公开(公告)号：US20010020444A1

公开(公告)日：2001-09-13

申请号：US09769583

申请日：2001-01-25

Applicant: Meggitt (UK) Limited

Inventor： Anthony Johnston

IPC: B05C011/00 ,  B05C013/00

CPC classification number: B01J8/0438 ,  B01J8/0221 ,  B01J8/0235 ,  B01J8/0285 ,  B01J8/0292 ,  B01J8/0496 ,  B01J19/0013 ,  B01J2208/0015 ,  B01J2208/00212 ,  B01J2208/00221 ,  B01J2219/00085 ,  B01J2219/182 ,  B01J2219/1943 ,  C01C1/0417 ,  F28D9/0037 ,  F28F3/048 ,  F28F2260/00 ,  Y02P20/52

Abstract: A reactor of the staged adiabatic reactor type, comprises at least one heat exchanger panel, preferably a printed circuit heat exchange (PCHE) panel, interposes between adiabatic beds of catalyst, wherein the facial area of the panels and the superficial facial area of the corresponding catalyst are substantially similar, and the panels include means defining discrete passages for handling of reactants and heat transfer media, wherein the means defining passages for heat transfer media provide for at least two differing flow path directions for the heat transfer media through the heat exchanger panel whereby the occurrence of temperature bias or differentials is reduced.

Abstract translation: 分级绝热反应器型的反应器包括至少一个热交换器面板，优选印刷电路热交换（PCHE）面板，介于催化剂的绝热床之间，其中面板的面部区域和相应的表面面积区域 催化剂基本上类似，并且面板包括限定用于处理反应物和传热介质的离散通道的装置，其中限定用于传热介质的通道的装置为传热介质提供至少两个不同的流动路径方向，所述传热介质通过热交换器面板 从而降低了温度偏差或微分的发生。

公开(公告)号：US20010007704A1

公开(公告)日：2001-07-12

申请号：US09756799

申请日：2001-01-10

Inventor： Yumiko Anzai ,  Motoyasu Terao ,  Tetsuya Nishida ,  Mokoto Miyamoto

IPC: B05C005/00 ,  B32B003/02 ,  B05C013/00 ,  B05C009/08 ,  B05B007/14

CPC classification number: B32B27/36 ,  B29C59/16 ,  B29C2035/0827 ,  B29K2069/00 ,  B29L2017/003 ,  B29L2017/005 ,  B32B27/28 ,  G11B7/2433 ,  G11B7/252 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/258 ,  G11B7/2585 ,  G11B7/26 ,  G11B2007/2571 ,  G11B2007/25713 ,  Y10T428/21

Abstract: An optical disk for recording/reproducing information have the problem of the fine irregularities on its substrate surface that causes increase of noise, under the process of forming the recording layer capable of changing physically or chemically by irradiation of laser light. The problem could deteriorate the record and reproduction characteristics and bring about a defect on a life test or on its storage ability. To solve the problem, the present invention provides the method of manufacturing an optical disk having the pits-and-lands pattern whose organic material is modified by the ultraviolet light irradiation. The transmission of the substrate is not more than 50% at one wavelength in a wavelength region from 300 to 375 nm. And, thereby the surface of an optical disk substrate is smoothed to effect the reduction of the substrate noise and the improvement of record and reproduction characteristics. Moreover, adhesiveness between the substrate and other layer formed thereon is bettered and hence the number of generated defects is reduced.

