WOUND DRESSING
    62.
    发明申请
    WOUND DRESSING 审中-公开
    伤口敷料

    公开(公告)号:US20140024989A1

    公开(公告)日:2014-01-23

    申请号:US13816969

    申请日:2012-03-01

    申请人: Atsushi Ueda

    发明人: Atsushi Ueda

    IPC分类号: A61F13/02

    摘要: As a wound dressing that includes a perforated material having through-holes, in which the perforated material can be coated with a low-adhesive resin without closing the through-holes, and that has excellent adhesion prevention properties to wounds, provided is a wound dressing 1 that includes a sheet-shaped perforated material 11 having through-holes 111 and a low-adhesive resin 12 with which at least one face of the perforated material 11 is coated without closing the through-holes 111, the perforated material 11 is a knitted fabric or a woven fabric formed of a multifilament, and the perforated material 11 has an average opening area of the through-holes 111 of 0.02 to 1.2 mm2 and an average number of through-holes of 40 to 220 cm−2. By designing the opening area of the through-hole 111 and the number of through-holes 111 in the perforated material 11 within the particular numerical ranges, such a wound dressing can be prevented from adhering to granulation tissues that invade the through-holes 111 and can ensure sufficient permeation properties of exudate through the through-holes 111.

    摘要翻译: 作为包含具有通孔的穿孔材料的伤口敷料,其中多孔材料可以用低粘合剂树脂涂覆而不关闭通孔,并且对伤口具有优异的防粘连性,提供了一种伤口敷料 如图1所示,包括具有通孔111的片状穿孔材料11和低密度树脂12,多孔材料11的至少一个表面与该多孔材料11的至少一个表面相结合而不关闭通孔111,多孔材料11是针织物 织物或由复丝形成的织物,并且穿孔材料11具有0.02至1.2平方毫米的通孔111的平均开口面积和40至220厘米-2的通孔平均数。 通过在特定数值范围内设计通孔111的开口面积和穿孔材料11中的通孔111的数量,可以防止这种伤口敷料附着在侵入通孔111的造粒组织和 可以确保渗透物通过通孔111的充分渗透性。

    Nonaqueous electrolyte secondary battery and method for fabricating the same
    63.
    发明授权
    Nonaqueous electrolyte secondary battery and method for fabricating the same 有权
    非水电解质二次电池及其制造方法

    公开(公告)号:US08389161B2

    公开(公告)日:2013-03-05

    申请号:US12529094

    申请日:2009-01-22

    IPC分类号: H01M4/64

    摘要: A nonaqueous electrolyte secondary battery includes a positive electrode 4 including a positive electrode current collector and a positive electrode mixture layer including a positive electrode active material and a binder, the positive electrode mixture layer being provided on the positive electrode current collector, a negative electrode 5, a porous insulating layer 6 interposed between the positive electrode 4 and the negative electrode 5, and a nonaqueous electrolyte. The tensile extension of the positive electrode 4 is equal to or higher than 3.0%. The charge end voltage in normal operation of the nonaqueous electrolyte secondary battery is equal to or higher than 4.3 V.

    摘要翻译: 非水电解质二次电池包括具有正极集电体的正极4和包括正极活性物质和粘合剂的正极合剂层,正极合剂层设置在正极集电体上,负极5 介于正极4和负极5之间的多孔绝缘层6和非水电解质。 正极4的拉伸伸长率为3.0%以上。 非水电解质二次电池正常工作时的充电结束电压为4.3V以上。

    SUBSTRATE PROCESSING APPARATUS FOR PERFORMING PLASMA PROCESS
    64.
    发明申请
    SUBSTRATE PROCESSING APPARATUS FOR PERFORMING PLASMA PROCESS 审中-公开
    用于执行等离子体处理的基板处理装置

    公开(公告)号:US20110253311A1

    公开(公告)日:2011-10-20

    申请号:US13175469

    申请日:2011-07-01

    摘要: A substrate processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate. The apparatus includes a gas feed passage configured to supply a process gas into the process container and an exhaust passage configured to exhaust gas from inside the process container. The apparatus further includes a plasma generation mechanism configured to generate plasma of the process gas inside the process container and a metal component to be exposed to plasma inside the process container. The metal component is provided with a silicon film that coats at least a portion thereof to be exposed to plasma and to suffer an intense electric filed generated thereabout.

    摘要翻译: 用于在目标衬底上执行等离子体处理的衬底处理装置包括配置成容纳目标衬底的处理容器。 该装置包括:气体供给通道,其构造成将处理气体供应到处理容器中;以及排气通道,其构造成从处理容器内部排出气体。 该装置还包括等离子体生成机构,其被配置为产生处理容器内的处理气体的等离子体,以及暴露于处理容器内的等离子体的金属成分。 金属部件设置有涂覆其至少一部分以暴露于等离子体并且在其周围产生强电场的硅膜。

    Inner electrode for barrier film formation and apparatus for film formation
    65.
    发明授权
    Inner electrode for barrier film formation and apparatus for film formation 有权
    用于阻挡膜形成的内部电极和用于成膜的装置

    公开(公告)号:US08034177B2

    公开(公告)日:2011-10-11

    申请号:US11660201

    申请日:2005-10-17

    摘要: An inner electrode for barrier film formation is an inner electrode for barrier film formation that is inserted inside a plastic container having an opening, supplies a medium gas to the inside of the plastic container, and supplies high frequency power to an outer electrode arranged outside the plastic container, thereby generating discharge plasma on the inner surface of the plastic container to form a barrier film on the inner surface of the plastic container, and that is provided with a gas supply pipe (101) having a gas flow path (101a) to supply a medium gas (G) and an insulating member (103) screwed into an end portion of the gas supply pipe (101) to be flush therewith and having a gas outlet (102) communicated with the gas flow path (101a).

