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334 条记录 (耗时 0.052 秒)

    Information distribution system, method, and program
    61.
    发明申请
    Information distribution system, method, and program 审中-公开
    信息分发系统，方法和程序

    公开(公告)号：US20060025924A1

    公开(公告)日：2006-02-02

    申请号：US11186977

    申请日：2005-07-22

    申请人： Kazutaka Yoshikawa ,  Hiroshi Tomita ,  Toshiaki Minami ,  Kenji Nagase

    发明人： Kazutaka Yoshikawa ,  Hiroshi Tomita ,  Toshiaki Minami ,  Kenji Nagase

    IPC分类号： G01C21/36

    CPC分类号： G01C21/3476 ,  G01C21/3617 ,  G01C21/3694

    摘要： Information distribution systems, methods, and/or programs register a point which meets predetermined registration conditions as a register point; select a predetermined register point as a predicted arrival display point; calculate a predicted arrival time at the predicted arrival display point; and display the predicted arrival on a map screen. Systems, methods, and/or programs obtain map data and traffic congestion information, including a plurality of congestion areas; set a priority for each congestion area; and display congestion detail information for a congestion area on the map screen based on the set priority. Systems, methods, and/or programs determine a priority for a register point; and display the register point on the map screen when the priority of the register point is greater than a predetermined value.

    摘要翻译： 信息分配系统，方法和/或程序将满足预定注册条件的点作为注册点注册; 选择预定的寄存器点作为预测到达显示点; 计算预测到达显示点的预计到达时间; 并在地图画面上显示预计抵达。 系统，方法和/或程序获得包括多个拥塞区域的地图数据和交通拥堵信息; 为每个拥挤区域设置优先级; 并且基于所设置的优先级，在地图画面上显示拥堵区域的拥塞细节信息。 系统，方法和/或程序确定寄存器点的优先级; 并且当寄存器点的优先级大于预定值时，在地图画面上显示寄存器点。

    Resist pattern forming apparatus and method thereof
    62.
    发明授权
    Resist pattern forming apparatus and method thereof 失效
    抗蚀剂图案形成装置及其方法

    公开(公告)号：US06984477B2

    公开(公告)日：2006-01-10

    申请号：US09963527

    申请日：2001-09-27

    申请人： Kunie Ogata ,  Koki Nishimuko ,  Hiroshi Tomita ,  Yoshio Kimura ,  Ryouichi Uemura ,  Michio Tanaka

    发明人： Kunie Ogata ,  Koki Nishimuko ,  Hiroshi Tomita ,  Yoshio Kimura ,  Ryouichi Uemura ,  Michio Tanaka

    IPC分类号： G03F9/00 ,  G03F7/20 ,  G03F7/30 ,  G03F7/40 ,  B05D3/12

    CPC分类号： H01L21/67253 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/6715

    摘要： A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and an appropriate amendment can be performed.

    摘要翻译： 使用涂覆和显影装置和对准器连接的抗蚀剂图案形成方法被控制以在其上形成有基膜和基底图案的基板的表面上形成抗蚀剂膜，然后检查至少一个 选自以下的多个测量项目：基膜和抗蚀剂膜的反射率和膜厚度，显影后的线宽度，基底图案与抗蚀剂图案匹配的精度，显影后的表面上的缺陷等。 基于每个测量项目的对应数据（例如抗蚀剂的膜厚度和显影后的线宽度）来选择修改参数，并且修改参数。 这导致操作者的工作量减少，并且可以执行适当的修改。

    Filter, substrate treatment apparatus and substrate treatment method
    63.
    发明申请
    Filter, substrate treatment apparatus and substrate treatment method 审中-公开
    过滤器，基板处理装置及基板处理方法

    公开(公告)号：US20050211378A1

    公开(公告)日：2005-09-29

    申请号：US11076231

    申请日：2005-03-10

    申请人： Hiroyasu Iimori ,  Hisashi Okuchi ,  Hiroshi Tomita ,  Yoshihiro Ogawa

    发明人： Hiroyasu Iimori ,  Hisashi Okuchi ,  Hiroshi Tomita ,  Yoshihiro Ogawa

    IPC分类号： H01L21/306 ,  C23F1/00 ,  H01L21/00 ,  H01L21/311

    CPC分类号： H01L21/67086 ,  H01L21/30604 ,  H01L21/31111

    摘要： A filter connectable to an external circulating system, the circulating system being included by a substrate treatment apparatus which etches a substrate with an H3PO4 solution, the filter includes: a chemical feeding port which permits feed of H3PO4 solution containing particles deposited due to etching of a substrate; an H2O adding port which permits the addition of H2O; a filter film which removes the particles from the H3PO4 solution whose heat distribution is made ununiform by the addition of H2O; and a protection member which is disposed between the H2O adding port and the filter film and which protects the filter film from bumping of the H3PO4 solution that is causable by the addition of H2O.

