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446 条记录 (耗时 0.041 秒)

    Polishing pad
    41.
    发明授权
    Polishing pad 有权
    抛光垫

    公开(公告)号：US07871309B2

    公开(公告)日：2011-01-18

    申请号：US11720964

    申请日：2005-12-08

    申请人： Kazuyuki Ogawa ,  Tetsuo Shimomura ,  Atsushi Kazuno ,  Yoshiyuki Nakai ,  Masahiro Watanabe ,  Takatoshi Yamada ,  Masahiko Nakamori

    发明人： Kazuyuki Ogawa ,  Tetsuo Shimomura ,  Atsushi Kazuno ,  Yoshiyuki Nakai ,  Masahiro Watanabe ,  Takatoshi Yamada ,  Masahiko Nakamori

    IPC分类号： B24B1/00 ,  B24D11/00

    CPC分类号： B24B37/205 ,  Y10T428/24339 ,  Y10T428/24992

    摘要： It is an object of the invention to provide a polishing pad capable of high precision optical detection of an endpoint during polishing in progress and prevention of slurry leakage from between a polishing region and a light-transmitting region during the use thereof even after the polishing pad has been used for a long period. It is a second object of the invention to provide a polishing pad capable of suppression of deterioration of polishing characteristics (such as in-plane uniformity) and generation of scratches due to a difference in behavior of a polishing region and a light-transmitting region during polishing. It is a third object of the invention to provide a polishing pad having a polishing region and a light-transmitting region with a concentration of a specific metal equal to or lower than a specific value (threshold value).

    摘要翻译： 本发明的目的是提供一种抛光垫，其能够在抛光过程中对端点进行高精度光学检测，并且即使在抛光垫之后也可防止在使用期间抛光区域和透光区域之间的浆料泄漏 已被使用了很长时间。 本发明的第二个目的是提供一种能够抑制抛光特性（例如面内均匀性）劣化的抛光垫以及由于抛光区域和透光区域的行为差异而产生的划痕 抛光。 本发明的第三个目的是提供一种具有抛光区域和特定金属浓度等于或低于特定值（阈值）的透光区域的抛光垫。

    Communication Systems
    42.
    发明申请
    Communication Systems 有权
    通讯系统

    公开(公告)号：US20100074164A1

    公开(公告)日：2010-03-25

    申请号：US12513805

    申请日：2007-07-31

    申请人： Michael John Beems Hart ,  Yuefeng Zhou ,  Dorin Viorel ,  Chenzi Zhu ,  Michiharu Nakamura ,  Masahiro Watanabe ,  Hiroshi Fujita ,  Makoto Yoshida

    发明人： Michael John Beems Hart ,  Yuefeng Zhou ,  Dorin Viorel ,  Chenzi Zhu ,  Michiharu Nakamura ,  Masahiro Watanabe ,  Hiroshi Fujita ,  Makoto Yoshida

    IPC分类号： H04B7/14

    CPC分类号： H04W52/46 ,  H04L1/0003 ,  H04L1/0009 ,  H04L1/0028 ,  H04L1/0029 ,  H04L2001/0097

    摘要： A method for transmission of information about downlink and uplink parameters of a intermediate apparatus link in a multi-hop wireless communication system, the system comprising a first node apparatus, a second node apparatus and one or more intermediate apparatuses, each said apparatus being operable to transmit and receive information along a series of links forming a communication path for downlink and uplink communication, the communication path extending between the first node and second node apparatuses via the or each intermediate apparatus, each link comprising either a first node link between the first node apparatus and a said intermediate apparatus or an intermediate apparatus link between a said intermediate apparatus and a said apparatus which is not the first node apparatus, and the system having access to a minimum allocation unit for allocating time and transmission frequency bandwidth, the method comprising: obtaining values of downlink and uplink parameters for a particular intermediate apparatus link; mapping both values onto a single minimum allocation unit and transmitting them towards the first node apparatus.

    摘要翻译： 一种用于在多跳无线通信系统中传输关于中间设备链路的下行链路和上行链路参数的信息的方法，所述系统包括第一节点设备，第二节点设备和一个或多个中间设备，每个所述设备可操作为 沿着形成用于下行链路和上行链路通信的通信路径的一系列链路发送和接收信息，所述通信路径经由或每个中间设备在第一节点和第二节点设备之间延伸，每个链路包括第一节点之间的第一节点链路 装置以及所述中间装置或中间装置之间的链路，所述中间装置或所述中间装置与不是所述第一节点装置的所述装置之间的链路，并且所述系统具有访问用于分配时间和传输频率带宽的最小分配单元，所述方法包括： 获得一个参数的下行链路和上行链路参数的值 中型设备连接; 将这两个值映射到单个最小分配单元上并将其发送到第一节点设备。