    摘要翻译: 用于形成阻挡膜的内部电极是插入到具有开口的塑料容器内的用于阻挡膜形成的内部电极,将中等气体供应到塑料容器的内部,并将高频电力提供给布置在外部的外部电极 塑料容器,从而在塑料容器的内表面上产生放电等离子体,以在塑料容器的内表面上形成阻挡膜,并且设置有气体供给管(101),该气体供给管具有气体流路(101a) 供给与气体供给管(101)的端部螺纹连接的中间气体(G)和绝缘构件(103),与该气体供给管(101)齐平并具有与气体流路(101a)连通的气体出口(102)。

    PLASMA PROCESSING APPARATUS
    66.
    发明申请
    PLASMA PROCESSING APPARATUS 审中-公开
    等离子体加工设备

    公开(公告)号:US20100307684A1

    公开(公告)日:2010-12-09

    申请号:US12680321

    申请日:2008-09-26

    IPC分类号: H01L21/306

    摘要: A microwave plasma processing apparatus (100) of a slot antenna type includes a plane antenna plate (31) constituting a flat waveguide and a cover (34) of a conductive member. The cover (34) is provided with a stub (43) as a second waveguide for adjusting electric field-distribution in the flat waveguide. The stub (43) is provided in the cover (34) of the conductive member. In plan view, the stub (43) is arranged to overlap slots (32) constituting a slot pair arranged at the outermost circumference of the plane antenna plate (31). By appropriately arranging the stub, it is possible to control electric field-distribution in the flat waveguide thereby to generate a uniform plasma.

    摘要翻译: 缝隙天线类型的微波等离子体处理装置(100)包括构成平坦波导的平面天线板(31)和导电部件的盖(34)。 盖34具有作为调整平面波导中的电场分布的第二波导的短截线43。 短路(43)设置在导电构件的盖(34)中。 在平面图中,短截线体43被布置成与构成设置在平面天线板31的最外圆周处的缝隙对的缝隙重叠。 通过适当地布置短截线,可以控制平坦波导中的电场分布,从而产生均匀的等离子体。

    SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PLACING TABLE USED FOR SAME, AND MEMBER EXPOSED TO PLASMA
    68.
    发明申请
    SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PLACING TABLE USED FOR SAME, AND MEMBER EXPOSED TO PLASMA 审中-公开
    基板加工装置,用于其的基板放置台和暴露于等离子体的构件

    公开(公告)号:US20090041568A1

    公开(公告)日:2009-02-12

    申请号:US12162900

    申请日:2007-01-31

    IPC分类号: B65G47/22 A47B37/00

    摘要: A substrate table includes a substrate table main body provided with a heater embedded therein and having an upper surface serving as a heating face for heating a target substrate, and lifter pins inserted in the substrate table main body and configured to be moved up and down. Recessed portions are formed in the heating face of the substrate table main body at positions corresponding to the lifter pins and have a bottom lower than the heating face. Each of the lifter pins includes a lifter pin main body and a head portion formed at a distal end of the lifter pin main body and having a diameter larger than the lifter pin main body, the head portion being formed to correspond to each recessed portion and to be partly accommodated in the recessed portion. The head portion has a head portion upper end for supporting the target substrate and a head portion lower surface opposite to the head portion upper end. The lifter pins are movable between a first state where the head portion lower surface engages with the bottom of the recessed portion, and a second state where the head portion lower surface separates upward from the bottom of the recessed portion.

    摘要翻译: 基板台包括设置有嵌入其中的加热器的基板台主体,并具有用作加热目标基板的加热面的上表面,以及插入到基板台主体中并被配置为上下移动的升降销。 在基板台主体的加热面上,在与升降销相对应的位置处形成凹部,并且底部比加热面低。 每个升降销包括提升销主体和形成在升降器销主体的远端处并且具有大于升降器销主体的直径的头部,该头部形成为对应于每个凹部,并且 以部分地容纳在凹部中。 头部具有用于支撑目标基板的头部上端和与头部上端相对的头部下表面。 提升销可以在头部下表面与凹部的底部接合的第一状态和头部下表面从凹部的底部向上分离的第二状态下移动。

    Inner Electrode for Barrier Film Formation and Apparatus for Film Formation
    70.
    发明申请
    Inner Electrode for Barrier Film Formation and Apparatus for Film Formation 有权
    用于阻挡膜形成的内部电极和用于成膜的装置

    公开(公告)号:US20080017113A1

    公开(公告)日:2008-01-24

    申请号:US11660201

    申请日:2005-10-17

    IPC分类号: C23C16/513

    摘要: An inner electrode for barrier film formation is an inner electrode for barrier film formation that is inserted inside a plastic container having an opening, supplies a medium gas to the inside of the plastic container, and supplies high frequency power to an outer electrode arranged outside the plastic container, thereby generating discharge plasma on the inner surface of the plastic container to form a barrier film on the inner surface of the plastic container, and that is provided with a gas supply pipe (101) having a gas flow path (101a) to supply a medium gas (G) and an insulating member (103) screwed into an end portion of the gas supply pipe (101) to be flush therewith and having a gas outlet (102) communicated with the gas flow path (101a).

    摘要翻译: 用于形成阻挡膜的内部电极是插入到具有开口的塑料容器内的用于阻挡膜形成的内部电极,将中等气体供应到塑料容器的内部,并将高频电力提供给布置在外部的外部电极 塑料容器,从而在塑料容器的内表面上产生放电等离子体,在塑料容器的内表面上形成阻挡膜,并且设置有具有气体流路(101a)的气体供给管(101) 供给与气体供给管(101)的端部螺纹连接的中间气体(G)和绝缘部件(103),与该气体流通通路(101a)连通的气体出口(102) 。