公开(公告)号：US6117374A

公开(公告)日：2000-09-12

申请号：US42156

申请日：1998-03-13

申请人： Hideo Kaneko ,  Kazutami Takahashi ,  Kiyoshi Ogawa

发明人： Hideo Kaneko ,  Kazutami Takahashi ,  Kiyoshi Ogawa

IPC分类号： B30B11/00 ,  B29C31/06 ,  B29C43/34 ,  B30B15/30 ,  B29C39/44

CPC分类号： B30B11/005 ,  B29C31/066 ,  B29C43/34 ,  B30B15/304 ,  B29C2037/90 ,  B29C2043/3494 ,  B29C2043/3618 ,  B29K2105/251

摘要： A powder feed apparatus and a control method thereof for a powder molding press wherein in feeding powder from a hopper of the powder feed apparatus to a feeder slidably disposed on a die plate of the press proper and charging powder into a die in the die plate the feeder is electronically controlled to a correct position on the die. Powder is fed from a powder feed apparatus into a feeder slidably disposed on a die plate of a press proper and a feeder drive motor is servo-controlled by an output obtained by comparing detection outputs from a position detector for detecting the vertical position of the die plate of the press proper and a position detector for detecting the position of the feeder in its sliding direction. As a result, it is possible to avoid the trouble of changing cams or inserting insert cams every time the shape of the compact being molded changes and it is possible to easily make changes to the movement speed of the feeder in correspondence with changes to the compact.

摘要翻译： 一种用于粉末成型压力机的粉末进料装置及其控制方法，其中将粉末进料装置的料斗中的粉末送入可滑动地设置在压榨机的模板上的进料器，并将粉末装入模板中的模具中 进料器被电子控制到模具上的正确位置。 将粉末从粉末供给装置供给到可滑动地设置在压制机的模板上的进料器中，并且通过比较来自用于检测模具的垂直位置的位置检测器的检测输出获得的输出来进行伺服控制的给料器驱动马达 压板本体的板和用于检测进给器在其滑动方向上的位置的位置检测器。 结果，可以避免在每次模制件的形状变化时改变凸轮或插入凸轮的麻烦，并且可以容易地根据紧凑件的变化来改变进给器的移动速度 。

公开(公告)号：US5591502A

公开(公告)日：1997-01-07

申请号：US348342

申请日：1994-12-02

申请人： Hideo Kaneko ,  Katsushi Tokunaga ,  Yoshio Tawara

发明人： Hideo Kaneko ,  Katsushi Tokunaga ,  Yoshio Tawara

IPC分类号： G11B5/73 ,  G11B5/84 ,  G11B5/66 ,  B32B3/02 ,  B32B5/16

CPC分类号： G11B5/7315 ,  G11B5/8404 ,  Y10S428/90 ,  Y10T428/12854 ,  Y10T428/265

摘要： Proposed is a magnetic recording medium consisting of a non-magnetic substrate and a magnetic recording layer formed thereon by the method of sputtering, in which the non-magnetic substrate is a disk of single crystal silicon having a surface of the crystallographic orientation of (100), the surface roughness Rp being 40 nm or smaller. By virtue of the use of the unique material for the substrate, the magnetic recording layer is outstandingly stable as compared with conventional aluminum or glass substrates and the magnetic layer formed thereon by sputtering has a greatly improved coercive force of 1300 oersted or higher.

摘要翻译： 提出了一种由非磁性基板和通过溅射方法在其上形成的磁记录层组成的磁记录介质，其中非磁性基板是晶体取向面为（100）的单晶硅盘 ），表面粗糙度Rp为40nm以下。 由于使用独特材料作为基板，所以与常规的铝或玻璃基板相比，磁记录层非常稳定，并且通过溅射在其上形成的磁性层的矫顽力大大提高了1300奥斯特或更高。

公开(公告)号：US5514468A

公开(公告)日：1996-05-07

申请号：US145173

申请日：1993-11-03

申请人： Hideo Kaneko ,  Katsushi Tokunaga ,  Yoshio Tawara ,  Yoshiaki Shimizu ,  Tadao Nomura

