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公开(公告)号：US20140311405A1
公开(公告)日：2014-10-23
申请号：US14205340
申请日：2014-03-11
Applicant: Kateeva, Inc.
Inventor： Justin Mauck , Alexander Sou-Kang Ko , Eliyahu Vronsky , Shandon Alderson
CPC classification number: B41J29/02 , B05C15/00 , B23P6/00 , B41J2/01 , B41J29/17 , F24F3/1607 , H01L21/6719 , Y10T29/49721
Abstract: The present teachings disclose various embodiments of a gas enclosure system can have a gas enclosure that can include a printing system enclosure and an auxiliary enclosure. In various embodiments of a gas enclosure system of the present teachings, a printing system enclosure can be isolated from an auxiliary enclosure. Various systems and methods of the present teachings can provide for the ongoing management of a printing system by utilizing various embodiments of isolatable enclosures. For example, various measurement and maintenance process steps for the management of a printhead assembly can be performed in an auxiliary enclosure, which can be isolated from a printing system enclosure of a gas enclosure system, thereby preventing or minimizing interruption of a printing process.
Abstract translation: 本教导公开了气体封闭系统的各种实施例可以具有可以包括打印系统外壳和辅助外壳的气体外壳。 在本教导的气体封闭系统的各种实施例中，打印系统外壳可以与辅助外壳隔离。 本教导的各种系统和方法可以通过利用可隔离外壳的各种实施例来提供打印系统的持续管理。 例如，用于管理打印头组件的各种测量和维护处理步骤可以在辅助外壳中执行，辅助外壳可以与气体外壳系统的打印系统外壳隔离，从而防止或最小化打印过程的中断。
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公开(公告)号：US20240312811A1
公开(公告)日：2024-09-19
申请号：US18677637
申请日：2024-05-29
Applicant: Kateeva, Inc.
Inventor： Conor F. Madigan , Eliyahu Vronsky , Alexander Sou-Kang Ko , Justin Mauck
IPC: H01L21/67 , H01L21/673 , H10K71/00 , H10K71/13 , H10K71/40
CPC classification number: H01L21/67225 , H01L21/67393 , H10K71/00 , H10K71/135 , H10K71/40 , H10K71/811 , H01L21/67161 , H01L21/67167 , H01L21/6719 , H01L21/67196 , H01L21/67201 , H01L21/67207
Abstract: Apparatus and techniques are described herein for use in manufacturing electronic devices, such as can include organic light emitting diode (OLED) devices. Such apparatus and techniques can include using one or more modules having a controlled environment. For example, a substrate can be received from a printing system located in a first processing environment, and the substrate can be provided a second processing environment, such as to an enclosed thermal treatment module comprising a controlled second processing environment. The second processing environment can include a purified gas environment having a different composition than the first processing environment.
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公开(公告)号：US20240100868A1
公开(公告)日：2024-03-28
申请号：US18531436
申请日：2023-12-06
Applicant: Kateeva, Inc.
Inventor： Justin Mauck , Alexander Sou-Kang Ko , Eliyahu Vronsky , Shandon Alderson
IPC: B41J29/13 , B41J2/165 , B41J29/17 , B41J29/377 , F24F3/163 , H01L21/67 , H01L33/00 , H10K71/00 , H10K71/13
CPC classification number: B41J29/13 , B41J2/16523 , B41J29/17 , B41J29/377 , F24F3/163 , H01L21/6719 , H01L33/005 , H10K71/00 , H10K71/135 , H10K71/811 , B41J2/16508 , B41J2/1652 , B41J2/16535 , H01L2924/0002 , Y10T29/49718
Abstract: The present teachings relate to various embodiments of an hermetically-sealed gas enclosure assembly and system that can be readily transportable and assemblable and provide for maintaining a minimum inert gas volume and maximal access to various devices and apparatuses enclosed therein. Various embodiments of an hermetically-sealed gas enclosure assembly and system of the present teachings can have a gas enclosure assembly constructed in a fashion that minimizes the internal volume of a gas enclosure assembly, and at the same time optimizes the working space to accommodate a variety of footprints of various OLED printing systems. Various embodiments of a gas enclosure assembly so constructed additionally provide ready access to the interior of a gas enclosure assembly from the exterior during processing and readily access to the interior for maintenance, while minimizing downtime.
