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公开(公告)号:US6056849A
公开(公告)日:2000-05-02
申请号:US3091
申请日:1998-01-06
申请人: Siegfried Straemke
发明人: Siegfried Straemke
IPC分类号: C23C8/36 , C23C14/02 , C23C14/56 , C23C14/58 , C23C16/02 , C23C16/56 , H01L21/00 , C23F1/02 , C23C16/00
CPC分类号: C23C14/5886 , C23C14/02 , C23C14/566 , C23C16/0254 , C23C16/56 , C23C8/36 , H01L21/67017
摘要: In an apparatus for the processing of workpieces and the surface treatment thereof by means of a plasma, a processing chamber (11) to process workpieces and a treatment chamber (10) for the surface treatment of the workpieces by means of a plasma are united in one device. The two chambers (10, 11) are sealed against the environment in a gastight manner and separated from each other by means of a gastight door (12). Thus, workpieces (15) can be machined in the processing chamber (11) by means of a tool (20) while the door (12) is closed. After processing, the conditions in the two chambers (10, 11) are adapted, for example by introducing the same gas into the processing chamber (11) as into the treatment chamber (10). After the pressure in the two chambers (10, 11) has been equalized, the door (12) is opened by displacement, and the workpieces (15) are transferred into the treatment chamber (10).
摘要翻译: 在用于加工工件和通过等离子体的表面处理的设备中,将用于处理工件的处理室(11)和用于通过等离子体对工件进行表面处理的处理室(10)结合在一起 一个设备 两个室(10,11)以气密的方式与环境密封并且通过气密门(12)彼此分离。 因此,当门(12)关闭时,工件(15)可以通过工具(20)在处理室(11)中加工。 在处理之后,两个室(10,11)中的条件适于例如通过将相同的气体引入处理室(10)中而进入处理室(10)。 在两个室(10,11)中的压力已经相等后,门(12)通过位移打开,工件(15)被转移到处理室(10)中。
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公开(公告)号:US5962071A
公开(公告)日:1999-10-05
申请号:US131699
申请日:1998-08-10
申请人: Ingrid Reineck , Maria Nordin
发明人: Ingrid Reineck , Maria Nordin
CPC分类号: C23C16/02 , C23C16/0254 , C23C16/27 , Y10S427/106
摘要: There is now provided a body coated with at least one diamond layer on a substrate of cemented carbide or cermets. The substrate is before the diamond coating process provided with spotwise occurring particles containing an element either being any of W, Ta, Ti, Mo Cr, V, Nb, Mg, Ca, Na, K or, preferably, any of B, Si, S, Al or P. These particles are dispersed at a density giving an average distance between two particles of 20 .mu.m or less, preferably 5 .mu.m or less.
摘要翻译: 现在提供了在硬质合金或金属陶瓷的基底上涂覆有至少一个金刚石层的主体。 该衬底在金刚石涂覆工艺之前提供有含有W,Ta,Ti,Mo Cr,V,Nb,Mg,Ca,Na,K中任一种的元素的点样存在的颗粒,或者优选B,Si, S,Al或P.这些颗粒以两个颗粒之间的平均距离为20μm或更小,优选5μm或更小的密度分散。
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公开(公告)号:US5824198A
公开(公告)日:1998-10-20
申请号:US265290
申请日:1994-06-24
申请人: Joel L. Williams , Susan L. Burkett , Shel McGuire
发明人: Joel L. Williams , Susan L. Burkett , Shel McGuire
IPC分类号: A61L31/08 , C23C14/02 , C23C14/46 , C23C16/02 , C23C16/40 , C23C16/44 , C23C16/50 , C23C14/00
CPC分类号: A61L31/088 , A61L31/084 , C23C14/022 , C23C14/46 , C23C16/0254 , C23C16/0272 , C23C16/401 , C23C16/4401 , C23C16/50
摘要: A method for sequentially depositing a barrier composition film as a barrier on a substrate. The film is useful for providing an effective barrier against gas permeability in containers and for extending shelf-life of containers, especially plastic evacuated blood collection devices.
摘要翻译: 用于在基板上依次沉积阻挡组合物膜作为阻挡层的方法。 该膜可用于提供容器中气体渗透性的有效屏障,并延长容器,特别是塑料抽空采血装置的保存期限。
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公开(公告)号:US5686195A
公开(公告)日:1997-11-11
申请号:US378030
申请日:1995-01-24
CPC分类号: C23C16/0254 , C23C16/306 , C23C16/4581
摘要: The surface of a zinc selenide substrate is ground to curve in the opposite direction from that which occurs due to the bimetallic effect when zinc sulfide is deposited on a flat substrate by the chemical vapor deposition process. The bowing of the interface that occurs upon cooling of the hot laminate when the surface of the substrate is flat before deposition is compensated for by the pre-figured bowing. A distortion free window for the transmission of infra-red radiation is provided by this invention.
