公开(公告)号：US08297292B2

公开(公告)日：2012-10-30

申请号：US12510314

申请日：2009-07-28

申请人： Takayuki Kokubo ,  Jun Yamawaku ,  Tsuyoshi Moriya

发明人： Takayuki Kokubo ,  Jun Yamawaku ,  Tsuyoshi Moriya

IPC分类号： B08B3/04

CPC分类号： B08B3/10 ,  B08B13/00 ,  B08B2230/01

摘要： Provided are a cleaning device and a cleaning method of a semiconductor manufacturing apparatus, capable of performing a cleaning process more effectively as compared to conventional cases and obtaining a high cleaning effect. A semiconductor manufacturing apparatus cleaning device 100 includes a pure water steam generating vessel 2 for generating pure water steam from pure water; a supply port 5 for supplying the pure water steam to a cleaning target portion; a supply line 4 for connecting the pure water steam generating vessel with the supply port; a collection port 6 for collecting steam used in cleaning from the cleaning target portion; a collection vessel 8 for condensing and collecting the used steam; and a collection line 7 for connecting the collection port 6 with the collection vessel 8.

摘要翻译： 提供了一种半导体制造装置的清洁装置和清洁方法，与常规情况相比，能够更有效地进行清洁处理并获得高清洁效果。 半导体制造装置清洁装置100包括用于从纯水产生纯水蒸汽的纯水蒸汽发生容器2， 用于将纯水蒸汽供应到清洁目标部分的供应口5; 用于将纯水蒸汽发生容器与供给口连接的供应管线4; 用于从清洁目标部分收集用于清洁的蒸汽的收集口6; 用于冷凝和收集用过的蒸汽的收集容器8; 以及用于将收集口6与收集容器8连接的收集线7。

公开(公告)号：US08260557B2

公开(公告)日：2012-09-04

申请号：US12398523

申请日：2009-03-05

申请人： Tsuyoshi Moriya

发明人： Tsuyoshi Moriya

IPC分类号： G01N31/00 ,  G06F17/18 ,  G06F19/00

CPC分类号： G01N15/02

摘要： A system for determining occurrence factors of particles includes a user interface device, and an apparatus for detecting the occurrence factors of particles. The apparatus for detecting the occurrence factors of particles includes a storage unit that stores a program for executing a calculation method for calculating a likelihood of each of the occurrence factors of particles in the form of a score; and a calculation unit for calculating the score for each of the occurrence factors of particles based on particle distributions at least on a surface of a substrate using the stored program. The user interface device displays the calculated score for each of the occurrence factors of particles.

摘要翻译： 用于确定颗粒的发生因子的系统包括用户界面装置和用于检测颗粒的出现因子的装置。 用于检测粒子出现因子的装置包括存储单元，该存储单元存储用于执行计算方法的程序，该计算方法用于计算分数形式的粒子的每个发生因子的可能性; 以及计算单元，用于基于使用所存储的程序的至少在基板的表面上的粒子分布来计算颗粒的每个发生因子的得分。 用户界面设备显示每个颗粒发生因子的计算得分。

公开(公告)号：US08172949B2

公开(公告)日：2012-05-08

申请号：US12718699

申请日：2010-03-05

申请人： Tomoyuki Kudo ,  Jun Ozawa ,  Hiroshi Nakamura ,  Kazunori Kazama ,  Tsuyoshi Moriya ,  Hiroyuki Nakayama ,  Hiroshi Nagaike

发明人： Tomoyuki Kudo ,  Jun Ozawa ,  Hiroshi Nakamura ,  Kazunori Kazama ,  Tsuyoshi Moriya ,  Hiroyuki Nakayama ,  Hiroshi Nagaike

