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    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    63.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20110096307A1

    公开(公告)日：2011-04-28

    申请号：US12960947

    申请日：2010-12-06

    申请人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens

    发明人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70866 ,  G03F7/70341

    摘要： An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

    摘要翻译： 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。

    Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly
    64.
    发明授权
    Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly 有权
    用于进行倾斜聚焦的方法和曝光装置以及由此制造的装置

    公开(公告)号：US07834975B2

    公开(公告)日：2010-11-16

    申请号：US11441348

    申请日：2006-05-26

    申请人： Jacobus Burghoorn ,  Jan Hauschild ,  Arie Jeffrey Den Boef ,  Martinus Hendrikus Antonius Leenders ,  Uwe Mickan ,  Roeland Nicolaas Maria Vanneer

    发明人： Jacobus Burghoorn ,  Jan Hauschild ,  Arie Jeffrey Den Boef ,  Martinus Hendrikus Antonius Leenders ,  Uwe Mickan ,  Roeland Nicolaas Maria Vanneer

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70641 ,  G03F7/70283 ,  G03F9/7026 ,  G03F9/7069

    摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.

    摘要翻译： 执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投影射束投射到目标部分上，引入第一投射投影 使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影 确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。