公开(公告)号：US06395631B1

公开(公告)日：2002-05-28

申请号：US09366751

申请日：1999-08-04

申请人： Yi Xu ,  Jian Xun Li

发明人： Yi Xu ,  Jian Xun Li

IPC分类号： H01L214763

CPC分类号： H01L21/31116 ,  H01L21/31138 ,  H01L21/31144 ,  H01L21/76802 ,  H01L21/7688

摘要： A method for forming, within a low dielectric constant dielectric layer formed upon a substrate employed within a microelectronics fabrication, a conductor pattern employing a hard mask cap layer. There is first provided a substrate having conductor regions formed therein upon which is formed a low dielectric constant dielectric layer. There is then formed over the substrate a silicon containing hard mask cap layer. There is then formed over the hard mask cap layer a patterned photoresist etch mask layer. There is then subtractively etched employing the patterned photoresist etch mask layer and a first subtractive etching environment the pattern into the hard mask layer. There is then subtractively etched employing the patterned hard mask layer and a second etching environment the pattern into the low dielectric constant dielectric layer, simultaneously stripping the photoresist etch mask layer. There is then removed by delamination the hard mask cap layer employing a chemical treatment, leaving a trench pattern in the low dielectric constant dielectric layer. The trench pattern may be filled with a microelectronics material to form a patterned layer around which is a maximized amount of low dielectric constant dielectric material. The order of filling with microelectronics material and delamination of the hard mask layer may be reversed if desired to minimize the amount of patterned microelectronics material remaining above the substrate surface, in which case the method is a lift off method for patterning a microelectronics layer. After filling and patterning, the substrate surface may be planarized for further processing and optional additional microelectronics layers formed thereover.

摘要翻译： 在形成在微电子制造中使用的衬底上的低介电常数电介质层内形成使用硬掩模帽层的导体图案的方法。 首先，设置有形成有导体区域的基板，在其上形成低介电常数介电层。 然后在衬底上形成含硅的硬掩模帽层。 然后在硬掩模帽层上形成图案化的光致抗蚀剂蚀刻掩模层。 然后使用图案化的光致抗蚀剂蚀刻掩模层进行减法蚀刻，并且将图案的第一减去刻蚀环境刻蚀成硬掩模层。 然后使用图案化的硬掩模层进行减法蚀刻，并且将图案的第二蚀刻环境放置到低介电常数介电层中，同时剥离光致抗蚀剂蚀刻掩模层。 然后通过分层去除采用化学处理的硬掩模帽层，在低介电常数介电层中留下沟槽图案。 沟槽图案可以用微电子材料填充以形成图案化层，围绕其形成最大量的低介电常数电介质材料。 如果需要，微电子材料的填充顺序和硬掩模层的分层可以相反，以使在基板表面之上残留的图案化微电子材料的量最小化，在这种情况下，该方法是用于图案化微电子层的剥离方法。 在填充和图案化之后，衬底表面可以被平坦化以用于进一步处理，并且在其上形成可选的另外的微电子层。

公开(公告)号：US06348407B1

公开(公告)日：2002-02-19

申请号：US09805955

申请日：2001-03-15

申请人： Subhash Gupta ,  Yi Xu ,  Simon Chooi ,  Mei Sheng Zhou

发明人： Subhash Gupta ,  Yi Xu ,  Simon Chooi ,  Mei Sheng Zhou

IPC分类号： H01L214763

CPC分类号： H01L21/76826 ,  H01L21/31058 ,  H01L21/76801 ,  H01L21/76807 ,  H01L21/76825 ,  H01L21/76829

摘要： This invention relates to a method of fabrication used for semiconductor integrated circuit devices, and more specifically to the use an alternate etch stop in dual damascene interconnects that improves adhesion between low dielectric constant organic materials. In addition, the etch stop material is a silicon containing material and is transformed into a low dielectric constant material (k=3.5 to 5), which becomes silicon-rich silicon oxide after UV radiation and silylation, oxygen plasma.

摘要翻译： 本发明涉及用于半导体集成电路器件的制造方法，更具体地说，涉及在双镶嵌互连中使用改进低介电常数有机材料之间的粘附性的交替蚀刻停止。 此外，蚀刻停止材料是含硅材料，并被转变成低介电常数材料（k = 3.5至5），其在UV辐射和甲硅烷基化之后变成富氧氧化硅，氧等离子体。

公开(公告)号：US5930677A

公开(公告)日：1999-07-27

申请号：US845252

申请日：1997-04-21

申请人： Jia Zhen Zheng ,  Guo Li Qi Mike ,  Yi Xu

发明人： Jia Zhen Zheng ,  Guo Li Qi Mike ,  Yi Xu

IPC分类号： H01L21/3105 ,  H01L21/314 ,  H01L21/316 ,  H01L21/768

CPC分类号： H01L21/02164 ,  H01L21/02126 ,  H01L21/022 ,  H01L21/02274 ,  H01L21/02282 ,  H01L21/31055 ,  H01L21/316 ,  H01L21/31612 ,  H01L21/76819

