公开(公告)号：US09217919B2

公开(公告)日：2015-12-22

申请号：US13062285

申请日：2009-08-26

Applicant: Hidenori Takahashi ,  Tomotaka Tsuchimura ,  Toru Tsuchihashi ,  Katsuhiro Yamashita ,  Naoyuki Nishikawa

Inventor： Hidenori Takahashi ,  Tomotaka Tsuchimura ,  Toru Tsuchihashi ,  Katsuhiro Yamashita ,  Naoyuki Nishikawa

IPC: G03F7/004 ,  C08F12/20 ,  C08F12/22 ,  C08F12/30 ,  C08F12/32 ,  G03F7/039 ,  C09D125/18

CPC classification number: G03F7/0392 ,  C08F12/20 ,  C08F12/22 ,  C08F12/30 ,  C08F12/32 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  C08F212/14 ,  C08F222/36 ,  C08F212/32 ,  C08F2220/1883

Abstract: A radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition.

Abstract translation: 一种辐射敏感性组合物，其包含具有离子结构位点的部分结构（A）的化合物（P），并且能够在用光化射线或辐射照射时分解以产生酸和部分结构（B），其具有至少一个 酚羟基，羟基的一部分或全部氢原子或各自被能够通过酸的作用而离开的基团保护的基团，其中化合物中包含的部分结构（A）的离子结构位点（ P）是在通过光化射线或辐射照射时能够在化合物（P）中产生酸阴离子的结构; 使用其的图案形成方法; 和用于组合物中的树脂。

公开(公告)号：US08895222B2

公开(公告)日：2014-11-25

申请号：US12729336

申请日：2010-03-23

Applicant: Tomotaka Tsuchimura ,  Hidenori Takahashi ,  Takayuki Ito ,  Takeshi Inasaki ,  Shohei Kataoka

Inventor： Tomotaka Tsuchimura ,  Hidenori Takahashi ,  Takayuki Ito ,  Takeshi Inasaki ,  Shohei Kataoka

IPC: G03F7/004 ,  G03F7/028 ,  G03F7/029 ,  G03F7/039 ,  G03F7/20 ,  C08F224/00

CPC classification number: C08F224/00 ,  C08F12/20 ,  C08F12/22 ,  C08F12/24 ,  C08F12/30 ,  C08F12/32 ,  C08F212/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/029 ,  G03F7/0392 ,  G03F7/2037 ,  Y10S430/122 ,  C08F220/16 ,  C08F212/32 ,  C08F2220/1883 ,  C08F2220/1825

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group.

Abstract translation: 本发明提供一种光活性射线敏感性或辐射敏感性树脂组合物，其包含（P）树脂，该树脂含有（A）具有离子结构部分的重复单元，该离子结构部分能够在照射光化学射线或辐射时在侧链上产生酸性阴离子 ，其中所述离子结构部分的阳离子部分具有酸可分解基团或碱可分解基团。

公开(公告)号：US08808961B2

公开(公告)日：2014-08-19

申请号：US12914762

申请日：2010-10-28

Applicant: Tomotaka Tsuchimura ,  Takeshi Kawabata ,  Takayuki Ito

Inventor： Tomotaka Tsuchimura ,  Takeshi Kawabata ,  Takayuki Ito

IPC: G03F7/00 ,  C07C311/48 ,  C07C311/51 ,  C07C233/00 ,  B41J2/01 ,  C07D317/14 ,  G03F7/038 ,  C07D405/12 ,  C07D317/72 ,  G03F7/039 ,  G03F7/004 ,  C07D317/58 ,  C07D319/06 ,  G03F7/20

CPC classification number: C07D317/14 ,  C07C311/48 ,  C07D317/58 ,  C07D317/72 ,  C07D319/06 ,  C07D405/12 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/2041

Abstract: An embodiment of the composition contains any of compounds of the formula A-LG in which A represents any of residues of general formula (A-1) below and LG represents any of groups that are cleaved to generate acids of the formula A-H when acted on by an acid. The composition further contains at least one of a compound that generates an acid when exposed to actinic rays or radiation and a compound that generates an acid when heated.

Abstract translation: 组合物的一个实施方案包含式A-LG的任何化合物，其中A表示下述通式（A-1）中的任何残基，LG表示当作用时被切割以产生式AH的酸的任何基团 通过酸。 组合物还含有当暴露于光化射线或辐射时产生酸的化合物和加热时产生酸的化合物中的至少一种。

公开(公告)号：US20120244472A1

公开(公告)日：2012-09-27

申请号：US13512633

申请日：2010-11-30

Applicant: Tomotaka Tsuchimura ,  Takayuki Ito ,  Toru Fujimori ,  Kana Fujii

Inventor： Tomotaka Tsuchimura ,  Takayuki Ito ,  Toru Fujimori ,  Kana Fujii

IPC: G03F7/027 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C09B69/101 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/091

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.

