公开(公告)号：US20100198707A1

公开(公告)日：2010-08-05

申请号：US12365950

申请日：2009-02-05

Applicant: Neerav Handa ,  Debashis Sadhukhan ,  Byung-Hyun Chung ,  Xin Wang ,  Min Zhu ,  Craig Hushaw

Inventor： Neerav Handa ,  Debashis Sadhukhan ,  Byung-Hyun Chung ,  Xin Wang ,  Min Zhu ,  Craig Hushaw

IPC: G06Q10/00 ,  G06F17/30

CPC classification number: G06F17/30575 ,  G06Q20/10 ,  G06Q40/00 ,  G06Q40/12

Abstract: Systems and methods for replicating data communicated over a network. According to one embodiment, among several embodiment, a data replication system includes a first interface table and a first application associated with a first computing system. The first application is configured to transfer data into the first interface table. The data replication system further includes a first replication module, which is also associated with the first computing system. The first replication module is configured to replicate data from the first interface table into a second interface table associated with a second computing system via a network. The data replication system also includes a second application and a second replication module associated with the second computing system. The second application is configured to transfer data into the second interface table. The second replication module is configured to replicate data from the second interface table into the first interface table via the network. Furthermore, the data replication system includes a web service module configured to check the contents of the second interface table before the first application performs a specific processing operation.

Abstract translation: 用于复制通过网络传送的数据的系统和方法。 根据一个实施例，在几个实施例中，数据复制系统包括与第一计算系统相关联的第一接口表和第一应用。 第一个应用程序配置为将数据传输到第一个接口表。 数据复制系统还包括第一复制模块，其也与第一计算系统相关联。 第一复制模块被配置为经由网络将数据从第一接口表复制到与第二计算系统相关联的第二接口表中。 数据复制系统还包括与第二计算系统相关联的第二应用和第二复制模块。 第二个应用程序配置为将数据传输到第二个接口表。 第二复制模块被配置为经由网络将数据从第二接口表复制到第一接口表中。 此外，数据复制系统包括被配置为在第一应用执行特定处理操作之前检查第二接口表的内容的Web服务模块。

公开(公告)号：US07720767B2

公开(公告)日：2010-05-18

申请号：US11256272

申请日：2005-10-24

Applicant: Thanh Ta ,  Mai Nguyen ,  Eddie J. Chen ,  Xin Wang ,  Thomas Demartini

Inventor： Thanh Ta ,  Mai Nguyen ,  Eddie J. Chen ,  Xin Wang ,  Thomas Demartini

IPC: G06F17/60 ,  H04K1/00 ,  H04L9/00

CPC classification number: G06F21/105 ,  G06Q30/06

Abstract: The invention relates to method for deriving a sub-right from a right, the right comprising a plurality of components, each of which specifies an aspect of the right. A component may be, for example, a principal, an action, a resource, and a condition. The invention also relates to a method for integrating a first right with a second right. Furthermore, the invention relates to a method of sharing rights by deriving a sub-right from a right, allowing use of the sub-right, and integrating the sub-right with the right. In addition, the invention relates to a system to support rights sharing by enabling the derivation of a sub-right from a right, the right comprising plural components each of which specifies an aspect of the right, the system comprising a receiving module for receiving a sub-right, the sub-right comprising plural components each of which specifies an aspect of the sub-right, and a confirmation module for confirming that the values of the components of the sub-right can be derived from the values of the corresponding components of the right. The invention further relates to a method for deriving a sub-right from a pool of rights granted by a grantor to a grantee for controlling use of resources within a computing environment, the computing environment having a mechanism for enforcing rights within the environment to control use of resources in accordance with the rights.