摘要： A method for forming a planarized interlevel dielectric layer without degradation due to the microloading effect from spin-on material etchback is described. A patterned first conducting layer is provided over an insulating layer on a semiconductor substrate. An improved interlevel dielectric layer is formed overlying the patterned first conducting layer by the following steps. A first oxide layer is deposited overlying the patterned first conducting layer and the insulating layer. A spin-on material layer is coated overlying the first oxide layer and etched back using O.sub.2 gas added to the CHF.sub.3 /CF.sub.4 chemistry until the first oxide layer is exposed overlying the patterned first conducting layer wherein microloading effects from the etching back of the spin-on material layer are lower than microloading effects in a conventional interlevel dielectric layer. A second oxide layer is deposited to complete the interlevel dielectric layer. A second conducting layer is deposited over the interlevel dielectric layer and patterned to complete the fabrication of the integrated circuit device.

摘要翻译： 描述了由于旋涂材料回蚀引起的微加载效应而形成平坦化层间电介质层而不降解的方法。 图案化的第一导电层设置在半导体衬底上的绝缘层上。 通过以下步骤形成覆盖图案化的第一导电层的改进的层间介电层。 沉积在图案化的第一导电层和绝缘层上的第一氧化物层。 将旋涂材料层涂覆在第一氧化物层上，并使用添加到CHF 3 / CF 4化学物质的O 2气体进行回蚀，直到第一氧化物层暴露在图案化的第一导电层上，其中来自旋转 - 材料层在常规层间介质层中低于微载荷效应。 沉积第二氧化物层以完成层间电介质层。 第二导电层沉积在层间电介质层上并被图案化以完成集成电路器件的制造。

公开(公告)号：US20240044480A1

公开(公告)日：2024-02-08

申请号：US18115815

申请日：2023-03-01

申请人： Yi Xu

发明人： Yi Xu

IPC分类号： F21V29/503 ,  F21V29/71 ,  F21V29/67

CPC分类号： F21V29/503 ,  F21V29/71 ,  F21V29/67 ,  G03B21/16

摘要： A new heat dissipation structure for sealed optical machines comprises an optical machine housing, an LED light source, a light cone, a first Fresnel lens, heat insulating glass, a liquid crystal screen, a second Fresnel lens, and a reflector; the upper part of the optical machine housing is installed with a second heat dissipation fan. The invention adopts two independent heat dissipation systems inside and outside, which can greatly increase the heat dissipation performance of the optical machine, and the external heat sink of the external heat dissipation system and the light heat sink share a fan in parallel, simplifying the structure and reducing the cost. The second heat dissipation fan is integrated with the optical machine shell, which effectively reduces the height of the optical machine, reduces the volume of the optical machine, and achieves a better internal circulation, further improving the heat dissipation efficiency.

公开(公告)号：US11343160B1

公开(公告)日：2022-05-24

申请号：US16398426

申请日：2019-04-30

申请人： Zahra Ferdowsi ,  Michael Cieslak ,  Michael David Marr ,  Aysegul Cansizoglu ,  Xiaolin Shi ,  Hussein Mehanna ,  Caleb Ogden ,  Yi Xu

发明人： Zahra Ferdowsi ,  Michael Cieslak ,  Michael David Marr ,  Aysegul Cansizoglu ,  Xiaolin Shi ,  Hussein Mehanna ,  Caleb Ogden ,  Yi Xu

IPC分类号： H04L43/55 ,  H04L67/1087 ,  H04L67/125 ,  H04L41/50

摘要： Clustering a plurality of client devices running an application as a function of a data structure such that the plurality of client devices are each assigned a cluster. Client devices having similar performance metrics are assigned the same cluster. An operation of the application is modified as a function of the performance metrics of the client device. The modification of application operation is performed by turning certain features of the application on and off using a rule based on device cluster.

公开(公告)号：US20110099979A1

公开(公告)日：2011-05-05

申请号：US12915857

申请日：2010-10-29

申请人： Yi Xu ,  Leslie R. Wolf

发明人： Yi Xu ,  Leslie R. Wolf

IPC分类号： F01N3/00 ,  C10L1/18

CPC分类号： C10L1/026 ,  C10G2300/301 ,  C10G2300/307 ,  C10G2300/405 ,  C10L1/08 ,  C10L1/1811 ,  C10L10/02 ,  C10L10/12

摘要： A diesel fuel composition is disclosed, as well as a method for reducing NOx emissions from a diesel engine at minimum fuel consumption wherein the diesel engine operates in a low temperature combustion mode, comprising the step of adding to the diesel engine at least one diesel fuel or blending component for a diesel fuel having a combination of a low T50 in the range of from 190° C. to 280° C., a high cetane number in the range of from 31 to 60, and an effective emissions reducing amount of a nitrogen-free cetane improver.