摘要翻译: 当硫化锌通过化学气相沉积工艺沉积在平坦的衬底上时,由于双金属效应,将硒化锌衬底的表面研磨成与发生相反的方向的曲线。 当在沉积之前衬底的表面平坦时,在热层压体冷却时发生的界面弯曲由预先弯曲的弯曲补偿。 本发明提供了用于传输红外辐射的无失真窗口。
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公开(公告)号:US5663001A
公开(公告)日:1997-09-02
申请号:US623893
申请日:1996-03-25
申请人: Marcus Textor , Roman Fuchs , Volkmar Gillich , Erich Simon
发明人: Marcus Textor , Roman Fuchs , Volkmar Gillich , Erich Simon
IPC分类号: B21B3/00 , C22C21/12 , C22F1/04 , C23C14/00 , C23C14/02 , C23C14/06 , C23C16/00 , C23C16/02 , G02B1/10 , B32B15/04 , G02B5/08
CPC分类号: C23C16/0254 , C22F1/04 , C23C14/021 , C23C14/028 , G02B1/105 , G02B5/0808 , G02B5/0858 , Y10T428/24975 , Y10T428/265 , Y10T428/31678
摘要: Articles of aluminum containing at least one unanodized surface or parts of at least one unanodized surface which are suitable for the deposition of layers or layer systems from the gas phase on said unanodized surfaces, the unanodized surfaces being of a refined aluminum with a degree of purity of equal to, or greater than, 98.3% by weight or aluminum alloys of said aluminum with at least one of the elements from the series comprising Si, Mg, Mn, Cu, Zn or Fe, and the surfaces have a peak-to-valley height Ra of equal to, or less than, 1 .mu.m, and the layer or the layer system is a reflective layer, in particular for radiations in the optical range.
摘要翻译: 含有至少一个未阳光化表面或至少一个未阳光化表面的部分的铝的制品,其适于从所述未阳光化表面上的气相沉积层或层系统,未阳极化表面是具有纯度的精制铝 等于或大于98.3重量%或所述铝与包含Si,Mg,Mn,Cu,Zn或Fe的系列中的至少一种元素的铝合金,并且所述表面具有峰 - 谷高度Ra等于或小于1μm,层或层系是反射层,特别是用于在光学范围内的辐射。
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公开(公告)号:US5660881A
公开(公告)日:1997-08-26
申请号:US470468
申请日:1995-06-06
申请人: Toshihiko Okamura
发明人: Toshihiko Okamura
IPC分类号: B23B27/14 , B23P15/28 , C22C1/05 , C23C16/02 , C23C16/26 , C23C16/27 , C30B25/02 , C30B29/04 , G06F11/34 , H04M3/22 , H04Q3/00 , B22F3/14 , B23P5/00
CPC分类号: C23C16/27 , C23C16/0227 , C23C16/0254 , H04M3/2254 , H04Q3/0025 , Y10T407/27 , Y10T428/24975 , Y10T428/30 , Y10T428/31678
摘要: This invention presents diamond coated tool member of high toughness exhibiting excellent diamond adhesion to the substrate. The green compacts of the usual Co and WC composition are subjected to primary sintering in a vacuum or in an inert gas atmosphere, followed by secondary sintering in a vacuum or in an inert gas atmosphere at a pressure in the range of 10-200 atmospheres at a temperature between the liquid formation temperature of Co and 1,500.degree. C. The as-sintered surfaces are subjected to chemical etching, followed by fine polishing in an ultrasonic bath held at room temperature or a temperature just below the boiling point. The cutting tool substrate having the polished surface is placed in a CVD reactor to deposit a diamond coating. The concentration profile of Co in the diamond coated tool member hus formed has a Co-deficient layer and a Co-gradient layer. The Co-deficient layer assures good adhesion of diamond coating to the cutting tool substrate and the regular Co concentration in the interior of the cutting tool substrate assures high toughness.
摘要翻译: 本发明提供了具有高韧性的金刚石涂层的工具构件,其显示出对基材的极好的金刚石粘合性。 将通常的Co和WC组合物的生坯在真空或惰性气体气氛中进行初次烧结,然后在真空中或在惰性气体气氛中在10-200大气压的范围内进行二次烧结 在Co的液体形成温度和1500℃之间的温度。对烧结表面进行化学蚀刻,然后在保持在室温或刚好低于沸点的温度的超声波浴中进行精细抛光。 将具有抛光表面的切削工具基板放置在CVD反应器中以沉积金刚石涂层。 形成金刚石涂层的工具构件中的Co的浓度分布具有Co缺陷层和Co-梯度层。 Co缺陷层确保金刚石涂层与切削工具基材的良好粘合性,并且切削工具基材内部的规则Co浓度确保高韧性。
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公开(公告)号:US5567522A
公开(公告)日:1996-10-22
申请号:US318188
申请日:1994-10-05
CPC分类号: C23C16/01 , B23B27/20 , C23C16/0254 , C23C16/27 , Y10T428/24355 , Y10T428/24413 , Y10T428/30 , Y10T428/31678
摘要: A diamond cutting tool has a rake face (5) of a cutting edge member (2) consisting essentially of a (111) plane of diamond. The cutting edge member (2) of diamond is vapor-deposited by CVD or the like on an independently prepared base material. In this vapor deposition, the diamond is deposited while controlling and periodically varying the carbon to hydrogen ratio of the supplied raw material gas, in such a manner that a (111) crystal plane is oriented with a prescribed fluctuation or non-uniformity, but is substantially parallel to the base material surface. The as-formed diamond material is separated from the base material and cut into a desired shape, and then bonded as a cutting edge member (2) to a tool base (1) through a metallization layer (4) and a brazing layer (3), in such an orientation that the (111) plane defines the rake face (5). The tool having such a rake face (5) consisting essentially of the (111) plane, with a prescribed fluctuation of its orientation, is excellent in wear resistance and is resistant to cleavage damage.
