公开(公告)号：US20050197903A1

公开(公告)日：2005-09-08

申请号：US11031766

申请日：2005-01-07

申请人： Daniel Hoffman ,  Michael Sutch ,  Jamie O'Keefe ,  William Rehm

发明人： Daniel Hoffman ,  Michael Sutch ,  Jamie O'Keefe ,  William Rehm

IPC分类号： H04L12/16 ,  G06F17/60

CPC分类号： G06Q30/02 ,  G06F19/3456 ,  G06Q50/22

摘要： The present invention improves upon tools of the prior art by enabling a user of such a tool to have alerts sent to an electronic “desktop” of multiple devices, such as a computer screen, the display of a Personal Digital Assistant (PDA) or cell phone, pagers and the like. Further, in accordance with the present invention, the user of the tool is solicited to provide information back to the tool. This interactive aspect can take on many forms and can be used for marketing and or and/or medical research, and can also be used to give the user positive reinforcement for compliant behavior; for example, when the user takes the appropriate dosage of a medication at the appropriate time, the tool's graphics could respond by displaying a positive graphic such as a smiling face. Failure to properly follow a medication regimen could result in the display of a negative graphic, such as a said face.

摘要翻译： 本发明通过使这种工具的用户能够将警报发送到多个设备的电子“桌面”，诸如计算机屏幕，个人数字助理（PDA）或单元的显示器，从而改进了现有技术的工具 电话，寻呼机等。 此外，根据本发明，请求工具的用户向工具提供信息。 这种互动方面可以采取多种形式，可用于营销和/或医疗研究，也可用于为用户提供符合行为的积极强化; 例如，当用户在适当的时间采取适当剂量的药物时，工具的图形可以通过显示正面图形（例如笑脸）来做出响应。 不能正确地遵循药物治疗方案可能导致显示阴性图形，例如所述面部。

公开(公告)号：US08489926B2

公开(公告)日：2013-07-16

申请号：US13411379

申请日：2012-03-02

申请人： Nathan John Walter Kube ,  Daniel Hoffman ,  Kevin Yoo

发明人： Nathan John Walter Kube ,  Daniel Hoffman ,  Kevin Yoo

IPC分类号： G06F11/00

CPC分类号： G06F11/263 ,  G06F11/3684

摘要： The present disclosure generally relates to the testing of a system that includes software or hardware components. In some embodiments, a testing framework generates a set of test cases for a system under test using a grammar. Each test case may perform an action, such as provide an input to the system under test, and result in an output from the system under test. The inputs and outputs are then compared to the expected results to determine whether the system under test is performing correctly. Prior to generating the set of test cases from the grammar, the testing framework processes the grammar to identify attributes of the test cases to be derived from the grammar and facilitates the modification of the grammar.

公开(公告)号：US08311772B2

公开(公告)日：2012-11-13

申请号：US12643342

申请日：2009-12-21

申请人： Daniel Hoffman

发明人： Daniel Hoffman

IPC分类号： G06F17/18

CPC分类号： G06F17/18 ,  G06K9/6284 ,  G06K9/6298

摘要： Apparatus, systems, and methods may operate to acquire an original data set comprising a series of data points having an independent portion and a dependent portion, the dependent portion representing a measure of device performance that depends on at least one device characteristic represented by the independent portion. Additional activity may include identifying outlier data points in the series by determining, in comparison with all other members of the series, whether the outlier data points conform to a known trend of the series; transforming the original data set into a transformed data set by removing the outlier data points from the series; and publishing the transformed data set. Other apparatus, systems, and methods are disclosed.

