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    Patterning device utilizing sets of stepped mirrors and method of using same
    51.
    发明授权
    Patterning device utilizing sets of stepped mirrors and method of using same 失效
    利用台阶反射镜的图案化装置及其使用方法

    公开(公告)号：US07738077B2

    公开(公告)日：2010-06-15

    申请号：US11495881

    申请日：2006-07-31

    申请人： Johannes Jacobus Matheus Baselmans ,  Patricius Aloysius Jacobus Tinnemans

    发明人： Johannes Jacobus Matheus Baselmans ,  Patricius Aloysius Jacobus Tinnemans

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70291 ,  G03F7/70283

    摘要： A system and method are used to independently control multiple parameters of a patterned beam. This can be performed using a patterning device configured to pattern a beam of radiation comprising a controller and an array of stepped mirrors. The array comprises a plurality of sets of four of the stepped mirrors that are controlled with respect to each other. Adjacent ones of the stepped mirrors in each of the sets have perpendicular axes of rotation and perpendicular steps. In one example, the patterning device is used to patterned the beam of radiation, which patterned beam is projected onto an object. For example, the object can be a substrate (e.g., semiconductor substrate or flat panel display substrate) or a display device.

    摘要翻译： 系统和方法用于独立控制图案化束的多个参数。 这可以使用构造成对包括控制器和阶梯式反射镜阵列的辐射束进行图案化的图案形成装置来执行。 阵列包括相对于彼此控制的多组四个阶梯式反射镜组。 每组中相邻的阶梯式反射镜具有垂直的旋转轴线和垂直方向的轴线。 在一个示例中，图案形成装置用于对辐射束进行图案化，该图案束被投影到物体上。 例如，该物体可以是基板（例如，半导体基板或平板显示基板）或显示装置。

    Lithographic Apparatus and Device Manufacturing Method Utilizing a Multiple Dictionary Compression Method for FPD
    52.
    发明申请
    Lithographic Apparatus and Device Manufacturing Method Utilizing a Multiple Dictionary Compression Method for FPD 有权
    利用FPD多字典压缩方法的平版印刷设备和器件制造方法

    公开(公告)号：US20090324111A1

    公开(公告)日：2009-12-31

    申请号：US12554083

    申请日：2009-09-04

    申请人： Lambertus Gerardus Maria KESSELS ,  Patricius Aloysius Jacobus Tinnemans ,  Remco Johannes Van Engelen

    发明人： Lambertus Gerardus Maria KESSELS ,  Patricius Aloysius Jacobus Tinnemans ,  Remco Johannes Van Engelen

    IPC分类号： G06K9/36

    CPC分类号： G03F7/70291 ,  G03F7/70508

    摘要： A system is provided that includes a device having an emissive portion, a memory, and a dictionary decompressor. The device having an emissive portion is configured to produce a patterned beam. The memory is configured to store a compressed representation of a requested dose pattern, comprising two groups of repeating pattern features, to be formed on a surface by the patterned beam. The dictionary decompressor at least partially decompresses the compressed representation. The dictionary decompressor comprises a first dictionary memory configured to store pattern data corresponding to a first group of the two groups of repeating pattern features and a second dictionary memory configured to store pattern data corresponding to a second group of the two groups of repeating pattern features. The repeating pattern features in the first group have one or more differing characteristics than the repeating pattern features in the second group. Related methods are also provided.

    摘要翻译： 提供一种包括具有发射部分的设备，存储器和字典解压缩器的系统。 具有发射部分的装置被配置为产生图案化的束。 存储器被配置为存储要由图案化的波束在表面上形成的包括两组重复图案特征的所请求的剂量图案的压缩表示。 字典解压缩器至少部分地解压缩压缩表示。 字典解压缩器包括第一字典存储器，其被配置为存储对应于两组重复图案特征的第一组的图案数据，以及第二字典存储器，其被配置为存储对应于两组重复图案特征的第二组的图案数据。 第一组中的重复图案特征具有与第二组中的重复图案特征相比具有一个或多个不同的特征。 还提供了相关方法。