Abstract translation: 用于记录/再现信息的光盘在形成能够通过激光的照射物理或化学变化的记录层的过程中存在其基板表面上的细小不规则性导致噪声增加的问题。 这个问题可能会使记录和再现特性恶化，并在生命测试或其存储能力上产生缺陷。 为了解决这个问题，本发明提供一种具有通过紫外光照射改变有机材料的凹凸图案的光盘的制造方法。 在300〜375nm的波长范围内的一个波长的基板的透射率不超过50％。 并且，由此光盘基板的表面被平滑化以实现基板噪声的降低和记录和再现特性的提高。 此外，衬底和其上形成的其它层之间的粘附性更好，因此产生的缺陷的数量减少。

公开(公告)号：US20040219288A1

公开(公告)日：2004-11-04

申请号：US10856836

申请日：2004-06-01

Applicant: TOKYO ELECTRON LIMITED

Inventor： Shinichi Hayashi ,  Hirofumi Ookuma ,  Kouichi Suefuji

IPC: B05D001/00 ,  B05C011/02 ,  B05C013/00

CPC classification number: H01L21/6715

Abstract: A processing solution is supplied from processing-solution suppliers onto the surfaces of targets to be processed while a flow rate of the processing solution is being adjusted. The processing solution is fed from a processing-solution supply source at a specific pressure via a processing-solution pressure-up feeder. The pressure of the processing solution fed via the processing-solution pressure-up feeder is adjust to another specific pressure or more at least when the processing-solution suppliers are operating simultaneously. A flow-rate detector detects the flow rate of the processing solution supplied from each processing-solution supplier. A pressure detector detects the pressure of the processing solution fed via the processing-solution pressure-up feeder. The flow-rate adjuster and the pressure adjuster are controlled based on prestored control data and detection signals from the flow-rate detector and the pressure detector so that the same amount of processing solution is supplied to the targets from the processing-solution suppliers.

公开(公告)号：US20040154530A1

公开(公告)日：2004-08-12

申请号：US10643820

申请日：2003-08-19

Inventor： Mark Hiatt ,  Karl Mautz ,  Ralf Schuster

IPC: B05C013/00

CPC classification number: H01L21/6704

Abstract: A process tool, preferably a spin coater, includes a set of at least three arms and an adjustable rinse nozzle. The arms lift a substrate, e.g. a semiconductor wafer, from a chuck inside the process chamber after having performed the corresponding manufacturing step, e.g. coating. The contact area between the arms and the substrate is as small as possible. The rinse nozzle dispenses a solvent liquid onto the backside of the substrate, thereby removing contaminating particles located at the area of contact between the vacuum channels of the chuck and the substrate. The set of arms rotates for a homogeneous cleaning. A gas flowing out of vacuum ports of the chuck prevents the vacuum ports from being obstructed with particles. While the substrate is being lifted, the chuck can also be cleaned by dispensing the solvent liquid onto the chuck.

Abstract translation: 工艺工具，优选旋转涂布机，包括一组至少三个臂和可调整的冲洗喷嘴。 臂提起基底，例如 在执行相应的制造步骤之后，来自处理室内的卡盘的半导体晶片，例如， 涂层。 臂和基板之间的接触面积尽可能小。 冲洗喷嘴将溶剂液体分配到基板的背面，从而去除位于卡盘的真空通道与基板之间的接触区域的污染颗粒。 该组臂旋转以进行均匀清洁。 从卡盘的真空端口流出的气体防止真空口被颗粒堵塞。 当基板被提起时，也可以通过将溶剂液体分配到卡盘上来清洁卡盘。

公开(公告)号：US20040052960A1

公开(公告)日：2004-03-18

申请号：US10416191

申请日：2003-10-21

Inventor： Didier Dauchelle ,  Hugues Baudin ,  Patrice Lucas ,  Laurent Gacher ,  Yves Prigent

IPC: B05D001/18 ,  B05C003/00 ,  B05C013/00

CPC classification number: C23C2/00

Abstract: The subject of the invention is a process for the continuous dip-coating of a metal strip (1) in a tank (11) containing a liquid metal bath (12), in which process the metal strip (1) is made to run continuously through a duct (13), the lower part of which is immersed in the liquid metal bath (12), in order to define with the surface of the said bath a liquid seal (14). In the region where the strip (1) leaves the liquid metal bath (12), the liquid metal is isolated from the surface of the said bath in an isolating enclosure (20) and the metal oxide particles and intermetallic compound particles are recovered by the liquid metal flowing from this region into the said enclosure (20) and the said particles are extracted from this enclosure (20). Another subject of the invention is a plant for implementing the process.