摘要翻译： 公开了一种柴油燃料组合物，以及用于以最小燃料消耗量从柴油发动机中减少NOx排放的方法，其中所述柴油发动机在低温燃烧模式下运行，所述方法包括以下步骤：向所述柴油发动机添加至少一种柴油燃料 或混合组分，用于具有在190℃至280℃范围内的低T50的组合的柴油燃料，高十六烷值在31至60的范围内，并且有效减少排放量 无氮十六烷改良剂。

公开(公告)号：US20090284959A1

公开(公告)日：2009-11-19

申请号：US12213125

申请日：2008-06-16

申请人： Yi Xu ,  Yechen Xu

发明人： Yi Xu ,  Yechen Xu

IPC分类号： F21L4/00

CPC分类号： G09F13/00 ,  G09F13/04

摘要： The present invention relates to solar lighting device, in particular, an illuminating solar display panel comprising display of a transparent illustration on the solar panel. The present invention has dual functional abilities of collecting solar power as a power supply unit and present illuminating illustration as a display unit, whereby an illustration is cutout from the dark coloured material layers of the power supply panel creating a transparent illustration; thereby, light can enter from behind the panel and create an illuminating effect to the illustration. Instead of two separate components, compromise of solar panel(s) and illuminating display unit, the current invention combines two separate units into one independent power efficient illuminating solar display apparatus.

摘要翻译： 本发明涉及太阳能照明装置，特别涉及一种包括在太阳能电池板上显示透明图示的照明太阳能显示面板。 本发明具有作为电源单元收集太阳能的双功能能力，并且将照明图示为显示单元，从而从电源面板的深色材料层切出图示，从而产生透明的图示; 因此，光可以从面板后面进入，并为该图示产生照明效果。 本发明将两个单独的单元组合成一个独立的功率有效的照明太阳能显示装置，而不是两个单独的部件，妥协太阳能电池板和照明显示单元。

公开(公告)号：US07401965B2

公开(公告)日：2008-07-22

申请号：US11518664

申请日：2006-09-11

申请人： Yi Xu ,  Ching-Huang Lin

发明人： Yi Xu ,  Ching-Huang Lin

IPC分类号： F21V7/04

CPC分类号： G02B6/002

摘要： An exemplary backlight module (1) includes a light guide plate (10) and at least one point illuminator (12). The light guide plate includes a first side surface (102), and a protrusion (14) outwardly extending from the first side surface. The protrusion includes at least one second side surface (144) oblique to the first side surface. The at least one point illuminator is adjacent to the least one second side surface.

摘要翻译： 示例性背光模块（1）包括导光板（10）和至少一个点照明器（12）。 导光板包括第一侧表面（102）和从第一侧表面向外延伸的突出部（14）。 该突出部包括至少一个倾斜于第一侧表面的第二侧表面（144）。 所述至少一个点照明器邻近所述至少一个第二侧表面。

公开(公告)号：US20060262563A1

公开(公告)日：2006-11-23

申请号：US11438831

申请日：2006-05-23

申请人： Yi Xu ,  Che-Kuei Mai

发明人： Yi Xu ,  Che-Kuei Mai

IPC分类号： F21V7/04

CPC分类号： G02B6/0016

摘要： A backlight module (30) includes a light guide plate and a light source (210). The light guide plate includes a light incident surface, and a light diffusion cavity (308) disposed corresponding to the light incident surface. The light source is disposed adjacent to the light incident surface. One of surfaces (309) of the light guide plate defining the light diffusion cavity includes a plurality of prism structures, the surface being the one nearest to the light incident surface. Most of the light from the light source can be diffused uniformly by the prism structures before entering an efficient display area of the light guide plate. This reduces or eliminates what would otherwise be one or more dark areas in the light guide plate, and results in the uniform emitting of light from the light guide plate.

摘要翻译： 背光模块（30）包括导光板和光源（210）。 导光板包括光入射表面和对应于光入射表面设置的光漫射腔（308）。 光源设置在光入射表面附近。 限定光扩散腔的导光板的一个表面（309）包括多个棱镜结构，该表面是最靠近光入射表面的表面。 在进入导光板的有效显示区域之前，来自光源的大部分光可以被棱镜结构均匀地扩散。 这减少或消除了导光板中的一个或多个暗区域，并导致来自导光板的均匀发光。

公开(公告)号：US20060066612A1

公开(公告)日：2006-03-30

申请号：US11231760

申请日：2005-09-22

申请人： Herb Yang ,  Yi Xu

发明人： Herb Yang ,  Yi Xu

IPC分类号： G06T15/00

CPC分类号： G06T15/205

摘要： An image-based rendering system and method for rendering a novel image from several reference images. The system includes a pre-processing module for pre-processing at least two of the reference images and providing pre-processed data; a view synthesis module connected to the pre-processing module for synthesizing an intermediate image from the at least two of the reference images and the pre-processed data; and, an artifact rejection module connected to the view synthesis module for correcting the intermediate image to produce the novel image.

摘要翻译： 一种基于图像的渲染系统和方法，用于从多个参考图像中渲染新颖的图像。 该系统包括用于预处理至少两个参考图像并提供预处理数据的预处理模块; 连接到预处理模块的视图合成模块，用于从所述至少两个参考图像和预处理数据合成中间图像; 以及连接到视图合成模块的伪像抑制模块，用于校正中间图像以产生新颖图像。