公开(公告)号：US07825377B2

公开(公告)日：2010-11-02

申请号：US12153068

申请日：2008-05-13

申请人： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

发明人： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

IPC分类号： G21K1/08 ,  H01J3/14

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1501 ,  H01J2237/1534 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/31793

摘要： An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

摘要翻译： 提供具有使用多极透镜的像差校正器的电子束装置。 电子束装置具有能够进行像差校正器的操作的扫描模式和用于禁止像差校正器的操作的扫描模式，并且每个像差校正器，聚光透镜等的操作被控制，使得 物镜的物体在任一种扫描模式下都不会改变。 如果在两种模式中的样本的二次电子图像之间进行比较，则图像缩放因子和焦点保持不变，并且可以通过清楚地仅识别像差校正器的效果来进行评估和调整。 这减少了由于像差校正器固有的轴向对准缺陷而长时间调整光轴所需的时间以及像差校正器之外的不同于彼此混合的部分的轴向对准缺陷所需的时间。

公开(公告)号：US20090008551A1

公开(公告)日：2009-01-08

申请号：US12153068

申请日：2008-05-13

申请人： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

发明人： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

IPC分类号： G01N23/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1501 ,  H01J2237/1534 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/31793

摘要： An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

摘要翻译： 提供具有使用多极透镜的像差校正器的电子束装置。 电子束装置具有能够进行像差校正器的操作的扫描模式和用于禁止像差校正器的操作的扫描模式，并且每个像差校正器，聚光透镜等的操作被控制，使得 物镜的物体在任一种扫描模式下都不会改变。 如果在两种模式中的样本的二次电子图像之间进行比较，则图像缩放因子和焦点保持不变，并且可以通过清楚地仅识别像差校正器的效果来进行评估和调整。 这减少了由于像差校正器固有的轴向对准缺陷而长时间调整光轴所需的时间以及像差校正器之外的不同于彼此混合的部分的轴向对准缺陷所需的时间。

公开(公告)号：US07199365B2

公开(公告)日：2007-04-03

申请号：US11220548

申请日：2005-09-08

申请人： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

发明人： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

IPC分类号： G21K1/08 ,  H01J3/14

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1501 ,  H01J2237/1534 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/31793

摘要： An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

公开(公告)号：US20060016991A1

公开(公告)日：2006-01-26

申请号：US11220548

申请日：2005-09-08

申请人： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

发明人： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

IPC分类号： G21K7/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1501 ,  H01J2237/1534 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/31793

摘要： An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

公开(公告)号：US6043491A

公开(公告)日：2000-03-28

申请号：US133667

申请日：1998-08-12

申请人： Yoichi Ose ,  Kiyomi Yoshinari ,  Hideo Todokoro ,  Mitsugu Sato

发明人： Yoichi Ose ,  Kiyomi Yoshinari ,  Hideo Todokoro ,  Mitsugu Sato

IPC分类号： H01J37/244 ,  H01J37/28

CPC分类号： H01J37/28 ,  H01J37/244 ,  H01J2237/026 ,  H01J2237/0475

摘要： A scanning electron microscope in the present invention, by employing a retarding method and suppressing interferences between an electron beam and secondary electrons or back scattered electrons, makes it possible to obtain a clearer SEM image with a higher resolution. In the scanning electron microscope in the present invention, a shield electrode 117 is provided for shielding the electron beam 104 from electric fields of an energy analyzer 118 and a detector 121, and the energy analyzer 118 and the detector 121 are located in contact with an electron beam aperture 115 and the shield electrode 117.

摘要翻译： 本发明的扫描型电子显微镜，通过采用延迟方法，抑制电子束与二次电子或背散射电子之间的干扰，能够得到更清晰的具有更高分辨率的SEM图像。 在本发明的扫描型电子显微镜中，设有屏蔽电极117，用于将电子束104与能量分析器118和检测器121的电场进行屏蔽，能量分析器118和检测器121位于与 电子束孔115和屏蔽电极117。

公开(公告)号：US5677530A

公开(公告)日：1997-10-14

申请号：US668177

申请日：1996-06-21

申请人： Mitsugu Sato ,  Ryuji Hoya ,  Yoichi Ose

发明人： Mitsugu Sato ,  Ryuji Hoya ,  Yoichi Ose

IPC分类号： H01J37/141 ,  G01R31/305 ,  H01J37/147 ,  H01J37/153 ,  H01J37/244 ,  H01J37/28

CPC分类号： G01R31/305 ,  H01J37/153 ,  H01J37/28

摘要： A scanning electron microscope comprising an objective lens for forming lens magnetic field on the sample side, and observing the image of the sample after detecting the secondary electrons from the sample on the upper side of the objective lens is disclosed. The accelerating electrode is arranged along the electron beam passage of the objective lens, and an positive potential is applied thereto. The electric field correction electrode is disposed outside the accelerating electrode or to the sample side. A negative potential is applied to the electric field correction electrode. An image observation with high resolution also is realized even when the sample is inclined.