IPC分类号： C23C16/00 ,  C23F1/00 ,  B65G21/677 ,  H01L21/306

CPC分类号： H01L21/67201 ,  H01L21/67017 ,  H01L21/67253 ,  H01L21/67748 ,  Y10S414/135 ,  Y10S414/139

摘要： A computer readable storage medium storing a program for performing an operation method of a substrate processing apparatus is provided. The operation method includes the steps of introducing a nonreactive gas into the vacuum preparation chamber before the gate valve is opened while the substrate is transferred between the vacuum preparation chamber of the vacuum processing unit and the transfer unit, stopping introducing the nonreactive gas when an inner pressure of the vacuum preparation chamber becomes same as an atmospheric pressure, starting an evacuation process of the corrosive gas in the vacuum preparation chamber and then opening to atmosphere performed by letting the vacuum preparation chamber communicate with an atmosphere, and opening the gate valve after the step of opening to atmosphere.

摘要翻译： 提供一种存储用于执行基板处理装置的操作方法的程序的计算机可读存储介质。 操作方法包括以下步骤：在基板在真空处理单元的真空处理室和转印单元的真空准备室之间转移时，在闸阀打开之前将非反应性气体引入真空准备室中，当内部 真空制备室的压力与大气压力相同，开始真空制备室中的腐蚀性气体的抽空处理，然后通过使真空制备室与大气连通而进入大气，并在该真空制备室之后打开闸阀 向大气开放的一步。

公开(公告)号：US08062432B2

公开(公告)日：2011-11-22

申请号：US12053880

申请日：2008-03-24

申请人： Eiichi Sugawara ,  Tsuyoshi Moriya

发明人： Eiichi Sugawara ,  Tsuyoshi Moriya

IPC分类号： B08B9/00

CPC分类号： B08B7/00 ,  B08B5/02 ,  B08B7/0057 ,  B08B9/00 ,  F04D19/042 ,  F04D29/701 ,  F05D2260/607

摘要： A cleaning method for a turbo molecular pump, which enables the exhausting ability of the turbo molecular pump to be restored without bringing about a decrease in the productivity of a substrate processing apparatus. A vaporizing gas that vaporizes foreign matter attached to an internal surface of the turbo molecular pump is supplied toward the foreign matter.

摘要翻译： 一种用于涡轮分子泵的清洁方法，其能够恢复涡轮分子泵的排气能力，而不会降低基板处理装置的生产率。 将附着于涡轮分子泵的内表面的异物气化的汽化气体向异物供给。

公开(公告)号：US08052798B2

公开(公告)日：2011-11-08

申请号：US12632559

申请日：2009-12-07

申请人： Tsuyoshi Moriya ,  Hiroshi Nagaike

发明人： Tsuyoshi Moriya ,  Hiroshi Nagaike

IPC分类号： B08B6/00

CPC分类号： H01J37/32431 ,  C23C16/4401 ,  H01J2237/022

摘要： A particle removal apparatus for removing particles from a chamber of a plasma processing apparatus, wherein the chamber is connected to a gas exhaust port and a plasma of a processing gas is generated in the chamber to plasma process a substrate to be processed, includes a particle charging control member for positively charging particles generated within the chamber by positive ions of an ion sheath region formed in a region other than the vicinity of the substrate to be processed, wherein positively charged particles are discharged from the chamber via the gas exhaust port. Therefore, there is no plasma disturbance or metal contamination, and thus can be applied to a practical use.

摘要翻译： 一种用于从等离子体处理装置的室中除去颗粒的颗粒去除装置，其中所述室连接到排气口，并且在所述室中产生处理气体的等离子体，以等离子体处理待处理的基板，包括颗粒 充电控制构件，用于通过形成在除被处理基板附近的区域中的离子鞘区域的正离子正向地对室内产生的颗粒进行充电，其中带正电的颗粒经由排气口从室排出。 因此，没有等离子体干扰或金属污染，因此可以应用于实际应用。

