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    Apparatus for aligning mask and wafer used in semiconductor circuit element fabrication
    51.
    发明授权
    Apparatus for aligning mask and wafer used in semiconductor circuit element fabrication 失效
    用于对准半导体电路元件制造中使用的掩模和晶片的装置

    公开(公告)号：US4636626A

    公开(公告)日：1987-01-13

    申请号：US570189

    申请日：1984-01-12

    申请人： Junji Hazama ,  Kinya Kato ,  Akikazu Tanimoto ,  Hisao Izawa

    发明人： Junji Hazama ,  Kinya Kato ,  Akikazu Tanimoto ,  Hisao Izawa

    IPC分类号： G03F9/00 ,  G01J1/20

    CPC分类号： G03F9/7023

    摘要： An alignment apparatus for aligning a semiconductor wafer with an optical mask containing a circuit pattern to be exposed onto the wafer in the fabrication of semiconductor devices by a proximity exposure apparatus. The alignment apparatus includes light beam radiating means for radiating a first and second light beams which are imaged at positions separated by a given gap in a direction substantially perpendicular to two flat sheets, first and second detecting means for respectively detecting the imaging condition of the first and second light beams at the flat sheets, means for relatively moving the light beam radiating means and the flat sheets, and means for discriminating the order of generation of signals from the first and second detecting means, whereby the value of each gap between the selected areas of the two flat sheets at a plurality of places is detected with a high degree of accuracy without changing the gap between the flat sheets thereby making it possible to correct the parallelism, inclination, etc., of the flat sheets.

    摘要翻译： 一种对准装置，用于通过接近曝光装置将半导体晶片与包含要在半导体器件制造中暴露于晶片上的电路图案的光学掩模对准。 对准装置包括光束照射装置，用于辐射第一和第二光束，该第一和第二光束在基本上垂直于两个平板的方向上以给定间隙分开的位置成像;第一和第二检测装置，用于分别检测第一和第二光束的成像条件 并且平板处的第二光束，用于使光束辐射装置和平板相对移动的装置，以及用于鉴别来自第一和第二检测装置的信号的产生顺序的装置，由此所选择的每个间隙之间的值 在不改变平板之间的间隙的情况下以高精度检测多个位置处的两个平板的区域，从而可以校正平板的平行度，倾斜度等。

    Dual focus optical system
    52.
    发明授权
    Dual focus optical system 失效
    双焦光学系统

    公开(公告)号：US4566762A

    公开(公告)日：1986-01-28

    申请号：US527388

    申请日：1983-08-29

    申请人： Kinya Kato

    发明人： Kinya Kato

    IPC分类号： G02B27/40 ,  G02B5/30 ,  G02B13/00 ,  G02B27/28 ,  G03F9/00 ,  H01L21/30

    CPC分类号： G03F9/70 ,  G02B13/00 ,  G02B27/283 ,  G02B5/3083

    摘要： A dual focus optical system for causing the images of two objects separate from each other on the optical axis to be formed on the same image plane comprises a diverging element for causing a second light ray to diverge relative to a first light ray, a converging element provided on the object side of the diverging element for converging the second light ray relative to the first light ray, and an objective lens provided on the object side of the two elements for converging both of the first light ray and the second light ray. The objective lens is disposed so that the point of intersection between the first light ray and the second light ray in the composite system comprising the diverging element and the converging element is coincident with the focal plane of the objective lens which is adjacent to the converging element.

