公开(公告)号：US07582651B2

公开(公告)日：2009-09-01

申请号：US10520784

申请日：2003-07-10

申请人： Takahiro Matsumoto ,  Osamu Kurasawa ,  Tsuneo Oda ,  Hiroshi Nagabukuro ,  Manabu Mochizuki

发明人： Takahiro Matsumoto ,  Osamu Kurasawa ,  Tsuneo Oda ,  Hiroshi Nagabukuro ,  Manabu Mochizuki

IPC分类号： A61K31/44 ,  C07D513/02

CPC分类号： C07D471/04

摘要： A novel pyrrolopyridine derivative which is a compound represented by the formula wherein Ring A represents an optionally substituted pyridine ring; X represents an electron-attracting group; Y represents an optionally substituted divalent C1-6 chain hydrocarbon group; R1 represents an optionally substituted hydrocarbon group; and R2 and R3 each independently represents hydrogen, an optionally substituted hydrocarbon group or an optionally-substituted heterocyclic group, or R2 and R3 may form an optionally substituted ring in cooperation with the adjacent nitrogen atom, or a salt of the compound. The pyrrolopyridine derivative has vanilloid receptor agonist activity and is useful as medicines such as a preventive/therapeutic agent and analgesic for overactive bladder.

摘要翻译： 一种新的吡咯并吡啶衍生物，其为下式表示的化合物：其中环A表示任选取代的吡啶环; X表示吸电子基团; Y表示任选取代的二价C 1-6链烃基; R1表示任选取代的烃基; 并且R 2和R 3各自独立地表示氢，任选取代的烃基或任选取代的杂环基，或者R 2和R 3可以与相邻的氮原子或化合物的盐协合形成任选取代的环。 吡咯并吡啶衍生物具有香草素受体激动剂活性，并且可用作药物，例如预防/治疗剂和膀胱过度活动症的止痛剂。

公开(公告)号：US07528966B2

公开(公告)日：2009-05-05

申请号：US11965868

申请日：2007-12-28

申请人： Takahiro Matsumoto

发明人： Takahiro Matsumoto

IPC分类号： G01B11/14

CPC分类号： G03F9/7026

摘要： The position detection apparatus includes a light projecting optical system which has an optical axis, and which cause two light beams symmetrical about the optical axis to enter a substrate, a light receiving optical system which receives the two light beams which have emerged from the light projecting optical system and are reflected by the substrate, a light receiving unit which is arranged at a position shifted in the optical axis direction, a detection unit which respectively detects the positions of the two light beams which have entered the light receiving unit, and a calculator which calculates the surface position of the substrate in the normal direction based on the positions of the two light beams, which are detected by the detection unit. At least one of the light projecting optical system and the light receiving optical system is shared for the two light beams.

摘要翻译： 位置检测装置包括具有光轴的光投射光学系统，其使得关于光轴对称的两个光束进入基板;受光光学系统，其接收从光投射的两个光束 光学系统，并被基板反射，布置在沿光轴方向偏移的位置的光接收单元，分别检测已经进入光接收单元的两个光束的位置的检测单元和计算器 其基于由检测单元检测到的两个光束的位置来计算基板在法线方向上的表面位置。 光投射光学系统和光接收光学系统中的至少一个被共享用于两个光束。

公开(公告)号：US20080262210A1

公开(公告)日：2008-10-23

申请号：US10557108

申请日：2004-05-13

申请人： Masami Mizu ,  Seiji Shinkai ,  Kazuo Sakurai ,  Kazuya Koumoto ,  Munenori Numata ,  Takahiro Matsumoto

发明人： Masami Mizu ,  Seiji Shinkai ,  Kazuo Sakurai ,  Kazuya Koumoto ,  Munenori Numata ,  Takahiro Matsumoto

IPC分类号： C07H21/00

CPC分类号： A61K9/0019 ,  A61K31/7125 ,  A61K47/36 ,  A61K2039/55561 ,  C08B37/0024

摘要： Disclosed is a new type of immunostimulating agent including an immunostimulating oligonucleotide complexed with a carrier which is safe and has a high transfection effect. The carrier complexed with the immunostimulating oligonucleotide to form the immunostimulating agent is a polysaccharide having β-1,3-bonds (preferably β-1,3-glucan such as schizophyllan). A preferred example of the immunostimulating oligonucleotide is one containing an unmethylated CpG motif. The polysaccharide for use is preferably modified with nucleic acid-binding functional group and/or cell membrane-affinitive functional group.