    SCANNING PROBE MICROSCOPE AND SAMPLE OBSERVING METHOD USING THE SAME
    43.
    发明申请
    SCANNING PROBE MICROSCOPE AND SAMPLE OBSERVING METHOD USING THE SAME 有权
    扫描探针显微镜和使用其的样品观察方法

    公开(公告)号：US20100064396A1

    公开(公告)日：2010-03-11

    申请号：US12523369

    申请日：2008-02-26

    申请人： Toshihiko Nakata ,  Masahiro Watanabe ,  Takashi Inoue ,  Kishio Hidaka ,  Motoyuki Hirooka

    发明人： Toshihiko Nakata ,  Masahiro Watanabe ,  Takashi Inoue ,  Kishio Hidaka ,  Motoyuki Hirooka

    IPC分类号： G01Q60/18 ,  G01Q60/24

    CPC分类号： G01Q60/18 ,  G01Q60/22

    摘要： In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.

    摘要翻译： 在使用孔径探针的近场扫描显微镜中，实际上孔径形成的上限为至多几十nm。 在使用散射探针的近场扫描显微镜中，由于外部照明光作为背景噪声，分辨能力被限制在至多几十nm。 此外，通过探针的损伤或磨损，测量再现性被严重降低。 可以以nm级分辨能力和高再现性测量样品表面的光学数据和不均匀性数据，同时通过制造具有nm级光学分辨率的等离子体增强近场探针而不损害探针和样品 通过将nm级圆柱形结构与nm级微粒组合，并在样品上的各个测量点处以低接触力将探针重复地移动到样品并从中离开它们的能力。

    Method and apparatus for inspecting defects of patterns formed on a hard disk medium
    44.
    发明申请
    Method and apparatus for inspecting defects of patterns formed on a hard disk medium 有权
    用于检查形成在硬盘介质上的图案的缺陷的方法和装置

    公开(公告)号：US20090161244A1

    公开(公告)日：2009-06-25

    申请号：US12314938

    申请日：2008-12-19

    申请人： Takenori Hirose ,  Masahiro Watanabe ,  Yasuhiro Yoshitake

    发明人： Takenori Hirose ,  Masahiro Watanabe ,  Yasuhiro Yoshitake

    IPC分类号： G11B27/36

    CPC分类号： G11B5/82 ,  B82Y10/00 ,  G01N21/55 ,  G01N21/95607 ,  G01N2021/95615 ,  G11B5/743 ,  G11B5/855 ,  G11B20/18 ,  G11B2220/2516

    摘要： If an inspection method for inspecting a patterned medium is intended for the nanoimprint process control, it is necessary to measure a correct shape of each pattern element. On the other hand, if the inspection method is intended for the quality control of products, it is necessary to inspect the products on a 100 percent basis. However, the conventional method which uses SEM or AFM could not satisfy these requirements.According to the present invention, 100-percent inspection of products becomes possible by a method including the steps of: irradiating a surface of a hard disk medium, on which a magnetic material pattern is formed, with a light beam including a plurality of wavelengths; detecting the intensity of a reflected light beam from the hard disk medium on a wavelength basis; calculating a spectral reflectance from the detected intensity of the reflected light beam; and detecting a shape of each pattern element formed on the hard disk medium on the basis of the calculated spectral reflectance.

    摘要翻译： 如果用于检查图案化介质的检查方法用于纳米压印过程控制，则需要测量每个图案元件的正确形状。 另一方面，如果检验方法是用于产品的质量控制，则必须以100％的价格检查产品。 然而，使用SEM或AFM的常规方法不能满足这些要求。 根据本发明，通过包括以下步骤的方法可以对产品进行100％的检查：用包括多个波长的光束照射形成有磁性材料图案的硬盘介质的表面; 以波长为基础检测来自硬盘介质的反射光束的强度; 根据所检测的反射光束的强度计算光谱反射率; 并根据计算出的光谱反射率检测形成在硬盘介质上的每个图形元素的形状。

    POLISHING PAD, METHOD OF PRODUCING THE SAME AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE BY USING THE SAME
    45.
    发明申请
    POLISHING PAD, METHOD OF PRODUCING THE SAME AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE BY USING THE SAME 审中-公开
    抛光垫，其制造方法和使用该方法制造半导体器件的方法

