公开(公告)号：US10509315B2

公开(公告)日：2019-12-17

申请号：US16377714

申请日：2019-04-08

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： William Williams, III ,  Emad Aqad ,  James F. Cameron

IPC: G03F7/004 ,  C07C255/31 ,  C07C25/18 ,  C07C381/12 ,  C07C255/24 ,  C07C255/34 ,  G03F7/039

Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.

公开(公告)号：US20190243239A1

公开(公告)日：2019-08-08

申请号：US16377714

申请日：2019-04-08

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： William Williams, III ,  Emad Aqad ,  James F. Cameron

IPC: G03F7/004 ,  C07C255/24 ,  C07C25/18 ,  C07C255/34 ,  C07C255/31 ,  C07C381/12 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C25/18 ,  C07C255/24 ,  C07C255/31 ,  C07C255/34 ,  C07C381/12 ,  C07C2602/08 ,  C07C2603/74 ,  G03F7/0397

Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.

公开(公告)号：US20190163058A1

公开(公告)日：2019-05-30

申请号：US16204839

申请日：2018-11-29

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  James F. Cameron ,  James W. Thackeray

IPC: G03F7/004 ,  C07F11/00 ,  C07C309/10 ,  C07C309/19 ,  C07C62/06 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26

Abstract: New Te-salt compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.

公开(公告)号：US10088749B2

公开(公告)日：2018-10-02

申请号：US15281292

申请日：2016-09-30

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad

IPC: G03F7/004 ,  G03F7/30 ,  C08F228/02 ,  C08F228/06 ,  C07D333/74 ,  C07C309/02 ,  C07C309/06 ,  C07C309/12 ,  C07C309/14 ,  C07C309/22 ,  C07C309/23 ,  C07C309/19 ,  C08F220/68 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  C07C303/32 ,  C07C309/04

Abstract: A photoacid-generating compound has the structure wherein m, n, R1, R2, X, Y, and Z− are defined herein. The photoacid-generating compound exhibits strong absorption and chemical sensitivity to extreme ultraviolet radiation, while also absorbing longer wavelengths with desirably reduced chemical sensitivity. Also described are a polymer incorporating the residue of a polymerizable version of the photoacid-generating compound, a photoresist composition that includes the photoacid-generating compound, the polymer, or a combination thereof, and a method of forming a photoresist relief image using the photoresist composition.

公开(公告)号：US20180095363A1

公开(公告)日：2018-04-05

申请号：US15281292

申请日：2016-09-30

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad

IPC: G03F7/004 ,  C07D333/74 ,  C07C309/06 ,  C07C309/19 ,  C08F220/68 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40

CPC classification number: G03F7/0045 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07C309/14 ,  C07C309/19 ,  C07C309/22 ,  C07C309/23 ,  C07D333/74 ,  C08F220/68 ,  C08F228/02 ,  C08F228/06 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/2004 ,  G03F7/30 ,  G03F7/322 ,  G03F7/40

Abstract: A photoacid-generating compound has the structure wherein m, n, R1, R2, X, Y, and Z− are defined herein. The photoacid-generating compound exhibits strong absorption and chemical sensitivity to extreme ultraviolet radiation, while also absorbing longer wavelengths with desirably reduced chemical sensitivity. Also described are a polymer incorporating the residue of a polymerizable version of the photoacid-generating compound, a photoresist composition that includes the photoacid-generating compound, the polymer, or a combination thereof, and a method of forming a photoresist relief image using the photoresist composition.

公开(公告)号：US09921475B1

公开(公告)日：2018-03-20

申请号：US15252522

申请日：2016-08-31

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  William Williams, III ,  Cong Liu

IPC: G03F7/004 ,  G03F7/38 ,  C07C69/753 ,  C07C303/32 ,  C07C309/00 ,  C07C309/12 ,  C08F218/14 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  C07C321/30 ,  G03F7/30 ,  C08F232/08

CPC classification number: G03F7/0045 ,  C07C69/753 ,  C07C303/32 ,  C07C309/00 ,  C07C309/12 ,  C07C381/12 ,  C07C2102/42 ,  C07C2103/74 ,  C07C2602/42 ,  C07C2603/74 ,  C07D303/40 ,  C07D317/34 ,  C07D317/72 ,  C07D327/08 ,  C07D333/76 ,  C07D335/16 ,  C07D339/08 ,  C07D409/12 ,  C07D493/18 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/30 ,  G03F7/38

Abstract: A photoacid-generating compound has the structure where R1, R2, R3, R4, Q, and X are defined herein. The photoacid-generating compound can be used as a component of a photoresist composition, or as a monomer incorporated into a polymer useful in a photoresist composition. The photoacid-generating compound provides a desired balance of solubility and line width roughness.

