利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

85 条记录 (耗时 0.027 秒)

    Pad assembly for eyeglass frames
    61.
    发明授权
    Pad assembly for eyeglass frames 失效
    眼镜架垫组件

    公开(公告)号：US4556300A

    公开(公告)日：1985-12-03

    申请号：US463726

    申请日：1983-02-04

    申请人： Anton Dietrich

    发明人： Anton Dietrich

    IPC分类号： G02C5/12

    CPC分类号： G02C5/12

    摘要： A pad assembly for eyeglass frames, in which an insert with a mounting portion is molded-in into the nose pad, whereby the mounting opening of the mounting portion is located outside of the nose pad; a connecting area is provided at the pad arm end which includes one or several projections and is adapted to be inserted into the mounting opening. The mounting opening is dimensionally reduced by plastic deformation of the mounting portion to such an extent that with an inserted connecting area of the pad arm end, a form-locking connection will result between the mounting portion and the pad arm.

    摘要翻译： 一种用于眼镜架的垫组件，其中具有安装部分的插入件被模制到鼻垫中，由此安装部分的安装开口位于鼻垫的外侧; 连接区域设置在焊盘臂端，其包括一个或多个突起，并且适于插入到安装开口中。 通过安装部分的塑性变形，安装开口尺寸减小到这样的程度，即当焊接臂端部的插入的连接区域在安装部分和焊盘臂之间将形成锁定连接。

    Method of co-sputtering alloys and compounds using a dual C-MAG cathode arrangement and corresponding apparatus
    67.
    发明申请
    Method of co-sputtering alloys and compounds using a dual C-MAG cathode arrangement and corresponding apparatus 审中-公开
    使用双C-MAG阴极布置和相应设备共同溅射合金和化合物的方法

    公开(公告)号：US20120067717A1

    公开(公告)日：2012-03-22

    申请号：US12923389

    申请日：2010-09-17

    申请人： Anton Dietrich ,  Kevin O'Connor ,  Richard Blacker

    发明人： Anton Dietrich ,  Kevin O'Connor ,  Richard Blacker

    IPC分类号： C23C14/35

    CPC分类号： C23C14/352 ,  C03C17/002 ,  H01J37/3405 ,  H01J37/3417

    摘要： Certain example embodiments of this invention relate to techniques for sputter-depositing a thin film(s) including two or more materials using targets such as rotating cylindrical sputtering targets, including a method and apparatus. Magnet bar assemblies in first and second adjacent sputtering targets are oriented differently. The different orientations of the magnet bar assemblies allows material from the second target to be sputtered onto the first target, or vice versa. The mixture of material on the first target, including sputtering material from both the first and second targets, is then sputtered onto a substrate to form a sputter-deposited thin film that includes a mixture of the sputtering materials from the targets.

    摘要翻译： 本发明的某些示例性实施例涉及使用诸如旋转圆柱形溅射靶的靶（包括方法和装置）溅射沉积包括两种或更多种材料的薄膜的技术。 第一和第二相邻溅射靶中的磁棒组件取向不同。 磁棒组件的不同取向允许来自第二靶的材料溅射到第一靶上，反之亦然。 然后将第一靶上的材料混合物（包括来自第一靶和第二靶的溅射材料）溅射到衬底上以形成溅射沉积的薄膜，其包括来自靶的溅射材料的混合物。

    Techniques for depositing transparent conductive oxide coatings using dual C-MAG sputter apparatuses
    69.
    发明申请
    Techniques for depositing transparent conductive oxide coatings using dual C-MAG sputter apparatuses 审中-公开
    使用双C-MAG溅射装置沉积透明导电氧化物涂层的技术

    公开(公告)号：US20100200395A1

    公开(公告)日：2010-08-12

    申请号：US12320904

    申请日：2009-02-06

    申请人： Anton Dietrich ,  Yiwei Lu ,  Bryce Corsner

    发明人： Anton Dietrich ,  Yiwei Lu ,  Bryce Corsner

    IPC分类号： C23C14/35 ,  C23C14/34

    CPC分类号： C23C14/0042 ,  C23C14/352 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/3405 ,  H01J37/342

    摘要： Certain example embodiments relate to techniques for depositing transparent conductive oxide (TCO) coatings using dual C-MAG sputtering apparatuses. Certain example embodiments provide a closed-loop system with the following process conditions. About 90% of the oxygen gas provided to the apparatus is provided via a top gas inlet. Pressure within the apparatus is increased to about 10−3 to 10−2 mbar, e.g., by providing an inert gas flow of at least about 600 sccm in certain example embodiments. Tube rotation is reduced to less than about 5 RPM. The power provided to the apparatus is adjusted in dependence on the presence or absence of oxygen partial pressure oscillations. TCOs such as, for example, ITO, ZnAlOx, SnSbOx, may be deposited according to the techniques of certain example embodiments.

    摘要翻译： 某些示例实施例涉及使用双C-MAG溅射装置沉积透明导电氧化物（TCO）涂层的技术。 某些示例性实施例提供具有以下处理条件的闭环系统。 提供给设备的约90％的氧气经由顶部气体入口提供。 在某些示例性实施方案中，例如通过提供至少约600sccm的惰性气体流，装置内的压力增加到约10-3至10-2毫巴。 管旋转减小到小于约5RPM。 根据氧气分压振荡的存在或不存在来调整提供给设备的功率。 可以根据某些示例性实施方案的技术沉积TCO，例如ITO，ZnAlO x，SnSbO x。