摘要翻译： 公开了一种扫描电子显微镜，其包括用于在样品侧形成透镜磁场的物镜，并且在从物镜的上侧的样品检测到二次电子之后观察样品的图像。 加速电极沿物镜的电子束通路配置，向其施加正电位。 电场校正电极设置在加速电极或样品侧的外侧。 对电场校正电极施加负电位。 即使样品倾斜，也可以实现高分辨率的图像观察。

公开(公告)号：US5668372A

公开(公告)日：1997-09-16

申请号：US615650

申请日：1996-03-13

申请人： Yuko Iwabuchi ,  Mitsugu Sato ,  Yoichi Ose

发明人： Yuko Iwabuchi ,  Mitsugu Sato ,  Yoichi Ose

IPC分类号： H01J37/20 ,  H01J37/12 ,  H01J37/153 ,  H01J37/244 ,  H01J37/28

CPC分类号： H01J37/153 ,  H01J37/28 ,  H01J2237/15

摘要： A device enables high resolution observation even when a sample is tiled. A deflecting electrode device for generating an electric field having a component in the direction perpendicular to the center axis (optical axis) of an objective lens is provided between the objective lens and the sample. A voltage applied to the deflecting electrode device is controlled in accordance with the tilting of a sample stage. A lateral electric field component generated on the optical axis when the sample stage is tiled is corrected by a deflected electric field generated by the deflecting electrode device. This is effective to suppress generation of astigmatism, and to allows effective arrival of an secondary electron at a secondary electron detector disposed at a position nearer the electron source side than the objective lens.

摘要翻译： 即使在样品被平铺时，该装置也能够进行高分辨率观察。 在物镜和样品之间设置用于产生具有与物镜的中心轴（光轴）垂直的方向的分量的电场的偏转电极装置。 根据样品台的倾斜来控制施加到偏转电极装置的电压。 当采样台平铺时在光轴上产生的横向电场分量由偏转电极装置产生的偏转电场来校正。 这有效地抑制散光的产生，并且允许二次电子在位于比物镜更靠近电子源侧的位置处的二次电子检测器的有效到达。

公开(公告)号：US5532483A

公开(公告)日：1996-07-02

申请号：US403980

申请日：1995-03-15

申请人： Yoichi Ose ,  Kiyomi Yoshinari ,  Masayoshi Yano ,  Tadao Mimura

发明人： Yoichi Ose ,  Kiyomi Yoshinari ,  Masayoshi Yano ,  Tadao Mimura

IPC分类号： H01J49/06 ,  H01J49/10

CPC分类号： H01J49/10 ,  H01J49/06

摘要： An ion beam having a good converging property and a good quality is provided by satisfying the limitations controlling both angle of dispersion and the width of beam at the same time. The voltage 12d of a repeller electrode 1f in an ion source of electron bombardment type is input to an ion source state monitor 11 and the ion source state monitor 11 output a predicted value 12e of the voltage applied to an extractor electrode 1g to an extractor power source 9. As for the extractor electrode system, the width of a slit in the acceleration electrode 1b is made larger than the width of a slit of the extractor electrode 1g, and the extractor electrode 1g is set in a position apart from the acceleration electrode 1b by the distance nearly equal to the distance between the acceleration electrode 1b and the ion generating region 2a. By doing so, the electric field leaked from the slit of the acceleration electrode 1b to the inside of the ionization chamber 1a expands to the vicinity of the ion generating region. As the result, the ion beam 2 is effectively extracted to pass through the slits in the acceleration electrode 1b and the extractor 1g. The amount of the current passing through the slits is measured with an ion current monitor 8a and the voltage 12f of a converging electrode 1d is adjusted so that the value of the current becomes the maximum.

摘要翻译： 通过满足同时控制分散角和宽度的限制来提供具有良好的会聚特性和良好质量的离子束。 电子轰击型离子源中的斥极电极1f的电压12d被输入到离子源状态监视器11，离子源状态监视器11将施加到抽出电极1g的电压的预测值12e输出到提取电力 对于提取器电极系统，使加速电极1b中的狭缝的宽度大于提取电极1g的狭缝的宽度，并且将提取电极1g设置在离开加速电极1的位置 1b的距离几乎等于加速电极1b和离子产生区域2a之间的距离。 通过这样做，从加速电极1b的狭缝向电离室1a的内部泄漏的电场扩大到离子产生区域附近。 结果，有效地提取离子束2以通过加速电极1b和提取器1g中的狭缝。 通过离子电流监视器8a测量通过狭缝的电流量，调节会聚电极1d的电压12f，使得电流值变为最大值。

公开(公告)号：US07435958B2

公开(公告)日：2008-10-14

申请号：US11356438

申请日：2006-02-17

申请人： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

发明人： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

IPC分类号： H01J37/10

CPC分类号： H01J37/09 ,  H01J37/16 ,  H01J2237/1405 ,  H01J2237/16 ,  H01J2237/2614 ,  H01J2237/2617 ,  H01J2237/28

摘要： A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

摘要翻译： 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室，其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金，镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

公开(公告)号：US07205550B2

公开(公告)日：2007-04-17

申请号：US11450382

申请日：2006-06-12

申请人： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

发明人： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

IPC分类号： H03M1/22

CPC分类号： H01J37/09 ,  H01J37/16 ,  H01J2237/1405 ,  H01J2237/16 ,  H01J2237/2614 ,  H01J2237/2617 ,  H01J2237/28

摘要： A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

摘要翻译： 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室，其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金，镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。