公开(公告)号：US08379218B2

公开(公告)日：2013-02-19

申请号：US12551308

申请日：2009-08-31

Applicant: Leslie L. Deck ,  Peter De Groot ,  Mark Davidson ,  Jan Liesener ,  Xavier Colonna De Lega

Inventor： Leslie L. Deck ,  Peter De Groot ,  Mark Davidson ,  Jan Liesener ,  Xavier Colonna De Lega

IPC: G01B9/02

CPC classification number: G01B9/0209 ,  G01B9/02007 ,  G01B9/0201 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02068 ,  G01B9/02077 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  Y10T29/49002

Abstract: Apparatus include a microscope including an objective and a stage for positioning a test object relative to the objective, the stage being moveable with respect to the objective, and a sensor system, that includes a sensor light source, an interferometric sensor configured to receive light from the sensor light source, to introduce an optical path difference (OPD) between a first portion and a second portion of the light, the OPD being related to a distance between the objective lens and the stage, and to combine the first and second portions of the light to provide output light, a detector configured to detect the output light from the interferometric sensor, a fiber waveguide configured to direct light between the sensor light source, the interferometric sensor and the detector, a tunable optical cavity in a path of the light from the sensor light source and the interferometric sensor, and an electronic controller in communication with the detector, the electronic controller being configured to determine information related to the OPD based on the detected output light.

Abstract translation: 装置包括显微镜，其包括物镜和用于相对于物镜定位测试对象的台，该台可相对于物镜移动;以及传感器系统，其包括传感器光源，干涉测量传感器，其被配置为从 所述传感器光源在所述光的第一部分和所述第二部分之间引入光程差（OPD），所述OPD与所述物镜与所述台之间的距离有关，并且将所述第一和第二部分 提供输出光的光，被配置为检测来自干涉测量传感器的输出光的检测器，配置成在传感器光源，干涉测量传感器和检测器之间引导光的光纤波导，在光的路径中的可调光学腔 来自传感器光源和干涉测量传感器以及与检测器通信的电子控制器，该电子控制器是共同的 根据检测到的输出光确定与OPD相关的信息。

公开(公告)号：US08126677B2

公开(公告)日：2012-02-28

申请号：US12332674

申请日：2008-12-11

Applicant: Peter De Groot ,  Xavier Colonna De Lega

Inventor： Peter De Groot ,  Xavier Colonna De Lega

IPC: G01B11/30 ,  G01B11/02

CPC classification number: G01B9/02084 ,  G01B9/02057 ,  G01B9/02088 ,  G01B9/0209 ,  G01B11/06 ,  G01B11/0675 ,  G01B11/2441 ,  G01N21/45 ,  G01N21/8422 ,  G01N21/9501 ,  G01N21/95607

Abstract: A method includes comparing a scanning interferometry signal obtained for a location of a test object to each of multiple model signals corresponding to different model parameters for modeling the test object, wherein for each model signal the comparing includes calculating a correlation function between the scanning interferometry signal and the model signal to identify a surface-height offset between the scanning interferometry signal and the model signal and, based on the identified surface-height offset, calculating a height-offset compensated merit value indicative of a similarity between the scanning interferometry signal and the model signal for a common surface height. The method further includes, based on the respective merit values for the different model signals, determining a test object parameter at the location of the test object.

Abstract translation: 一种方法包括将获得的用于测试对象的位置的扫描干涉测量信号与对应于不同模型参数的多个模型信号中的每一个进行比较，用于对测试对象进行建模，其中对于每个模型信号，所述比较包括计算扫描干涉测量信号 以及所述模型信号以识别所述扫描干涉测量信号和所述模型信号之间的表面高度偏移，并且基于所识别的表面高度偏移来计算指示所述扫描干涉测量信号和所述扫描干涉测量信号之间的相似性的高度偏移补偿的优值值 模型信号为共同的表面高度。 该方法还包括基于不同模型信号的相应优值，确定测试对象位置处的测试对象参数。

公开(公告)号：US08004688B2

公开(公告)日：2011-08-23

申请号：US12509098

申请日：2009-07-24

Applicant: Mark Davidson ,  Jan Liesener ,  Peter De Groot ,  Xavier Colonna De Lega ,  Leslie L. Deck

Inventor： Mark Davidson ,  Jan Liesener ,  Peter De Groot ,  Xavier Colonna De Lega ,  Leslie L. Deck

