METHOD OF CONSUMER/PRODUCER RAW MATERIAL SELECTION
    41.
    发明申请
    METHOD OF CONSUMER/PRODUCER RAW MATERIAL SELECTION 有权
    消费者/生产者原材料选择方法

    公开(公告)号:US20150006112A1

    公开(公告)日:2015-01-01

    申请号:US14242283

    申请日:2014-04-01

    CPC classification number: G01T1/178 H01L2924/0002 H01L2924/00

    Abstract: A system, method and computer program product for determining whether a material meets an alpha particle emissivity specification that includes measuring a background alpha particle emissivity for the counter and measuring a combined alpha particle emissivity from the counter containing a sample of the material. The combined alpha particle emissivity includes the background alpha particle emissivity in combination with a sample alpha particle emissivity. The decision statistic is computed based on the observed data and compared to a threshold value. When the decision statistic is less than the threshold value, the material meets the alpha particle emissivity specification. The testing times are computed based on pre-specified criteria so as to meet the needs of both Producer and Consumer.

    Abstract translation: 一种用于确定材料是否满足α粒子发射率规范的系统,方法和计算机程序产品,其包括测量用于计数器的背景α粒子发射率并从包含材料样品的计数器测量组合的α粒子发射率。 组合的α粒子发射率包括背景α粒子发射率与样品α粒子发射率的组合。 根据观察到的数据计算决策统计量,并与阈值进行比较。 当判定统计量小于阈值时,材料满足α粒子发射率规格。 测试时间是根据预先确定的标准计算的,以满足生产者和消费者的需求。

    EVALUATION OF WAFER CARCASS ALPHA PARTICLE EMISSION

    公开(公告)号:US20220317172A1

    公开(公告)日:2022-10-06

    申请号:US17217341

    申请日:2021-03-30

    Abstract: A method for measuring alpha particle emissions may include obtaining a wafer emission rate, wherein the wafer emission rate is measured with a counter. The method may further include covering the wafer with a metal mesh grounded to a cathode of the counter wherein the metal mesh is grounded to the cathode outboard of the wafer and obtaining a mesh and wafer emission rate, wherein the mesh and wafer emission rate is measured with the counter. The method may further include replacing the wafer with a wafer carcass, obtaining a wafer carcass and mesh emission rate, and calculating a wafer carcass emissivity.

    INTEGRATED REACTIVE MATERIAL ERASURE ELEMENT WITH PHASE CHANGE MEMORY

    公开(公告)号:US20210257410A1

    公开(公告)日:2021-08-19

    申请号:US16692586

    申请日:2019-11-22

    Abstract: A reactive material erasure element comprising a reactive material is located between PCM cells and is in close proximity to the PCM cells. The reaction of the reactive material is trigger by a current applied by a bottom electrode which has a small contact area with the reactive material erasure element, thereby providing a high current density in the reactive material erasure element to ignite the reaction of the reactive material. Due to the close proximity of the PCM cells and the reactive material erasure element, the heat generated from the reaction of the reactive material can be effectively directed to the PCM cells to cause phase transformation of phase change material elements in the PCM cells, which in turn erases data stored in the PCM cells.

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