摘要翻译： 装置，系统和方法可以操作以获取包括具有独立部分和从属部分的一系列数据点的原始数据集，从属部分表示取决于由独立部分和从属部分表示的至少一个设备特性的设备性能的度量 一部分。 附加活动可以包括通过与所述系列的所有其他成员相比较来确定异常值数据点是否符合该系列的已知趋势，来识别该系列中的离群数据点; 通过从该系列中去除异常数据点将原始数据集变换为变换数据集; 并发布转换后的数据集。 公开了其他装置，系统和方法。

公开(公告)号：US20100221583A1

公开(公告)日：2010-09-02

申请号：US12703897

申请日：2010-02-11

申请人： Majeed A. Foad ,  Jacob Newman ,  Jose Antonio Marin ,  Daniel Hoffman ,  Stephen Moffatt ,  Steven Verhaverbeke

发明人： Majeed A. Foad ,  Jacob Newman ,  Jose Antonio Marin ,  Daniel Hoffman ,  Stephen Moffatt ,  Steven Verhaverbeke

IPC分类号： G11B5/82 ,  C23C16/44 ,  C23C16/04

CPC分类号： G11B5/82 ,  C23C14/48 ,  C23C14/50 ,  C23C16/00 ,  C23F1/00 ,  G11B5/84 ,  G11B5/855 ,  H01L21/673 ,  H01L21/677 ,  H01L21/687

摘要： Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on a substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective layer and a lubricant layer are deposited over the patterned magnetic layer. The patterning is accomplished through a number of processes that expose substrates to energy of varying forms. Apparatus and methods disclosed herein enable processing of two major surfaces of a substrate simultaneously, or sequentially by flipping. In some embodiments, magnetic properties of the substrate surface may be uniformly altered by plasma exposure and then selectively restored by exposure to patterned energy.

摘要翻译： 提供了用于形成具有磁性图案化表面的基底的方法和设备。 在基板上形成包含一种或多种具有磁性的材料的磁性层。 对磁性层进行图案化处理，其中磁性层的表面的选定部分被改变，使得改变的部分与未改变的部分具有不同的磁性，而不改变衬底的形貌。 在图案化的磁性层上沉积保护层和润滑剂层。 图案化通过使衬底暴露于不同形式的能量的许多工艺来完成。 本文公开的装置和方法能够同时或顺序地翻转来处理衬底的两个主表面。 在一些实施例中，衬底表面的磁特性可以通过等离子体暴露均匀地改变，然后通过暴露于图案化能量选择性地恢复。

公开(公告)号：US20090277874A1

公开(公告)日：2009-11-12

申请号：US12433465

申请日：2009-04-30

申请人： Ying Rui ,  Imad Yousif ,  Daniel Hoffman

发明人： Ying Rui ,  Imad Yousif ,  Daniel Hoffman

IPC分类号： B44C1/22 ,  C23F1/08

CPC分类号： H01J37/3266 ,  G03F7/427 ,  H01J37/32357 ,  H01J37/32495 ,  H01L21/02057 ,  H01L21/0206 ,  H01L21/02087 ,  H01L21/0209 ,  H01L21/31138 ,  H01L21/67207

摘要： A method and an apparatus for removing polymer from a substrate are provided. In one embodiment, an apparatus utilized to remove polymer from a substrate includes a processing chamber having a chamber wall and a chamber lid defining a process volume, a substrate support assembly disposed in the processing chamber, a remote plasma source coupled to the processing chamber through an outlet port formed through the processing chamber, the outlet port having an opening pointing toward an periphery region of a substrate disposed on the substrate support assembly, and a substrate supporting surface of the substrate support assembly that substantially electrically floats the substrate disposed thereon relative to the substrate support assembly.

摘要翻译： 提供了从基板上除去聚合物的方法和装置。 在一个实施方案中，用于从基材中除去聚合物的装置包括处理室，其具有室壁和限定处理体积的室盖，设置在处理室中的基板支撑组件，远程等离子体源，其通过 通过处理室形成的出口，所述出口具有指向设置在所述基板支撑组件上的基板的周边区域的开口，以及所述基板支撑组件的基板支撑表面，所述基板支撑表面基本上电漂浮相对于 基板支撑组件。

