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    Method of co-sputtering alloys and compounds using a dual C-MAG cathode arrangement and corresponding apparatus
    64.
    发明申请
    Method of co-sputtering alloys and compounds using a dual C-MAG cathode arrangement and corresponding apparatus 审中-公开
    使用双C-MAG阴极布置和相应设备共同溅射合金和化合物的方法

    公开(公告)号：US20120067717A1

    公开(公告)日：2012-03-22

    申请号：US12923389

    申请日：2010-09-17

    申请人： Anton Dietrich ,  Kevin O'Connor ,  Richard Blacker

    发明人： Anton Dietrich ,  Kevin O'Connor ,  Richard Blacker

    IPC分类号： C23C14/35

    CPC分类号： C23C14/352 ,  C03C17/002 ,  H01J37/3405 ,  H01J37/3417

    摘要： Certain example embodiments of this invention relate to techniques for sputter-depositing a thin film(s) including two or more materials using targets such as rotating cylindrical sputtering targets, including a method and apparatus. Magnet bar assemblies in first and second adjacent sputtering targets are oriented differently. The different orientations of the magnet bar assemblies allows material from the second target to be sputtered onto the first target, or vice versa. The mixture of material on the first target, including sputtering material from both the first and second targets, is then sputtered onto a substrate to form a sputter-deposited thin film that includes a mixture of the sputtering materials from the targets.

    摘要翻译： 本发明的某些示例性实施例涉及使用诸如旋转圆柱形溅射靶的靶（包括方法和装置）溅射沉积包括两种或更多种材料的薄膜的技术。 第一和第二相邻溅射靶中的磁棒组件取向不同。 磁棒组件的不同取向允许来自第二靶的材料溅射到第一靶上，反之亦然。 然后将第一靶上的材料混合物（包括来自第一靶和第二靶的溅射材料）溅射到衬底上以形成溅射沉积的薄膜，其包括来自靶的溅射材料的混合物。

    Techniques for depositing transparent conductive oxide coatings using dual C-MAG sputter apparatuses
    66.
    发明申请
    Techniques for depositing transparent conductive oxide coatings using dual C-MAG sputter apparatuses 审中-公开
    使用双C-MAG溅射装置沉积透明导电氧化物涂层的技术

    公开(公告)号：US20100200395A1

    公开(公告)日：2010-08-12

    申请号：US12320904

    申请日：2009-02-06

    申请人： Anton Dietrich ,  Yiwei Lu ,  Bryce Corsner

    发明人： Anton Dietrich ,  Yiwei Lu ,  Bryce Corsner

    IPC分类号： C23C14/35 ,  C23C14/34

    CPC分类号： C23C14/0042 ,  C23C14/352 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/3405 ,  H01J37/342

    摘要： Certain example embodiments relate to techniques for depositing transparent conductive oxide (TCO) coatings using dual C-MAG sputtering apparatuses. Certain example embodiments provide a closed-loop system with the following process conditions. About 90% of the oxygen gas provided to the apparatus is provided via a top gas inlet. Pressure within the apparatus is increased to about 10−3 to 10−2 mbar, e.g., by providing an inert gas flow of at least about 600 sccm in certain example embodiments. Tube rotation is reduced to less than about 5 RPM. The power provided to the apparatus is adjusted in dependence on the presence or absence of oxygen partial pressure oscillations. TCOs such as, for example, ITO, ZnAlOx, SnSbOx, may be deposited according to the techniques of certain example embodiments.

    摘要翻译： 某些示例实施例涉及使用双C-MAG溅射装置沉积透明导电氧化物（TCO）涂层的技术。 某些示例性实施例提供具有以下处理条件的闭环系统。 提供给设备的约90％的氧气经由顶部气体入口提供。 在某些示例性实施方案中，例如通过提供至少约600sccm的惰性气体流，装置内的压力增加到约10-3至10-2毫巴。 管旋转减小到小于约5RPM。 根据氧气分压振荡的存在或不存在来调整提供给设备的功率。 可以根据某些示例性实施方案的技术沉积TCO，例如ITO，ZnAlO x，SnSbO x。