发明人： Hideo Kaneko ,  Katsushi Tokunaga ,  Yoshio Tawara ,  Yoshiaki Shimizu ,  Tadao Nomura

IPC分类号： G11B11/105 ,  B32B3/02 ,  B32B5/16 ,  G11B5/66

CPC分类号： G11B11/10584 ,  G11B11/10593 ,  Y10S428/90 ,  Y10T428/26 ,  Y10T428/265

摘要： A magneto-optical recording medium having a layered structure consisting of a first dielectric layer, magnetic recording layer, second dielectric layer and reflecting layer successively formed on a transparent substrate plate can be imparted with improved performance relative to the recording sensitivity and the C/N ratio when the recording layer and the second dielectric layer each have such a thickness that the angle .delta. given by the equation .delta.=tan.sup.-1 (.epsilon./.theta.k), in which .epsilon. is the Kerr ellipticity of the regenerative light and .theta.k is the Kerr rotation angle, does not exceed 10.degree., the thickness of the recording layer being in the range from 8 nm to 13.5 nm and the thickness of the second dielectric layer satisfying the relationship given by the inequality0.06.ltoreq.nd/.lambda..ltoreq.0.14,in which d is the thickness of the second dielectric layer, .lambda. is the wavelength of the regenerative light for reading-out of the recorded signals and n is the refractive index of the material forming the second dielectric layer to the regenerative light of wavelength .lambda..

摘要翻译： 具有由第一电介质层，磁记录层，第二电介质层和连续形成在透明基板上的反射层组成的层状结构的磁光记录介质可以相对于记录灵敏度和C / N 当记录层和第二介电层各自具有这样的厚度，即由等式delta = tan-1（epsilon /θk）给出的角度δ，其中ε是再生光的Kerr椭圆率和θk是 克尔旋转角不超过10°，记录层的厚度在8nm至13.5nm的范围内，第二介电层的厚度满足不等式0.06

公开(公告)号：US4146391A

公开(公告)日：1979-03-27

申请号：US839885

申请日：1977-10-06

申请人： Kiyoshi Inoue ,  Hideo Kaneko

发明人： Kiyoshi Inoue ,  Hideo Kaneko

IPC分类号： C22C38/00 ,  C22C38/02 ,  C22C38/06 ,  H01F1/147

CPC分类号： C22C38/06 ,  C22C38/02 ,  H01F1/14791

摘要： A rollable or plastically deformable Sendust-type magnetic alloy containing by weight 3 to 8% aluminum, 4 to 8% silicon, 0.1 to 2% niobium or tantalum or mixture thereof, 0.5 to 7% a mixture of vanadium and copper and the balance iron. The alloy is especially suitable for use with high-frequency inputs.

摘要翻译： 包含重量为3至8％的铝，4至8％的硅，0.1至2％的铌或钽或其混合物的可卷曲或塑性可变形的Sendust型磁性合金，0.5至7％的钒和铜的混合物以及余量为 。 该合金特别适用于高频输入。

公开(公告)号：US07037625B2

公开(公告)日：2006-05-02

申请号：US10179969

申请日：2002-06-26

申请人： Hideo Kaneko ,  Yukio Inazuki ,  Tetsushi Tsukamoto ,  Satoshi Okazaki

发明人： Hideo Kaneko ,  Yukio Inazuki ,  Tetsushi Tsukamoto ,  Satoshi Okazaki

IPC分类号： G03F1/00

CPC分类号： G03F1/58 ,  B32B18/00 ,  C04B35/16 ,  C04B35/58007 ,  C04B35/58042 ,  C04B35/597 ,  C04B2235/9653 ,  C04B2237/34 ,  C04B2237/36 ,  C04B2237/704 ,  G03F1/32

摘要： A phase shift mask blank is composed of a transparent substrate and a phase shift film thereon. The phase shift film is made of at least two types of layer stacked in alternation, each type having a different composition and containing at least one element selected from among metals, silicon, oxygen and nitrogen. The alternately layered film enables a high-quality phase shift mask blank having improved chemical resistance to be achieved.