公开(公告)号：US20090249121A1

公开(公告)日：2009-10-01

申请号：US12395235

申请日：2009-02-27

申请人： Nathan John Walter Kube ,  Daniel Hoffman ,  Kevin Yoo

发明人： Nathan John Walter Kube ,  Daniel Hoffman ,  Kevin Yoo

IPC分类号： G06F11/263

CPC分类号： G06F11/263 ,  G06F11/3684

摘要： The present disclosure generally relates to the testing of a system that includes software or hardware components. In some embodiments, a testing framework generates a set of test cases for a system under test using a grammar. Each test case may perform an action, such as provide an input to the system under test, and result in an output from the system under test. The inputs and outputs are then compared to the expected results to determine whether the system under test is performing correctly. Prior to generating the set of test cases from the grammar, the testing framework processes the grammar to identify attributes of the test cases to be derived from the grammar and facilitates the modification of the grammar.

摘要翻译： 本公开通常涉及包括软件或硬件组件的系统的测试。 在一些实施例中，测试框架使用语法为被测系统生成一组测试用例。 每个测试用例可以执行一个操作，例如向被测系统提供输入，并产生被测系统的输出。 然后将输入和输出与预期结果进行比较，以确定被测系统是否正确执行。 在从语法生成一组测试用例之前，测试框架处理语法，以识别从语法导出的测试用例的属性，并有助于语法的修改。

公开(公告)号：US20070254483A1

公开(公告)日：2007-11-01

申请号：US11413900

申请日：2006-04-28

申请人： Kallol Bera ,  Xiaoye Zhao ,  Kenny Doan ,  Ezra Gold ,  Paul Brillhart ,  Bruno Geoffrion ,  Bryan Pu ,  Daniel Hoffman

发明人： Kallol Bera ,  Xiaoye Zhao ,  Kenny Doan ,  Ezra Gold ,  Paul Brillhart ,  Bruno Geoffrion ,  Bryan Pu ,  Daniel Hoffman

IPC分类号： C23F1/00 ,  H01L21/302

CPC分类号： H01L21/31116 ,  H01J37/3244 ,  H01J37/32449 ,  H01J2237/334 ,  H01L21/67069

摘要： A plasma etch process for etching high aspect ratio openings in a dielectric film on a workpiece is carried out in a reactor having a ceiling electrode overlying the workpiece and an electrostatic chuck supporting the workpiece. The process includes injecting a polymerizing etch process gas through at least one of plural concentric gas injection zones of the ceiling electrode and injecting an inert diluent gas through at least a selected one of the plural gas injection zones of the ceiling electrode and apportioning respective flow rates of the diluent gas through respective ones of the gas injection zones in accordance with the distribution among corresponding concentric zones of the workpiece of etch profile tapering. The process further includes evacuating gas from the reactor through a pumping annulus surrounding an edge of the workpiece, and etching the high aspect ratio openings in the dielectric film with etch species derived from the etch process gas while depositing a polymer derived from the etch process gas onto the workpiece, by generating a plasma in the reactor.

摘要翻译： 用于蚀刻工件上的电介质膜中的高纵横比开口的等离子体蚀刻工艺在具有覆盖工件的顶部电极的反应器和支撑工件的静电卡盘上进行。 该方法包括将聚合蚀刻工艺气体注入到天花板电极的多个同心气体注入区域中的至少一个中，并且通过天花板电极的多个气体注入区域中的至少一个选择惰性稀释气体并分配各自的流量 根据蚀刻轮廓渐缩的工件的相应同心区域之间的分布，通过相应的气体注入区域的稀释气体。 该方法还包括通过围绕工件边缘的泵送环空将气体从反应器排出，以及用蚀刻工艺气体衍生的蚀刻物质蚀刻电介质膜中的高纵横比开口，同时沉积衍生自蚀刻工艺气体的聚合物 通过在反应器中产生等离子体而在工件上。

公开(公告)号：US20070251918A1

公开(公告)日：2007-11-01

申请号：US11414017

申请日：2006-04-28

申请人： Kallol Bera ,  Xiaoye Zhao ,  Kenny Doan ,  Ezra Gold ,  Paul Brillhart ,  Bruno Geoffrion ,  Bryan Pu ,  Daniel Hoffman