Abstract translation: 本发明涉及用于从右侧导出子权利的方法，该权利包括多个组件，每个组件指定权利的一个方面。 组件可以是例如主体，动作，资源和条件。 本发明还涉及一种用于将第一权利与第二权利进行整合的方法。 此外，本发明涉及通过从权利获得权利，允许使用副权利，并将子权利与权利相结合来分享权利的方法。 另外，本发明还涉及一种支持权利共享的系统，该系统能够从权利中导出子权利，该权利包括多个组件，每个组件指定权利的一个方面，该系统包括接收模块，用于接收 子权利，子权利包括多个组件，每个组件指定子权限的一个方面;以及确认模块，用于确认可以从相应组件的值中导出子权限的组件的值 的权利。 本发明还涉及一种用于从授予者授予的权利池授予子权利以控制计算环境内的资源使用的方法，所述计算环境具有用于在环境中执行权限以控制使用的机制 的资源按照权利。

公开(公告)号：US07714527B2

公开(公告)日：2010-05-11

申请号：US11886804

申请日：2005-08-15

Applicant: Xin Wang ,  Shenwei Wang ,  Jiangqun Cheng

Inventor： Xin Wang ,  Shenwei Wang ,  Jiangqun Cheng

IPC: E05F15/20

CPC classification number: B65F1/1426 ,  B65F1/1638

Abstract: The garbage container, having a simple structure, a reliable performance, and being easy to install and cost effective, includes a container body, an infrared induction device, a movable cover automatically opened through infrared induction device, an infrared induction device, an automatic cover-opening device connected with the control unit, an output shaft of the driving motor connected with a cable-collecting wheel via a first set of reduction gears. One end of the cable is fixed to the cable-collecting wheel while the other end of the cable is connected with the cover. An output shaft of the cable-collecting wheel is connected with a cam via a second set of reduction gears. The protruding part of the cam is rotated to contact a cover-opening stroke switch and a cover-closing stroke switch respectively. The cover-opening stroke switch and the cover-closing stroke switch are connected respectively with the control unit through a data line.

Abstract translation: 垃圾容器结构简单，性能可靠，安装方便，成本有效，包括容器主体，红外感应装置，通过红外感应装置自动打开的活动盖，红外感应装置，自动罩 与所述控制单元连接的开启装置，所述驱动电机的输出轴经由第一组减速齿轮与电缆收集轮连接。 电缆的一端固定到电缆收集轮，而电缆的另一端与盖连接。 电缆收集轮的输出轴经由第二组减速齿轮与凸轮连接。 凸轮的突出部分分别旋转以接触盖打开行程开关和盖闭合行程开关。 盖打开行程开关和盖盖行程开关分别通过数据线与控制单元连接。

公开(公告)号：US20100050272A1

公开(公告)日：2010-02-25

申请号：US12609725

申请日：2009-10-30

Applicant: Bijan Tadayon ,  Aram Nahidipour ,  Xin Wang ,  Michael C. Raley ,  Guillermo Lao ,  Thanh T. Ta

Inventor： Bijan Tadayon ,  Aram Nahidipour ,  Xin Wang ,  Michael C. Raley ,  Guillermo Lao ,  Thanh T. Ta

IPC: H04L29/06 ,  G06F17/00

CPC classification number: G06F21/10 ,  G06F21/62 ,  G06F2221/0746 ,  G06F2221/0768 ,  G06Q10/10

Abstract: A system and method for distribution of digital works in a tree-like structure of devices. A hierarchical right may include a first usage right governing a use for the digital work and a first delegation right governing distribution of the digital work to child nodes of the tree-like structure. A second usage right and/or a second delegation right may be generated based on the hierarchical right, the second usage right governing a use for the digital work and the second delegation right governing distribution of the digital work to child nodes of a first child node of the tree-like structure. The second usage right and/or the second delegation right may be assigned to a version of the digital work, and the second usage right and/or the second delegation right and the version of the digital work may be forwarded to the first child node.