Abstract translation: 本发明的主题是一种用于在包含液态金属浴（12）的罐（11）中连续浸涂金属带（1）的方法，其中使金属条（1）连续地运行 通过其下部浸入液态金属浴（12）中的管道（13），以便与所述槽的表面限定液体密封（14）。 在条带（1）离开液态金属浴（12）的区域中，液体金属在隔离外壳（20）中与所述槽的表面隔离，金属氧化物颗粒和金属间化合物颗粒被 从该区域流入所述外壳（20）的液体金属和所述颗粒从该外壳（20）中抽出。 本发明的另一主题是用于实施该方法的设备。

公开(公告)号：US20040016398A1

公开(公告)日：2004-01-29

申请号：US10622887

申请日：2003-07-18

Applicant: Elpatronic AG

Inventor： Peter Taiana ,  Andreas Lanz

IPC: B05C013/00

CPC classification number: C23C24/02 ,  Y10S118/03

Abstract: The invention relates first of all to a method for covering areas of damaged protective coating on containers (1) or the like, in which, according to the invention, protective coating material is stamped on to the zone in which the damaged areas occur. The invention also describes an apparatus for carrying out the method in which a carrier unit (12) is provided for stamping protective coating material on to the damaged area. Means (6, 10, 11) are Apparatus is provided for positioning the carrier unit (12) with respect to the container (1).

Abstract translation: 本发明首先涉及用于覆盖容器（1）等上损坏的保护涂层的区域的方法，根据本发明，保护涂层材料被冲压到损坏区域发生的区域上。 本发明还描述了一种用于执行方法的装置，其中提供承载单元（12）以将保护涂层材料冲压到损坏的区域上。 装置（6,10,11）设置有用于相对于容器（1）定位托架单元（12）。

公开(公告)号：US20030230237A1

公开(公告)日：2003-12-18

申请号：US10170957

申请日：2002-06-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Hsi-Kuei Cheng ,  Ting-Chu Wang ,  Yu-Ku Lin ,  Chin-Te Huang ,  Huai-Tei Yang ,  Chun-Chang Chen ,  Yi-Lang Wang

IPC: B05C013/00 ,  B05C013/02

CPC classification number: H01L21/68735 ,  H01L21/6875 ,  Y10S269/903

Abstract: An improved hoop support for semiconductor wafers reduces contamination of the wafer during edge beveling operations through the use of support pins that make only line contact with the wafer. The support pins are spaced around the periphery of the hoop and possess a triangular cross section. Two intersecting sides of the pins form an edge that defines the line contact with the wafer. These intersecting sides are preferably inclined relative to the wafer at an angle of between 60 and 80 degrees.

Abstract translation: 用于半导体晶片的改进的环形支撑通过使用仅与晶片线接触的支撑销来减少边缘斜切操作期间晶片的污染。 支撑销围绕环的周边间隔开并且具有三角形横截面。 销的两个相交的侧面形成限定与晶片的线接触的边缘。 这些相交侧优选以60度和80度之间的角度相对于晶片倾斜。

公开(公告)号：US20030170399A1

公开(公告)日：2003-09-11

申请号：US10093006

申请日：2002-03-07

Inventor： John Paul Owed JR.

IPC: B05C013/00 ,  B05B005/00 ,  B05D001/04

CPC classification number: B05B5/082

Abstract: A method and apparatus for coating articles with coating material includes dispensing coating material from a coating dispensing device, maintaining the coating dispensing device at high-magnitude electrostatic potential, coupling articles to a conveyor on hangers constructed from electrically non-insulative strips, and conveying the articles through the dispensed coating material on the hangers.