发明人： Kallol Bera ,  Xiaoye Zhao ,  Kenny Doan ,  Ezra Gold ,  Paul Brillhart ,  Bruno Geoffrion ,  Bryan Pu ,  Daniel Hoffman

IPC分类号： C03C25/68 ,  C23F1/00

CPC分类号： H01L21/31116 ,  H01J37/321 ,  H01J37/32449

摘要： A plasma etch process for etching a workpiece is carried out in a plasma reactor having a ceiling electrode overlying the process region with plural concentric gas injection zones. The process includes injecting process gases with different compositions of chemical species through different ones of the gas injection zones to establish a distribution of chemical species among the plural gas injection zones. The process gases include fluorine-rich polymerizing etch gases that promote a high etch rate, carbon-rich polymerizing etch gases that promote a high polymer deposition rate, polymer management gases (e.g., oxygen or nitrogen) that retard polymer deposition rate and an inert diluent gas that reduces etch profile tapering. The method further includes distributing the processes gases among the plural gas injection zone so that (a) the fluorine-rich etch process gases have the highest flow rate over zones of the workpiece tending to have the lowest etch rate, (b) the carbon-rich etch process gases have the highest flow rate over zones of the workpiece tending to have the highest etch rate, (c) the polymer management gases have the highest flow rate over zones of the workpiece tending to have the highest tendency for etch stop, (d) the inert diluent gas has the highest flow rate over zones of the workpiece tending to have the greatest etch profile tapering.

摘要翻译： 用于蚀刻工件的等离子体蚀刻工艺在具有覆盖具有多个同心气体注入区的工艺区域的顶板电极的等离子体反应器中进行。 该方法包括通过不同的气体注入区注入具有不同组成的化学物质的工艺气体，以建立多个气体注入区域之间的化学物质分布。 工艺气体包括富含氟的聚合蚀刻气体，其促进高蚀刻速率，促进高聚合物沉积速率的富碳聚合蚀刻气体，阻止聚合物沉积速率的聚合物管理气体（例如氧气或氮气）和惰性稀释剂 减少蚀刻轮廓渐缩的气体。 该方法还包括在多个气体注入区域之间分配工艺气体，使得（a）富氟蚀刻工艺气体在工件区域上具有最高的流速，倾向于具有最低的蚀刻速率，（b）碳 - 丰富的蚀刻工艺气体在工件区域上具有最高的流速，倾向于具有最高的蚀刻速率，（c）聚合物管理气体在工件区域上具有最高的流速，倾向于具有蚀刻停止的最高趋势（ d）惰性稀释气体在工件区域上具有最高的流速，倾向于具有最大的蚀刻轮廓渐缩。

公开(公告)号：US20070091540A1

公开(公告)日：2007-04-26

申请号：US11409184

申请日：2006-04-21

申请人： Paul Brillhart ,  Richard Fovell ,  Douglas Buchberger ,  Douglas Burns ,  Kallol Bera ,  Daniel Hoffman

发明人： Paul Brillhart ,  Richard Fovell ,  Douglas Buchberger ,  Douglas Burns ,  Kallol Bera ,  Daniel Hoffman

IPC分类号： H01T23/00

CPC分类号： H01L21/67248 ,  F25B49/02 ,  F25B2400/0401 ,  F25B2400/0403 ,  F25B2400/0411 ,  F25B2700/21174 ,  F25B2700/21175 ,  H01J37/32091 ,  H01J37/32183 ,  H01J37/32724 ,  H01J2237/2001 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831 ,  H05H2001/4682

摘要： A method of processing a workpiece in a plasma reactor having an electrostatic chuck for supporting the workpiece within a reactor chamber, the method including circulating a coolant through a refrigeration loop that includes inner and outer zone evaporators inside respective inner and outer zones of the electrostatic chuck, while pressurizing inner and outer zones of a workpiece-to-chuck interface with a thermally conductive gas, and sensing conditions in the chamber including inner and outer zone temperatures near the workpiece. The method further includes obtaining the next scheduled change in RF heat load on the workpiece and using thermal modeling to estimate respective changes in thermal conditions of the coolant in the inner and outer zone evaporators, respectively, that would hold temperatures measured in the inner and outer electrostatic chuck zones, respectively, nearly constant by compensating for the next scheduled change in RF heat load, and making the respective changes in thermal conditions of the coolant in inner and outer zone evaporators prior to the time of the next scheduled change by a head start related to the thermal propagation delay through the electrostatic chuck.