公开(公告)号：US08043971B2

公开(公告)日：2011-10-25

申请号：US12340256

申请日：2008-12-19

申请人： Yasuharu Sasaki ,  Tsuyoshi Moriya ,  Hiroshi Nagaike

发明人： Yasuharu Sasaki ,  Tsuyoshi Moriya ,  Hiroshi Nagaike

IPC分类号： H01L21/302

CPC分类号： H01J37/32642 ,  H01J37/32706 ,  H01L21/67069

摘要： [Problem to be Solved] In a plasma processing apparatus for executing a process using plasma, promoting the sharing of an apparatus in executing a plurality of different processes and plasma states amongst apparatuses in executing same processes in a plurality of apparatuses are provided.[Solution] A ring member formed of an insulating material is disposed to surround a to-be-treated substrate in a processing vessel and an electrode is installed in the ring member for adjusting a plasma sheath region. For example, a first DC voltage is applied to the electrode when a first process is performed on the to-be-treated substrate and a second DC voltage is applied to the electrode when a second process is performed on the to-be-treated substrate. In this case, the plasma state can be matched by applying an appropriate DC voltage according to each process or each apparatus executing the same process. Therefore, the sharing of an apparatus can be promoted and the plasma state can be readily adjusted.

摘要翻译： [待解决的问题]在用于执行使用等离子体的处理的等离子体处理装置中，提供了在执行多个装置中的相同处理的装置中执行多个不同处理和等离子体状态的共享的装置。 [解决方案]由绝缘材料形成的环形构件设置成围绕处理容器中的待处理衬底，并且电极安装在用于调整等离子体鞘区域的环构件中。 例如，当在待处理的基板上执行第一工艺时，将第一直流电压施加到电极，并且当对待处理的基板执行第二工艺时，向电极施加第二直流电压 。 在这种情况下，可以通过根据每个处理或执行相同处理的每个装置施加适当的DC电压来匹配等离子体状态。 因此，可以促进装置的共享，并且可以容易地调整等离子体状态。

公开(公告)号：US07969572B2

公开(公告)日：2011-06-28

申请号：US12015156

申请日：2008-01-16

申请人： Tsuyoshi Moriya ,  Takashi Enomoto

发明人： Tsuyoshi Moriya ,  Takashi Enomoto

IPC分类号： G01N21/00

CPC分类号： G01N21/534 ,  G01N15/0205 ,  G01N21/94 ,  G01N2015/03

摘要： A particle monitor system that can detect fine particles in a substrate processing apparatus. The substrate processing apparatus has a chamber in which a substrate is housed and subjected to processing, a dry pump that exhausts gas out of the chamber, and a bypass line that communicates the chamber and the dry pump together. The particle monitor system has a laser light oscillator that irradiates laser light toward a space in which the particles may be present, and a laser power measurement device that is disposed on an optical path of the laser light having passed through the space and measures the energy of the laser light.

摘要翻译： 一种能够检测基板处理装置中的微粒子的粒子监视器系统。 基板处理装置具有容纳基板并经受处理的室，将气体排出室的干燥泵和将室与干燥泵连通的旁通管。 粒子监视器系统具有将激光照射到可能存在粒子的空间的激光振荡器，以及设置在穿过该空间的激光的光路上并测量能量的激光功率测量装置 的激光。

公开(公告)号：US20110094680A1

公开(公告)日：2011-04-28

申请号：US12985099

申请日：2011-01-05

申请人： Tsuyoshi Moriya ,  Hiroyuki Nakayama

发明人： Tsuyoshi Moriya ,  Hiroyuki Nakayama

IPC分类号： H01L21/465 ,  G01N21/84

CPC分类号： H01J37/32935 ,  B08B9/08 ,  G01N15/0272 ,  G01N15/06 ,  G01N2015/0693 ,  Y10T428/30 ,  Y10T428/315 ,  Y10T428/8305

摘要： A particle monitoring apparatus includes a housing disposed on a gas exhaust line, a laser beam source for emitting a laser beam to particles in the gas exhaust line, a window member disposed at the housing for monitoring the particles in the gas exhaust line. The window member has a transparent base which is formed of a transparent resin or glass containing silicon and has a gas contact surface which faces a gas within the gas exhaust line, and a surface treatment layer formed on the gas contact surface of the transparent base, wherein the surface treatment layer contains one material selected from the group consisting of yttrium and calcium fluoride.

