公开(公告)号：US07551361B2

公开(公告)日：2009-06-23

申请号：US10571267

申请日：2004-07-14

申请人： Hans-Juergen Rostalski ,  Alexander Epple ,  Aurelian Dodoc ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Joerg Schultz ,  Franz-Josef Stickel ,  Wolfgang Singer ,  Joachim Wietzorrek

发明人： Hans-Juergen Rostalski ,  Alexander Epple ,  Aurelian Dodoc ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Joerg Schultz ,  Franz-Josef Stickel ,  Wolfgang Singer ,  Joachim Wietzorrek

IPC分类号： G02B3/00

CPC分类号： G03F7/70066 ,  G03F7/70241

摘要： An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.

摘要翻译： 用于微光刻投影曝光系统的光学成像系统用于将布置在成像系统的物体平面中的物体场成像为布置在成像系统的图像平面中的图像场。 特别是可以涉及在照明系统中使用的投影物镜或中继物镜。 成像系统具有布置在物平面和图像平面之间的多个透镜，并且在每种情况下具有第一透镜表面和第二透镜表面。 至少一个透镜是双非球面透镜，其中第一透镜表面和第二透镜表面是非球面。 对于具有可接受的关于透镜表面的表面处理和测试的费用的双非球面透镜的情况，可以产生具有非常强的变形非球面作用的良好质量的透镜。

公开(公告)号：US20090073410A1

公开(公告)日：2009-03-19

申请号：US12257910

申请日：2008-10-24

申请人： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

发明人： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

IPC分类号： G03B27/70

CPC分类号： G21K1/06 ,  B82Y10/00 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358

摘要： There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.

摘要翻译： 提供一种用于投影曝光装置的投影物镜，其具有用于发射具有波长<= 193nm的主射线的电磁辐射的主光源。 投影物镜包括物平面，第一镜，第二镜，第三镜，第四镜; 和一个图像平面。 物体平面，第一反射镜，第二反射镜，第三反射镜，第四反射镜和像平面以围绕公共光轴的中心布置布置。 第一镜，第二镜，第三镜和第四镜位于物平面和像平面之间。 当从主光源方向入射到物平面中的物体上时，主光线远离公共光轴倾斜。

公开(公告)号：US20090059385A1

公开(公告)日：2009-03-05

申请号：US12269686

申请日：2008-11-12

申请人： Susanne BEDER ,  Wolfgang Singer ,  Karl-Heinz Schuster

发明人： Susanne BEDER ,  Wolfgang Singer ,  Karl-Heinz Schuster

IPC分类号： G02B9/00

CPC分类号： G02B17/0892 ,  B82Y10/00 ,  G02B17/0804 ,  G02B17/0812 ,  G03F7/70225 ,  G03F7/70325 ,  G03F7/70341 ,  G03F7/70958

摘要： A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.

摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的适合于微光刻投影曝光机的投影物镜的平面上的投影物镜具有在投影物镜的工作波长处对于辐射而透明的多个光学元件。 至少一个光学元件是在工作波长处由折射率n> = 1.6的高折射率材料制成的高折射率光学元件。

公开(公告)号：US20080304032A1

公开(公告)日：2008-12-11

申请号：US12190007

申请日：2008-08-12

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G02B21/33

摘要： An immersion liquid for a microlithographic projection exposure apparatus is enriched with heavy isotopes. This reduces the chemical reactivity, which leads to an extension of the lifetime of optical elements which come in contact with the immersion liquid. For example, heavy water (D2O), deuterated sulfuric acid, (D2SO4) or deuterated phosphoric acid D3P16O4 may be used. Organic compounds such as perfluoro polyethers, which have been deuterated or enriched with heavy oxygen (18O), are furthermore suitable.