    摘要翻译： 用于使得要在相同图像平面上形成的在光轴上彼此分离的两个物体的图像的双焦点光学系统包括用于使第二光线相对于第一光线发散的发散元件，会聚元件 设置在发散元件的物体侧，用于相对于第一光线会聚第二光线;以及物镜，设置在两个元件的物体侧，用于会聚第一光线和第二光线。 物镜被配置为使得包括发散元件和会聚元件的复合系统中的第一光线和第二光线之间的交点与与会聚元件相邻的物镜的焦平面重合 。

    ILLUMINATION OPTICAL ASSEMBLY, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
    53.
    发明申请
    ILLUMINATION OPTICAL ASSEMBLY, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD 有权
    照明光学组件，曝光装置和器件制造方法

    公开(公告)号：US20140211174A1

    公开(公告)日：2014-07-31

    申请号：US14126126

    申请日：2011-11-25

    申请人： Norio Miyake ,  Kinya Kato

    发明人： Norio Miyake ,  Kinya Kato

    IPC分类号： G03F7/20 ,  G02B26/08 ,  G02B5/30 ,  G02B27/09 ,  G02B27/28

    CPC分类号： G03F7/7015 ,  G02B5/3083 ,  G02B26/0816 ,  G02B27/0927 ,  G02B27/286 ,  G03F7/20 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70566

    摘要： There is provided an illumination optical system for illuminating an illumination objective surface. The illumination optical system includes a first spatial light modulator which has a plurality of optical elements arranged on a first plane, a polarizing member which is arranged in an optical path on an illumination objective surface side with respect to the first plane and which gives a polarization state change to a first light beam passes through a first area in a plane intersecting an optical axis of the illumination optical system, the polarization state change being different from a polarization state change given to a second light beam passes through a second area in the intersecting plane, and a second spatial light modulator which has a plurality of optical elements controlled individually and arranged on a second plane, and which variably forms a light intensity distribution on an illumination pupil of the illumination optical system.

    摘要翻译： 提供了一种用于照明照明物镜表面的照明光学系统。 照明光学系统包括：第一空间光调制器，其具有布置在第一平面上的多个光学元件;偏振构件，其布置在相对于第一平面的照明物镜表面侧上的光路中，并且具有偏振 对第一光束的状态变化通过与照明光学系统的光轴相交的平面中的第一区域，与给予第二​​光束的偏振态变化不同的偏振态变化通过相交的第二区域 平面和第二空间光调制器，其具有单独控制并且布置在第二平面上的多个光学元件，并且可变地在照明光学系统的照明光瞳上形成光强度分布。

    Reference sphere detecting device, reference sphere position detecting device, and three-dimensional-coordinate measuring device
    54.
    发明授权
    Reference sphere detecting device, reference sphere position detecting device, and three-dimensional-coordinate measuring device 有权
    参考球检测装置，参考球位置检测装置和三维坐标测量装置

    公开(公告)号：US08314939B2

    公开(公告)日：2012-11-20

    申请号：US12873506

    申请日：2010-09-01

    申请人： Kinya Kato

    发明人： Kinya Kato

    IPC分类号： G01B11/24

    CPC分类号： G01B11/002 ,  G01S17/66

    摘要： A reference sphere detecting device used for a reference sphere position detecting device comprises an optical unit having a laser light source, a collective lens for collecting light from the laser light source and irradiating the light to a reference sphere positioned at or near a front focal position, a first image pickup device for receiving and detecting reflected light from the reference sphere, the first image pickup device being disposed at a rear focal position of the collective lens; driving units for rotationally moving the optical unit about a reference point; and a control unit for controlling the driving units on the basis of the position at which the reflected light is received and rotationally moving the optical unit so that the reflected light reaches a predetermined reference position of the first image pickup device.

    摘要翻译： 用于参考球位置检测装置的参考球检测装置包括具有激光光源的光学单元，用于收集来自激光光源的光并将光照射到位于前焦点位置处或附近的参考球的聚光透镜 ，用于接收和检测来自参考球的反射光的第一图像拾取装置，所述第一图像拾取装置设置在所述集体透镜的后焦点位置; 驱动单元，用于围绕参考点旋转所述光学单元; 以及控制单元，用于基于接收到反射光的位置来控制驱动单元，并且旋转地移动光学单元，使得反射光到达第一图像拾取装置的预定基准位置。