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公开(公告)号：US20230290667A1
公开(公告)日：2023-09-14
申请号：US18169649
申请日：2023-02-15
Applicant: Kateeva, Inc.
Inventor： Robert B. Lowrance , Alexander Sou-Kang Ko , Justin Mauck , Eliyahu Vronsky , Aleksey Khrustalev , Karl Mathia , Shandon Alderson
IPC: H01L21/683 , B41J3/28 , B41J3/407 , B41J25/304 , B41J25/00 , H01L21/68 , H01L21/677 , B41J11/22 , B41J11/06 , B41J29/02
CPC classification number: H01L21/6838 , B41J3/28 , B41J3/407 , B41J25/304 , B41J25/005 , H01L21/68 , H01L21/67784 , B41J11/22 , B41J11/06 , B41J29/02 , H10K71/00
Abstract: The present teachings disclose various embodiments of a printing system for printing substrate, in which the printing system can be housed in a gas enclosure, where the environment within the enclosure can be maintained as a controlled printing environment. A controlled environment of the present teachings can include control of the type of gas environment within the gas enclosure, the size and level particulate matter within the enclosure, control of the temperature within the enclosure and control of lighting. Various embodiments of a printing system of the present teachings can include a Y-axis motion system and a Z-axis moving plate that are configured to substantially decrease excess thermal load within the enclosure by, for example, eliminating or substantially minimizing the use of conventional electric motors.
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公开(公告)号：US11626311B2
公开(公告)日：2023-04-11
申请号：US17247013
申请日：2020-11-24
Applicant: Kateeva, Inc.
Inventor： Robert B. Lowrance , Alexander Sou-Kang Ko , Justin Mauck , Eliyahu Vronsky , Aleksey Khrustalev , Karl Mathia , Shandon Alderson
IPC: B41J29/02 , B41J3/28 , B41J3/407 , B41J11/06 , B41J11/22 , B41J25/304 , B41J25/00 , H01L51/56 , H01L21/683 , H01L21/677 , H01L21/68
Abstract: The present teachings disclose various embodiments of a printing system for printing substrate, in which the printing system can be housed in a gas enclosure, where the environment within the enclosure can be maintained as a controlled printing environment. A controlled environment of the present teachings can include control of the type of gas environment within the gas enclosure, the size and level particulate matter within the enclosure, control of the temperature within the enclosure and control of lighting. Various embodiments of a printing system of the present teachings can include a Y-axis motion system and a Z-axis moving plate that are configured to substantially decrease excess thermal load within the enclosure by, for example, eliminating or substantially minimizing the use of conventional electric motors.
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Patent Agency Ranking
公开(公告)号：US11489119B2
公开(公告)日：2022-11-01
申请号：US16574334
申请日：2019-09-18
Applicant: KATEEVA, INC.
Inventor： Alexander Sou-Kang Ko , Justin Mauck , Eliyahu Vronsky , Conor F. Madigan , Eugene Rabinovich , Nahid Harjee , Christopher Buchner , Gregory Lewis
IPC: B05D5/00 , B41J11/00 , H01L51/00 , H01L51/52 , B05B15/60 , B05C13/00 , B05C15/00 , B41J2/01 , B41J3/407 , H01L21/67 , H01L21/677 , H01L51/56 , H01L21/673 , B05D3/06 , C09D11/101
Abstract: A method for providing a substrate coating comprises transferring a substrate to an enclosed ink jet printing system; printing organic material in a deposition region of the substrate using the enclosed ink jet printing system, the deposition region comprising at least a portion of an active region of a light-emitting device on the substrate; loading the substrate with the organic material deposited thereon to an enclosed curing module; supporting the substrate in the enclosed curing module, the supporting the substrate comprising floating the substrate on a gas cushion established by a floatation support apparatus; and while supporting the substrate in the enclosed curing module, curing the organic material deposited on the substrate to form an organic film layer.
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公开(公告)号：US11034176B2
公开(公告)日：2021-06-15
申请号：US16287577
申请日：2019-02-27
Applicant: Kateeva, Inc.
