公开(公告)号：US08891574B2

公开(公告)日：2014-11-18

申请号：US13425825

申请日：2012-03-21

申请人： Shinji Nagai ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Shinji Nagai ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/22 ,  H01S3/10 ,  H01S3/23 ,  H01S3/225 ,  H01S3/00

CPC分类号： H01S3/10061 ,  H01S3/005 ,  H01S3/2251 ,  H01S3/2316

摘要： A degree of polarization control device includes: a calcium fluoride crystal substrate for transmitting a laser beam; a polarization monitor for measuring the degree of polarization of a laser beam transmitted through the calcium fluoride crystal substrate; and a controller for controlling the rotation angle of the calcium fluoride crystal substrate according to the degree of polarization measured by the polarization monitor; the calcium fluoride crystal substrate being formed by a flat plate having a laser beam entering surface and a laser beam exiting surface running in parallel with the (111) crystal face, the Brewster angle being selected for the incident angle, the rotation angle around the [111] axis operating as a central axis being controlled by the controller.

摘要翻译： 一种偏光控制装置包括：用于透射激光束的氟化钙晶体基板; 用于测量透射穿过氟化钙晶体衬底的激光束的偏振度的偏振监视器; 以及控制器，用于根据由偏振监视器测量的偏振度来控制氟化钙晶体基板的旋转角度; 所述氟化钙晶体基板由具有激光入射面的平板和与（111）晶面平行地行进的激光束离开表面形成，所述布鲁斯特角为入射角选择，围绕[ 111]轴作为中心轴由控制器控制。

公开(公告)号：US08884257B2

公开(公告)日：2014-11-11

申请号：US13562950

申请日：2012-07-31

申请人： Shinji Nagai ,  Junichi Fujimoto ,  Kouji Ashikawa

发明人： Shinji Nagai ,  Junichi Fujimoto ,  Kouji Ashikawa

IPC分类号： G02B5/08 ,  G21K5/00 ,  H05G2/00

CPC分类号： H05G2/008 ,  G02B5/0891 ,  G21K5/00 ,  H05G2/005

摘要： A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber.

摘要翻译： 可以与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生EUV光的室; 收集器反射镜，其具有形成在其中心的区域中的第一通孔，并且被构造成收集室内产生的EUV光，收集器反射镜被定位成使得第一通孔位于基本对应于 遮蔽区; 以及蚀刻气体供给单元，设置在所述第一通孔中，并且被配置为向所述室供给蚀刻气体。

公开(公告)号：US08629417B2

公开(公告)日：2014-01-14

申请号：US13540314

申请日：2012-07-02

申请人： Shinji Nagai ,  Tamotsu Abe ,  Takanobu Ishihara ,  Osamu Wakabayashi

发明人： Shinji Nagai ,  Tamotsu Abe ,  Takanobu Ishihara ,  Osamu Wakabayashi

IPC分类号： G01N21/33 ,  H01J1/50 ,  G21K5/08

CPC分类号： H05G2/003 ,  G01J3/10 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.

摘要翻译： 一种与激光系统组合使用的极紫外光发生装置，该装置可以包括：设置有至少一个入口的腔室，用于将从激光系统输出的激光束引入腔室; 目标供给单元，其设置在所述室中，用于将所述目标材料供给到所述室内的预定区域，所述目标材料用所述激光束照射; 设置在所述室内的至少一个光学元件; 用于产生围绕预定区域的磁场的磁场产生单元; 离子收集单元，设置在所述磁场的磁力线的方向上，用于收集当所述靶材料被所述激光束照射并沿着所述磁力线流动时产生的离子; 以及用于将蚀刻气体引入到室中的气体引入单元。

公开(公告)号：US08624208B2

公开(公告)日：2014-01-07

申请号：US13048454

申请日：2011-03-15

申请人： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

发明人： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC分类号： G21K5/00

CPC分类号： G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

摘要翻译： 极紫外光发生系统是与激光装置一起使用并与外部装置连接以向其提供极紫外光的极紫外光发生系统，并且极紫外光发生系统可包括：室 入射至少一个激光束的入口; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，其被设置到蚀刻气体通过的室，所述蚀刻气体被引入以蚀刻所述目标材料的碎屑，所述目标材料在所述靶材料被所述室内的所述激光束照射时发射，并且粘附至所述至少一个 光学元件 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US08586954B2

公开(公告)日：2013-11-19

申请号：US13419177

申请日：2012-03-13

申请人： Takeshi Asayama ,  Kouji Kakizaki ,  Akira Endo ,  Shinji Nagai

发明人： Takeshi Asayama ,  Kouji Kakizaki ,  Akira Endo ,  Shinji Nagai

IPC分类号： G01N21/00 ,  G01N21/33 ,  H05G2/00

CPC分类号： H05G2/008 ,  H05G2/003 ,  H05G2/005

摘要： An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.