    公开(公告)号：US20090075568A1

    公开(公告)日：2009-03-19

    申请号：US11912092

    申请日：2006-02-24

    申请人： Tsuyoshi Kimura ,  Yoshiyuki Nakai ,  Masahiro Watanabe

    发明人： Tsuyoshi Kimura ,  Yoshiyuki Nakai ,  Masahiro Watanabe

    IPC分类号： B24D11/00 ,  B24B1/00 ,  B24D18/00 ,  B24B7/20

    CPC分类号： B24B37/26 ,  B24D3/32 ,  Y10T29/49995 ,  Y10T83/0304 ,  Y10T409/303808 ,  Y10T409/304536

    摘要： The present invention provides a polishing pad used for planarizing inter layer dielectrics and the like by CMP (chemical mechanical polishing) in the manufacturing process of a semiconductor device, a method of producing the polishing pad and a method of producing a semiconductor device by using the polishing pad. The present invention relates to a semiconductor wafer polishing pad having grooves in a polishing surface and formed from a foamed polyurethane, wherein a processed surface of the groove comprising a side surface and a bottom surface has a surface roughness Ra of not more than 10.

    摘要翻译： 本发明提供了一种用于在半导体器件的制造工艺中通过CMP（化学机械抛光）平坦化层间电介质等的抛光垫，制造抛光垫的方法以及通过使用该半导体器件制造半导体器件的方法 抛光垫 本发明涉及一种半导体晶片抛光垫，该抛光垫在抛光表面上由发泡聚氨酯形成，其中包括侧面和底面的槽的加工表面的表面粗糙度Ra不大于10。

    Method for Producing Electrocatalyst
    48.
    发明申请
    Method for Producing Electrocatalyst 有权
    生产电催化剂的方法

    公开(公告)号：US20080280753A1

    公开(公告)日：2008-11-13

    申请号：US11664506

    申请日：2005-10-06

    申请人： Masahiro Watanabe ,  Hiroyuki Uchida

    发明人： Masahiro Watanabe ,  Hiroyuki Uchida

    IPC分类号： H01M4/88

    CPC分类号： H01M4/921 ,  B01J21/18 ,  B01J23/8906 ,  B01J35/0013 ,  B01J37/0219 ,  B01J37/16 ,  B82Y30/00 ,  H01M4/925 ,  H01M4/926 ,  H01M2008/1095

    摘要： [Problem]To provide a method for producing an electrocatalyst having no compositional scatter, wherein nano-level alloy catalyst molecules with an ordered particle size are supported in a highly dispersed state.[Means of Solution]The method includes the steps of preparing a reverse micelle solution by mixing two or more catalyst precursors selected from among metal salts and/or metal complexes, a solvent having hydrophilic groups and a non-aqueous solvent, forming alloy particles in the reverse micelle by adding a non-aqueous solution having a reducing action to the reverse micelle and heating, and supporting the alloy particles on a carrier.

    摘要翻译： 本发明提供一种不具有组成分散性的电极催化剂的制造方法，其中具有有序粒径的纳米级合金催化剂分子以高分散状态负载。 [解决方案]该方法包括以下步骤：通过混合选自金属盐和/或金属络合物中的两种或更多种催化剂前体，具有亲水基团的溶剂和非水溶剂来制备反胶束溶液，形成合金颗粒 通过向反胶束中加入具有还原作用的非水溶液并加热，并将合金颗粒负载在载体上，从而反相胶束。

    Scanning Microscope With Shape Correction Means
    50.
    发明申请
    Scanning Microscope With Shape Correction Means 审中-公开
    扫描显微镜与形状修正手段

    公开(公告)号：US20080047334A1

    公开(公告)日：2008-02-28

    申请号：US11866661

    申请日：2007-10-03

    申请人： Shuichi Baba ,  Toshihiko Nakata ,  Masahiro Watanabe ,  Takeshi Arai

    发明人： Shuichi Baba ,  Toshihiko Nakata ,  Masahiro Watanabe ,  Takeshi Arai

    IPC分类号： G01B5/28

    CPC分类号： G01Q10/06 ,  G01Q10/065 ,  G01Q20/02 ,  G01Q20/04 ,  G01Q30/025 ,  G01Q30/06

    摘要： A scanning probe microscope for measuring a surface shape of a sample by scanning a probe by bringing said probe close to, or into contact with, a sample surface and measuring a physical interaction occurring between the probe and the sample, includes a measurement area specific which specifies a measurement area of the sample on the basis of the image of the sample surface, and a measurement shape corrector which corrects the measurement result of the sample surface on the basis of the condition of the probe.

    摘要翻译： 扫描探针显微镜，其用于通过使所述探针靠近或接触样品表面并测量所述探针和所述样品之间的物理相互作用来扫描探针来测量样品的表面形状，所述扫描探针显微镜包括测量区域特异性， 基于样品表面的图像指定样品的测量面积;以及测量形状校正器，其基于探针的条件校正样品表面的测量结果。