    摘要翻译： 一种可连接到外部循环系统的过滤器，所述循环系统由用H 3 PO 4溶液蚀刻衬底的衬底处理设备包括，所述过滤器包括： 化学品供给口，其允许由于蚀刻基材而沉积的含有3个/ 3个PO 4的溶液的进料; 允许加入H 2 O的H 2 O 2添加口; 过滤膜，其通过添加H 2 O 2从热分布不均匀的H 3 PO 4 溶液中除去颗粒; 以及保护构件，其设置在H 2 O 2添加口和过滤膜之间，并且保护过滤膜免受H 3 PO 4加成口的冲击， / SUB溶液，其通过加入H 2 O 2可以引起。

    Substrate processing apparatus and method
    64.
    发明授权
    Substrate processing apparatus and method 有权
    基板加工装置及方法

    公开(公告)号：US06593045B2

    公开(公告)日：2003-07-15

    申请号：US09902159

    申请日：2001-07-11

    申请人： Norikatsu Sato ,  Kunie Ogata ,  Yoshio Kimura ,  Hiroshi Tomita ,  Seiji Nakashima ,  Hidehiko Kamiya

    发明人： Norikatsu Sato ,  Kunie Ogata ,  Yoshio Kimura ,  Hiroshi Tomita ,  Seiji Nakashima ,  Hidehiko Kamiya

    IPC分类号： G03F900

    CPC分类号： H01L21/67161 ,  G01N21/9501 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67778 ,  H01L21/67781 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/141

    摘要： A cassette station, a processing station having a coating unit and a developing unit, and an inspecting station having a film thickness inspecting apparatus and a defect inspecting apparatus are disposed in the direction approximately perpendicular to the direction of the disposition of cassettes of the cassette station in such a manner that the inspecting station is disposed midway between the cassette station and the processing station. In the structure, the inspecting station and the processing station are connected and wafers are automatically transferred among the stations, operations from the substrate process to the inspection can be simplified and the time period necessary therefore can be shortened.

    摘要翻译： 具有涂布单元和显影单元的盒式磁带站，具有膜厚度检查装置和缺陷检查装置的检查站沿大致垂直于盒式磁带机的盒的方向的方向设置 以这样的方式，使得检查站位于盒站和处理站之间的中间。 在结构中，检测站和处理站连接，晶片自动转移到站之间，可以简化从基板处理到检查的操作，从而可以缩短所需的时间。

    Process for producing aromatic carboxylic acid
    65.
    发明授权
    Process for producing aromatic carboxylic acid 失效
    芳香族羧酸的制造方法

    公开(公告)号：US06506931B1

    公开(公告)日：2003-01-14

    申请号：US09656997

    申请日：2000-09-07

    申请人： Masayasu Ishibashi ,  Hiroshi Tomita

    发明人： Masayasu Ishibashi ,  Hiroshi Tomita

    IPC分类号： C07C51255

    CPC分类号： C07C51/265 ,  C07C63/26

    摘要： A process for producing an aromatic carboxylic acid by a liquid phase oxidation of an alkylaromatic compound with molecular oxygen in a reaction solvent comprising a lower aliphatic carboxylic acid in the presence of an oxidation catalyst, in which an aromatic carboxylic acid having an improved hue of the powdery product thereof and exhibiting an improved light transmittance when dissolved in an aqueous solution of a base can be produced efficiently in a simple manner by suppressing contamination due to the intermediates and by-products formed by side reactions, the said process comprising performing the liquid phase oxidation of the alkylaromatic compound in the presence of a hydrogen gas-treated liquid containing the catalyst.