摘要翻译： 一种在等离子体反应器中处理工件的方法，所述等离子体反应器具有用于在反应室内支撑工件的静电卡盘，所述方法包括使冷却剂循环通过制冷回路，所述制冷回路在静电吸盘的内部和外部区域内包括内部和外部区域蒸发器 同时用导热气体对工件 - 卡盘界面的内部和外部区域加压，以及感测室中包括工件附近的内部和外部区域温度的条件。 该方法还包括获得工件上的RF热负荷的下一个预定的改变，并且使用热模型来分别估计在内部和外部区域蒸发器中的冷却剂的热条件的各自变化，其将保持在内部和外部测量的温度 通过补偿下一个预定的RF热负荷变化，分别使静电吸盘区域几乎恒定，并且在下一次预定的改变时间之前通过头部开始使得内部和外部区域蒸发器中的冷却剂的热条件的各自变化 与通过静电卡盘的热传播延迟有关。

公开(公告)号：US20070091538A1

公开(公告)日：2007-04-26

申请号：US11408567

申请日：2006-04-21

申请人： Douglas Buchberger ,  Paul Brillhart ,  Richard Fovell ,  Hamid Tavassoli ,  Douglas Burns ,  Kallol Bera ,  Daniel Hoffman

发明人： Douglas Buchberger ,  Paul Brillhart ,  Richard Fovell ,  Hamid Tavassoli ,  Douglas Burns ,  Kallol Bera ,  Daniel Hoffman

IPC分类号： H01T23/00

CPC分类号： H01L21/67248 ,  F25B49/02 ,  F25B2400/0401 ,  F25B2400/0403 ,  F25B2400/0411 ,  F25B2700/21174 ,  F25B2700/21175 ,  H01J37/32091 ,  H01J37/32183 ,  H01J37/32724 ,  H01J2237/2001 ,  H01L21/67069 ,  H01L21/67109 ,  H01L21/6831 ,  H05H2001/4682

摘要： A plasma reactor with a reactor chamber and an electrostatic chuck having a surface for holding a workpiece inside the chamber includes a backside gas pressure source coupled to the electrostatic chuck for applying a thermally conductive gas under a selected pressure into a workpiece-surface interface formed whenever a workpiece is held on the surface, and an evaporator inside the electrostatic chuck and a refrigeration loop having an expansion valve for controlling flow of coolant through the evaporator. The reactor further includes a temperature sensor in the electrostatic chuck, a thermal model capable of simulating heat transfer between the evaporator and the surface based upon measurements from the temperature sensor and an agile control processor coupled to the thermal model and governing the backside gas pressure source in response to predictions from the model of changes in the selected pressure that would bring the temperature measured by the sensor closer to a desired temperature.

摘要翻译： 具有反应室和具有用于将工件保持在腔室内的表面的静电卡盘的等离子体反应器包括耦合到静电卡盘的背侧气体压力源，用于将选定压力下的导热气体施加到每次形成的工件表面界面中 工件被保持在表面上，并且蒸发器位于静电卡盘内部，制冷回路具有用于控制通过蒸发器的冷却剂流动的膨胀阀。 反应器还包括静电吸盘中的温度传感器，能够模拟蒸发器和表面之间的热传递的热模型，其基于来自温度传感器和耦合到热模型的敏捷控制处理器的测量，并控制背侧气体压力源 响应于来自所选压力的变化模型的预测，其将使由传感器测量的温度更接近所需温度。