公开(公告)号：US20070110383A1

公开(公告)日：2007-05-17

申请号：US11623414

申请日：2007-01-16

申请人： Bertram Frei ,  Norman Korner ,  Ralph Scholl

发明人： Bertram Frei ,  Norman Korner ,  Ralph Scholl

IPC分类号： G02B6/00

CPC分类号： G02B27/0994 ,  G02B27/0927 ,  G02B27/62

摘要： A light handling device, tolerant of elevated heat and heating cycles, includes a plurality of separate walls bounding a surrounded area, the walls reflecting light transmitted through the bounded area. The device includes a first composition adhesive engaged with at least two of the walls for securing the two walls together, and a second, different composition adhesive engaged with the same at least two of the walls for securing the two walls together.

摘要翻译： 容纳升高和加热循环的光处理装置包括多个分隔开的围绕着区域的单独的壁，壁反射透过有界区域的光。 该装置包括与至少两个壁接合以将两个壁固定在一起的第一组合物粘合剂和与其相同的至少两个壁接合的第二不同组合物粘合剂，用于将两个壁固定在一起。

公开(公告)号：US20070014017A1

公开(公告)日：2007-01-18

申请号：US11462819

申请日：2006-08-07

申请人： Heidi Thome-Forster ,  Claus Heine-Kempkens

发明人： Heidi Thome-Forster ,  Claus Heine-Kempkens

IPC分类号： G02B5/18

CPC分类号： G01N21/6452 ,  G01N21/4788 ,  G01N21/774 ,  G01N21/7746

摘要： This invention relates to a platform (11) and a method for generating electromagnetic field distributions. The invention relates in particular to optical sensors for measuring biological or chemical substances. The platform (11) according to the invention comprises a substrate (13), a structured layer (19) and, positioned between the substrate (13) and the structured layer (19), a multilayer assembly (17), said components being so matched relative to one another that upon appropriate impingement by electromagnetic radiation an electromagnetic field distribution is generated that is at a maximum within the structured layer (19).

摘要翻译： 本发明涉及平台（11）和产生电磁场分布的方法。 本发明特别涉及用于测量生物或化学物质的光学传感器。 根据本发明的平台（11）包括衬底（13），结构化层（19），并且位于衬底（13）和结构化层（19）之间，多层组件（17），所述组件如此 相对于彼此匹配，在通过电磁辐射适当冲击时，产生在结构化层（19）内处于最大值的电磁场分布。

公开(公告)号：US20070007357A1

公开(公告)日：2007-01-11

申请号：US11456131

申请日：2006-07-07

申请人： Martin Dubs

发明人： Martin Dubs

IPC分类号： G06K19/00

CPC分类号： G11B7/24038 ,  G11B7/266

摘要： An optical storage medium having at least two information layers is provided, wherein a first information layer is in the form of a dichroic filter that is reflective at a first selected wavelength and transmissive at a second selected wavelength. The dichroic filter has a laminate structure that includes at least a metallic layer and a dielectric layer, wherein the total thickness of the dichroic filter is about or less than 100 nm. A second information layer that is reflective at the second wavelength is disposed behind and spaced from the dichroic filter. This construction permits a first incident light beam at the first wavelength to be reflected from the dichroic filter, to produce a first reflected beam carrying information recorded in that layer. A second incident light beam at the second wavelength can be transmitted through the dichroic filter and reflected from the second information layer to produce a second reflected beam that passes through the dichroic filter, carrying information recorded in the second information layer.

摘要翻译： 提供了具有至少两个信息层的光学存储介质，其中第一信息层呈二向色滤光器的形式，其在第一选定波长处是反射的并且以第二选定波长透射。 二向色滤光器具有至少包括金属层和电介质层的叠层结构，其中二向色滤光片的总厚度为大约或小于100nm。 在第二波长处反射的第二信息层设置在二向色滤光器的后面并与之隔开。 这种结构允许第一波长的第一入射光束从二向色滤光器反射，以产生承载在该层中记录的信息的第一反射光束。 第二波长的第二入射光束可以通过二向色滤光片透射并从第二信息层反射，以产生穿过二向色滤光器的第二反射光束，承载记录在第二信息层中的信息。

公开(公告)号：US07105080B2

公开(公告)日：2006-09-12

申请号：US10334564

申请日：2002-12-31

申请人： Felix Mullis

发明人： Felix Mullis

IPC分类号： C23C16/00 ,  C23C14/34 ,  C23F1/00

CPC分类号： H01J37/32935 ,  H01J37/3299

摘要： Method for manufacturing a workpiece by a vacuum treatment process includes providing a vacuum treatment system with first second parts in a vacuum chamber. Either a sensor or an adjusting element with first signal connection is mounted on the second part. An electronic unit in the chamber has a reference potential and a second electric signal connection. The first part is connected to a system reference potential. A workpiece goes into the chamber and the method includes operating the second part at a further electric potential different from the system reference potential by at least 12 V. The method includes connecting the first electric signal connection to the second electric signal connection and maintaining the reference connection during operation on the further electric potential by metallically connecting the reference connection to the second part.

