摘要:
After formation of a lower electrode, made of an Ru film, over the side walls and bottom portion of a hole in a silicon oxide film, wherein an information storage capacitive element is to be formed, a tantalum oxide film, which is to serves as a capacitive insulating film, is deposited by CVD over the lower electrode. In order to improve the quality of this tantalum oxide film, heat treatment of it is conducted in a mixed gas atmosphere of H2O (water vapor) and H2 (hydrogen), while controlling a partial pressure ratio of H2O to H2 so as to fall within a region bounded by the curves (a) and (c) of FIG. 15. This heat treatment makes it possible to improve the quality of the tantalum oxide film, while preventing oxidation of the Ru film constituting the lower electrode.
摘要:
The back side of a strip substrate with plural semiconductor chips mounted thereon is vacuum-chucked to a lower mold half of a mold, and in this state the plural semiconductor chips are sealed with resin simultaneously to form a seal member. Thereafter, the strip substrate and the seal member are released from the mold and are cut into plural semiconductor devices. The semiconductor devices thus obtained are improved in their mounting reliability.
摘要:
An exposure apparatus includes a projection optical system of a catadioptric type and an optical element disposed on a reciprocating light path of the projection optical system. The optical element is movable along an optical axis direction.
摘要:
A reflection type magnification projection optical system includes five light-reflecting mirrors arranged from an object side to an image side in a sequence of a concave mirror (M1), a convex mirror (M2), a concave mirror (M3), a convex mirror (M4), and a concave mirror (M5) such that those mirrors basically form a coaxial system, and forming no intermediate image, and wherein an object point and an image point are respectively on opposite sides across an optical axis, and the object point and the image point are kept 400˜1500 mm apart with respect to a direction orthogonal to the optical axis.
摘要:
A phase shift mask blank comprising a transparent substrate and at least one layer of a phase shifter thereon, wherein the phase shifter is a film composed primarily of a fluorine-doped metal silicide, can be fabricated into a high-performance phase shift mask having adequate transmittance and good stability over time even when used with light sources that emit short-wavelength light. The phase shift mask can be used to fabricate semiconductor integrated circuits to a smaller minimum feature size and a higher level of integration.
摘要:
A magnetic disk unit includes a magnetic disk, a slider having a magnetic head, a suspension for providing the slider, and an actuator arm for positioning the slider on the magnetic disk a first pad including the magnetic head and second pads including no magnetic heads are disposed on an air bearing surface of the slider. A load point of the suspension with respect to the slider is positioned between a leading edge of the slider and a position located at a distance equivalent to substantially 0.42 times a whole length of the slider from the leading edge of the slider. When the slider is seek-positioned on a certain track on the magnetic disk, a frictional force exerted between the first pad of the slider and the magnetic disk is smaller than a product of lateral stiffness of the suspension in a seeking direction and a track width.
摘要:
A producing method of a metal band of a metal belt for a belt-type continuously variable transmission includes the following steps of: superposing a predetermined number of blank rings concentrically on one another to constitute a laminated blank rings; fitting the laminated blank rings to an outer periphery of a circle jig made of material having higher thermal expansivity than that of the blank ring; heating the laminated blank rings together with the circle jig; and deforming the laminated blank rings plastically by thermal expansion of the circle jig.
摘要:
A solid-state displacement element includes an inorganic layered compound having a layered structure and an organic substance inserted between layers of the inorganic layered compound. The solid-state displacement element expands or contracts in the lamination direction of the inorganic layered compound when irradiated with controlling light. An optical element and an interference filter using the same principle of expansion or contraction as that in the solid-state displacement element are also disclosed.
摘要:
An optical integrated oxide device uses a silicon-based functional matrix substrate on which both an oxide device and a semiconductor light emitting device can be commonly integrated with an optimum structure and a high density. A single-crystal Si substrate has formed on its surface a first region where a cleaned surface of the single-crystal Si substrate itself appears, and a second region in which a CeO2 thin film is preferentially (100)-oriented or epitaxially grown on the single-crystal Si substrate. A semiconductor laser is integrated in the first region by epitaxial growth or atomic layer bonding, and an optical modulation device or optical detection device made of oxides are formed in the second region, to make up an optical integrated oxide device. A MgAl2O4 thin film may be used instead of CeO2 thin film.
摘要:
It is intended to provide a ferroelectric that exhibits superior ferroelectricity. A ferroelectric provided is an oxide having a layered crystal structure that is composed of Bi, a first element Me, a second element R, and O. The first element Me is at least one element selected from the group consisting of Na, K, Ca, Ba, Sr, Pb, and Bi. The second element R is at least one element selected from the group consisting of Fe, Ti, Nb, Ta, and W. Ninety-eight percent or more of the entire body of the ferroelectric exhibits ferroelectricity. After an oxide having a layered crystal structure has been grown by a vapor-phase method (crystal growth step), electrodes are attached to the oxide having a layered crystal structure and a voltage is applied thereto (voltage application step). As a result, strains of crystal lattices are corrected at least partially, whereby portions that did not exhibit ferroelectricity at all or did not exhibit superior ferroelectricity due to such large strains that the symmetry of crystal lattices is lost are changed so as to exhibit superior ferroelectricity.