摘要翻译： 一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动， 极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面 与离子收集器装置中的离子相撞。

公开(公告)号：US08569723B2

公开(公告)日：2013-10-29

申请号：US13183217

申请日：2011-07-14

申请人： Shinji Nagai ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Tamotsu Abe

发明人： Shinji Nagai ,  Takanobu Ishihara ,  Kouji Kakizaki ,  Tamotsu Abe

IPC分类号： G21K5/02

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/006 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.

摘要翻译： 极紫外光源装置具有磁场发生器，该磁场发生器在通过等离子体产生等离子体区域的磁场方向周围产生磁场区域，并将包含从等离子体区域射出的离子的带电粒子向着 磁场方向，安装在磁场区域的磁场轴的两侧的第一带电粒子收集器（接收器），以收集（接收）由磁场收敛的带电粒子;目标供给单元 从位于极紫外光发生室内的磁场区域内的会聚区域的会聚区域的喷嘴和位于与喷嘴相对的位置的目标集合体供给目标，目标取出部 检索对等离子体的产生无贡献的残留目标。

公开(公告)号：US08503499B2

公开(公告)日：2013-08-06

申请号：US12899886

申请日：2010-10-07

申请人： Shinji Nagai ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Shinji Nagai ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/22 ,  H01S3/10 ,  H01S3/08

CPC分类号： H01S3/034 ,  G02B1/02 ,  G02B5/3091 ,  H01S3/0346 ,  H01S3/08054 ,  H01S3/0816 ,  H01S3/225 ,  H01S3/2251

摘要： A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window (2) and a second window (3) of the gas discharge chamber have an incident plane and an emitting plane in parallel with a (111) crystal plane of their calcium fluoride crystal. With respect to an arrangement where laser light entering the calcium fluoride crystal passes through a plane including a axis and a axis of each of the first window (2) and the second window (3) as seen from inside the chamber (1), the first window (2) and the second window (3) are arranged in positions rotated in the same direction by the same angle about their axis.

摘要翻译： 使用减少由于机械应力（窗口保持器和激光气体压力）的破裂的氟化钙晶体，来自光吸收等的热应力的气体放电室增加了输出激光器的线性极化的程度，并抑制了劣化 由于强紫外线（特别是ArF）激光照射。 气体放电室的第一窗口（2）和第二窗口（3）具有与其氟化钙晶体的（111）晶面平行的入射面和发射平面。 关于进入氟化钙晶体的激光通过包括第一窗口（2）和第二窗口（3）中的每一个的<111>轴和<001>轴的平面的布置，从内侧看 室（1），第一窗口（2）和第二窗口（3）被布置在围绕其<111>轴线沿相同方向旋转相同角度的位置。

公开(公告)号：US08436328B2

公开(公告)日：2013-05-07

申请号：US12638571

申请日：2009-12-15

申请人： Tatsuya Yanagida ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

发明人： Tatsuya Yanagida ,  Akira Endo ,  Hiroshi Komori ,  Shinji Nagai ,  Kouji Kakizaki ,  Tamotsu Abe ,  Hideo Hoshino

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/008

摘要： In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.

摘要翻译： 在EUV光源装置中，集光镜受到保护，不会损坏镜面涂层。 EUV光源装置包括：产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 等离子体产生激光器单元，用于用等离子体产生激光束照射室内的目标材料以产生等离子体; 电离激光单元，用于用电离激光束照射在等离子体产生时产生的中性粒子，以将中性粒子转化为离子; 用于收集从等离子体辐射的极紫外光的收集镜; 以及用于在室内形成磁场或电场以捕获离子的磁场或电场形成单元。

公开(公告)号：US08399867B2

公开(公告)日：2013-03-19

申请号：US12566170

申请日：2009-09-24

申请人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

发明人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

IPC分类号： H04H1/04

CPC分类号： H05G2/003 ,  H05G2/001 ,  H05G2/008

摘要： An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.

摘要翻译： EUV光源装置，可以抑制光学元件和其他元件被碎屑污染或损坏，从而实现更长寿命。 EUV光源装置是通过在室内产生目标材料的等离子体来辐射极紫外光的装置，包括：第一激光单元，用于向目标材料施加第一激光束以产生预等离子体; 用于将第二激光束施加到所述预等离子体以产生用于辐射所述极紫外光的主等离子体的第二激光单元; 以及用于在所述室内产生磁场以控制所述预等离子体和所述主等离子体中的至少一个的状态的磁场产生单元。

公开(公告)号：US20110284775A1

公开(公告)日：2011-11-24

申请号：US13196311

申请日：2011-08-02

申请人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

发明人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

IPC分类号： G01J3/10 ,  G21K5/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/008

摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.

摘要翻译： 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，从激光装置输出的激光束通过该入口进入室; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 用于在预定区域中产生磁场的磁场产生单元; 以及带电粒子收集单元，其设置在所述磁场的磁通方向上，用于收集带电粒子，所述带电粒子是当所述靶材料被所述腔室内的所述激光束照射并且沿着所述磁通量行进时产生的。