公开(公告)号：US20170285470A1

公开(公告)日：2017-10-05

申请号：US15614376

申请日：2017-06-05

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  Mingqi Li ,  Joseph Mattia ,  Cheng-Bai Xu

IPC: G03F7/004 ,  C07J31/00 ,  C07C381/12

Abstract: New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.

公开(公告)号：US20160016872A1

公开(公告)日：2016-01-21

申请号：US14792968

申请日：2015-07-07

Applicant: Rohm and Haas Electronic Materials LLC ,  Rohm and Haas Electronic Materials Korea Ltd.

Inventor： Emad Aqad ,  Mingqi Li ,  Shintaro Yamada ,  Sung Wook Cho

IPC: C07C39/15 ,  C08G12/34 ,  C08G8/04 ,  C07C39/23 ,  G03F7/32 ,  C09D161/06 ,  C09D161/26 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20 ,  C08G8/10 ,  C07D213/16

CPC classification number: G03F7/094 ,  C07C39/14 ,  C07C39/17 ,  C07C2603/18 ,  C07C2603/24 ,  C07C2603/40 ,  C07C2603/42 ,  C07C2603/50 ,  C07C2603/52 ,  C07D213/16 ,  C08G8/04 ,  C08G8/08 ,  C08G8/10 ,  C08G12/08 ,  C08G12/26 ,  C08G12/34 ,  C09D161/06 ,  C09D161/22 ,  C09D161/26 ,  G03F7/091 ,  G03F7/30 ,  G03F7/36

Abstract: Polymeric reaction products of certain substituted tetraarylmethane monomers are useful as underlayers in semiconductor manufacturing processes.

Abstract translation: 某些取代的四芳基甲烷单体的聚合反应产物可用作半导体制造工艺中的底层。

公开(公告)号：US09110369B2

公开(公告)日：2015-08-18

申请号：US13925926

申请日：2013-06-25

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  Irvinder Kaur ,  Cong Liu ,  Cheng-bai Xu ,  Mingqi Li ,  Gregory P. Prokopowicz

IPC: G03F7/004 ,  C07C309/06 ,  C07C309/07 ,  G03F7/20 ,  G03F7/039

CPC classification number: G03F7/004 ,  G03F7/0045 ,  G03F7/0395 ,  G03F7/20

Abstract: A photoacid generator has the formula (I): wherein R1, R2, R3, L1, L2, L3 X, Z+, a, b, c, d, p, q, and r, are defined herein. A photoresist comprises the photoacid generator, and a coated article comprises the photoresist. The photoresist can be used to form an electronic device.

Abstract translation: 光酸产生剂具有式（I）：其中R1，R2，R3，L1，L2，L3X，Z +，a，b，c，d，p，q和r在本文中定义。 光致抗蚀剂包括光致酸产生剂，并且涂覆制品包括光致抗蚀剂。 光致抗蚀剂可用于形成电子器件。

公开(公告)号：US08956799B2

公开(公告)日：2015-02-17

申请号：US13711679

申请日：2012-12-12

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  Cheng-Bai Xu ,  Mingqi Li ,  William Williams, III

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/09

CPC classification number: C07D493/18 ,  G03F7/0045 ,  G03F7/027 ,  G03F7/0392

Abstract: A photoacid generator includes those of formula (I): wherein each Ra in formula 1 is independently H, F, a C1-10 nonfluorinated organic group, C1-10 fluorinated organic group, or a combination comprising at least one of the foregoing, provided at least one Ra is F or a C1-10 fluorinated organic group, the C1-10 fluorinated and nonfluorinated organic groups each optionally comprising O, S, N, or a combination comprising at least one of the foregoing heteroatoms; L1 is a linking group comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing; G+ is an onium salt of the formula (II): wherein in formula (II), X is S or I, each R0 is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination comprising at least one of the foregoing, provided at least one R0 is substituted where each R0 is a C6 monocyclic aryl group, and wherein when X is I, a is 2, and where X is S, a is 3, p is 0 or 1, and q is an integer of from 1 to 10.

Abstract translation: 一种光酸产生剂包括式（I）的那些：其中式1中的每个Ra独立地是H，F，C 1-10非氟化有机基团，C 1-10氟化有机基团或包含至少一个前述的组合， 至少一个R a为F或C 1-10氟化有机基团，所述C 1-10氟化和非氟化有机基团各自任选包含O，S，N或包含至少一个前述杂原子的组合; L 1是包含O，S，N，F的杂原子的连接基团，或包含前述的至少一种的组合; G +是式（II）的鎓盐：其中在式（II）中，X是S或I，每个R 10独立地是C 1-30烷基; 多环或单环C 3-30环烷基; 多环或单环C 4-30芳基; 或包含前述的至少一种的组合，只要至少一个R 0被取代，其中每个R 0是C 6单环芳基，其中当X是I时，a是2，并且其中X是S，a是3，p 为0或1，q为1至10的整数。