Inventor： Justin Mauck , Alexander Sou-Kang Ko , Eliyahu Vronsky , Shandon Alderson
IPC: B41J29/13 , B41J2/165 , H01L33/00 , B41J29/377 , H01L51/00 , H01L21/67 , F24F3/163 , B41J29/17 , H01L51/56
Abstract: The present teachings relate to various embodiments of an hermetically-sealed gas enclosure assembly and system that can be readily transportable and assemblable and provide for maintaining a minimum inert gas volume and maximal access to various devices and apparatuses enclosed therein. Various embodiments of an hermetically-sealed gas enclosure assembly and system of the present teachings can have a gas enclosure assembly constructed in a fashion that minimizes the internal volume of a gas enclosure assembly, and at the same time optimizes the working space to accommodate a variety of footprints of various OLED printing systems. Various embodiments of a gas enclosure assembly so constructed additionally provide ready access to the interior of a gas enclosure assembly from the exterior during processing and readily access to the interior for maintenance, while minimizing downtime.
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公开(公告)号：US10654299B2
公开(公告)日：2020-05-19
申请号：US16102392
申请日：2018-08-13
Applicant: Kateeva, Inc.
Inventor： Justin Mauck , Alexander Sou-Kang Ko , Eliyahu Vronsky , Shandon Alderson , Alexey Stepanov
Abstract: The present teachings relate to various embodiments of a gas enclosure system that can have various components comprising a particle control system that can provide a low-particle zone proximal to a substrate. Various components of a particle control system can include a gas circulation and filtration system, a low-particle-generating motion system for moving a printhead assembly relative to a substrate, a service bundle housing exhaust system, and a printhead assembly exhaust system. In addition to maintaining substantially low levels for each species of various reactive species, including various reactive atmospheric gases, such as water vapor and oxygen, for various embodiments of a gas enclosure system that have a particle control system, an on-substrate particle specification can be readily met. Accordingly, processing of various substrates in an inert, low-particle gas environment according to systems and methods of the present teachings can have substantially lower manufacturing defects.
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公开(公告)号：US10468279B2
公开(公告)日：2019-11-05
申请号：US15106907
申请日：2014-12-23
Applicant: Kateeva, Inc.
Inventor： Conor F. Madigan , Eliyahu Vronsky , Alexander Sou-Kang Ko , Justin Mauck
IPC: H01L21/67 , H01L51/56 , H01L51/00 , H01L21/673
Abstract: Apparatus and techniques are described herein for use in manufacturing electronic devices. such as can include organic light emitting diode (OLED) devices. Such apparatus and techniques can include using one or more modules having a controlled environment. For example, a substrate can be received from a printing system located in a first processing environment, and the substrate can be provided a second processing environment, such as to an enclosed thermal treatment module comprising a controlled second processing environment. The second processing environment can include a purified gas environment having a different composition than the first processing environment.
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公开(公告)号：US20190219285A1
公开(公告)日：2019-07-18
申请号：US16362595
申请日：2019-03-22
Applicant: Kateeva, Inc.
Inventor： Justin Mauck , Alexander Sou-Kang Ko , Eliyahu Vronsky , Shandon Alderson
IPC: F24F3/16 , F24F3/14 , B41J29/393 , H05B33/10
CPC classification number: F24F3/161 , B05B17/0638 , B41J29/393 , F24F3/14 , H01L51/0005 , H01L51/56 , H05B33/02 , H05B33/10
Abstract: The present teachings relate to various embodiments of an hermetically-sealed gas enclosure assembly and system that can be readily transportable and assemblable and provide for maintaining a minimum inert gas volume and maximal access to various devices and apparatuses enclosed therein. Various embodiments of an hermetically-sealed gas enclosure assembly and system of the present teachings can have a gas enclosure assembly constructed in a fashion that minimizes the internal volume of a gas enclosure assembly, and at the same time optimizes the working space to accommodate a variety of footprints of various OLED printing systems. Various embodiments of a gas enclosure assembly so constructed additionally provide ready access to the interior of a gas enclosure assembly from the exterior during processing and readily access to the interior for maintenance, while minimizing downtime.
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