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51.发明授权Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate 失效油墨组合物，喷墨记录方法，印刷材料，平版印刷版的制造方法和平版印刷版公开(公告)号：US07618683B2
公开(公告)日：2009-11-17
申请号：US11649808
申请日：2007-01-05
Applicant: Tomotaka Tsuchimura
Inventor： Tomotaka Tsuchimura
CPC classification number: C09D11/101 , B33Y70/00 , Y10T428/24802
Abstract: An ink composition is provided that includes (A) an acid-generating compound having an anion represented by any one of Formulae (I) to (XI), (B) a cationically polymerizable compound, and (C) a colorant. (In the formulae, R1 to R3 independently denote a monovalent organic group, Rb1 to Rb3, Rf1, and Rf2 independently denote a perfluoroalkyl group, a perfluoroaryl group, or an aryl group substituted with at least one fluorine atom or perfluoroalkyl group, X1 to X3 independently denote a monovalent organic group, and Y1 denotes a hydrogen atom or a monovalent organic group.)
Abstract translation: 提供了一种油墨组合物，其包括（A）具有式（I）至（XI）中任一项所示的阴离子，（B）阳离子聚合性化合物和（C）着色剂）的产酸化合物。 （式中，R 1〜R 3分别独立地表示一价有机基团，R 1b〜R b3，R f1，Rf 2分别独立地表示全氟烷基，全氟芳基或被至少一个氟原子或全氟烷基取代的芳基，X1〜 X3独立地表示一价有机基团，Y1表示氢原子或一价有机基团。）
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52.发明申请Photosensitive Compositions, Curable Compositions, Novel Compounds, Photopolymerizable Compositions, Color Filters, and Planographic Printing Plate Precursors 有权光敏组合物，可固化组合物，新型化合物，可光聚合组合物，滤色器和平版印刷版前体公开(公告)号：US20090023085A1
公开(公告)日：2009-01-22
申请号：US12174883
申请日：2008-07-17
Applicant: Tomotaka Tsuchimura
Inventor： Tomotaka Tsuchimura
IPC: G03F1/00 , C07D209/86 , C07C321/30 , G03F7/004 , C07D239/62 , G03F7/00
CPC classification number: G03F7/031 , B33Y70/00 , G03F7/0007
Abstract: A photosensitive composition includes a compound represented by Formula (I) and a curable composition contains the compound of Formula (I) and a polymerizable compound. A compound is represented by a Formula (1) and a photocurable composition contains the compound of Formula (1) and a polymerizable compound. In Formula (I), R, R1 and R2 each independently represent a hydrogen atom or a monovalent substituent. In Formula (1), R and B each independently represent a monovalent substituent, A represents a divalent organic group, and Ar represents an aryl group.
Abstract translation: 感光性组合物包含由式（I）表示的化合物和含有式（I）的化合物和可聚合化合物的固化性组合物。 化合物由式（1）表示，光固化性组合物含有式（1）的化合物和可聚合化合物。 在式（I）中，R 1，R 2和R 2各自独立地表示氢原子或一价取代基。 在式（1）中，R和B各自独立地表示一价取代基，A表示二价有机基团，Ar表示芳基。
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53.发明授权Polymerizable composition, photopolymerizing method and process for producing lithographic printing plate using the polymerizable composition 失效可聚合组合物，光聚合方法和使用该可聚合组合物生产平版印刷版的方法公开(公告)号：US07306894B2
公开(公告)日：2007-12-11
申请号：US11067250
申请日：2005-02-28
Applicant: Tomotaka Tsuchimura
Inventor： Tomotaka Tsuchimura
Abstract: A polymerizable composition comprising an ethylenic monomer, a photopolymerization initiator and a specific benzotriazole compound or sulfone compound, and a method for producing a lithographic printing plate comprising a step of exposing a light-sensitive layer containing the above-described polymerizable composition on a support with laser light having a wavelength of 450 nm or shorter and a step of treating the exposed light-sensitive layer with a developing solution having a pH of 13.0 or less.
Abstract translation: 包含烯属单体，光聚合引发剂和特定苯并三唑化合物或砜化合物的可聚合组合物和平版印刷版的制备方法，包括将含有上述可聚合组合物的感光层曝光在载体上的步骤， 具有450nm以下的波长的激光以及用pH为13.0以下的显影液处理曝光的感光层的工序。
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54.发明申请Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate 失效油墨组合物，喷墨记录方法，印刷材料，平版印刷版的制造方法和平版印刷版公开(公告)号：US20070160815A1
公开(公告)日：2007-07-12
申请号：US11649808
申请日：2007-01-05
Applicant: Tomotaka Tsuchimura
Inventor： Tomotaka Tsuchimura
CPC classification number: C09D11/101 , B33Y70/00 , Y10T428/24802
Abstract: An ink composition is provided that includes (A) an acid-generating compound having an anion represented by any one of Formulae (I) to (XI), (B) a cationically polymerizable compound, and (C) a colorant. (In the formulae, R1 to R3 independently denote a monovalent organic group, Rb1 to Rb3, Rf1, and Rf2 independently denote a perfluoroalkyl group, a perfluoroaryl group, or an aryl group substituted with at least one fluorine atom or perfluoroalkyl group, X1 to X3 independently denote a monovalent organic group, and Y1 denotes a hydrogen atom or a monovalent organic group.)