摘要翻译: 金刚石切割工具具有基本上由(111)钻石平面组成的切削刃部件(2)的前刀面(5)。 通过CVD等将金刚石的切削刃部件(2)以独立制备的基材气相沉积。 在这种气相沉积中,以(111)晶面以规定的波动或非均匀性取向的方式,控制和周期性地改变供给的原料气体的碳/氢比,沉积金刚石,但是 基本平行于基材表面。 将形成的金刚石材料与基材分离并切割成所需的形状,然后通过金属化层(4)和钎焊层(3)作为切割边缘部件(2)粘合到工具基体(1) ),以(111)面限定前刀面(5)的方向。 具有基本上由(111)面形成的具有规定的取向波动的这样的前刀面(5)的刀具具有优异的耐磨性并且耐裂纹损伤。
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公开(公告)号:US5435889A
公开(公告)日:1995-07-25
申请号:US277141
申请日:1988-11-29
申请人: Herbert Dietrich
发明人: Herbert Dietrich
CPC分类号: C04B41/009 , C04B41/5025 , C04B41/5096 , C04B41/85 , C04B41/87 , C23C16/0254 , Y02T50/67 , Y10T428/24537 , Y10T428/2462
摘要: A process is disclosed for coating a ceramic composite in which the composite has a pattern of grooves cut into the surface followed by coating to increase adhesion and inhibit cracking of the coating.
摘要翻译: 公开了一种用于涂覆陶瓷复合材料的方法,其中复合材料具有切割成表面的凹槽图案,然后进行涂布以增加粘合力并抑制涂层的开裂。
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公开(公告)号:US5403657A
公开(公告)日:1995-04-04
申请号:US44451
申请日:1993-04-09
申请人: Marcus Textor , Roman Fuchs , Volkmar Gillich , Erich Simon
发明人: Marcus Textor , Roman Fuchs , Volkmar Gillich , Erich Simon
IPC分类号: B21B3/00 , C22C21/12 , C22F1/04 , C23C14/00 , C23C14/02 , C23C14/06 , C23C16/00 , C23C16/02 , G02B1/10 , G02B5/08
CPC分类号: C23C16/0254 , C22F1/04 , C23C14/021 , C23C14/028 , G02B1/105 , G02B5/0808 , G02B5/0858 , Y10T428/24975 , Y10T428/265 , Y10T428/31678
摘要: Articles of aluminum containing at least one unanodized surface or parts of at least one unanodized surface which are suitable for the deposition of layers or layer systems from the gas phase on said unanodized surfaces, the unanodized surfaces being of a refined aluminum with a degree of purity of equal to, or greater than, 98.3% by weight or aluminum alloys of said aluminum with at least one of the elements from the series comprising Si, Mg, Mn, Cu, Zn or Fe, and the surfaces have a peak-to-valley height Ra of equal to, or less than, 1 .mu.m, and the layer or the layer system is a reflective layer, in particular for radiations in the optical range.
摘要翻译: 含有至少一个未阳光化表面或至少一个未阳光化表面的部分的铝的制品,其适于从所述未阳光化表面上的气相沉积层或层系统,未阳极化表面是具有纯度的精制铝 等于或大于98.3重量%或所述铝与包含Si,Mg,Mn,Cu,Zn或Fe的系列中的至少一种元素的铝合金,并且所述表面具有峰 - 谷高度Ra等于或小于1μm,层或层系是反射层,特别是用于在光学范围内的辐射。
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公开(公告)号:US5364666A
公开(公告)日:1994-11-15
申请号:US125704
申请日:1993-09-23
申请人: Joel L. Williams , Susan L. Burkett , Shel McGuire
发明人: Joel L. Williams , Susan L. Burkett , Shel McGuire
IPC分类号: A61L31/08 , C23C14/02 , C23C14/46 , C23C16/02 , C23C16/40 , C23C16/44 , C23C16/50 , B05D3/06
CPC分类号: A61L31/088 , A61L31/084 , C23C14/022 , C23C14/46 , C23C16/0254 , C23C16/0272 , C23C16/401 , C23C16/4401 , C23C16/50
摘要: A method for sequentially depositing a silicon oxide based film as a barrier on a substrate. The film is useful for providing an effective barrier against gas permeability in containers and for extending shelf-life of containers, especially plastic evacuated blood collection devices.
摘要翻译: 一种用于在基板上依次沉积氧化硅基膜作为阻挡层的方法。 该膜可用于提供容器中气体渗透性的有效屏障,并延长容器,特别是塑料抽空采血装置的保存期限。
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