公开(公告)号：US08524427B2

公开(公告)日：2013-09-03

申请号：US13087133

申请日：2011-04-14

Applicant: Jaw-Jung Shin ,  Shy-Jay Lin ,  Wen-Chuan Wang ,  Burn Jeng Lin

Inventor： Jaw-Jung Shin ,  Shy-Jay Lin ,  Wen-Chuan Wang ,  Burn Jeng Lin

IPC: G03C5/00 ,  G03F9/00

CPC classification number: G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/2059 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31764 ,  Y10S430/143

Abstract: An electron beam lithography method and apparatus for improving throughput is disclosed. An exemplary lithography method includes receiving a pattern layout having a pattern layout dimension; shrinking the pattern layout dimension; and overexposing a material layer to the shrunk pattern layout dimension, thereby forming the pattern layout having the pattern layout dimension on the material layer.

Abstract translation: 公开了一种用于提高吞吐量的电子束光刻方法和装置。 示例性光刻方法包括接收具有图案布局尺寸的图案布局; 缩小图案布局尺寸; 并且将材料层过度曝光到缩小图案布局尺寸，从而在材料层上形成具有图案布局尺寸的图案布局。

公开(公告)号：US08368037B2

公开(公告)日：2013-02-05

申请号：US13051507

申请日：2011-03-18

Applicant: Wen-Chuan Wang ,  Shy-Jay Lin ,  Jaw-Jung Shin ,  Burn Jeng Lin

Inventor： Wen-Chuan Wang ,  Shy-Jay Lin ,  Jaw-Jung Shin ,  Burn Jeng Lin

IPC: G21K5/00

CPC classification number: G03F7/2059 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/31761 ,  H01J2237/31774

Abstract: A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The method also includes writing a pattern to the medium using a plurality of independently-controllable beams of the e-beam source, in which the pattern comprises a plurality of parallel strips. Each of the parallel strips is written using multiple ones of the independently-controllable beams.

公开(公告)号：US08216767B2

公开(公告)日：2012-07-10

申请号：US12555145

申请日：2009-09-08

Applicant: Chien-Wei Wang ,  Ching-Yu Chang ,  Tsai-Sheng Gau ,  Burn Jeng Lin

Inventor： Chien-Wei Wang ,  Ching-Yu Chang ,  Tsai-Sheng Gau ,  Burn Jeng Lin

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/40 ,  G03F7/028

CPC classification number: G03F7/0045 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/12 ,  Y10S430/128

Abstract: A method for fabricating an integrated circuit device is disclosed. The method includes providing a substrate; forming a first material layer over the substrate; forming a second material layer over the first material layer, wherein the second material layer comprises a photodegradable base material; and exposing at least a portion of the second material layer.

Abstract translation: 公开了一种用于制造集成电路器件的方法。 该方法包括提供基板; 在所述衬底上形成第一材料层; 在所述第一材料层上形成第二材料层，其中所述第二材料层包含可光降解的基材; 并暴露第二材料层的至少一部分。

公开(公告)号：US08180141B2

公开(公告)日：2012-05-15

申请号：US11934512

申请日：2007-11-02

Applicant: Chin-Hsiang Lin ,  Burn Jeng Lin ,  Tsai-Shen Gau

Inventor： Chin-Hsiang Lin ,  Burn Jeng Lin ,  Tsai-Shen Gau

IPC: G06K9/00 ,  G03F1/00

CPC classification number: G03F7/7065 ,  G03F7/70383 ,  H01L22/22 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A system for wafer repair, comprising an inspection tool being capable of extracting a wafer image of a semiconductor wafer; a direct-writing tool being capable of locally exposing the semiconductor wafer; and an information processing module configured to compare the wafer image with a reference image and generate data of locations and patterns of defective regions and communicate the data of locations and patterns of defective regions to the direct-writing tool, wherein the reference image comprises a pattern consisting of a scanned image of another die having no defective region.

Abstract translation: 一种用于晶片修复的系统，包括能够提取半导体晶片的晶片图像的检查工具; 能够局部暴露半导体晶片的直写工具; 以及信息处理模块，被配置为将晶片图像与参考图像进行比较，并生成缺陷区域的位置和图案的数据，并将缺陷区域的位置和图案的数据传送到直接书写工具，其中参考图像包括图案 由没有缺陷区域的另一个芯片的扫描图像组成。

公开(公告)号：US08125611B2

公开(公告)日：2012-02-28

申请号：US11762651

申请日：2007-06-13

Applicant: Ching-Yu Chang ,  Tsai-Sheng Gau ,  Burn Jeng Lin

Inventor： Ching-Yu Chang ,  Tsai-Sheng Gau ,  Burn Jeng Lin

IPC: G03B27/42 ,  G03B27/52 ,  G03B27/58

CPC classification number: G03F7/70341

Abstract: Immersion lithography apparatus and method using a shield module are provided. An immersion lithography apparatus including a lens module having an imaging lens, a substrate table positioned beneath the lens module and configured for holding a substrate for processing, a fluid module for providing an immersion fluid to a space between the lens module and the substrate on the substrate table, and a shield module for covering an edge of the substrate during processing.

