20 ,  C07C309/04 ,  C07D327/04

CPC分类号： G03F7/0045 ,  C07D327/02 ,  C07D327/04 ,  C07D497/08 ,  C08K5/36 ,  C08K5/42 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

摘要： A compound represented by general formula (I); and a compound represented by general formula (b1-1). X-Q1-Y1—SO3−M+  [Chemical Formula 1] (I) X-Q1-Y1—SO3−A+ (b1-1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.

摘要翻译： 由通式（I）表示的化合物; 和由通式（b1-1）表示的化合物。 <？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-M + [化学式1] <？in-line-formula description =“ “end =”tail“？> <？in-line-formula description =”In-line formula“end =”lead“？>（I）<？in-line-formula description =”In-line Formulas“end = “tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-A + <？in-line-formula description =“In-line Formulas “end =”tail“？> <？in-line-formula description =”在线公式“end =”lead“？>（b1-1）<？in-line-formula description =”In-line Formulas“ end =“tail”？>其中Q1表示二价连接基团或单键; Y1表示可以具有取代基的亚烷基或可以具有取代基的氟化亚烷基; X表示可以具有取代基的3〜30个碳原子的环状基团，其结构中具有-SO 2 - 键; M +表示碱金属离子; 而A +代表有机阳离子。

公开(公告)号：US20090104563A1

公开(公告)日：2009-04-23

申请号：US12251327

申请日：2008-10-14

申请人： Keita Ishiduka ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takehiro Seshimo ,  Hideo Hada

发明人： Keita Ishiduka ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takehiro Seshimo ,  Hideo Hada

IPC分类号： G03F7/028 ,  G03F7/20 ,  C07C309/02 ,  C07C309/78

CPC分类号： G03F7/0045 ,  C07C309/10 ,  C07C381/12 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

摘要： There is provided a compound represented by a general formula (B1-1) shown below, an acid generator composed of the above compound, a resist composition containing an acid generator composed of the above compound, and a method of forming a resist pattern: (wherein RX represents a hydrocarbon group which may contain a substituent group; Q1 represents an alkylene group of 1 to 12 carbon atoms which may contain a substituent group, or a single bond; n represents an integer of 0 or 1; Y1 represents an alkylene group of 1 to 4 carbon atoms, or a fluorinated alkylene group of 1 to 4 carbon atoms; and A+ represents an organic cation which contains a nitrogen atom).

摘要翻译： 提供由下述通式（B1-1）表示的化合物，由上述化合物组成的酸产生剂，含有由上述化合物组成的酸发生剂的抗蚀剂组合物和形成抗蚀剂图案的方法：（ 其中RX表示可以含有取代基的烃基; Q1表示可以含有取代基的1〜12个碳原子的亚烷基或单键; n表示0或1的整数; Y1表示亚烷基 1〜4个碳原子的氟化亚烷基或1〜4个碳原子的氟化亚烷基，A +表示含有氮原子的有机阳离子。

公开(公告)号：US07504196B2

公开(公告)日：2009-03-17

申请号：US11884748

申请日：2006-02-09

申请人： Daju Shiono ,  Taku Hirayama ,  Hideo Hada

发明人： Daju Shiono ,  Taku Hirayama ,  Hideo Hada

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： G03F7/0045 ,  Y10S430/106

摘要： A positive resist composition that includes a base material component (A) that contains an acid-dissociable, dissolution-inhibiting group and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) contains a compound (A1), in which either a portion of, or all of, hydrogen atoms of phenolic hydroxyl groups within a polyhydric phenol compound, which has two or more phenolic hydroxyl groups, a molecular weight of 300 to 2,500, and is represented by a general formula (I) shown below, have been substituted with an acid-dissociable, dissolution-inhibiting group (II) represented by a general formula (II) shown below.

摘要翻译： 一种正性抗蚀剂组合物，其包含含有酸解离的溶解抑制基团并且在酸的作用下表现出增加的碱溶解性的基材成分（A）和暴露时产生酸的酸产生剂成分（B），其中 基材成分（A）含有具有两个以上酚羟基的多元酚化合物中的酚羟基的一部分或全部氢原子的一部分或全部的化合物（A1），其分子量为 300〜2500，由下述通式（I）表示，用下述通式（II）表示的酸解离性溶解抑制基团（II）代替。