IPC: G01B11/02

CPC classification number: G01B9/0209 ,  G01B9/02007 ,  G01B9/0201 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02068 ,  G01B9/02077 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  Y10T29/49002

Abstract: In general, in one aspect, the invention features apparatus that includes a broadband scanning interferometry system including interferometer optics for combining test light from a test object with reference light from a reference object to form an interference pattern on a detector, wherein the test and reference light are derived from a common light source. The interferometry system further includes a scanning stage configured to scan an optical path difference (OPD) between the test and reference light from the common source to the detector and a detector system including the detector for recording the interference pattern for each of a series of OPD increments, wherein the frequency of each OPD increment defines a frame rate. The interferometer optics are configured to produce at least two monitor interferometry signals each indicative of changes in the OPD as the OPD is scanned, wherein the detector system is further configured to record the monitor interferometry signals. The apparatus also includes an electronic processor electronically coupled to the detection system and scanning stage and configured to determine information about the OPD increments with sensitivity to perturbations to the OPD increments at frequencies greater than the frame rate.

Abstract translation: 一般来说，一方面，本发明的特征在于，包括宽带扫描干涉测量系统的装置，其包括用于将来自测试对象的测试光与来自参考物体的参考光组合在一起的干涉仪光学元件，以在检测器上形成干涉图案，其中测试和参考 光源自普通光源。 所述干涉测量系统还包括扫描台，被配置为扫描来自所述公共源的所述测试参考光与所述检测器之间的光程差（OPD）;以及检测器系统，包括用于记录一系列OPD中的每一个的所述干涉图案的检测器 增量，其中每个OPD增量的频率定义帧速率。 干涉仪光学器件被配置为产生至少两个监视器干涉测量信号，每个监视器干涉测量信号指示当OPD被扫描时OPD的变化，其中检测器系统还被配置为记录监视器干涉测量信号。 该装置还包括电子处理器，其电耦合到检测系统和扫描级，并且被配置为以大于帧速率的频率灵敏地确定对OPD增量的扰动的OPD增量的信息。

公开(公告)号：US07952724B2

公开(公告)日：2011-05-31

申请号：US12579626

申请日：2009-10-15

Applicant: Xavier Colonna De Lega ,  Peter De Groot

Inventor： Xavier Colonna De Lega ,  Peter De Groot

IPC: G01B11/02

CPC classification number: G01B9/023 ,  G01B9/02004 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02044 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02074 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B11/0675 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  G01N21/21 ,  G01N21/211

Abstract: Disclosed is a system including: (i) an interferometer configured to direct test electromagnetic radiation to a test surface and reference electromagnetic radiation to a reference surface and subsequently combine the electromagnetic radiation to form an interference pattern, the electromagnetic radiation being derived from a common source; (ii) a multi-element detector; and (iii) one or more optics configured to image the interference pattern onto the detector so that different elements of the detector correspond to different illumination angles of the test surface by the test electromagnetic radiation. The apparatus is configured to operate in a first mode in which the combined light is directed to the detector so that the different regions of the detector correspond to the different illumination angles of the test surface by the test light, and a second mode in which the different regions of the detector correspond to the different regions of the test surface illuminated by the test light to enable a profiling mode of operation.

Abstract translation: 公开了一种系统，包括：（i）干涉仪，被配置为将测试电磁辐射引导到测试表面并将电磁辐射引用到参考表面，并且随后组合电磁辐射以形成干涉图案，所述电磁辐射是从公共源 ; （ii）多元素检测器; 和（iii）一个或多个光学元件，被配置为将干涉图案成像到检测器上，使得检测器的不同元件对应于测试电磁辐射的测试表面的不同照明角度。 该装置被配置为以第一模式操作，其中组合的光被引导到检测器，使得检测器的不同区域对应于被测试光的测试表面的不同照明角度，其中第二模式 检测器的不同区域对应于由测试光照射的测试表面的不同区域，以使得能够进行轮廓操作模式。

公开(公告)号：US20100134786A1

公开(公告)日：2010-06-03

申请号：US12579626

申请日：2009-10-15

Applicant: Xavier Colonna De Lega ,  Peter De Groot

Inventor： Xavier Colonna De Lega ,  Peter De Groot

IPC: G01B9/02 ,  G01N21/84 ,  G01N21/17

CPC classification number: G01B9/023 ,  G01B9/02004 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02044 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02074 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B11/0675 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  G01N21/21 ,  G01N21/211

