公开(公告)号：US20060012799A1

公开(公告)日：2006-01-19

申请号：US11144748

申请日：2005-06-06

申请人： Ulrich Wegmann

发明人： Ulrich Wegmann

IPC分类号： G01B9/02

CPC分类号： G03F7/70191 ,  G01J9/00 ,  G03F7/706

摘要： An apparatus having a wavefront measuring device (1, 2, 7), which is designed to determine a wavefront tilt in one or more non-parallel transverse directions perpendicular to an optical axis of the optical imaging system, at a plurality of measurement points which are mutually offset in the direction of the optical axis. An evaluation unit (5) determines a telecentricity error value from the wavefront tilt measurement values obtained by the wavefront measuring device.

摘要翻译： 一种具有波前测量装置（1,2,7）的装置，其被设计成在多个测量点处确定在垂直于光学成像系统的光轴的一个或多个非平行横向方向上的波前倾斜， 在光轴的方向上相互偏移。 评估单元（5）根据由波前测量装置获得的波前倾斜测量值确定远心误差值。

公开(公告)号：US20050264827A1

公开(公告)日：2005-12-01

申请号：US10964868

申请日：2004-10-15

申请人： Martin Schriever ,  Ulrich Wegmann ,  Helmut Haidner

发明人： Martin Schriever ,  Ulrich Wegmann ,  Helmut Haidner

IPC分类号： G01B9/02 ,  G02B5/02 ,  G03F1/08 ,  G03F7/20 ,  H01L21/027 ,  G01B11/02

CPC分类号： G02B5/0221 ,  G02B5/0252 ,  G03F7/70075 ,  G03F7/706

摘要： A measuring device for interferometric measurement of an optical imaging system that is provided for projecting a useful pattern, provided on a mask, into the image plane of the imaging system, includes a wavefront source for generating at least one wavefront traversing the imaging system; a diffraction grating, arrangeable downstream of the imaging system, for interacting with the wavefront reshaped by the imaging system; and a spatially resolving detector, assigned to the diffraction grating, for acquiring interferometric information. The wavefront source has at least one measuring pattern that is formed on the mask in addition to the useful pattern. The useful pattern may represent the structure of a layer of a semiconductor component in a specific fabrication step. The measuring pattern may be formed as a coherence-forming structure periodic in one or two dimensions.

摘要翻译： 一种用于光学成像系统的干涉测量的测量装置，其被提供用于将设置在掩模上的有用图案投影到成像系统的图像平面中，包括用于产生穿过成像系统的至少一个波前的波前源; 衍射光栅，其布置在成像系统的下游，用于与由成像系统重新形成的波前相互作用; 以及分配给衍射光栅的空间分辨检测器，用于获取干涉信息。 除了有用的图案之外，波前源具有形成在掩模上的至少一个测量图案。 有用的图案可以表示特定制造步骤中的半导体部件的层的结构。 测量图案可以形成为一维或二维周期性的相干形成结构。

公开(公告)号：US20050243328A1

公开(公告)日：2005-11-03

申请号：US11080525

申请日：2005-03-16

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Helmut Haidner ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Gobppert

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Helmut Haidner ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Gobppert

IPC分类号： G03F7/20 ,  G01B9/02

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device and a method for the optical measurement of an optical system (1), in particular an optical imaging system. The device includes one or more object-side test optics components (2a, 2b) arranged in front of the optical system to be measured, and/or one or more image-side test optics components (3, 4, 5) arranged behind the optical system to be measured. A container for use in such a device, a microlithography projection exposure machine equipped with such a device, and a method which can be carried out with the aid of this device are also disclosed. An immersion fluid is introduced adjacent to at least one of the one or more object-side test optics components and/or image-side test optics components. Such device and method provide for optical measurement by microlithography projection objectives of high numerical aperture using wavefront detection with shearing or point diffraction interferometry or a Moiré measuring technique.

摘要翻译： 一种用于光学系统（1）的光学测量的装置和方法，特别是光学成像系统。 该装置包括布置在待测量的光学系统前面的一个或多个物体侧测试光学部件（2a，2b）和/或一个或多个图像侧测试光学部件（3,4,5） 在要测量的光学系统后面。 还公开了一种用于这种装置的容器，配备有这种装置的微光刻投影曝光机以及可借助该装置进行的方法。 相邻于一个或多个物体侧测试光学部件和/或图像侧测试光学部件中的至少一个被引入浸没流体。 这种装置和方法通过使用具有剪切或点衍射干涉测量或莫尔测量技术的波前检测的高数值孔径的微光刻投影物镜提供光学测量。