    Charged-particle-beam mapping projection-optical systems and methods for adjusting same
    57.
    发明授权
    Charged-particle-beam mapping projection-optical systems and methods for adjusting same 有权
    带电粒子束映射投影光学系统及其调整方法

    公开(公告)号：US07183562B2

    公开(公告)日：2007-02-27

    申请号：US11411349

    申请日：2006-04-25

    申请人： Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

    发明人： Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

    IPC分类号： G01N21/00 ,  G21K7/00

    CPC分类号： H01J37/26 ,  G01N23/225 ,  H01J37/1471 ,  H01J37/226 ,  H01J37/265 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/1501 ,  H01J2237/2482 ,  H01J2237/2538 ,  H01J2237/262 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2823 ,  H01J2237/2826 ,  H01J2237/30438

    摘要： Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.

    摘要翻译： 公开了可以快速且准确地执行这种系统的带电粒子束（CPB）映射投影光学系统和调整方法。 在典型的系统中，照射光束从光源发出，通过照射光学系统，并进入维恩滤光片（“ExB”）。 当通过ExB时，照射光束通过物镜光学系统并且入射到物体表面上。 这种冲击产生观察光束，该观察光束经由成像光学系统通过物镜 - 光学系统和ExB以不同的方向返回到检测器。 调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。 调节光束可以相对于物镜光学系统偏轴。 对于这种调整和对准，可以使用为CPB光学系统和离轴光学系统优化的基准标记（例如位于物体表面的平面中）。 理想地，当电压和电流未施加到ExB时，在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。 还提供了用于这种对准的“评估图”，其不需要调整照射光学系统的光轴，并且发射的调节光束的动能分布从该对准是稳定的。

    Decomposition apparatus and decomposition method
    58.
    发明授权
    Decomposition apparatus and decomposition method 失效
    分解装置和分解方法

    公开(公告)号：US07169287B2

    公开(公告)日：2007-01-30

    申请号：US10206697

    申请日：2002-07-26

    申请人： Toshihiko Miura ,  Hiroshi Kubo ,  Kinya Kato ,  Masahiro Kawaguchi ,  Akira Kuriyama

    发明人： Toshihiko Miura ,  Hiroshi Kubo ,  Kinya Kato ,  Masahiro Kawaguchi ,  Akira Kuriyama

    IPC分类号： C02F1/461

    CPC分类号： B01D53/74 ,  A62D2203/10 ,  C02F1/4672 ,  C02F2101/36

    摘要： A decomposition apparatus that decomposes a decomposition target is provided. The decomposition apparatus includes a decomposition chamber having a decomposition section that continuously decomposes the decomposition target, an introducing device that continuously introduces the decomposition target into the decomposition chamber, a discharging device that discharges decomposition products produced in the decomposition chamber, and a selection section that selects a set of drive conditions from a plurality of sets of conditions for the decomposition section such that the concentration of the decomposition target within the decomposition chamber during decomposition of the decomposition target is at the predetermined concentration. When the concentration of the decomposition target is the predetermined concentration during decomposition in the decomposition section under the set of drive conditions selected by the selection section, the amount per unit time of the decomposition target that is taken into the liquid within the decomposition chamber is in equilibrium with the amount per unit time of the decomposition target that is decomposed within the decomposition chamber.

    摘要翻译： 提供分解目标物的分解装置。 该分解装置具有：分解室，具有连续分解分解对象物的分解部，将分解对象物连续地导入分解室的导入装置，排出分解室内产生的分解物的排出装置;以及选择部， 从用于分解部的多组条件中选择一组驱动条件，使得在分解目标分解期间分解室内的分解对象的浓度为预定浓度。 当在由选择部选择的驱动条件的集合下的分解部分分解期间，分解对象物的浓度为规定浓度时，分解室内的液体中的分解对象物的单位时间量为 与在分解室内分解的分解靶的每单位时间的量的平衡。