    EMI filter for plasma display panel
    68.
    发明申请
    EMI filter for plasma display panel 有权
    用于等离子体显示面板的EMI滤波器

    公开(公告)号：US20090297864A1

    公开(公告)日：2009-12-03

    申请号：US12230033

    申请日：2008-08-21

    申请人： Philip J. Lingle ,  Anton Dietrich ,  Yiwei Lu ,  Willem Den Boer ,  John A. Vanderploeg ,  Yei-Ping (Mimi) H. Wang

    发明人： Philip J. Lingle ,  Anton Dietrich ,  Yiwei Lu ,  Willem Den Boer ,  John A. Vanderploeg ,  Yei-Ping (Mimi) H. Wang

    IPC分类号： B32B15/04 ,  H05K9/00

    CPC分类号： G02B1/00 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3652 ,  C03C17/3676 ,  G02B1/11 ,  G02B1/116 ,  G02B5/28 ,  H01J11/44 ,  H05K9/0096 ,  Y10T428/12549 ,  Y10T428/2495

    摘要： A plasma display panel (PDP) includes an EMI filter at a front portion thereof for blocking/shielding substantial amounts of electromagnetic waves. The filters has high visible transmission, and is capable of blocking/shielding electromagnetic waves. In certain example embodiments, a silver based coating of the EMI filter reduces damage from EMI radiation through highly conductive Ag layers, blocks significant amounts of NIR and IR radiation from outdoor sunlight to reduce PDP panel temperature, and enhances contrast ratio through reduced reflection, while maintaining high visible transmission. In certain example embodiments, at least one layer of or including silicon nitride may be Si-rich, and/or at least one layer including an oxide of Ni and/or Cr may be a suboxide, in order to improve heat treatability of the coated article.

    摘要翻译： 等离子体显示面板（PDP）在其前部包括用于阻挡/屏蔽大量电磁波的EMI滤波器。 滤光片具有高可见透光率，能够阻挡/屏蔽电磁波。 在某些示例性实施例中，EMI滤波器的基于银的涂层减少了通过高导电性Ag层的EMI辐射的损伤，阻挡了来自户外太阳光的大量NIR和IR辐射以降低PDP面板温度，并且通过减少的反射增强了对比度，同时 保持高可见传播。 在某些示例性实施例中，至少一层或包含氮化硅的层可以是富Si的，和/或包含Ni和/或Cr的氧化物的至少一层可以是低氧化物，以便改善被涂覆层的热处理性 文章。

    First surface mirror with chromium nitride layer
    69.
    发明授权
    First surface mirror with chromium nitride layer 有权
    第一表面镜与氮化铬层

    公开(公告)号：US07621648B2

    公开(公告)日：2009-11-24

    申请号：US11892500

    申请日：2007-08-23

    申请人： Francis Wuillaume ,  Anton Dietrich ,  Brent Boyce ,  Gregory Scott

    发明人： Francis Wuillaume ,  Anton Dietrich ,  Brent Boyce ,  Gregory Scott

    IPC分类号： G02B7/182

    CPC分类号： G02B5/08

    摘要： A mirror (e.g., first surface mirror) is provided with a layer of or including chromium nitride (CrNx). In certain example embodiments, the CrNx layer may be the primary reflective layer of the mirror. Surprisingly and unexpectedly, it has been found the addition of nitrogen to the chromium to form CrNx reduces pinhole formations in the resulting layer. In certain example embodiments, the more nitrogen which is introduced into the layer, the smaller the number and/or size of pinholes in the Cr inclusive layer. In certain example embodiments, it has also been found that the addition of nitrogen to Cr may improve durability.

    摘要翻译： 反射镜（例如，第一表面反射镜）设置有或包含氮化铬（CrNx）的层。 在某些示例性实施例中，CrNx层可以是反射镜的主要反射层。 令人惊奇和意外的是，已经发现向铬中添加氮以形成CrNx，从而减少所得层中的针孔形成。 在某些示例性实施例中，被引入层中的氮越多，包含Cr的层中的针孔的数量和/或尺寸越小。 在某些示例性实施方案中，还已经发现，向Cr中添加氮可以提高耐久性。