公开(公告)号：US08654346B2

公开(公告)日：2014-02-18

申请号：US13493747

申请日：2012-06-11

申请人： Ulrich Wegmann

发明人： Ulrich Wegmann

IPC分类号： G01B11/02

CPC分类号： G02B5/0278 ,  G01J1/04 ,  G01J1/0474 ,  G01J9/0215 ,  G02B5/0242 ,  G02B5/0294 ,  G03F7/70341 ,  G03F7/706

摘要： Immersion objective arrangement including an objective, an immersion medium and an optical scattering disk, and associated method. The optical scattering disk includes a transparent substrate (1) and a light scattering layer (2) adjoining a surface of the substrate and having light-scattering-active particles (3). The light scattering layer has an embedding medium (4) which is optically denser than air and directly adjoins the facing surface of the substrate without intervening air gaps and by which the light-scattering-active particles are surrounded. Such optical scattering disks may be used, e.g., in apparatuses for wavefront measurement of high-aperture microlithography projection objectives employing lateral shearing interferometry.

摘要翻译： 包括物镜，浸没介质和光散射盘的浸没物镜布置及相关方法。 光散射盘包括透明基板（1）和邻接基板表面并具有光散射活性颗粒（3）的光散射层（2）。 光散射层具有比空气更光密的直接邻接衬底的相对表面的嵌入介质（4），而没有中间空气间隙，并且光散射活性颗粒被围绕。 这种光学散射盘可以用于例如使用横向剪切干涉测量法的用于波长测量高孔径微光刻投影物镜的装置中。

公开(公告)号：US08537333B2

公开(公告)日：2013-09-17

申请号：US12983735

申请日：2011-01-03

申请人： Rolf Freimann ,  Ulrich Wegmann

发明人： Rolf Freimann ,  Ulrich Wegmann

IPC分类号： G03B27/42

CPC分类号： G03F7/70491 ,  G01B9/02018 ,  G01B9/02028 ,  G01B9/02065 ,  G01B9/0209 ,  G01B11/002 ,  G01N21/95607 ,  G01N2021/95615 ,  G01N2021/95676 ,  G03F7/70 ,  G03F7/70258 ,  G03F7/706 ,  G03F7/7085

摘要： An optical imaging device, in particular for microlithography, including an imaging unit adapted to image an object point on an image point and a measurement device. The imaging unit has a first optical element group having at least one first optical element. The imaging device is adapted to participate in the imaging of the object point on the image point, and the measurement unit is adapted to determine at least one image defect occurring on the image point when the object point is imaged. The measuring device includes at least one measurement light source, one second optical element group and at least one detection unit. The measurement light source transmits at least one measurement light bundle. The second optical element group includes at least one optical reference element and one second optical element, the elements adapted to direct the at least one measurement light bundle to the at least one detection unit, to produce at least one detection signal. The second optical element has a defined spatial relationship with the first optical element. The optical reference element has an at least partially reflecting first optical surface and the second optical element has an at least partially reflecting second optical surface. The measurement device is adapted to determine the at least one image defect using the at least one detection signal. The first optical surface and the second optical surface are positioned relative to one another such that a multiple reflection of the at least one measurement light bundle occurs between them.

摘要翻译： 一种光学成像装置，特别是用于微光刻，包括适于对图像点上的物点进行成像的成像单元和测量装置。 成像单元具有具有至少一个第一光学元件的第一光学元件组。 成像装置适于参与图像点上的对象点的成像，并且测量单元适于确定当对象点成像时在图像点上发生的至少一个图像缺陷。 测量装置包括至少一个测量光源，一个第二光学元件组和至少一个检测单元。 测量光源透射至少一个测量光束。 第二光学元件组包括至少一个光学参考元件和一个第二光学元件，所述元件适于将至少一个测量光束引导到至少一个检测单元，以产生至少一个检测信号。 第二光学元件与第一光学元件具有限定的空间关系。 光学参考元件具有至少部分反射的第一光学表面，并且第二光学元件具有至少部分反射的第二光学表面。 测量装置适于使用至少一个检测信号来确定至少一个图像缺陷。 第一光学表面和第二光学表面相对于彼此定位，使得在它们之间发生至少一个测量光束的多次反射。

公开(公告)号：US08199333B2

公开(公告)日：2012-06-12

申请号：US11915705

申请日：2006-05-23

申请人： Ulrich Wegmann

发明人： Ulrich Wegmann

IPC分类号： G01B9/02

CPC分类号： G02B5/0278 ,  G01J1/04 ,  G01J1/0474 ,  G01J9/0215 ,  G02B5/0242 ,  G02B5/0294 ,  G03F7/70341 ,  G03F7/706

摘要： Optical scattering disk, use and wavefront measuring apparatus. The optical scattering disk includes a transparent substrate (1) and a light scattering layer (2) adjoining a surface of the substrate and having light-scattering-active particles (3). The light scattering layer has an embedding medium (4) which is optically denser than air and directly adjoins the facing surface of the substrate without intervening air gaps and by which the light-scattering-active particles are surrounded. Such optical scattering disks may be used, e.g., in apparatuses for wavefront measurement of high-aperture microlithography projection objectives employing lateral shearing interferometry.