Abstract translation: 本发明提供一种光化射线敏感性或辐射敏感性树脂组合物，其包含（A）由通式表示的特定化合物，（B）在碱存在下碱不溶性或微溶碱性并易于碱溶解的树脂 的酸，和（C）能够在用光化射线或辐射照射时能够产生酸的化合物; 使用该组合物形成的膜; 以及使用该图案形成方法的图案形成方法。

公开(公告)号：US20120094235A1

公开(公告)日：2012-04-19

申请号：US13320116

申请日：2010-05-20

Applicant: Toru Tsuchihashi ,  Hideaki Tsubaki ,  Koji Shirakawa ,  Hidenori Takahashi ,  Tomotaka Tsuchimura

Inventor： Toru Tsuchihashi ,  Hideaki Tsubaki ,  Koji Shirakawa ,  Hidenori Takahashi ,  Tomotaka Tsuchimura

IPC: G03F7/20 ,  G03F7/027

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (A) whose solubility in an alkali developer is increased by the action of an acid, the resin containing any of the units of general formula (AI) below and any of the units of general formula (AII) below, and a compound (B) that when exposed to actinic rays or radiation, generates an acid with any of the structures of general formula (BI) below.

Abstract translation: 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括其在碱性显影剂中的溶解度通过酸的作用而增加的树脂（A），所述树脂包含任何通式（AI）的单元， 和下述通式（AII）的任何单元和当暴露于光化射线或辐射时产生具有以下通式（BI）的任何结构的酸的化合物（B）。

公开(公告)号：US08148044B2

公开(公告)日：2012-04-03

申请号：US12608567

申请日：2009-10-29

Applicant: Shuhei Yamaguchi ,  Tomotaka Tsuchimura ,  Yuko Tada

Inventor： Shuhei Yamaguchi ,  Tomotaka Tsuchimura ,  Yuko Tada

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  C07C309/15

CPC classification number: G03F7/0045 ,  C07C309/17 ,  C07C381/12 ,  C07C2602/42 ,  C07C2603/66 ,  C07C2603/74 ,  C09B49/126 ,  C09B57/00 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126

Abstract: A positive photosensitive composition includes at least one compound that when exposed to actinic rays or radiation, generates any of the sulfonic acids of general formula (I) and a resin whose solubility in an alkali developer is increased by the action of an acid, wherein each of X1 and X2 independently represents a fluorine atom or a fluoroalkyl group, R1 represents a group with a polycyclic structure, provided that the polycyclic structure may have a substituent, and R2 represents a hydrogen atom, a chain alkyl group, a monocyclic alkyl group, a group with a polycyclic structure or a monocyclic aryl group, provided that each of the chain alkyl group, monocyclic alkyl group, polycyclic structure and monocyclic aryl group may have a substituent, and provided that R1 and R2 may be bonded to each other to thereby form a polycyclic structure.

Abstract translation: 正型光敏组合物包括至少一种化合物，当暴露于光化射线或辐射时，产生通式（I）的任何磺酸和其在碱显影剂中的溶解度通过酸的作用而增加的树脂，其中每种 的X 1和X 2独立地表示氟原子或氟烷基，R 1表示具有多环结构的基团，条件是多环结构可以具有取代基，并且R 2表示氢原子，链烷基，单环烷基， 具有多环结构或单环芳基的基团，条件是链烷基，单环烷基，多环结构和单环芳基中的每一个可以具有取代基，并且条件是R 1和R 2可以彼此键合，从而 形成多环结构。

公开(公告)号：US08110324B2

公开(公告)日：2012-02-07

申请号：US12407935

申请日：2009-03-20

Applicant: Toru Fujimori ,  Yoichi Maruyama ,  Hiroyuki Einaga ,  Kazuto Shimada ,  Tomotaka Tsuchimura ,  Yushi Kaneko

Inventor： Toru Fujimori ,  Yoichi Maruyama ,  Hiroyuki Einaga ,  Kazuto Shimada ,  Tomotaka Tsuchimura ,  Yushi Kaneko

IPC: G02B5/20

CPC classification number: G03F7/0007

Abstract: A photosensitive resin composition is provided that includes at least (A) titanium black, (B) two or more types of polymerizable compounds, (C) a resin, (D) a photopolymerization initiator, and (E) an organic solvent. There are also provided a light-shielding color filter formed by using the photosensitive resin composition, and a process for producing a light-shielding color filter, the process including a step of coating a substrate with the photosensitive resin composition, a step of imagewise exposing, and a step of developing to form a pattern. Furthermore, there is provided an image sensor that includes the light-shielding color filter.