摘要翻译： 用于微光刻投影曝光装置的浸没液体富含重同位素。 这降低了化学反应性，这导致与浸没液体接触的光学元件的寿命延长。 例如，可以使用重水（D 2 O），氘化硫酸（D 2 SO 4）或氘代磷酸D3P16O4。 已经氘化或富含重氧（18O）的有机化合物如全氟聚醚也是合适的。

公开(公告)号：US20080297745A1

公开(公告)日：2008-12-04

申请号：US12187152

申请日：2008-08-06

申请人： Karl-Stefan WEISSENRIEDER ,  Alexander HIRNET ,  Alexander PAZIDIS ,  Karl-Heinz SCHUSTER ,  Christoph ZACZEK ,  Michael LILL ,  Patrick SCHEIBLE ,  Guenter SCHEIBLE ,  Sigrid SCHEIBLE ,  Harald SCHINK ,  Markus BROTSACK ,  Ulrich LOERING ,  Toralf GRUNER

发明人： Karl-Stefan WEISSENRIEDER ,  Alexander HIRNET ,  Alexander PAZIDIS ,  Karl-Heinz SCHUSTER ,  Christoph ZACZEK ,  Michael LILL ,  Patrick SCHEIBLE ,  Guenter SCHEIBLE ,  Sigrid SCHEIBLE ,  Harald SCHINK ,  Markus BROTSACK ,  Ulrich LOERING ,  Toralf GRUNER

IPC分类号： G03B27/52 ,  G02B13/14 ,  B05D5/06

CPC分类号： G03F7/70983 ,  G03F7/70341

摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

摘要翻译： 在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中 平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

公开(公告)号：US20080291419A1

公开(公告)日：2008-11-27

申请号：US12187116

申请日：2008-08-06

申请人： Karl-Stefan Weissenrieder ,  Alexander Hirnet ,  Alexandra Pazidis ,  Karl-Heinz Schuster ,  Christoph Zaczek ,  Michael Lill ,  Patrick Scheible ,  Guenter Scheible ,  Harald Schink ,  Markus Brotsack ,  Ulrich Loering ,  Toralf Gruner ,  Sigrid Scheible

发明人： Karl-Stefan Weissenrieder ,  Alexander Hirnet ,  Alexandra Pazidis ,  Karl-Heinz Schuster ,  Christoph Zaczek ,  Michael Lill ,  Patrick Scheible ,  Guenter Scheible ,  Harald Schink ,  Markus Brotsack ,  Ulrich Loering ,  Toralf Gruner ,  Sigrid Scheible

IPC分类号： G03B27/54 ,  G03B27/32

CPC分类号： G03F7/70983 ,  G03F7/70341

摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

公开(公告)号：US07446951B2

公开(公告)日：2008-11-04

申请号：US12046809

申请日：2008-03-12

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G02B3/02

CPC分类号： G02B1/02 ,  G02B3/00 ,  G02B3/04 ,  G02B13/143 ,  G03F7/70225 ,  G03F7/70308 ,  G03F7/70341 ,  G03F7/70966

摘要： Imaging systems, in particular a projection objectives of a microlithographic projection exposure apparatus, are provided. The imaging systems can have an optical axis and produce an image field which is extra-axial relative to the optical axis. The imaging systems can include a first optical element which causes a first distribution of the retardation in a plane that lies perpendicular to the optical axis, and at least one second optical element which causes a second distribution of the retardation in a plane that lies perpendicular to the optical axis. The second distribution of the retardation can at least partially compensate the first distribution of the retardation. The first and the second optical elements can be designed without rotational symmetry relative to the optical axis.

公开(公告)号：US07411656B2

公开(公告)日：2008-08-12

申请号：US11337491

申请日：2006-01-24

申请人： Michael Totzeck ,  Birgit Enkisch ,  Karl-Heinz Schuster

发明人： Michael Totzeck ,  Birgit Enkisch ,  Karl-Heinz Schuster

IPC分类号： G03B27/72 ,  G03B27/28 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70566 ,  G02B5/1809 ,  G02B5/3083 ,  G02B27/286 ,  G03F7/70308

摘要： A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the retardation arrangement and differs from the spatial distribution of polarization states of the input radiation, is designed as a reflective retardation arrangement. A useful cross section of the retardation arrangement has a multiplicity of retardation zones of different retardation effect. Such a mirror arrangement having a retardation effect varying as a function of location can be used to compensate undesired fluctuations in the polarization state over the cross section of an input radiation beam and/or to set specific output polarization states, for example in order to set radial or tangential polarization.

