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公开(公告)号:US20210111088A1
公开(公告)日:2021-04-15
申请号:US16464547
申请日:2016-12-29
Applicant: INTEL CORPORATION
Inventor: Rahul Jain , Kyu Oh Lee , Siddharth K. Alur , Wei-Lun K. Jen , Vipul V. Mehta , Ashish Dhall , Sri Chaitra J. Chavali , Rahul N. Manepalli , Amruthavalli P. Alur , Sai Vadlamani
IPC: H01L23/31 , H01L25/065 , H01L23/00 , H01L23/538 , H01L21/48 , H01L21/56
Abstract: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
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公开(公告)号:US20200373257A1
公开(公告)日:2020-11-26
申请号:US16990782
申请日:2020-08-11
Applicant: Intel Corporation
Inventor: Cheng Xu , Yikang Deng , Kyu Oh Lee , Ji Yong Park , Srinivas Venkata Ramanuja Pietambaram , Ying Wang , Chong Zhang , Rui Zhang , Junnan Zhao
IPC: H01L23/64 , H01L23/522 , H01L23/528 , H01F27/24 , H01L27/04 , H01F27/28 , H01L21/822
Abstract: Techniques are provided for an inductor at a second level interface between a first substrate and a second substrate. In an example, the inductor can include a winding and a core disposed inside the winding. The winding can include first conductive traces of a first substrate, second conductive traces of a second non-semiconductor substrate, and a plurality of connectors configured to connect the first substrate with the second substrate. Each connector of the plurality of connectors can be located between a trace of the first conductive traces and a corresponding trace of the second conductive traces.
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公开(公告)号:US10777514B2
公开(公告)日:2020-09-15
申请号:US16012371
申请日:2018-06-19
Applicant: Intel Corporation
Inventor: Cheng Xu , Yikang Deng , Kyu Oh Lee , Ji Yong Park , Srinivas Pietambaram , Ying Wang , Chong Zhang , Rui Zhang , Junnan Zhao
IPC: H01L23/64 , H01L23/522 , H01L23/528 , H01F27/24 , H01L27/04 , H01F27/28 , H01L21/822
Abstract: Techniques are provided for an inductor at a second level interface between a first substrate and a second substrate. In an example, the inductor can include a winding and a core disposed inside the winding. The winding can include first conductive traces of a first substrate, second conductive traces of a second non-semiconductor substrate, and a plurality of connectors configured to connect the first substrate with the second substrate. Each connector of the plurality of connectors can be located between a trace of the first conductive traces and a corresponding trace of the second conductive traces.
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公开(公告)号:US20200168384A1
公开(公告)日:2020-05-28
申请号:US16637006
申请日:2017-09-28
Applicant: Intel Corporation
Inventor: Junnan Zhao , Ying Wang , Cheng Xu , Kyu Oh Lee , Sheng Li , Yikang Deng
IPC: H01F17/00 , H01F27/255
Abstract: Described herein are magnetic core inductors (MCI) and methods for manufacturing magnetic core inductors. A first embodiment of the MCI can be a snake-configuration MCI. The snake-configuration MCI can be formed by creating an opening in a base material, such as copper, and providing a nonconductive magnetic material in the opening. The inductor can be further formed by forming plated through holes into the core material. The conductive elements for the inductor can be formed in the plated through holes. The nonconductive magnetic material surrounds each conductive element and plated through hole. In embodiments, a layered coil inductor can be formed by drilling a laminate to form a cavity through the laminate within the metal rings of the layered coil inductor. The nonconductive magnetic material can be provided in the cavity.
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65.
公开(公告)号:US20190355654A1
公开(公告)日:2019-11-21
申请号:US15985348
申请日:2018-05-21
Applicant: Intel Corporation
Inventor: Cheng Xu , Jiwei Sun , Ji Yong Park , Kyu Oh Lee , Yikang Deng , Zhichao Zhang , Liwei Cheng , Andrew James Brown
IPC: H01L23/498 , H01L23/00 , H01L21/48
Abstract: Microelectronic assemblies, and related devices and methods, are disclosed herein. For example, in some embodiments, a microelectronic assembly may include a package substrate having a core substrate with a first conductive structure having a first thickness on the core substrate, and a second conductive structure having a second thickness on the core substrate, where the first thickness is different than the second thickness.