摘要翻译： 公开了一种新型的免疫刺激剂，其包括与载体复合的免疫刺激寡核苷酸，其是安全的并且具有高的转染效果。 与免疫刺激寡核苷酸复合以形成免疫刺激剂的载体是具有β-1,3-键的多糖（优选β-1,3-葡聚糖如分枝孢子菌素）。 免疫刺激寡核苷酸的优选实例是含有未甲基化CpG基序的寡核苷酸。 所用的多糖优选用核酸结合官能团和/或细胞膜亲和官能团修饰。

公开(公告)号：US20080151258A1

公开(公告)日：2008-06-26

申请号：US11942348

申请日：2007-11-19

申请人： Takahiro Matsumoto ,  Ryo Sasaki

发明人： Takahiro Matsumoto ,  Ryo Sasaki

IPC分类号： G01B9/023

CPC分类号： G01B11/2441 ,  G03F9/7026 ,  G03F9/7034

摘要： A shape measuring method for measuring a surface shape of a measurement target includes dividing light from a light source into measurement light and reference light, the measurement light being obliquely incident upon a surface of the measurement target, the reference light being incident upon a reference mirror, introducing the measurement light reflected by the measurement target and the reference light reflected by the reference mirror to a photoelectric conversion element, detecting interference light formed by the measurement light and the reference light by the photoelectric conversion element while moving the measurement target, and measuring the surface shape of the measurement target based on an interference signal obtained from the measurement light that has been reflected at the same position on the surface of the measurement target.

摘要翻译： 用于测量测量对象的表面形状的形状测量方法包括将来自光源的光分成测量光和参考光，测量光倾斜地入射到测量对象的表面上，参考光入射到参考反射镜 将由测量对象反射的测量光和由参考反射镜反射的参考光引入光电转换元件，在移动测量目标的同时检测由光电转换元件测量的光和参考光形成的干涉光，并测量 基于从已经在测量对象的表面上的相同位置反射的测量光获得的干涉信号来测量目标的表面形状。

公开(公告)号：US07382134B2

公开(公告)日：2008-06-03

申请号：US11305010

申请日：2005-12-19

申请人： Takahiro Matsumoto

发明人： Takahiro Matsumoto

IPC分类号： G01V3/00

CPC分类号： G01R33/3815 ,  G01R33/3806

摘要： In a superconducting magnets for MRI configured to generate a homogeneous magnetic field and a gradient magnetic field in a space between a top superconducting magnet and a bottom superconducting magnet, the bottom superconducting magnet is provided with a supporting member that supports a helium vessel, and the supporting member is fixed to a vacuum vessel of the bottom superconducting magnet at one end, and is fixed to the floor surface in the vicinity of the end fixed to the vacuum vessel. A high-quality MR image can be thus obtained by preventing direct transmission of oscillation of the gradient coils to the superconducting magnet and reducing oscillation of the gradient coils while achieving a reduction of the overall superconducting magnet in size.

摘要翻译： 在用于MRI的超导磁​​体被配置为在顶部超导磁体和底部超导磁体之间的空间中产生均匀的磁场和梯度磁场，底部超导磁体设置有支撑氦容器的支撑构件，并且 支撑构件在一端固定到底部超导磁体的真空容器，并且固定到固定到真空容器的端部附近的地板表面。 因此可以通过防止梯形线圈的振荡直接传递到超导磁体并减小梯度线圈的振荡，同时实现整个超导磁体的尺寸的减小，从而可以获得高质量的MR图像。

公开(公告)号：US07265841B2

公开(公告)日：2007-09-04

申请号：US10872031

申请日：2004-06-18

申请人： Takahiro Matsumoto

发明人： Takahiro Matsumoto

IPC分类号： G01B11/00

CPC分类号： G03F9/7092 ,  G03F9/7046

摘要： A method for calculating a position of an image of an alignment mark formed on an object to be detected includes the steps of obtaining first information indicative of a center position in the alignment mark based on a detection signal, obtaining a waveform characteristic of the detection signal as second information, and correcting the first information based on the second information that has been obtained, and a measurement error of the center position of the alignment mark, which result from an optical system for detecting the alignment mark.

摘要翻译： 用于计算形成在待检测物体上的对准标记的图像的位置的方法包括以下步骤：基于检测信号获得指示对准标记中的中心位置的第一信息，获得检测信号的波形特性 作为第二信息，并且基于获得的第二信息和由用于检测对准标记的光学系统产生的对准标记的中心位置的测量误差来校正第一信息。

公开(公告)号：US20070171392A1

公开(公告)日：2007-07-26

申请号：US11695705

申请日：2007-04-03

申请人： Takahiro Matsumoto

发明人： Takahiro Matsumoto

IPC分类号： G03B27/32

CPC分类号： G03F9/7065 ,  G03B27/52 ,  G03F9/7011

摘要： A wavelength selecting method for selecting a wavelength of light, the light being used to detect a position of a target with a signal from an image of an alignment mark covered with resist, includes the steps of obtaining a reflectance of the resist at a position outside the alignment mark by irradiating lights having plural wavelengths to the resist at the position, and selecting one of the lights which one has a wavelength that provides the maximum value of reflectance among the reflectances measured by the measuring step or which one has a wavelength that falls within a predetermined wave range centering on the wavelength that provide the maximum reflectance.