Abstract translation: 数字作品在树状结构中分配的系统和方法。 分级权限可以包括管理数字作品的使用的第一使用权以及将数字作品分配给树状结构的子节点的第一授权权限。 第二使用权和/或第二授权权利可以基于分级权利，管理数字作品使用的第二使用权以及第二授权权利来控制数字作品对第一子节点的子节点的分配 的树状结构。 可以将第二使用权和/或第二授权权限分配给数字作品的版本，并且可以将第二使用权和/或第二授权权和数字作品的版本转发到第一子节点。

公开(公告)号：US20090227084A1

公开(公告)日：2009-09-10

申请号：US12357712

申请日：2009-01-22

Applicant: Zhiqiang Wu ,  Xin Wang

Inventor： Zhiqiang Wu ,  Xin Wang

IPC: H01L21/336

CPC classification number: H01L29/7833 ,  H01L21/26506 ,  H01L29/165 ,  H01L29/6656 ,  H01L29/6659 ,  H01L29/7845 ,  H01L29/7847 ,  H01L29/7848

Abstract: The invention provides a method of fabricating a semiconductor device that enhances the amount of stress that is transmitted to the channel region for carrier mobility enhancement. In one embodiment an amorphous region is formed at or near the gate dielectric interface prior to source/drain anneal. In a second embodiment the gate material is amorphous as deposited and processing temperatures are kept below the gate material crystallization temperature until stress enhancement processing has been completed. The amorphous gate material deforms during high temperature anneal and converts from an amorphous to a polycrystalline phase allowing more stress to be transmitted into the channel region. This enhances carrier mobility and improves transistor drive current.

Abstract translation: 本发明提供了一种制造半导体器件的方法，该半导体器件增强了传输到沟道区的载流子迁移率增强的应力量。 在一个实施例中，在源极/漏极退火之前，在栅极电介质界面处或附近形成非晶区域。 在第二实施例中，栅极材料是非晶态的，并且处理温度保持低于栅极材料结晶温度，直到应力增强处理完成。 非晶栅极材料在高温退火期间变形，并从非晶态转变为多晶相，允许更多的应力传输到沟道区。 这增强了载流子迁移率并改善了晶体管驱动电流。

公开(公告)号：US20090181506A1

公开(公告)日：2009-07-16

申请号：US12407624

申请日：2009-03-19

Applicant: Jihong Chen ,  Eddie Hearl Breashears ,  Xin Wang ,  John Howard Macpeak

Inventor： Jihong Chen ,  Eddie Hearl Breashears ,  Xin Wang ,  John Howard Macpeak

IPC: H01L21/8239 ,  H01L21/426

CPC classification number: H01L29/7881 ,  H01L21/26586 ,  H01L27/115 ,  H01L27/11521 ,  H01L29/40114

Abstract: An embedded memory device and method of forming MOS transistors having reduced masking requirements and defects using a single drain sided halo implant in the NMOS FLASH or EEPROM memory regions is discussed. The memory device comprises a memory region and a logic region. Logic transistors within the logic region have halos implanted at an angle underlying the channel from both drain and source region sides. Asymmetric memory cell transistors within the memory region receive a selective halo implant only from the drain side of the channel and not from the source side to form a larger halo on the drain side and leave a higher dopant concentration more deeply into the source side. One method of asymmetrically forming memory cell transistors comprises masking over the memory region; halo implanting a first conductivity dopant in NMOS regions of the logic region in first and second implant directions; masking over the logic region; halo implanting the first conductivity dopant in NMOS regions of the memory region in the second implant direction only, thereby reducing the number of masks required; masking over the memory region; halo implanting a second conductivity dopant in PMOS regions of the logic region in the first and second implant directions.

Abstract translation: 讨论了在NMOS闪存或EEPROM存储器区域中使用单个漏极侧卤素注入形成具有减小的掩模要求和缺陷的MOS晶体管的嵌入式存储器件和方法。 存储器件包括存储器区域和逻辑区域。 逻辑区域内的逻辑晶体管具有从沟道和源极区两侧的通道下方的角度注入的光晕。 存储器区域内的不对称存储单元晶体管仅从沟道的漏极侧接收选择性晕圈注入而不从源极接收，以在漏极侧形成较大的卤素，并且在源极侧更高的掺杂浓度。 一种不对称形成存储单元晶体管的方法包括：对存储区进行掩蔽; 在第一和第二植入方向上在所述逻辑区域的NMOS区域中注入第一电导率掺杂剂; 屏蔽逻辑区域; 在第二注入方向仅在存储区域的NMOS区域中注入第一电导率掺杂剂，从而减少所需的掩模数量; 掩蔽内存区域; 在所述第一和第二植入方向上在所述逻辑区域的PMOS区域中注入第二电导率掺杂剂。