摘要翻译： 光散射盘，使用和波前测量装置。 光散射盘包括透明基板（1）和邻接基板表面并具有光散射活性颗粒（3）的光散射层（2）。 光散射层具有比空气更光密的直接邻接衬底的相对表面的嵌入介质（4），而没有中间空气间隙，并且光散射活性颗粒被围绕。 这种光学散射盘可以用于例如使用横向剪切干涉测量法的用于波长测量高孔径微光刻投影物镜的装置中。

公开(公告)号：US08120763B2

公开(公告)日：2012-02-21

申请号：US12489639

申请日：2009-06-23

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/00 ,  G01B9/02 ,  G03B27/42

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

摘要翻译： 提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。 该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。 浸没流体与至少一个测试光学部件相邻。 还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。 该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

公开(公告)号：US20090257049A1

公开(公告)日：2009-10-15

申请号：US12489639

申请日：2009-06-23

申请人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

发明人： Ulrich Wegmann ,  Uwe Schellhorn ,  Joachim Stuehler ,  Albrecht Ehrmann ,  Martin Schriever ,  Markus Goeppert ,  Helmut Haidner

IPC分类号： G01B9/00 ,  G03B27/80

CPC分类号： G03F7/2041 ,  G03F7/70341 ,  G03F7/706

摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

摘要翻译： 提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。 该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。 浸没流体与至少一个测试光学部件相邻。 还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。 该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

公开(公告)号：US07570345B2

公开(公告)日：2009-08-04

申请号：US11808316

申请日：2007-06-08

申请人： Gerd Reisinger ,  Manfred Maul ,  Paul Graeupner ,  Martin Schriever ,  Ulrich Wegmann

发明人： Gerd Reisinger ,  Manfred Maul ,  Paul Graeupner ,  Martin Schriever ,  Ulrich Wegmann

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70191 ,  G03B27/52 ,  G03F7/70216

摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.

摘要翻译： 提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。 该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及 将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

公开(公告)号：US07352452B2

公开(公告)日：2008-04-01

申请号：US11228286

申请日：2005-09-19

申请人： Ulrich Wegmann ,  Eric Eva

发明人： Ulrich Wegmann ,  Eric Eva

IPC分类号： G01B9/00

CPC分类号： G01J9/00 ,  G02B27/0025 ,  G03F7/70308 ,  G03F7/706

摘要： Method and apparatus for setting optical imaging properties using radiation treatment, specifically a method and an apparatus for setting the imaging properties of an optical system with radiation treatment of at least one optical element of the optical system in the installed state, and a method for setting the imaging properties of an internal optical element with radiation treatment. A measurement is carried out on the optical system in order to determine one or more aberrations in a spatially resolved fashion, a correction that changes the shape and/or refractive index of the internal optical element is calculated in order to reduce the measured aberration or aberrations, and the optical element is irradiated with the aid of a processing radiation that changes the shape and/or refractive index, in accordance with the calculated correction. In addition, a radiation treatment of an optical element for setting its imaging properties uses a compacting processing radiation with the aid of which the optical element is irradiated in a controlled fashion in such a way that its imaging properties are influenced in a controlled fashion via spatially resolved material shrinkage and/or increase of the refractive index. The method and apparatus are suited, for example, for producing correction aspherics in microlithography projection objectives in the installed state.

摘要翻译： 具体地说，一种使用放射线治疗来设定光学成像特性的方法和装置，具体地说，一种用于在安装状态下设置光学系统的至少一个光学元件的放射线处理光学系统的成像特性的方法和装置，以及一种设置方法 具有放射线处理的内部光学元件的成像特性。 在光学系统上进行测量以便以空间分辨的方式确定一个或多个像差，计算改变内部光学元件的形状和/或折射率的校正，以便减少所测量的像差或像差 并且借助于根据所计算的校正改变形状和/或折射率的处理辐射照射光学元件。 此外，用于设置其成像特性的光学元件的辐射处理使用压实处理辐射，借助于该光学元件以受控的方式照射光学元件，使得其成像特性以受控的方式经由空间影响 分辨的材料收缩和/或折射率的增加。 该方法和装置例如适用于在安装状态下在微光刻投影物镜中产生校正非球面。