Abstract translation: 提供至少包含（A）钛黑，（B）两种或更多种可聚合化合物，（C）树脂，（D）光聚合引发剂和（E）有机溶剂）的感光性树脂组合物。 还提供了使用感光性树脂组合物形成的遮光性滤色器，以及遮光性滤色片的制造方法，其特征在于，包括使用所述感光性树脂组合物涂布基材的工序，成像曝光工序 ，以及形成图案的步骤。 此外，提供了包括遮光滤色器的图像传感器。

公开(公告)号：US20110267714A1

公开(公告)日：2011-11-03

申请号：US13144600

申请日：2010-01-12

Applicant: Masaomi Makino ,  Tomotaka Tsuchimura

Inventor： Masaomi Makino ,  Tomotaka Tsuchimura

IPC: G03F7/20 ,  G02B5/22 ,  C07D491/048 ,  C08F22/14 ,  C07D491/044

CPC classification number: C07D491/044 ,  B33Y70/00 ,  C07D209/86 ,  C07D471/04 ,  C07D487/04 ,  C07D495/04 ,  C08F2/50 ,  G03F7/0007 ,  G03F7/031

Abstract: Provided is a photopolymerizable composition that is highly sensitive to light having wavelengths of 365 nm and 405 nm, and is capable of forming a curable film that can suppress deterioration in physical properties of the film due to heat-aging. The photopolymerizable composition include: (A) an oxime polymerization initiator which includes a condensed ring formed by containing two or more rings selected from an aromatic ring and a heterocyclic ring, and a cyclic structure which is connected to the condensed ring, the cyclic structure containing a carbonyl group and having an oxime group directly connected to the carbonyl group; and (B) a polymerizable compound.

Abstract translation: 提供对波长为365nm和405nm的光高度敏感的可光聚合组合物，并且能够形成能够抑制由于热老化而导致的膜的物理性能劣化的固化膜。 光聚合性组合物包括：（A）肟聚合引发剂，其包含通过含有选自芳香环和杂环的两个以上的环形成的稠环和与稠环连接的环状结构，所述环状结构含有 具有与羰基直接相连的肟基的羰基; 和（B）可聚合化合物。

公开(公告)号：US07470502B2

公开(公告)日：2008-12-30

申请号：US11505392

申请日：2006-08-17

Applicant: Tomotaka Tsuchimura

Inventor： Tomotaka Tsuchimura

IPC: G03F7/00 ,  G03C5/16 ,  C09D11/00

CPC classification number: B41C1/1066 ,  B41M7/0081 ,  C09D11/38

Abstract: An ink composition is provided that includes (a) an onium salt, a counteranion thereof having a volume of 1,000 Å3 or greater and (b) a cationically polymerizable compound. There is also provided an inkjet recording method that includes (a′) a step of discharging the ink composition onto a recording medium and (b′) a step of curing the ink composition by irradiating the discharged ink composition with actinic radiation. There are also provided a printed material obtained by the inkjet recording method, a process for producing a lithographic printing plate employing the ink composition, and a lithographic printing plate obtained by the production process.

Abstract translation: 提供一种油墨组合物，其包括（a）体积为1000埃或更大的鎓盐，其抗衡阴离子和（b）阳离子聚合性化合物。 还提供了一种喷墨记录方法，其包括（a）将油墨组合物排出到记录介质上的步骤，（b'）通过用光化辐射照射排出的油墨组合物来固化油墨组合物的步骤。 还提供了通过喷墨记录方法获得的印刷材料，使用该油墨组合物的平版印刷版的制造方法和通过该制造方法得到的平版印刷版。

公开(公告)号：US20070197677A1

公开(公告)日：2007-08-23

申请号：US11699446

申请日：2007-01-30

Applicant: Tomotaka Tsuchimura ,  Yasutomo Kawanishi

Inventor： Tomotaka Tsuchimura ,  Yasutomo Kawanishi

IPC: C07D333/50 ,  C08J7/18

CPC classification number: B41C1/1066 ,  B41M7/0081 ,  C07D333/78 ,  C09D11/101

Abstract: A sulfonium salt is provided that has a cation represented by Formula (II) (R1′ to R13′ in Formula (II) independently denote a hydrogen atom or a substituent, and may be bonded to each other to form a ring, provided that at least one of R1′ to R8′ denotes a halogen atom or a haloalkyl group). There are also provided a curable composition that includes the sulfonium salt, and an ink composition that includes the curabie composition. Furthermore, there are also provided an inkjet recording method employing the ink composition, and a process for producing a lithographic printing plate, the process including discharging the ink composition onto a hydrophilic support. A printed material and a lithographic printing plate thus obtained are also included in the present invention.

Abstract translation: 提供具有由式（II）表示的阳离子（式（II）中的R 1至R 13至R 13'）的锍盐独立地表示氢原子或取代基 并且可以彼此键合形成环，条件是R 1至R 8中的至少一个表示卤素原子或卤代烷基）。 还提供了包含锍盐的可固化组合物和包含可乐定组合物的油墨组合物。 此外，还提供了使用该油墨组合物的喷墨记录方法和一种用于制备平版印刷版的方法，该方法包括将油墨组合物排出到亲水载体上。 由此获得的印刷材料和平版印刷版也包括在本发明中。