公开(公告)号：US08574409B2

公开(公告)日：2013-11-05

申请号：US13551815

申请日：2012-07-18

申请人： Stanislav Kadlec ,  Frantisek Balon ,  Juergen Weichart ,  Bart Scholte van Mast

发明人： Stanislav Kadlec ,  Frantisek Balon ,  Juergen Weichart ,  Bart Scholte van Mast

IPC分类号： C23C14/00 ,  H01L21/00

CPC分类号： H01J37/3408 ,  H01J37/3455

摘要： A method of magnetron sputtering, comprises rotating a magnet of a magnetron with an angular frequency ω, and, during sputtering of material from a source of the magnetron onto a substrate, periodically modulating a power level applied to the source with at least a component comprising a frequency f which is a harmonic of the angular frequency ω of rotation of the magnet other than the first harmonic.

摘要翻译： 磁控溅射的方法包括以角频率Ω旋转磁控管的磁体，并且在将材料从磁控管的源溅射到衬底上时，周期性地调制施加到源的功率电平，其中至少一个部件包括 频率f是除了第一谐波之外的磁体的旋转的角频率ω的谐波。

公开(公告)号：US20130248358A1

公开(公告)日：2013-09-26

申请号：US13877960

申请日：2011-10-03

申请人： Juergen Weichart

发明人： Juergen Weichart

IPC分类号： C23F4/00

CPC分类号： C23F4/00 ,  C23C14/50 ,  C23C14/541 ,  C23C16/455 ,  C23C16/45517 ,  C23C16/463 ,  H01J37/32522 ,  H01J37/32871

摘要： An etching chamber is equipped with an actively-cooled element preferentially adsorbs volatile compounds that are evolved from a polymeric layer of a wafer during etching, which compounds will act as contaminants if re-deposited on the wafer, for example on exposed metal contact portions where they may interfere with subsequent deposition of metal contact layers. In desirable embodiments, a getter sublimation pump is also provided in the etching chamber as a source of getter material. Methods of etching in such a chamber are also disclosed.

摘要翻译： 蚀刻室装备有主动冷却元件，优先吸附在蚀刻期间从晶片的聚合物层放出的挥发性化合物，如果再沉积在晶片上，则化合物将作为污染物，例如在暴露的金属接触部分上， 它们可能会干扰随后沉积金属接触层。 在理想的实施例中，吸气剂升华泵也设置在蚀刻室中作为吸气材料源。 还公开了在这种室中的蚀刻方法。

公开(公告)号：US20130180850A1

公开(公告)日：2013-07-18

申请号：US13808956

申请日：2011-07-08

申请人： Hartmut Rohrmann ,  Martin Dubs

发明人： Hartmut Rohrmann ,  Martin Dubs

IPC分类号： C23C14/35

CPC分类号： C23C14/352 ,  H01J37/3408 ,  H01J37/3447 ,  H01J37/347

摘要： A magnetron sputtering apparatus comprises, within a vacuum chamber (1), a substrate support (2) holding a substrate (3) with an upward-facing plane substrate surface (4) which is to be coated. The substrate (3) may be a disk of, e.g., 200 mm diameter. At a distance from a centre plane (5) two oblong targets (7a, 7b) are symmetrically arranged which are inclined towards the centre plane (5) so as to enclose an acute angle (β; −β) of between 8° and 35° with the plane defined by the substrate surface (4). Above the substrate surface (4) a collimator (13) with equidistant rectangular collimator plates is arranged. With this configuration high uniformity of the coating is achievable, in particular, if the distance of the collimator (13) from the substrate surface (4) is chosen as a multiple n of the extension of the collimator (13) perpendicular to the said surface, preferably with n equalling 1 or 2, for suppressing ripple.

摘要翻译： 磁控溅射装置包括在真空室（1）内的基板支撑件（2），该基板支撑件（2）用待涂覆的面向上的平面基板表面（4）保持基板（3）。 衬底（3）可以是例如200mm直径的盘。 在离中心平面（5）的距离处，两个长方形的靶（7a，7b）对称地布置成朝向中心平面（5）倾斜，以便包围在8°和35°之间的锐角（β-β） °，由基板表面（4）限定的平面。 在基板表面（4）上方布置有具有等距矩形准直板的准直器（13）。 利用这种结构可以实现涂层的高均匀性，特别是如果将准直器（13）与衬底表面（4）的距离选择为垂直于所述表面的准直器（13）的延伸部的倍数 ，优选为n等于1或2，以抑制纹波。

