Fabrication method for surrounding gate silicon nanowire transistor with air as spacers
    53.
    发明授权
    Fabrication method for surrounding gate silicon nanowire transistor with air as spacers 有权
    围绕栅极硅纳米线晶体管的制造方法,其中空气为间隔物

    公开(公告)号:US08513067B2

    公开(公告)日:2013-08-20

    申请号:US13266791

    申请日:2011-07-15

    CPC classification number: H01L29/66439 B82Y10/00 H01L29/775

    Abstract: The invention discloses a fabrication method for a surrounding gate silicon nanowire transistor with air as spacers. The method comprises: performing isolation, and depositing a material A which has a higher etch selectivity ratio with respect to Si; performing photolithography to define a Fin hard mask; etching the material A to form the Fin hard mask; performing source and drain implantation; performing photolithography to define a channel region and large source/drain regions; forming the Si Fin and the large source/drains; removing the hard mask of the material A; forming a nanowire; etching the SiO2 to form a floating nanowire; forming a gate oxide layer; depositing a polysilicon; performing polysilicon injection; performing annealing to activate dopants; etching the polysilicon; depositing SiN; performing photolithography to define a gate pattern; etching the SiN and the polysilicon to form the gate pattern; separating the gate and the source/drain with a space in between filled with air; depositing SiO2 to form air sidewalls; performing annealing to densify the SiO2 layer; using subsequent processes to complete the device fabrication. The invention is compatible with the CMOS process flow. The introduction of the air sidewalls can effectively reduce the parasitic capacitance of the device, and improve the transient response of the device, so that the method is applicable for a logic circuit with high performance.

    Abstract translation: 本发明公开了一种具有空气作为间隔物的周围栅极硅纳米线晶体管的制造方法。 该方法包括:执行隔离和沉积相对于Si具有较高蚀刻选择比的材料A; 执行光刻以限定Fin硬掩模; 蚀刻材料A以形成Fin硬掩模; 进行源极和漏极植入; 执行光刻以限定沟道区和大的源极/漏极区; 形成Si Fin和大源/排水; 去除材料A的硬掩模; 形成纳米线; 蚀刻SiO 2以形成浮动的纳米线; 形成栅氧化层; 沉积多晶硅; 执行多晶硅注入; 执行退火以激活掺杂剂; 蚀刻多晶硅; 沉积SiN; 执行光刻以限定栅极图案; 蚀刻SiN和多晶硅以形成栅极图案; 分离门和源/排水管之间的空间填充空气之间; 沉积SiO 2以形成空气侧壁; 进行退火以使SiO 2层致密化; 使用后续过程来完成器件制造。 本发明与CMOS工艺流程兼容。 空气侧壁的引入可以有效降低器件的寄生电容,提高器件的瞬态响应,使其适用于具有高性能的逻辑电路。

    HIGH SPEED UPLINK PACKET ACCESS ADAPTIVE RETRANSMISSION METHOD AND APPARATUS
    55.
    发明申请
    HIGH SPEED UPLINK PACKET ACCESS ADAPTIVE RETRANSMISSION METHOD AND APPARATUS 有权
    高速上链路分组访问自适应重传方法和设备

    公开(公告)号:US20120201121A1

    公开(公告)日:2012-08-09

    申请号:US13449967

    申请日:2012-04-18

    CPC classification number: H04L1/1825 H04L1/0015 H04L1/1883

    Abstract: An embodiment of the present invention discloses a high speed uplink packet access adaptive retransmission method and apparatus. The method includes: obtaining a resource limitation state; performing adjustment decision according to the resource limitation state and a current target number of retransmissions of a UE; and adjusting the target number of retransmissions of the UE between a preset large target number of retransmissions and a preset small target number of retransmissions, where the large target number of retransmissions is greater than the small target number of retransmissions. The utilization rate of resources may be effectively improved.

    Abstract translation: 本发明的实施例公开了一种高速上行分组接入自适应重传方法和装置。 该方法包括:获取资源限制状态; 根据资源限制状态和UE的当前目标重传次数进行调整决定; 以及在预设的大目标重发次数与预定的小目标重发次数之间调整所述UE的目标重传次数,其中所述大目标重发次数大于所述小目标重传次数。 资源利用率可以有效提高。

    BIOMARKERS AND METHODS FOR DETERMINING SENSITIVITY TO EPIDERMAL GROWTH FACTOR RECEPTOR MODULATORS
    56.
    发明申请
    BIOMARKERS AND METHODS FOR DETERMINING SENSITIVITY TO EPIDERMAL GROWTH FACTOR RECEPTOR MODULATORS 审中-公开
    生物标记物和测定敏感性的方法,用于生物生长因子受体调节剂

    公开(公告)号:US20120195889A1

    公开(公告)日:2012-08-02

    申请号:US13372824

    申请日:2012-02-14

    Abstract: EGFR biomarkers useful in a method for predicting the likelihood that a mammal that will respond therapeutically to a method of treating cancer comprising administering an EGFR modulator, wherein the method comprises (a) measuring in the mammal the level of at least one biomarker selected from epiregulin and amphiregulin, (b) exposing a biological sample from the mammal to the EGFR modulator, and (c) following the exposing of step (b), measuring in the biological sample the level of the at least one biomarker, wherein an increase in the level of the at least one biomarker measured in step (c) compared to the level of the at least one biomarker measured in step (a) indicates an increased likelihood that the mammal will respond therapeutically to the method of treating cancer.

    Abstract translation: EGFR生物标志物可用于预测将对治疗癌症治疗的治疗反应的哺乳动物的可能性的方法,其包括施用EGFR调节剂,其中所述方法包括(a)在哺乳动物中测量至少一种选自上皮蛋白的生物标志物 (b)将生物样品从哺乳动物暴露于EGFR调节剂,和(c)在暴露步骤(b)之后,在生物样品中测量至少一种生物标志物的水平,其中增加 与步骤(a)中测量的至少一种生物标志物的水平相比,在步骤(c)中测量的至少一种生物标志物的水平表明哺乳动物对治疗癌症的方法治疗反应的可能性增加。

    USER-GUIDED SURFACE RECONSTRUCTION
    60.
    发明申请
    USER-GUIDED SURFACE RECONSTRUCTION 有权
    用户指导的表面重建

    公开(公告)号:US20100085353A1

    公开(公告)日:2010-04-08

    申请号:US12245709

    申请日:2008-10-04

    CPC classification number: G06T17/005 G06T17/00 G06T2210/52

    Abstract: Described is a technology by which a user interacts with a surface representative of a point cloud data to correct for imperfect scan data. The surface is reconstructed based on the interaction. Real time viewing of the image is facilitated by parallel surface reconstruction. For example, the user may draw strokes to reduce topological ambiguities in poorly-sampled areas. An algorithm automatically adds new oriented sample points to the original point cloud based on the user interaction. Then a new isosurface is generated for the augmented point cloud. The user also may specify the geometry of missing areas of the surface. The user copies a set of points from another point cloud, and places the points around the target area. A new isosurface is then generated.

    Abstract translation: 描述了用户与表示点云数据的表面进行交互以校正不完美扫描数据的技术。 基于交互重建表面。 通过平行表面重建,实现了图像的实时观察。 例如,用户可以绘制笔画以减少不良采样区域的拓扑模糊。 基于用户交互,算法会自动将新的定向采样点添加到原始点云。 然后为增强点云生成一个新的等值面。 用户还可以指定表面缺失区域的几何形状。 用户从另一个点云复制一组点,并将点放在目标区域周围。 然后生成新的等值面。

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