Abstract: Disclosed is a system including: (i) an interferometer configured to direct test electromagnetic radiation to a test surface and reference electromagnetic radiation to a reference surface and subsequently combine the electromagnetic radiation to form an interference pattern, the electromagnetic radiation being derived from a common source; (ii) a multi-element detector; and (iii) one or more optics configured to image the interference pattern onto the detector so that different elements of the detector correspond to different illumination angles of the test surface by the test electromagnetic radiation. The apparatus is configured to operate in a first mode in which the combined light is directed to the detector so that the different regions of the detector correspond to the different illumination angles of the test surface by the test light, and a second mode in which the different regions of the detector correspond to the different regions of the test surface illuminated by the test light to enable a profiling mode of operation.

Abstract translation: 公开了一种系统，包括：（i）干涉仪，被配置为将测试电磁辐射引导到测试表面并将电磁辐射引用到参考表面，并且随后组合电磁辐射以形成干涉图案，所述电磁辐射是从公共源 ; （ii）多元素检测器; 和（iii）一个或多个光学元件，被配置为将干涉图案成像到检测器上，使得检测器的不同元件对应于测试电磁辐射的测试表面的不同照明角度。 该装置被配置为以第一模式操作，其中组合的光被引导到检测器，使得检测器的不同区域对应于被测试光的测试表面的不同照明角度，其中第二模式 检测器的不同区域对应于由测试光照射的测试表面的不同区域，以使得能够进行轮廓操作模式。

公开(公告)号：US20100128278A1

公开(公告)日：2010-05-27

申请号：US12551308

申请日：2009-08-31

Applicant: Leslie L. Deck ,  Peter De Groot ,  Mark Davidson ,  Jan Liesener ,  Xavier Colonna De Lega

Inventor： Leslie L. Deck ,  Peter De Groot ,  Mark Davidson ,  Jan Liesener ,  Xavier Colonna De Lega

IPC: G01B9/02

CPC classification number: G01B9/0209 ,  G01B9/02007 ,  G01B9/0201 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02068 ,  G01B9/02077 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  Y10T29/49002

Abstract: Apparatus include a microscope including an objective and a stage for positioning a test object relative to the objective, the stage being moveable with respect to the objective, and a sensor system, that includes a sensor light source, an interferometric sensor configured to receive light from the sensor light source, to introduce an optical path difference (OPD) between a first portion and a second portion of the light, the OPD being related to a distance between the objective lens and the stage, and to combine the first and second portions of the light to provide output light, a detector configured to detect the output light from the interferometric sensor, a fiber waveguide configured to direct light between the sensor light source, the interferometric sensor and the detector, a tunable optical cavity in a path of the light from the sensor light source and the interferometric sensor, and an electronic controller in communication with the detector, the electronic controller being configured to determine information related to the OPD based on the detected output light.

Abstract translation: 装置包括显微镜，其包括物镜和用于相对于物镜定位测试对象的台，该台可相对于物镜移动;以及传感器系统，其包括传感器光源，被配置为从 所述传感器光源在所述光的第一部分和所述第二部分之间引入光程差（OPD），所述OPD与所述物镜与所述台之间的距离有关，并且将所述第一和第二部分 提供输出光的光，被配置为检测来自干涉测量传感器的输出光的检测器，配置成在传感器光源，干涉测量传感器和检测器之间引导光的光纤波导，在光的路径中的可调光学腔 来自传感器光源和干涉测量传感器以及与检测器通信的电子控制器，该电子控制器是共同的 根据检测到的输出光确定与OPD相关的信息。

公开(公告)号：US20090021723A1

公开(公告)日：2009-01-22

申请号：US11780360

申请日：2007-07-19

Applicant: Xavier Colonna De Lega

Inventor： Xavier Colonna De Lega

IPC: G01N21/00

CPC classification number: G01B9/02027 ,  G01B9/02043 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/50 ,  G01B2290/70 ,  G01N21/211

Abstract: A method is disclosed which includes, for each of multiple areas of a test surface on a test object having different reflectivities, using an interferometry system to measure each area in a first mode of operation that measures information about the reflectivity of the area over a range of angles and wavelengths; using the same interferometry-system to measure the test surface in a second mode of operation that interferometrically profiles a topography of the test surface over a range including at least some of the multiple areas; and correcting the profile based on the information about the reflectivity of the multiple areas to reduce errors.