公开(公告)号：US06733930B2

公开(公告)日：2004-05-11

申请号：US10073415

申请日：2002-02-13

申请人： Tsutomu Shinagawa ,  Tamotsu Maruyama ,  Hideo Kaneko ,  Mikio Kojima ,  Yukio Inazuki ,  Satoshi Okazaki

发明人： Tsutomu Shinagawa ,  Tamotsu Maruyama ,  Hideo Kaneko ,  Mikio Kojima ,  Yukio Inazuki ,  Satoshi Okazaki

IPC分类号： G03F900

CPC分类号： G03F1/50 ,  G03F1/46 ,  G03F1/80

摘要： In a photomask blank comprising a light-shielding film and an antireflective film on a transparent substrate, the light-shielding film and the antireflective film are formed of a chromium base material containing oxygen, nitrogen and carbon such that the content of carbon decreases stepwise or continuously from a surface side toward the substrate. The photomask blank can be etched at a controlled rate to produce perpendicular walls. A photomask is manufactured by lithographically patterning the photomask blank. The photomask blank and photomask have uniform film properties and contribute to the microfabrication of semiconductor ICs of greater density and finer feature size.

摘要翻译： 在透明基板上包括遮光膜和抗反射膜的光掩模坯料中，遮光膜和抗反射膜由含有氧，氮和碳的铬基材料形成，使得碳含量逐步降低或 从表面侧连续地朝向基板。 可以以受控的速率蚀刻光掩模坯料以产生垂直的壁。 通过光刻图案化光掩模坯料制造光掩模。 光掩模坯料和光掩模具有均匀的膜性质，并且有助于具有更大密度和更精细特征尺寸的半导体IC的微细加工。

公开(公告)号：US06666957B2

公开(公告)日：2003-12-23

申请号：US10036685

申请日：2001-12-21

申请人： Masataka Watanabe ,  Satoshi Okazaki ,  Hideo Kaneko ,  Ken Ohashi ,  Hideki Kobayashi

发明人： Masataka Watanabe ,  Satoshi Okazaki ,  Hideo Kaneko ,  Ken Ohashi ,  Hideki Kobayashi

IPC分类号： C23C1435

CPC分类号： H01J37/3455 ,  C23C14/35 ,  H01J37/3408

摘要： The present invention provides a magnetron sputtering system, which ensures a formation of a desired thin film, using a thick target. In the sputtering process, a portion of the target does not have erosion free portions. The present invention provides a magnetron sputtering system comprising a chamber for sputtering, a target electrode 5 installed inside said chamber, a substrate electrode 6 installed in the chamber opposite to the target electrode, a ring-shaped magnet 2 installed so as to enclose the side surface of the target electrode, and a semi-circular disk shaped magnet installed opposite to the target-mounted surface of the target electrode, wherein the semi-circular disk shaped magnet is rotated in the circumferential direction of the target electrode and is magnetized in the direction perpendicular to the target electrode. This ensures a specific magnetic field component to be generated over the thick planar target surface 3.

公开(公告)号：US06620593B1

公开(公告)日：2003-09-16

申请号：US08277031

申请日：1994-07-19

申请人： Koji Hayashi ,  Toshiyuki Sakaki ,  Yoshiyasu Yabusaki ,  Koichiro Komai ,  Hideo Kaneko ,  Iwao Nakatsuka

发明人： Koji Hayashi ,  Toshiyuki Sakaki ,  Yoshiyasu Yabusaki ,  Koichiro Komai ,  Hideo Kaneko ,  Iwao Nakatsuka

IPC分类号： C12Q126

CPC分类号： C12Y106/02004 ,  C12N9/0038 ,  C12N9/0077 ,  C12Q1/025

摘要： There is disclosed a method for evaluation of the safety of a chemical compound, which includes the steps of: (a) reacting a chemical compound with recombinant yeast cells expressing, or in other words producing, human cytochrome P450 molecular species P450 1A2, P450 2C9, P450 2E1 and P450 3A4 together with a yeast NADPH-P450 reductase, which may be in the form of a fused enzyme with each of said human cytochrome P450 molecular species, or with the cell free extracts of the yeast cells; and (b) analyzing the resulting metabolite to determine the safety of the compound. According to this method, it can be determined whether a test compound will be converted into a carcinogenic or mutagenic form through the metabolism in the human liver, and whether the test compound or its metabolite has mutagenicity.