Abstract translation: 提供了一种油墨组合物，其包括（A）具有式（I）至（XI）中任一项所示的阴离子，（B）阳离子聚合性化合物和（C）着色剂）的产酸化合物。 （式中，R 1至R 3独立地表示一价有机基团，R b 1至R b 3 Rf 1和Rf 2独立地表示全氟烷基，全氟芳基或被至少一个氟原子或全氟烷基取代的芳基，X“ 1至X 3独立地表示一价有机基团，Y 1表示氢原子或一价有机基团。）
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55.发明申请Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate 有权油墨组合物，喷墨记录方法，印刷材料，平版印刷版的制造方法和平版印刷版公开(公告)号：US20070048506A1
公开(公告)日：2007-03-01
申请号：US11506913
申请日：2006-08-21
Applicant: Tomotaka Tsuchimura
Inventor： Tomotaka Tsuchimura
CPC classification number: G03F7/031 , C09D11/101 , G03F7/029 , G03F7/0755 , Y10T428/24802
Abstract: An ink composition is provided that includes a condensed polycyclic aromatic compound, a polymerization initiator, and a polymerizable compound, and the condensed polycyclic aromatic compound is a compound selected from the group consisting of a compound represented by the formula below, a compound having at least three hydroxy groups, alkoxy groups, and/or aryloxy groups on a condensed polycyclic aromatic ring, and a compound having at least one atom having an atomic weight of 32 or greater bonded to a condensed polycyclic aromatic ring and/or one group bonded to the condensed polycyclic aromatic ring via an atom having an atomic weight of 32 or greater. There are also provided a printed material obtained by employing the ink composition, a process for producing a lithographic printing plate employing the ink composition, and a lithographic printing plate obtained by the production process.
Abstract translation: 提供了一种油墨组合物，其包含缩合多环芳族化合物，聚合引发剂和可聚合化合物，并且所述缩合多环芳族化合物是选自由下式表示的化合物，至少具有下式的化合物 稠合多环芳香环上的三个羟基，烷氧基和/或芳氧基，以及具有至少一个原子量为32以上的原子与稠合多环芳环键合的化合物和/或与 缩合多环芳环通过原子量为32或更大的原子。 还提供了使用油墨组合物获得的印刷材料，使用该油墨组合物的平版印刷版的制造方法和通过该制造方法得到的平版印刷版。
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Patent Agency Ranking
56.发明申请Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate 审中-公开油墨组合物，喷墨记录方法，印刷材料，平版印刷版的制造方法和平版印刷版公开(公告)号：US20060178449A1
公开(公告)日：2006-08-10
申请号：US11346424
申请日：2006-02-03
Applicant: Tomotaka Tsuchimura , Kazuto Shimada
Inventor： Tomotaka Tsuchimura , Kazuto Shimada
IPC: C03C17/00
CPC classification number: C09D11/101
Abstract: An ink composition comprising a triarylsulfonium salt polymerization initiator containing at least one aryl skeleton having an electron attractive group as a substituent, a polymerizable compound, a sensitizing dye, and a colorant.
Abstract translation: 包含含有至少一个具有吸电子基团的芳基骨架作为取代基的三芳基锍盐聚合引发剂，可聚合化合物，增感染料和着色剂的油墨组合物。
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公开(公告)号：US20060024611A1
公开(公告)日：2006-02-02
申请号：US11181857
申请日：2005-07-15
Applicant: Tomotaka Tsuchimura , Keisuke Arimura , Tadahiro Sorori
Inventor： Tomotaka Tsuchimura , Keisuke Arimura , Tadahiro Sorori
IPC: G03C1/492
CPC classification number: G03F7/038 , G03F7/0045 , G03F7/029 , G03F7/031
Abstract: A photosensitive composition comprising: at least one photopolymerization initiator; an N-oxyamide compound represented by formula (1); and a compound of undergoing a reaction by an effect of at least one of a radical and an acid to irreversibly change in its physical or chemical property, wherein X, Y and Z each independently represents a monovalent substituent.