Abstract translation: 提供了使用屏蔽模块的浸渍光刻设备和方法。 一种浸没式光刻设备，包括具有成像透镜的透镜模块，位于透镜模块下方的被配置用于保持用于处理的基板的基板台，用于在透镜模块和基板之间的空间中提供浸没流体的流体模块 衬底台和用于在处理期间覆盖衬底的边缘的屏蔽模块。

公开(公告)号：US20110267591A1

公开(公告)日：2011-11-03

申请号：US13176604

申请日：2011-07-05

Applicant: Burn Jeng Lin

Inventor： Burn Jeng Lin

IPC: G03B27/52

CPC classification number: G02B7/028 ,  G02B7/04 ,  G03F7/70341

Abstract: An apparatus for immersion lithography that includes an imaging lens which has a front surface, a fluid-containing wafer stage for supporting a wafer that has a top surface to be exposed positioned spaced-apart and juxtaposed to the front surface of the imaging lens, and a fluid that has a refractive index between about 1.0 and about 2.0 filling a gap formed in-between the front surface of the imaging lens and the top surface of the wafer. A method for immersion lithography can be carried out by flowing a fluid through a gap formed in-between the front surface of an imaging lens and a top surface of a wafer. The flow rate and temperature of the fluid can be controlled while particulate contaminants are filtered out by a filtering device.

公开(公告)号：US07986395B2

公开(公告)日：2011-07-26

申请号：US11427421

申请日：2006-06-29

Applicant: Ching-Yu Chang ,  Burn Jeng Lin ,  Chin-Hsiang Lin

Inventor： Ching-Yu Chang ,  Burn Jeng Lin ,  Chin-Hsiang Lin

IPC: G03B27/42

CPC classification number: G03F7/70925 ,  G03F7/70341

Abstract: A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; and a cleaning module adapted to clean the lithography apparatus. The cleaning module is selected from the group consisting of an ultrasonic unit, a scrubber, a fluid jet, an electrostatic cleaner, and combinations thereof.

Abstract translation: 光刻设备包括成像透镜模块; 位于所述成像透镜模块下方且被配置为保持基板的基板台; 以及适于清洁光刻设备的清洁模块。 清洁模块选自超声波单元，洗涤器，流体射流，静电清洁器及其组合。

公开(公告)号：US07924397B2

公开(公告)日：2011-04-12

申请号：US10702664

申请日：2003-11-06

Applicant: Burn Jeng Lin ,  David Lu

Inventor： Burn Jeng Lin ,  David Lu

IPC: G03B27/52 ,  G03B27/42

CPC classification number: G03F7/70983 ,  G02B1/105 ,  G02B1/111 ,  G02B1/113 ,  G02B1/115 ,  G02B1/14 ,  G02B13/143 ,  G03F7/70341

Abstract: Disclosed is an objective lens adapted for use in liquid immersion photolithography and a method for making such a lens. In one example, the objective lens has multiple lens elements, one of which includes a transparent substrate and a layer of anti-corrosion coating (ACC). The ACC is formed proximate to the transparent substrate and is positioned between a liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid.

Abstract translation: 公开了适用于液浸光刻的物镜和制造这种透镜的方法。 在一个示例中，物镜具有多个透镜元件，其中之一包括透明基板和一层防腐涂层（ACC）。 ACC形成在透明基板附近，并且位于液浸光刻期间使用的液体和透明基板之间，以保护透明基板免于液体。

公开(公告)号：US20100248158A1

公开(公告)日：2010-09-30

申请号：US12411229

申请日：2009-03-25

Applicant: Jeng-Horng Chen ,  Shy-Jay Lin ,  Burn Jeng Lin

Inventor： Jeng-Horng Chen ,  Shy-Jay Lin ,  Burn Jeng Lin

IPC: G03F7/20 ,  G21K5/04

CPC classification number: G03F7/70275 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70291 ,  G03F7/70508 ,  H01J37/3177 ,  H01J2237/31762

Abstract: The present disclosure provides a maskless lithography apparatus. The apparatus includes a plurality of writing chambers, each including: a wafer stage operable to secure a wafer to be written and a multi-beam module operable to provide multiple radiation beams for writing the wafer; an interface operable to transfer wafers between each of the writing chambers and a track unit for processing an imaging layer to the wafers; and a data path operable to provide a set of circuit pattern data to each of the multiple radiation beams in each of the writing chambers.

Abstract translation: 本公开提供一种无掩模光刻设备。 该装置包括多个写入室，每个写入室包括：可操作以固定要写入的晶片的晶片台和可操作以提供用于写入晶片的多个辐射束的多光束模块; 可操作以在每个写入室之间传送晶片的接口和用于将成像层处理到晶片的轨道单元; 以及数据路径，其可操作以向每个写入室中的每个多个辐射束提供一组电路图案数据。

公开(公告)号：US07394080B2

公开(公告)日：2008-07-01

申请号：US11317974

申请日：2005-12-23

Applicant: Burn Jeng Lin

Inventor： Burn Jeng Lin

IPC: H01J37/08 ,  G21K5/10 ,  G03F7/20

CPC classification number: G03F7/70275 ,  G03F7/70208 ,  G03F7/70283

Abstract: An exposure system includes a mask stage module adapted for holding a first mask and a second mask, wherein the first mask is configured for illumination by a first beam to form a transformed first beam having a first pattern from the first mask and the second mask is configured for illumination by a second beam to form a transformed second beam having a second pattern from the second mask. The exposure system also includes a beam combiner configured to combine the transformed first and second beams to form a resultant beam, wherein the resultant beam is projected into a substrate coated with a photoresist layer.

Abstract translation: 曝光系统包括适于保持第一掩模和第二掩模的掩模台模块，其中第一掩模被配置为由第一光束照明以形成具有来自第一掩模的第一图案的变换的第一光束，而第二掩模是 被配置为由第二光束照明以形成具有来自第二掩模的第二图案的变换的第二光束。 曝光系统还包括光束组合器，其被配置为组合变换的第一和第二光束以形成合成光束，其中所得到的光束投射到涂覆有光致抗蚀剂层的基板中。