摘要:
In a breakover type surge protection device utilizing punch-through that comprises a second semiconductor region forming a first pn junction with a first semiconductor region, a third semiconductor region forming a second pn junction with the second semiconductor region and a fourth semiconductor region forming a third pn junction with the first semiconductor region at a place apart from the second semiconductor region, the second semiconductor region is constituted of a punch-through suppression region portion disposed to cover the corners of the third semiconductor region and a punch-through generation region portion disposed at a place where its thickness can be made uniform. Fabricating surge protection devices according to this configuration reduces variation among their breakover currents and hold currents and increases their surge absorption capacity.
摘要:
A surge protection device for absorbing surges of either polarity has a second region forming a first pn junction with a first region, a third region capable of injecting first minority carriers into the second region, a fourth region forming a second pn junction with the first region and a fifth region capable of injecting second minority carriers into the fourth region. The surfaces of the fourth region and the fifth region and a first Schottky junction with respect to the first region are in mutual electrical connection with a first ohmic electrode, while the surfaces of the second region and the third region and a second Schottky junction with respect to the first region are in mutual electrical connection with a second ohmic electrode. During the initial stage when a surge voltage applied across the first and second electrodes is in a transient rising state, the dV/dt immunity is increased by majority carrier current flowing into the first region through the Schottky junction forward biased owing to the surge polarity and charging the junction capacitance of the reverse biased pn junction.
摘要:
A lateral insulating gate type field effect transistor can be manufactured with ease reliably by using a semiconductor substrate having excellent crystal property. A projected portion (2) is formed on a first major surface side of a semiconductor substrate (1). A first gate portion (3) having a width (length) smaller than that of the projected portion (2) is formed on the projected portion (2). An insulating layer (4) is formed on the whole surface of the semiconductor substrate (1) so as to bury the first gate portion (3). The semiconductor substrate (1) is removed horizontally from its second major surface side, i.e., from the opposite side of the side of the projected portion (2) to a position (a) at which the insulating layer (4) is formed so as to bury the projected portion (2) is exposed. A second gate portion (5) is formed on such exposed surface.
摘要:
An optical control circuit is formed by connecting a photoconductive element and resistive element at their one end to the control electrode of a transistor, while connecting the other end of the photoconductive element to one of output electrodes of the transistor and the other end of the resistive element to a predetermined voltage supply point. With this simple circuit arrangement, an effective input control with respect to the control electrode of the transistor can be realized.
摘要:
In an MONOS type nonvolatile semiconductor memory comprising a channel forming semiconductor region between source and drain regions in a surface of a substrate; a tunnel insulating film formed on the channel forming semiconductor region in the surface of the substrate, the tunnel insulating film permitting charge-injection; a silicon nitride film formed as a second insulating film on the tunnel insulating film; a silicon oxide film formed as a third insulating film; and a conductive electrode formed on the silicon oxide film, the silicon nitride film has a composition close to a stoichiometric value of Si.sub.3 N.sub.4 at a portion near an interface with the tunnel insulating film and has a composition of excess silicon at a portion of the thickness of the same film except near the interface with the tunnel insulating film.
摘要翻译:一种MONOS型非易失性半导体存储器,包括在衬底的表面中在源区和漏区之间形成半导体区的沟道; 隧道绝缘膜形成在衬底表面上形成半导体区的沟道上,隧道绝缘膜允许电荷注入; 在隧道绝缘膜上形成为第二绝缘膜的氮化硅膜; 形成为第三绝缘膜的氧化硅膜; 和形成在氧化硅膜上的导电电极,所述氮化硅膜在与隧道绝缘膜的界面附近的部分处具有接近Si 3 N 4的化学计量值的组成,并且在厚度的一部分具有过量的硅的组成 相同的膜除了与隧道绝缘膜的界面附近。
摘要:
A circuiting device comprising a flexible base member having end portions to be fixed, a movable portion therebetween and conductor patterns carried on the base member. Parts of the portions to be fixed adjacent to the movable portion are covered by protective films which prevent solder from flowing to the movable portion from the portions to be fixed. This arrangement prevents disconnection and short circuit in the conductor patterns on the circuiting device, and facilitates connecting operations.
摘要:
A mist supplying device for supplying a film-forming solution to form a thin film on a substrate includes a nozzle having an elongate outlet port, an atomizer coupled to the nozzle for atomizing the film-forming solution, and a disperser movably disposed in the nozzle between the outlet port and the atomizer and having a plurality of substantially uniformly distributed mist passages for passing the atomized film-forming solution in a first flow passage direction therethrough. An air blower is coupled to the atomizer for delivering the atomized film-forming solution into the nozzle. A driver unit is coupled to the disperser for reciprocally moving the mist passages in a second flow passage direction transverse to the first flow passage direction.
摘要:
A photoelectric transducer comprising at least a light-transmissive substrate having a relatively flat surface provided on its light-receiving side and an uneven surface provided on its opposite side, and a photoelectric transducing layer provided on the uneven surface of the substrate. The photoelectric transducing layer comprises at least a light-transmissive conductive layer, a semiconductor layer, and a back conductive electrode layer. The back conductive electrode layer comprises a second light-transmissive conductive layer and a conductive layer. The uneven surface on the substrate includes numerous projections, each projection having a triangular section and a shape of pyramidal, ridged roof, or conical type. The projections and the second light-transmissive conductive layer of the uneven back conductive electrode layer elongate the optical path of light beams in the photoelectric transducing layer, and prevent the adherence of dust particles and the abrasion of the photoelectric transducing layer.
摘要:
A semiconductor non-volatile optical memory device is constructed by providing light-permeable charge retention means in an insulating layer on a first semiconductor surface into which photo-generated carriers in the surface of the first semiconductor region are injected over the semiconductor-insulator potential barrier by applying reverse bias between the first semiconductor region and a second region forming a rectifying junction with the first semiconductor region. Also disclosed in a non-volatile memory integrated circuit employing one or more of said devices together with light source in the same package. The non-volatile memory integrated circuit operates under low bias voltage and is compatible with a high speed integrated logic circuits.
摘要:
A high frequency insulated gate field effect transistor comprises a semiconductor body of one type of conductivity, a base region of the same type of conductivity as the semiconductor body but with a higher impurity concentration than the body, and drain and source regions of the opposite type of conductivity. A portion of the base region is disposed between the drain region and the source region and the impurity concentration of the base region is reduced from the source region toward the drain region and is less at its junction with the drain region than that of the drain region. Such transistor can be incorporated in an integrated circuit as an amplifier transistor with a depletion type transistor as a load transistor. A common region serves both as a drain region of the amplifier transistor and a source region of the load transistor. A process of making the transistor and the integrated circuit comprises masking a semiconductor body, forming windows in the mask and successively diffusing through the same window both a first impurity to form the base region and a second impurity to form the source region.