Abstract translation: 公开了一种方法，其包括对于具有不同反射率的测试对象上的测试表面的多个区域中的每个区域，使用干涉测量系统来测量第一操作模式中的每个区域，该第一操作模式测量关于区域的反射率的信息 的角度和波长; 使用相同的干涉测量系统在第二操作模式中测量所述测试表面，所述第二操作模式在包括所述多个区域中的至少一些区域的范围内对测试表面的形貌进行干涉测量; 并且基于关于多个区域的反射率的信息来校正简档以减少错误。

公开(公告)号：US07446882B2

公开(公告)日：2008-11-04

申请号：US11335873

申请日：2006-01-19

Applicant: Xavier Colonna De Lega ,  Peter De Groot

Inventor： Xavier Colonna De Lega ,  Peter De Groot

IPC: G01B11/02

CPC classification number: G01B9/023 ,  G01B9/02004 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02044 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02074 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B11/0675 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  G01N21/21 ,  G01N21/211

Abstract: Disclosed is a system including: (i) an interferometer configured to direct test electromagnetic radiation to a test surface and reference electromagnetic radiation to a reference surface and subsequently combine the electromagnetic radiation to form an interference pattern, the electromagnetic radiation being derived from a common source; (ii) a multi-element detector; and (iii) one or more optics configured to image the interference pattern onto the detector so that different elements of the detector correspond to different illumination angles of the test surface by the test electromagnetic radiation.

Abstract translation: 公开了一种系统，包括：（i）干涉仪，被配置为将测试电磁辐射引导到测试表面并将电磁辐射引用到参考表面，并且随后组合电磁辐射以形成干涉图案，所述电磁辐射是从公共源 ; （ii）多元素检测器; 和（iii）一个或多个光学元件，被配置为将干涉图案成像到检测器上，使得检测器的不同元件对应于测试电磁辐射的测试表面的不同照明角度。

公开(公告)号：US07304747B2

公开(公告)日：2007-12-04

申请号：US11604668

申请日：2006-11-27

Applicant: Xavier Colonna De Lega

Inventor： Xavier Colonna De Lega

IPC: G01B11/02 ,  G01B9/02

CPC classification number: G01B9/02084 ,  G01B9/02058 ,  G01B9/0209 ,  G01B11/2441 ,  G01M11/0228 ,  G01M11/0271 ,  G01N21/45

Abstract: Methods and related systems for determining properties of optical systems (e.g., interferometers) and/or optical elements (e.g., lenses and/or lens systems) are described. For example, information related to an optical thickness mismatch of an interferometer can be determined by providing scanning interferometry data. The data typically include obtaining one or more interference signals each corresponding to a different spatial location of a test object. A phase is determined for each of multiple frequencies of each interference signal. The information related to the optical thickness mismatch is determined based on the phase for each of the multiple frequencies of the interference signal(s).

公开(公告)号：US07142311B2

公开(公告)日：2006-11-28

申请号：US11131649

申请日：2005-05-17

Applicant: Xavier Colonna De Lega

Inventor： Xavier Colonna De Lega

IPC: G01B11/02

CPC classification number: G01B9/02084 ,  G01B9/02058 ,  G01B9/0209 ,  G01B11/2441 ,  G01M11/0228 ,  G01M11/0271 ,  G01N21/45

Abstract: Methods and related systems for determining properties of optical systems (e.g., interferometers) and/or optical elements (e.g., lenses and/or lens systems) are described. For example, information related to an optical thickness mismatch of an interferometer can be determined by providing scanning interferometry data. The data typically include obtaining one or more interference signals each corresponding to a different spatial location of a test object. A phase is determined for each of multiple frequencies of each interference signal. The information related to the optical thickness mismatch is determined based on the phase for each of the multiple frequencies of the interference signal(s).

Abstract translation: 描述了用于确定光学系统（例如，干涉仪）和/或光学元件（例如，透镜和/或透镜系统）的性质的方法和相关系统。 例如，可以通过提供扫描干涉测量数据来确定与干涉仪的光学厚度失配有关的信息。 数据通常包括获得每个对应于测试对象的不同空间位置的一个或多个干扰信号。 确定每个干扰信号的多个频率中的每一个的相位。 基于干涉信号的多个频率中的每一个的相位确定与光学厚度失配有关的信息。