摘要翻译： 公开了一种用于评估化合物安全性的方法，其包括以下步骤：（a）使化学化合物与表达或换句话说，生成人细胞色素P450分子种类P450 1A2，P450 2C9的重组酵母细胞 ，P450 2E1和P450 3A4以及酵母NADPH-P450还原酶，其可以是与每种所述人细胞色素P450分子种类的融合酶的形式，或与酵母细胞的无细胞提取物; 和（b）分析得到的代谢物以确定化合物的安全性。 根据该方法，可以确定试验化合物是否将通过人肝脏中的代谢转化为致癌或诱变形式，以及试验化合物或其代谢物是否具有致突变性。

公开(公告)号：US06503669B2

公开(公告)日：2003-01-07

申请号：US09783322

申请日：2001-02-15

申请人： Hideo Kaneko ,  Yukio Inazuki ,  Tamotsu Maruyama ,  Satoshi Okazaki

发明人： Hideo Kaneko ,  Yukio Inazuki ,  Tamotsu Maruyama ,  Satoshi Okazaki

IPC分类号： G03F900

CPC分类号： G03F1/68 ,  C03C17/22 ,  C03C17/225 ,  C03C2217/281 ,  C03C2217/282 ,  C03C2218/155 ,  C23C14/0057 ,  C23C14/06 ,  G03F1/50

摘要： A photomask blank has at least one layer of chromium base film on a transparent substrate. The chromium base film of chromium oxycarbide (CrCO) or chromium oxynitride carbide (CrCON) is formed by a reactive sputtering technique using chromium or chromium containing O, N or C as the target and a mixture of carbon dioxide gas and an inert gas as the sputtering gas. A photomask is manufactured by lithographically patterning the photomask blank. The photomask blank and photomask are of quality featuring high uniformity within the substrate plane and ease of control during manufacture.

摘要翻译： 光掩模坯料在透明衬底上具有至少一层铬基膜。 碳氧化铬（CrCO）或氮氧化铬碳化铬（CrCON）的铬基膜通过使用含有O，N或C的铬或铬作为靶的反应溅射技术形成，并且将二氧化碳气体和惰性气体的混合物作为 溅射气体。 通过光刻图案化光掩模坯料制造光掩模。 光掩模坯料和光掩模的质量在基板平面内具有高均匀性，并且在制造期间易于控制。

公开(公告)号：US06503668B2

公开(公告)日：2003-01-07

申请号：US09757615

申请日：2001-01-11

申请人： Yukio Inazuki ,  Hideo Kaneko ,  Tamotsu Maruyama ,  Satoshi Okazaki

发明人： Yukio Inazuki ,  Hideo Kaneko ,  Tamotsu Maruyama ,  Satoshi Okazaki

IPC分类号： G03F900

CPC分类号： G03F1/32 ,  G03F1/26

摘要： A phase shift mask blank has a phase shift film of MoSiOC or MoSiONC on a transparent substrate, and optionally a chromium-based light-shielding film, a chromium-based antireflection film or a multilayer combination of both on the phase shift film. A manufacture method involving depositing the MoSi base phase shift film by a reactive sputtering technique using a sputtering gas containing carbon dioxide produces a phase shift mask blank and phase shift mask of quality, with advantages of in-plane uniformity and easy control during manufacture.

摘要翻译： 相移掩模空白在透明基板上具有MoSiOC或MoSiONC的相移膜，并且可选地，在相移膜上具有铬基遮光膜，铬基抗反射膜或两者的多层组合。 包括通过使用含有二氧化碳的溅射气体的反应溅射技术沉积MoSi基相变膜的制造方法产生质量的相移掩模坯料和相移掩模，具有在制造过程中面内均匀性和易于控制的优点。