公开(公告)号：US07521274B2

公开(公告)日：2009-04-21

申请号：US11684264

申请日：2007-03-09

Applicant: Stephen D. Hersee ,  Xin Wang ,  Xinyu Sun

Inventor： Stephen D. Hersee ,  Xin Wang ,  Xinyu Sun

IPC: H01L21/00

CPC classification number: H01L29/413 ,  B82Y10/00 ,  B82Y20/00 ,  B82Y30/00 ,  C30B29/60 ,  H01L21/0237 ,  H01L21/02458 ,  H01L21/0254 ,  H01L21/02573 ,  H01L21/02603 ,  H01L21/02609 ,  H01L21/02612 ,  H01L21/0262 ,  H01L21/02636 ,  H01L21/02639 ,  H01L21/02642 ,  H01L29/045 ,  H01L29/0676 ,  H01L29/2003 ,  H01L29/775 ,  H01L31/0304 ,  H01L31/035236 ,  H01L31/184 ,  H01L33/18 ,  H01L33/24 ,  H01L2221/1094 ,  H01L2924/0002 ,  H01S5/1042 ,  H01S5/1835 ,  H01S5/18369 ,  H01S5/3428 ,  Y02E10/544 ,  Y02P70/521 ,  Y10S977/762 ,  Y10S977/816 ,  Y10T428/24612 ,  H01L2924/00

Abstract: Exemplary embodiments provide semiconductor devices including high-quality (i.e., defect free) group III-N nanowires and uniform group III-N nanowire arrays as well as their scalable processes for manufacturing, where the position, orientation, cross-sectional features, length and the crystallinity of each nanowire can be precisely controlled. A pulsed growth mode can be used to fabricate the disclosed group III-N nanowires and/or nanowire arrays providing a uniform length of about 10 nm to about 1000 microns with constant cross-sectional features including an exemplary diameter of about 10-1000 nm. In addition, high-quality GaN substrate structures can be formed by coalescing the plurality of GaN nanowires and/or nanowire arrays to facilitate the fabrication of visible LEDs and lasers. Furthermore, core-shell nanowire/MQW active structures can be formed by a core-shell growth on the nonpolar sidewalls of each nanowire.

Abstract translation: 示例性实施例提供包括高质量（即，无缺陷）III-N族纳米线和均匀III-N纳米线阵列的半导体器件及其可制造的可扩展工艺，其中位置，取向，横截面特征，长度和 可以精确地控制每个纳米线的结晶度。 可以使用脉冲生长模式来制造公开的提供约10nm至约1000微米的均匀长度的III-N族纳米线和/或纳米线阵列，其具有恒定的横截面特征，包括约10-1000nm的示例性直径。 此外，可以通过聚结多个GaN纳米线和/或纳米线阵列来形成高质量的GaN衬底结构，以便制造可见的LED和激光器。 此外，核 - 壳纳米线/ MQW活性结构可以通过在每个纳米线的非极性侧壁上的核 - 壳生长形成。

公开(公告)号：US20090085105A1

公开(公告)日：2009-04-02

申请号：US11866365

申请日：2007-10-02

Applicant: Shih Tzung Su ,  Jun Zeng ,  Poi Sun ,  Kao Way Tu ,  Tai Chiang Chen ,  Long Lv ,  Xin Wang

Inventor： Shih Tzung Su ,  Jun Zeng ,  Poi Sun ,  Kao Way Tu ,  Tai Chiang Chen ,  Long Lv ,  Xin Wang