    摘要翻译： 在氧化催化剂存在下，通过在含有低级脂肪族羧酸的反应溶剂中通过烷基芳族化合物与分子氧进行液相氧化来制备芳族羧酸的方法，其中具有改进的色调的芳族羧酸 通过抑制由副反应形成的中间体和副产物引起的污染，可以以简单的方式有效地制备溶解在碱的水溶液中时提高其透光度的粉末状产物，所述方法包括进行液相 在含有催化剂的氢气处理液体存在下，烷基芳族化合物的氧化。

    Line filter
    68.
    发明授权
    Line filter 有权
    线路滤波器

    公开(公告)号：US6078242A

    公开(公告)日：2000-06-20

    申请号：US340243

    申请日：1999-07-01

    申请人： Hiroshi Tomita ,  Toshinori Oda ,  Hirotaka Ishikawa

    发明人： Hiroshi Tomita ,  Toshinori Oda ,  Hirotaka Ishikawa

    IPC分类号： H01F27/34 ,  H01F17/06 ,  H01F37/00 ,  H03H1/00 ,  H03H2/00 ,  H01F27/30 ,  H01F27/24

    CPC分类号： H03H7/427 ,  H03H2001/005

    摘要： A line filter capable of eliminating the common mode noise and the normal mode noise altogether. It comprises both the common mode noise elimination means and the normal mode noise elimination means. A central magnetic core 32 is provided in the middle flange 34 of bobbin 23. A through-window 36 is provided at a place facing the counterpart feet 27 of closed magnetic circuit core 28 so as a part of the central magnetic core 32 is exposed, but the central magnetic core 32 and the closed magnetic circuit core 28 are not making contact with each other.

    摘要翻译： 能够消除共模噪声和正常模式噪声的线路滤波器。 它包括共模噪声消除装置和正常模式噪声消除装置。 中心磁芯32设置在绕线管23的中间凸缘34中。在与闭合磁路芯28的配对脚27相对的位置处设有通孔36，以使中心磁芯32的一部分露出， 但是中心磁芯32和闭合磁路芯28彼此不接触。

    Laminated film
    69.
    发明授权
    Laminated film 失效
    层压膜

    公开(公告)号：US5958552A

    公开(公告)日：1999-09-28

    申请号：US606971

    申请日：1996-02-26

    申请人： Masayuki Fukuda ,  Hiroshi Tomita

    发明人： Masayuki Fukuda ,  Hiroshi Tomita

    IPC分类号： C08J5/18 ,  B29C55/02 ,  B29K67/00 ,  B29L9/00 ,  B32B27/20 ,  B32B27/36 ,  B41M5/52 ,  C08J7/04 ,  C08K7/16 ,  C08L67/00 ,  C08L67/02 ,  C08L71/00 ,  C08L71/02 ,  C09D167/02 ,  B32B27/08 ,  B32B27/18

    CPC分类号： C08J7/047 ,  B32B27/20 ,  B32B27/36 ,  B41M5/506 ,  B41M5/508 ,  C09D167/025 ,  C08J2367/02 ,  C08J2467/00 ,  Y10T428/24355 ,  Y10T428/24802 ,  Y10T428/24893 ,  Y10T428/254 ,  Y10T428/31786

    摘要： A laminated film comprising (A) an aromatic polyester film; and (B) a hydrophilic coating layer which is present on at least one side of the aromatic polyester film (A) and has a surface energy of at least 54 dyne/cm, the coating layer comprising (a) 50 to 80% by weight of a copolyester which contains a dicarboxylic acid component having a sulfonate group in an amount of 1 to 16 mol % of the total of all dicarboxylic acid components and has a secondary transition point of 20 to 90.degree. C., (b) 10 to 30% by weight of poly(alkylene oxide) homopolymer having a number average molecular weight of 600 to 2,000, and (c) 3 to 25% by weight of fine particles having an average particle diameter of 20 to 80 nm, based on the total of components (a), (b) and (c). The above laminated film is useful as a transparency for an overhead projector and a recording paper for an ink jet printer.

    摘要翻译： 一种层压膜，其包含（A）芳族聚酯膜; 和（B）亲水性涂层，其存在于芳族聚酯膜（A）的至少一侧上并具有至少54达因/厘米的表面能，所述涂层包含（a）50至80重量％ 的共聚酯，其含有具有磺酸盐基的二羧酸成分，其量为所有二羧酸成分总量的1〜16摩尔％，二次转变点为20〜90℃，（b）10〜30 重量的数均分子量为600〜2,000的聚（环氧烷）均聚物，和（c）3〜25重量％的平均粒径为20〜80nm的微粒，基于 组分（a），（b）和（c）。 上述层合膜可用作高架投影仪的透明体和用于喷墨打印机的记录纸。