摘要翻译： 用于将从延迟装置的输入侧入射的输入辐射束转换成输出辐射束的延迟装置，该输出辐射束在其横截面上具有可被延迟装置影响的极化状态的空间分布，并且与空间 输入辐射的极化状态的分布被设计为反射延迟布置。 延迟结构的有用的截面具有不同的延迟效果的多个延迟区域。 可以使用具有作为位置的函数而变化的延迟效应的这种反射镜装置来补偿在输入辐射束的横截面上的偏振状态的不期望的波动和/或设置特定的输出偏振状态，例如以设定 径向或切向极化。

公开(公告)号：US07362514B2

公开(公告)日：2008-04-22

申请号：US11492725

申请日：2006-07-25

申请人： Karl-Heinz Schuster

发明人： Karl-Heinz Schuster

IPC分类号： G02B3/02

CPC分类号： G02B1/02 ,  G02B3/00 ,  G02B3/04 ,  G02B13/143 ,  G03F7/70225 ,  G03F7/70308 ,  G03F7/70341 ,  G03F7/70966

摘要： Imaging systems, in particular a projection objectives of a microlithographic projection exposure apparatus, are provided. The imaging systems can have an optical axis and produce an image field which is extra-axial relative to the optical axis. The imaging systems can include a first optical element which causes a first distribution of the retardation in a plane that lies perpendicular to the optical axis, and at least one second optical element which causes a second distribution of the retardation in a plane that lies perpendicular to the optical axis. The second distribution of the retardation can at least partially compensate the first distribution of the retardation. The first and the second optical elements can be designed without rotational symmetry relative to the optical axis.

摘要翻译： 提供成像系统，特别是微光刻投影曝光设备的投影物镜。 成像系统可以具有光轴并且产生相对于光轴超轴的图像场。 成像系统可以包括第一光学元件，其引起在垂直于光轴垂直的平面中的延迟的第一分布;以及至少一个第二光学元件，其在第二分布的垂直于 光轴。 延迟的第二分布可以至少部分地补偿延迟的第一分布。 第一和第二光学元件可以被设计成相对于光轴没有旋转对称。

公开(公告)号：US07289279B2

公开(公告)日：2007-10-30

申请号：US11350941

申请日：2006-02-10

申请人： Karl-Heinz Schuster ,  Alexander Epple

发明人： Karl-Heinz Schuster ,  Alexander Epple

IPC分类号： G02B3/00 ,  G02B9/00 ,  G02B9/34

CPC分类号： G03F7/70241 ,  G02B9/14 ,  G02B13/0095 ,  G02B13/143 ,  G02B13/24 ,  G02B27/0043

摘要： A projection objective includes a first lens group (G1) of positive refractive power, a second lens group (G2) of negative refractive power and at least one further lens group of positive refractive power in which a diaphragm is mounted. The first lens group (G1) includes exclusively lenses of positive refractive power. The number of lenses of positive refractive power (L101 to L103; L201, L202) of the first lens group (G1) is less than the number of lenses of positive refractive power (L116 to L119; L215 to L217) which are mounted forward of the diaphragm of the further lens group (G5).

摘要翻译： 投影物镜包括正折射光焦度的第一透镜组（G 1），负折射光焦度的第二透镜组（G 2）和安装有光阑的至少一个正屈光力透镜组。 第一透镜组（G 1）仅包括具有正屈光力的透镜。 第一透镜组（G 1）的正屈光力量的透镜数（L 101〜L 103; L 201，L 202）的数量小于正折射力透镜的数量（L 116〜L 119; L 215 至L 217），其安装在另一透镜组（G 5）的隔膜的前方。