公开(公告)号：US20130133576A1

公开(公告)日：2013-05-30

申请号：US13701591

申请日：2011-05-28

申请人： Rolf Bazlen

发明人： Rolf Bazlen

IPC分类号： C23C16/52

CPC分类号： C23C16/52 ,  C23C16/4409 ,  C23C16/4412

摘要： An exhaust opening of a process chamber (12) contained in a vacuum chamber (11) is connected to an exhaust line (13) by a connector comprising a bellows (03) with one end which is connected to the exhaust line (13) fixed to a housing and its opposite end carrying a coupling tube (02) for connecting to a coupling ring (01) which surrounds the exhaust opening, the coupling tube (02) being elastically biased towards the same. The coupling tube (02) can be moved between a connected state where it is in contact with the coupling ring (01) and a disconnected state by an actuator reciprocatable in an axial direction perpendicular to the exhaust opening. To enable a gas-tight connection with the process chamber (12) the coupling tube (02) has lateral play such that it can align with the coupling ring (01) when a conical surface of the coupling tube (02) contacts a complementary conical surface on the coupling ring (01) in the connected state. The actuator comprises two rods (04) which extend through drill holes of an outward extending holding ring (05) of the coupling tube (02) and interact with the same in such a way that the lateral position of the coupling tube (02) is fixed in the disconnected state.

摘要翻译： 容纳在真空室（11）中的处理室（12）的排气口通过包括波纹管（03）的连接器连接到排气管（13），所述连接器的一端连接到排气管（13）固定 到壳体，并且其相对端承载用于连接到围绕排气开口的联接环（01）的联接管（O 2），所述联接管（02）朝向其弹性偏置。 联接管（O 2）可以在与联接环（01）接触的连接状态和通过在垂直于排气口的轴向方向上可往复运动的致动器的断开状态下移动。 为了能够与处理室（12）进行气密连接，联接管（02）具有横向游隙，使得当联接管（02）的锥形表面接触互补圆锥体 连接环（01）上的表面处于连接状态。 致动器包括两个杆（04），其延伸穿过联接管（02）的向外延伸的保持环（05）的钻孔并与其相互作用，使得联接管（02）的横向位置为 固定在断开状态。

公开(公告)号：US20120031749A1

公开(公告)日：2012-02-09

申请号：US13258576

申请日：2010-04-23

申请人： Martin Dubs ,  Kurt Ruhm ,  Hartmut Rohrmann

发明人： Martin Dubs ,  Kurt Ruhm ,  Hartmut Rohrmann

IPC分类号： C23C14/35 ,  C23C14/34

CPC分类号： C23C14/0036 ,  C23C14/0094 ,  C23C14/352 ,  C23C14/505 ,  H01J37/3405 ,  H01J37/3426 ,  H01J37/3438 ,  H01J37/3444

摘要： The apparatus (1) for coating a substrate (14) by reactive sputtering comprises an axis (8), at least two targets (11,12) in an arrangement symmetrically to said axis (8) and a power supply connected to the targets (11,12), wherein the targets are alternatively operable as cathode and anode. The method is a method for manufacturing a coated substrate (14) by coating a substrate (14) by reactive sputtering in an apparatus (1) comprising an axis (8). The method comprises a) providing a substrate (14) to be coated; b) providing at least two targets (11,12) in an arrangement symmetrically to said axis (8); c) alternatively operating said targets (11,12) as cathode and anode during coating. Preferably, the targets (11,12) are rotated during sputtering and/or the targets are arranged concentrically, with an innermost circular target surrounded by at least one ring-shaped outer target.

摘要翻译： 用于通过反应溅射涂覆衬底（14）的装置（1）包括轴线（8），至少两个对准所述轴线（8）的靶子（11,12）和连接到靶材 11,12），其中目标可替代地可操作为阴极和阳极。 该方法是通过在包括轴线（8）的装置（1）中通过反应溅射涂覆基板（14）来制造涂覆的基板（14）的方法。 该方法包括：a）提供待涂覆的基底（14）; b）以与所述轴线（8）对称的布置提供至少两个目标（11,12）; c）在涂覆期间可选地将所述靶（11,12）作为阴极和阳极操作。 优选地，靶（11,12）在溅射期间旋转和/或目标物同心地布置，其中最内圆的圆形靶被至少一个环形外靶围绕。

公开(公告)号：US20120009730A1

公开(公告)日：2012-01-12

申请号：US13256979

申请日：2010-03-15

申请人： Stephan Voser ,  Oliver Rattunde ,  Martin Dubs ,  Gerald Feistritzer ,  Volker Wuestenhagen ,  Gerhard Dovids

发明人： Stephan Voser ,  Oliver Rattunde ,  Martin Dubs ,  Gerald Feistritzer ,  Volker Wuestenhagen ,  Gerhard Dovids

IPC分类号： H01L31/18

CPC分类号： H01L31/18 ,  H01L21/67173 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67207

摘要： Throughput of manufacturing thin-film solar panels by inline technique is made substantially independent from the time extent of different surface treatment steps by accordingly subdividing treatment steps in sub-steps performed in inline subsequent treatment stations. Treatment duration in each of the subsequent treatment stations is equal (τ).

摘要翻译： 通过在线技术制造薄膜太阳能电池板的生产能力通过相应地在后续处理站中执行的子步骤中分开处理步骤而与不同的表面处理步骤的时间范围基本上独立。 每个后续治疗站的治疗持续时间相等（τ）。