摘要翻译： 粒子监测装置包括：设置在排气管上的壳体，用于向气体排出管线中的颗粒发射激光束的激光束源;设置在壳体处的用于监测排气管线中的颗粒的窗口部件。 窗构件具有由透明树脂或含硅的玻璃形成的透明基底，并且具有与气体排出管线内的气体相对的气体接触面，以及形成在透明基底的气体接触面上的表面处理层， 其中所述表面处理层含有选自钇和氟化钙的一种材料。

公开(公告)号：US20100332364A1

公开(公告)日：2010-12-30

申请号：US12820692

申请日：2010-06-22

申请人： Tsuyoshi Moriya

发明人： Tsuyoshi Moriya

IPC分类号： G06Q50/00 ,  G06Q10/00 ,  G06Q30/00 ,  G06F17/30

CPC分类号： G06Q30/06 ,  G06Q30/0283 ,  G06Q30/04 ,  H01L22/12

摘要： Provided is a charging method capable of offering a user an incentive to use a particle generation factor determining system. In the particle generation factor determining system including a user interface device 11 through which a user inputs a particle map and a server 13, the server 13 calculates accuracy of each of multiple particle generation factors based on the particle map; the user interface device 11 displays the calculated accuracy or a title of generation-factor-relevant information 27 on each particle generation factor corresponding to this accuracy; the server 13 provides the generation-factor-relevant information 27 to the user interface device 11; a charged fee for providing particle generation-factor-relevant information 27 is determined based on accuracy of a particle generation factor corresponding to the provided generation-factor-relevant information 27.

摘要翻译： 提供了一种能够向用户提供使用粒子生成因子确定系统的激励的计费方法。 在包括用户通过其输入粒子映射的用户界面装置11和服务器13的粒子生成因子确定系统中，服务器13基于粒子图计算多个粒子生成因子中的每一个的精度; 用户界面装置11对与该精度对应的每个粒子生成因子显示计算出的生成因子相关信息27的精度或标题; 服务器13向用户接口设备11提供生成因子相关信息27; 基于与所提供的生成因子相关信息27相对应的粒子生成因子的精度，确定用于提供粒子生成因子相关信息27的收费。

公开(公告)号：US07852476B2

公开(公告)日：2010-12-14

申请号：US11969501

申请日：2008-01-04

申请人： Tsuyoshi Moriya

发明人： Tsuyoshi Moriya

IPC分类号： G01N21/00

CPC分类号： C23C16/4412 ,  G01N15/1404 ,  G01N21/53 ,  G01N2015/1415 ,  H01J37/32834

摘要： A particle monitor system capable of accurately detecting the number of or the size of particles flowing through an exhaust pipe. In a bypass line through which a chamber is communicated with a dry pump, there is disposed the particle monitor system that includes a laser oscillator for irradiating laser light, a photo multiplier tube having a focal point thereof located at a location where the center axis of the bypass line crosses the laser light, and a particle converging member formed by a circular disk-like member and formed with a through hole facing the focal point FP. A gap is defined between the bypass line and an outer periphery of the particle converging member.

摘要翻译： 一种能够准确地检测流过排气管的颗粒的数量或尺寸的粒子监测系统。 在室内与干泵连通的旁通管路中，设置有包括用于照射激光的激光振荡器的光电倍增管，其焦点位于中心轴的位置， 旁路管穿过激光，以及由圆盘状部件形成并形成有面向焦点FP的通孔的颗粒会聚部件。 在旁路管线和颗粒会聚部件的外周之间限定间隙。