Abstract translation: 用涂料涂覆物品的方法和设备包括从涂料分配装置分配涂料，将涂料分配装置保持在高度静电势，将物品连接到由电绝缘条构成的悬挂架上的输送机上， 物品通过分配的涂料在衣架上。

公开(公告)号：US20030150563A1

公开(公告)日：2003-08-14

申请号：US10276394

申请日：2002-11-14

Inventor： Akira Kuibara ,  Masuhiro Natsuhara ,  Hirohiko Nakata

IPC: B05C013/00 ,  B05C013/02 ,  H01L021/306 ,  C23C016/00

CPC classification number: H01L21/6833 ,  B32B18/00 ,  B32B2309/022 ,  B32B2315/02 ,  C04B35/44 ,  C04B35/581 ,  C04B37/005 ,  C04B2235/3217 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3865 ,  C04B2235/96 ,  C04B2237/064 ,  C04B2237/08 ,  Y10T279/23

Abstract: A substrate holding structure having excellent corrosion resistance and airtightness, having excellent dimensional accuracy and having sufficient durability when mechanical or thermal stress is applied thereto is obtained. A holder (1) serving as the substrate holding structure according to the present invention comprises a ceramic base (2) for holding a substrate, a protective cylinder (7) joined to the ceramic base (2) and a joining layer (8) positioned between the ceramic base (2) and the protective cylinder (7) for joining the ceramic base (2) and the protective cylinder (7) to each other. The joining layer (8) contains at least 2 mass % and not more than 70 mass % of a rare earth oxide, at least 10 mass % and not more than 78 mass % of aluminum oxide, and at least 2 mass % and not more than 50 mass % of aluminum nitride. The rare earth oxide or the aluminum oxide has the largest ratio among the aforementioned three types of components in the joining layer (8).

Abstract translation: 获得具有优异的耐腐蚀性和气密性的基板保持结构，具有优异的尺寸精度并且在施加机械或热应力时具有足够的耐久性。 根据本发明的用作基板保持结构的保持器（1）包括用于保持基板的陶瓷基座（2），接合到陶瓷基座（2）的保护筒（7）和位于 在陶瓷基座（2）和用于将陶瓷基座（2）和保护筒（7）彼此接合的保护筒（7）之间。 接合层（8）含有2质量％以上且70质量％以下的稀土类氧化物，至少10质量％以上且78质量％以下的氧化铝，至少2质量％以上 超过50质量％的氮化铝。 在接合层（8）中，上述三种成分中的稀土类氧化物或氧化铝的比例最大。

公开(公告)号：US20030089457A1

公开(公告)日：2003-05-15

申请号：US09993240

申请日：2001-11-13

Applicant: Applied Materials, Inc.

Inventor： Padmapani C. Nallan ,  Ajay Kumar

IPC: C23C016/00 ,  C23F001/00 ,  H01L021/306 ,  B05C013/00

CPC classification number: H01L21/67248 ,  H01J37/32431 ,  H01J2237/2001 ,  H01L21/67103

Abstract: Apparatus for controlling a thermal conductivity profile of a pedestal in a semiconductor wafer processing system. One embodiment of the apparatus is a thermal shim that is positioned between a wafer retention device (e.g., electrostatic chuck) and a pedestal. The shim controls the thermal conductivity between the wafer retention device and the pedestal. In one embodiment, the thermal shim has a low thermally conductive region and a high thermally conductive region. In a further embodiment, the low thermally conductive region is a hole. By having a hole in the center of the shim, thus forming an annulus, an air gap is formed between the wafer retention device and the pedestal such that less heat will be transferred through the air gap as compared to the high thermally conductive region of the shim.

Abstract translation: 用于控制半导体晶片处理系统中基座的热导率分布的装置。 该装置的一个实施例是位于晶片保持装置（例如，静电卡盘）和基座之间的热垫片。 垫片控制晶片保持装置和基座之间的热导率。 在一个实施例中，热垫片具有低导热区域和高导热区域。 在另一个实施例中，低导热区域是一个孔。 通过在垫片的中心具有孔，从而形成环形空间，在晶片保持装置和基座之间形成气隙，使得较少的热量将通过空气间隙传递， 垫片