摘要翻译： 一种用于选择光的波长选择方法，用于利用由抗蚀剂覆盖的对准标记的图像的信号来检测目标的位置的光包括以下步骤：获得外部位置处的抗蚀剂的反射率 该对准标记通过向该位置处的抗蚀剂照射具有多个波长的光，并且选择一个具有提供测量步骤测量的反射率中的最大反射率值的波长的光或者具有下降波长的光 在以提供最大反射率的波长为中心的预定波段内。

公开(公告)号：US07190455B2

公开(公告)日：2007-03-13

申请号：US10762599

申请日：2004-01-21

申请人： Takahiro Matsumoto

发明人： Takahiro Matsumoto

IPC分类号： G01B11/00 ,  G06F17/50

CPC分类号： G03F9/7046

摘要： A method for detecting disposition of plurality of exposure shot areas of an object that is to be exposed includes a first detection step of detecting the alignment marks on the object, an evaluation step of evaluating randomness of the alignment marks based on the detection result by the first detection step, a determination step of determining a number smaller than the total number of alignment marks on the object based on the evaluation result by the evaluation step, and a second detection step of detecting the disposition of the plurality of exposure shot areas by detecting alignment marks corresponding to the number determined by the determination step.

摘要翻译： 一种用于检测要曝光的对象的多个曝光拍摄区域的配置的方法包括：检测对象上的对准标记的第一检测步骤;基于检测结果的对准标记的随机性的评估步骤; 第一检测步骤，基于评估步骤的评估结果确定小于对象上的对齐标记总数的数字的确定步骤;以及第二检测步骤，通过检测多个曝光拍摄区域的配置来检测 对应于由确定步骤确定的数量的对准标记。

公开(公告)号：US07062010B2

公开(公告)日：2006-06-13

申请号：US10183332

申请日：2002-06-25

申请人： Takahiro Matsumoto

发明人： Takahiro Matsumoto

IPC分类号： G21K5/00

CPC分类号： G03F9/703 ,  G03F1/22 ,  G03F1/42 ,  G03F7/7035 ,  G03F9/7038 ,  G03F9/7049 ,  G03F9/7088

摘要： There is provided a method of making a gap between first and second objects have a predetermined value. The method includes steps of introducing light to an entry window on the first object, detecting an intensity of light from an exit window on the first object, the exit window being at such a position that light would enter through the entry window of the first object, reflect on the second object, and then enter the exit window of the first object if the gap has the predetermined value, and positioning the second object, with respect to a direction concerning the gap, based on an intensity of light detected in the detecting step.

摘要翻译： 提供了使第一和第二物体之间的间隙具有预定值的方法。 该方法包括以下步骤：将光引入第一物体上的入口窗口，检测来自第一物体上的出口窗口的光强度，出射窗口处于这样的位置，即光将通过第一物体的入口窗口进入 反映在第二物体上，然后如果间隙具有预定值，则进入第一物体的出射窗口，并且基于在检测中检测到的光的强度相对于关于间隙的方向定位第二物体 步。

公开(公告)号：US20060050274A1

公开(公告)日：2006-03-09

申请号：US11218538

申请日：2005-09-06

申请人： Takahiro Matsumoto ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Satoru Oishi

发明人： Takahiro Matsumoto ,  Hideki Ina ,  Takehiko Suzuki ,  Koichi Sentoku ,  Satoru Oishi

IPC分类号： G01B11/00

CPC分类号： G03F9/7092 ,  G03F7/70633

摘要： An exposure apparatus performs AGA measurement by using a predetermined sample shot group formed on a wafer, and decides an alignment parameter. The exposure apparatus executes wafer alignment processing and exposure processing by using the alignment parameter. The exposure apparatus notifies a central processing unit of AGA measurement results and the alignment parameter. An overlay inspection apparatus measures an actual exposure position on the exposed wafer, and notifies the central processing unit of the measurement result. The central processing unit optimizes alignment processing on the basis of the AGA measurement results, alignment parameter, and actually measured exposure position.

摘要翻译： 曝光装置通过使用形成在晶片上的预定取样组进行AGA测量，并且确定对准参数。 曝光装置通过使用对准参数来执行晶片对准处理和曝光处理。 曝光装置向中央处理单元通知AGA测量结果和对准参数。 覆盖检查装置测量曝光的晶片上的实际曝光位置，并向中央处理单元通知测量结果。 中央处理单元根据AGA测量结果，对准参数和实际测量的曝光位置优化对准处理。