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公开(公告)号:US10384431B2
公开(公告)日:2019-08-20
申请号:US15475157
申请日:2017-03-31
Applicant: Intel Corporation
Inventor: Ji Yong Park , Sri Chaitra J. Chavali , Siddharth K. Alur , Kyu Oh Lee
Abstract: A method for forming a substrate structure for an electrical component includes placing an electrically insulating laminate on a substrate and applying hot pressure to the electrically insulating laminate by a heatable plate. An average temperature of a surface temperature distribution within a center area of the heatable plate is higher than 80° C. during applying the hot pressure. Further, an edge area of the heatable plate laterally surrounds the center area and a temperature of the heatable plate within the edge area decreases from the center area towards an edge of the heatable plate during applying the hot pressure. A temperature at a location located vertically above an edge of the substrate during applying the hot pressure is at least 5° C. lower than the average temperature of the surface temperature distribution within the center area.
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67.
公开(公告)号:US10373951B1
公开(公告)日:2019-08-06
申请号:US16017247
申请日:2018-06-25
Applicant: Intel Corporation
Inventor: Cheng Xu , Rahul Jain , Seo Young Kim , Kyu Oh Lee , Ji Yong Park , Sai Vadlamani , Junnan Zhao
IPC: H01L27/07 , H01L23/64 , H01L23/522 , H01L23/00 , H01L49/02
Abstract: Disclosed embodiments include an embedded thin-film capacitor and a magnetic inductor that are assembled in two adjacent build-up layers of a semiconductor package substrate. The thin-film capacitor is seated on a surface of a first of the build-up layers and the magnetic inductor is partially disposed in a recess in the adjacent build up layer. The embedded thin-film capacitor and the integral magnetic inductor are configured within a die shadow that is on a die side of the semiconductor package substrate.
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公开(公告)号:US10373900B2
公开(公告)日:2019-08-06
申请号:US15806231
申请日:2017-11-07
Applicant: Intel Corporation
Inventor: Sri Chaitra J. Chavali , Amanda E. Schuckman , Kyu Oh Lee
IPC: H01L21/48 , H01L23/00 , H01L23/498
Abstract: Techniques and mechanisms for providing effective connectivity with surface level microbumps on an integrated circuit package substrate. In an embodiment, different metals are variously electroplated to form a microbump which extends through a surface-level dielectric of a substrate to a seed layer including copper. The microbump includes a combination of tin and zinc that mitigates precipitation of residual copper by promoting the formation of miconstituents in the microbump. In another embodiment, the microbump has a mass fraction of zinc, or a mass fraction of tin, that is different in various regions along a height of the microbump.
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69.
公开(公告)号:US20180286812A1
公开(公告)日:2018-10-04
申请号:US15475175
申请日:2017-03-31
Applicant: Intel Corporation
Inventor: Rahul Jain , Ji Yong Park , Kyu Oh Lee
IPC: H01L23/538 , H01L25/065 , H01L25/00 , H01L21/48 , H01L23/00
Abstract: Examples relate to a die interconnect substrate comprising a bridge die comprising at least one bridge interconnect connecting a first bridge die pad of the bridge die to a second bridge die pad of the bridge die. The die interconnect substrate further comprises a substrate structure comprising a substrate interconnect electrically insulated from the bridge die, wherein the bridge die is embedded in the substrate structure. The die interconnect substrate further comprises a first interface structure for attaching a semiconductor die to the substrate structure, wherein the first interface structure is connected to the first bridge die pad. The die interconnect substrate further comprises a second interface structure for attaching a semiconductor die to the substrate structure, wherein the second interface structure is connected to the substrate interconnect. A surface of the first interface structure and a surface of the second interface structure are at the same height.
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公开(公告)号:US20180076119A1
公开(公告)日:2018-03-15
申请号:US15806231
申请日:2017-11-07
Applicant: Intel Corporation
Inventor: Sri Chaitra J. Chavali , Amanda E. Schuckman , Kyu Oh Lee
IPC: H01L23/498 , H01L23/00 , H01L21/48
CPC classification number: H01L23/49816 , H01L21/486 , H01L23/49827 , H01L23/49833 , H01L24/17 , H01L2224/13111 , H01L2224/13118 , H01L2224/16238 , H01L2924/01022 , H01L2924/15321 , H01L2924/15747
Abstract: Techniques and mechanisms for providing effective connectivity with surface level microbumps on an integrated circuit package substrate. In an embodiment, different metals are variously electroplated to form a microbump which extends through a surface-level dielectric of a substrate to a seed layer including copper. The microbump includes a combination of tin and zinc that mitigates precipitation of residual copper by promoting the formation of miconstituents in the microbump. In another embodiment, the microbump has a mass fraction of zinc, or a mass fraction of tin, that is different in various regions along a height of the microbump.
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