Information providing system and method for providing information
    52.
    发明授权
    Information providing system and method for providing information 有权
    提供信息的信息提供系统和方法

    公开(公告)号:US06959392B1

    公开(公告)日:2005-10-25

    申请号:US09465761

    申请日:1999-12-17

    CPC classification number: H04L63/083 G06F21/31 H04L63/0892

    Abstract: In an information providing system, a condition notifying part is provided by a providing part to the user terminal with information that is in accordance with a request of the user terminal, is activated in a user terminal connecting to the information providing system via a network and notifies of a condition of the user terminal. In addition, a session management part manages session information in accordance with the condition of the user terminal notified by the condition notifying part activated in the user terminal. A session between the information providing system and the user terminal is established when the user is authenticated in accordance with authentication information from the user terminal and the session information managed by said session management part.

    Abstract translation: 在信息提供系统中,条件通知部分由提供部件向用户终端提供符合用户终端的请求的信息,经由网络连接到信息提供系统的用户终端被激活, 通知用户终端的状况。 此外,会话管理部件根据由用户终端中激活的条件通知部件通知的用户终端的状况来管理会话信息。 当用户根据来自用户终端的认证信息和由会话管理部分管理的会话信息进行认证时,建立信息提供系统与用户终端之间的会话。

    Plasma display apparatus
    53.
    发明申请
    Plasma display apparatus 审中-公开
    等离子显示装置

    公开(公告)号:US20050212725A1

    公开(公告)日:2005-09-29

    申请号:US11071346

    申请日:2005-03-04

    Abstract: A AC type plasma display apparatus has been disclosed, which satisfies various requirements such as the number of gradations that can be displayed, the display luminance, and the upper limit of power and, further, the efficiency of light emission and the luminance can be increased as much as possible and the display quality of which is not deteriorated. In the plasma display apparatus, a frame is composed of plural subfields, an image is displayed by causing a sustain discharge to occur in each subfield, the sustain discharge can be caused to occur by at least a first sustain waveform and a second sustain waveform different from the first sustain waveform, and the ratio of the first sustain waveform to the second sustain waveform changes, both waveforms being used to cause the sustain discharge to occur in each subfield.

    Abstract translation: 已经公开了一种AC型等离子体显示装置,其满足诸如可显示的等级数量,显示亮度和功率上限等各种要求,并且还可以增加发光效率和亮度 尽可能地使其显示质量不劣化。 在等离子体显示装置中,由多个子场构成帧,通过在各子场中发生维持放电来显示图像,可以通过至少第一维持波形和第二维持波形而发生维持放电 从第一维持波形开始,第一维持波形与第二维持波形的比例发生变化,这两个波形用于在每个子场中发生维持放电。

    Capacitor and manufacturing method thereof
    55.
    发明授权
    Capacitor and manufacturing method thereof 失效
    电容器及其制造方法

    公开(公告)号:US06762107B2

    公开(公告)日:2004-07-13

    申请号:US10311999

    申请日:2002-12-23

    CPC classification number: H01G4/005 H01G4/06 H01G4/33

    Abstract: A capacitor (1) using a flexible substrate (2) includes a hole portion (6a) formed in a dielectric (6) to connect an upper electrode (7) to an external leader electrode (4). At least part of the hole portion (6a) extends from its lower end to upper end at an inclination between 0.1 and 20° with respect to a top surface of the external leader electrode (4). Then, an upper end corner of an inclined wall surface of the upper electrode (7), which inclines along the hole portion (6a) of the dielectric (6), has a downward inclination between 0.1 and 20°. A lower end corner of the inclined wall surface of the upper electrode (7), which inclines along the hole portion of the dielectric (6), has an upward inclination between 0.1 and 20°. As a result, stress concentration on the corners of the upper electrode (7) is drastically reduced to prevent the upper electrode (7) from cracking.

    Abstract translation: 使用柔性基板(2)的电容器(1)包括形成在电介质(6)中的用于将上电极(7)连接到外引导电极(4)的孔部(6a)。 孔部分(6a)的至少一部分相对于外部引导电极(4)的顶表面从其下端到上端以0.1和20°之间的倾斜度延伸。 然后,沿着电介质(6)的孔部(6a)倾斜的上电极(7)的倾斜壁面的上端角落在0.1〜20°之间。 上电极(7)的倾斜壁表面的沿着电介质(6)的孔部倾斜的下端角度具有在0.1和20度之间的向上倾斜。 结果,上部电极(7)的角部上的应力集中显着减小,以防止上部电极(7)破裂。

    Wet-chemical treatment method, treatment method of semiconductor substrate, and manufacturing method of semiconductor device
    58.
    发明授权
    Wet-chemical treatment method, treatment method of semiconductor substrate, and manufacturing method of semiconductor device 失效
    湿化学处理方法,半导体衬底的处理方法以及半导体器件的制造方法

    公开(公告)号:US06171975B2

    公开(公告)日:2001-01-09

    申请号:US09048282

    申请日:1998-03-26

    Abstract: In a wet-chemical treatment of a semiconductor substrate with a chemical treatment fluid containing ammonia and hydrogen peroxide, an experiment is carried out in a system where the concentrations of chemical species are known, to experimentally previously determine a relation between an etching rate of an SiO2 film with a mixture of ammonia and hydrogen peroxide and the concentrations of the dissolved chemical species (calculated by a chemical equilibrium analysis) or the temperature of the chemical treatment fluid, and the determined relation is then expressed. The concentrations of the chemical species are calculated by the chemical equilibrium analysis on the basis of values measured by a chemical treatment fluid composition monitor at a suitable interval and values measured by a fluid temperature sensor, and in accordance with the expressed relation, the etching rate of the SiO2 film with the chemical treatment fluid is calculated at the suitable interval. This result is fed back to a replenish mechanism of a wet-chemical treatment apparatus to regulate the amounts of the chemicals, thereby controlling the concentrations of the chemical treatment fluid. In consequence, there can be provided a wet-chemical treatment method which can stably treat the semiconductor.

    Abstract translation: 在具有含有氨和过氧化氢的化学处理流体的半导体衬底的湿化学处理中,在已知化学物质的浓度的系统中进行实验,以实验性地先前确定 用氨和过氧化氢的混合物和溶解的化学物质的浓度(通过化学平衡分析计算)或化学处理流体的温度的SiO2膜,然后表示确定的关系。 化学物质的浓度通过化学平衡分析计算,其基于由化学处理流体组成监测器以合适的间隔测量的值和通过流体温度传感器测量的值,并且根据表述的关系,蚀刻速率 的化学处理液的SiO 2膜以适当的间隔计算。 将该结果反馈到湿式化学处理装置的补充机构,以调节化学品的量,从而控制化学处理流体的浓度。 因此,可以提供可以稳定地处理半导体的湿化学处理方法。

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