    Lithographic Apparatus and Device Manufacturing Method Utilizing Data Filtering
    53.
    发明申请
    Lithographic Apparatus and Device Manufacturing Method Utilizing Data Filtering 有权
    利用数据过滤的平版印刷设备和器件制造方法

    公开(公告)号：US20090011345A1

    公开(公告)日：2009-01-08

    申请号：US12166837

    申请日：2008-07-02

    申请人： Patricius Aloysius Jacobus Tinnemans ,  Johannes Jacobus Matheus Baselmans

    发明人： Patricius Aloysius Jacobus Tinnemans ,  Johannes Jacobus Matheus Baselmans

    IPC分类号： G03F7/00 ,  G03F7/20 ,  G03B27/42

    CPC分类号： G03F7/70191 ,  G03F7/70291 ,  G03F7/70433 ,  G03F7/70508

    摘要： An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.

    摘要翻译： 使用装置和方法在基板上形成图案。 该装置包括投影系统，图案形成装置，低通滤波器和数据操作装置。 投影系统将辐射束投射到基板上作为子光束阵列。 图案形成装置调制子光束以在衬底上基本上产生所要求的剂量图案。 低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。 数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。 在各种示例中，也可以使用过滤器。

    Altering pattern data based on measured optical element characteristics
    54.
    发明申请
    Altering pattern data based on measured optical element characteristics 有权
    基于测量的光学元件特性改变图案数据

    公开(公告)号：US20070291240A1

    公开(公告)日：2007-12-20

    申请号：US11454803

    申请日：2006-06-19

    申请人： Jason D. Hintersteiner ,  Wenceslao A. Cebuhar ,  Patricius Aloysius Jacobus Tinnemans

    发明人： Jason D. Hintersteiner ,  Wenceslao A. Cebuhar ,  Patricius Aloysius Jacobus Tinnemans

    IPC分类号： G03B27/68

    CPC分类号： G03B27/68 ,  G03B27/42 ,  G03F7/70291 ,  G03F7/706

    摘要： A system and method are used to compensate for distortions or aberrations in an image formed in a projection system. Pattern data is generated corresponding to features to be formed on a substrate. At least one of aberrations and distortions of a projection optical system are measured. The pattern data is altered based on the measuring step. The altered pattern data is transmitted to a patterning device to control individually controllable elements coupled to the patterning device. Non uniformities in one or both of a field and pupil of an illumination system can also be measured and used to alter the pattern data.

    摘要翻译： 使用系统和方法来补偿在投影系统中形成的图像中的失真或像差。 对应于要在基板上形成的特征产生图案数据。 测量投影光学系统的像差和失真中的至少一个。 基于测量步骤改变图案数据。 改变的图案数据被传送到图案形成装置，以控制耦合到图案形成装置的单独可控元件。 照明系统的场和光瞳的一个或两个中的非均匀性也可以被测量并用于改变图案数据。

    Lithographic apparatus and device manufacturing method
    60.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US08233135B2

    公开(公告)日：2012-07-31

    申请号：US12349642

    申请日：2009-01-07

    申请人： Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Jan-Gerard Cornelis Van Der Toorn

    发明人： Hans Jansen ,  Patricius Aloysius Jacobus Tinnemans ,  Jan-Gerard Cornelis Van Der Toorn

    IPC分类号： G03B27/52 ,  G03B27/42

    CPC分类号： G03F7/70341

    摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface for liquid supplied by the liquid supply system in place of the substrate; and a closing surface positioning device configured to create and maintain a gap between the liquid supply system and the closing surface so that the liquid flows in the gap when the closing surface is used to confine the liquid supplied by the liquid supply system.

    摘要翻译： 光刻设备包括：投影系统，被配置为将图案化的辐射束投影到由衬底台支撑的衬底上; 液体供应系统，被配置为用液体在所述投影系统和所述基板之间提供空间; 闭合表面，其构造成为由液体供应系统提供的液体提供代替基底的液体的限制表面; 以及封闭面定位装置，其构造成在所述液体供应系统和所述封闭表面之间产生并保持间隙，使得当所述封闭表面用于限制由所述液体供应系统供应的液体时，所述液体在所述间隙中流动。