Abstract translation: 一种光敏组合物，其包含：至少一种光聚合引发剂; 由式（1）表示的N-氧酰胺化合物; 以及通过至少一种自由基和酸的作用进行反应的化合物，其物理或化学性质不可逆地改变，其中X，Y和Z各自独立地表示一价取代基。
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公开(公告)号：US06958206B2
公开(公告)日：2005-10-25
申请号：US10359711
申请日：2003-02-07
Applicant: Tomotaka Tsuchimura , Ippei Nakamura , Tadahiro Sorori , Akihiro Endo , Tomoo Murakami
Inventor： Tomotaka Tsuchimura , Ippei Nakamura , Tadahiro Sorori , Akihiro Endo , Tomoo Murakami
CPC classification number: B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41M5/368 , Y10S430/145 , Y10S430/146
Abstract: An image recording material comprising (a) an infrared ray absorber and (b) a polymer to lower a dynamic coefficient of friction to from 0.38 to 0.60, which can undergo image formation upon exposure with infrared laser; or a long-chain alkyl group-containing polymer having a reduction rate of coefficient of friction to a base polymer of from 0.5 to 0.97, the polymer being a copolymer of a long-chain alkyl group-containing monomer having 6 or more carbon atoms and a hydrophilic monomer.
Abstract translation: 一种图像记录材料，包括（a）红外线吸收剂和（b）将动态摩擦系数降至0.38至0.60的聚合物，其可以在用红外激光曝光时进行图像形成; 或具有0.5〜0.97摩尔的摩擦系数的缩合率为0.5〜0.97的长链烷基的聚合物，所述聚合物为具有6个或更多个碳原子的长链烷基单体和 亲水单体。
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59.发明授权Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition 有权光化学射线或辐射敏感性树脂组合物和使用该组合物形成图案的方法公开(公告)号：US08940471B2
公开(公告)日：2015-01-27
申请号：US12895300
申请日：2010-09-30
Applicant: Takeshi Kawabata , Tomotaka Tsuchimura , Takayuki Ito
Inventor： Takeshi Kawabata , Tomotaka Tsuchimura , Takayuki Ito
CPC classification number: G03F7/0045 , G03F7/0046 , G03F7/028 , G03F7/0397 , Y10S430/12 , Y10S430/122 , Y10S430/126
Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound that when exposed to actinic rays or radiation, generates any of acids of general formula (I) below, in which W1 represents an optionally substituted alkylene group, W2 represents a bivalent connecting group, W3 represents an optionally substituted organic group having 15 or more carbon atoms, and Z represents a hydroxyl group or a fluoroalkylsulfonamido group having at least one fluorine atom introduced therein as a substituent.
Abstract translation: 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括当暴露于光化射线或辐射时产生下列通式（I）的任何酸的化合物，其中W 1表示任选取代的亚烷基， W2表示二价连接基团，W3表示具有15个或更多个碳原子的任选取代的有机基团，Z表示其中引入有至少一个氟原子的羟基或氟烷基亚磺酰氨基作为取代基。
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60.发明授权Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks 有权抗蚀剂图案形成方法，抗蚀剂图案，用于有机溶剂显影的可交联负极化学放大抗蚀剂组合物，抗蚀剂膜和抗蚀剂掩模毛坯公开(公告)号：US08889339B2
公开(公告)日：2014-11-18
申请号：US14035484
申请日：2013-09-24
Applicant: Toru Tsuchihashi , Tadateru Yatsuo , Koutarou Takahashi , Tomotaka Tsuchimura
Inventor： Toru Tsuchihashi , Tadateru Yatsuo , Koutarou Takahashi , Tomotaka Tsuchimura
IPC: G03F1/50 , G03F7/20 , G03F7/32 , C08F8/14 , C08F12/24 , C08F212/14 , C08J3/24 , G03F7/038 , G03F7/004
CPC classification number: G03F7/20 , C08F8/14 , C08F12/24 , C08F212/14 , C08J3/24 , C08J2325/18 , G03F1/50 , G03F7/004 , G03F7/0382 , G03F7/325 , Y10S430/143 , C08F212/32
Abstract: A resist pattern forming method contains: in the following order, (1) forming a resist film by using a negative chemical amplification resist composition containing (A) a polymer compound having a repeating unit represented by formula (1) as defined in the specification, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a crosslinking agent capable of crosslinking the polymer compound (A) by an action of an acid; (2) exposing the resist film, so as to form an exposed resist film; and (4) developing the exposed resist film by using a developer containing an organic solvent.
Abstract translation: 抗蚀剂图案形成方法包括：（1）通过使用含有（A）具有如说明书中定义的由式（1）表示的重复单元的高分子化合物的负性化学增幅抗蚀剂组合物形成抗蚀剂膜， （B）能够通过光化射线或辐射照射时能够产生酸的化合物和（C）能够通过酸的作用使高分子化合物（A）交联的交联剂; （2）使抗蚀剂膜曝光，形成曝光的抗蚀剂膜; 和（4）通过使用含有有机溶剂的显影剂显影曝光的抗蚀剂膜。
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