IPC: H01L29/78 ,  H01L21/336

CPC classification number: H01L29/7813 ,  H01L29/0661 ,  H01L29/407 ,  H01L29/41766 ,  H01L29/4236 ,  H01L29/42372 ,  H01L29/4238 ,  H01L29/456 ,  H01L29/4925 ,  H01L29/66719 ,  H01L29/66727 ,  H01L29/66734 ,  H01L29/7811

Abstract: A method for manufacturing a trench MOSFET semiconductor device comprises: providing a heavily doped N+ silicon substrate; forming an N type epitaxial layer; forming a thick SiO2 layer; creating P body and source area formations by ion implantation without any masks; utilizing a first mask to define openings for a trench gate and a termination; thermally growing a gate oxide layer followed by formation of a thick poly-Silicon refill layer without a mask to define a gate bus area; forming sidewall spacers; forming P+ areas; removing the sidewall spacers; depositing tungsten to fill contacts and vias; depositing a first thin barrier metal layer; depositing a first thick metal layer; utilizing a second metal mask to open a gate bus area; forming second sidewall spacers; depositing a second thin barrier metal layer; depositing a second thick metal layer; and planarizing at least the second thick metal layer and the second thin metal layer to isolate the source metal portions from gate metal portions, whereby the trench MOSFET semiconductor device is manufactured utilizing only first and second masks.

Abstract translation: 一种用于制造沟槽MOSFET半导体器件的方法包括：提供重掺杂的N +硅衬底; 形成N型外延层; 形成厚的SiO 2层; 通过离子注入创建P体和源区形成，而不需要任何掩模; 利用第一掩模来限定沟槽栅极和终端的开口; 热生长栅极氧化层，随后形成厚度不含掩模的多晶硅替代层，以限定栅极总线面积; 形成侧壁间隔物; 形成P +区域; 去除侧壁间隔物; 沉积钨以填充触点和通孔; 沉积第一薄的阻挡金属层; 沉积第一厚金属层; 利用第二金属掩模打开闸总线区域; 形成第二侧壁间隔物; 沉积第二薄的阻挡金属层; 沉积第二厚金属层; 并且至少平面化第二厚金属层和第二薄金属层以将源极金属部分与栅极金属部分隔离，由此仅利用第一和第二掩模制造沟槽MOSFET半导体器件。

公开(公告)号：USD579618S1

公开(公告)日：2008-10-28

申请号：US29293445

申请日：2007-11-23

Applicant: Xin Wang ,  Jiangqun Chen

Designer： Xin Wang ,  Jiangqun Chen

公开(公告)号：US07444605B2

公开(公告)日：2008-10-28

申请号：US11245550

申请日：2005-10-06

Applicant: Xin Wang ,  Harold J. Levy ,  Michael N. Misheloff

Inventor： Xin Wang ,  Harold J. Levy ,  Michael N. Misheloff

IPC: G06F17/50

CPC classification number: G06F17/5045

Abstract: An enhanced library accessible by an EDA tool can include a base curve database and a plurality of curve data sets. Each curve data set refers to a standard cell having certain timing characteristics. To determine those timing characteristics, each curve data set identifies at least one base curve (in the base curve database) as well as a starting current, a peak current, a peak voltage, and a peak time. In one embodiment, each base curve can be normalized. The base curve(s), the starting current, peak current, peak voltage, and peak time can accurately model the functioning of the IC device, e.g. represented by an I(V) curve.

Abstract translation: 由EDA工具可访问的增强库可以包括基线曲线数据库和多个曲线数据集。 每个曲线数据集是指具有某些定时特性的标准单元。 为了确定这些时序特性，每个曲线数据集识别至少一个基本曲线（在基线曲线数据库中）以及启动电流，峰值电流，峰值电压和峰值时间。 在一个实施例中，每个基本曲线可以被归一化。 基本曲线，起始电流，峰值电流，峰值电压和峰值时间可以精确地模拟IC器件的功能，例如， 由I（V）曲线表示。