公开(公告)号：US5975709A

公开(公告)日：1999-11-02

申请号：US234948

申请日：1994-04-28

申请人： Ryuichi Ebinuma ,  Yutaka Watanabe

发明人： Ryuichi Ebinuma ,  Yutaka Watanabe

IPC分类号： G02B5/10 ,  G02B7/182 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  G02B5/08

CPC分类号： G03F7/702 ,  G02B5/10 ,  G02B7/182 ,  G03F7/70233 ,  G03F7/70891 ,  G21K1/06 ,  G21K2201/067

摘要： A reflection system, includes a reflecting member having a mirror-finished reflection surface of a spherical shape; and a base member having a base surface of a predetermined shape; and wherein the reflection member and the base member are adhered to each other with one of the bottom surface of the reflection member and the base surface of the base member being made to follow the other to cause deformation of the spherical shape, whereby the reflection surface is formed into an aspherical shape.

摘要翻译： 反射系统包括具有球面形状的镜面反射面的反射部件， 以及具有预定形状的基面的基底构件; 并且其中所述反射构件和所述基底构件通过所述反射构件的底表面中的一个并且所述基底构件的所述基面彼此粘合以引起所述球形的变形，由此所述反射面 形成为非球面形状。

公开(公告)号：US5822133A

公开(公告)日：1998-10-13

申请号：US695203

申请日：1996-08-01

申请人： Makoto Mizuno ,  Ryuichi Ebinuma ,  Toshinori Minowa

发明人： Makoto Mizuno ,  Ryuichi Ebinuma ,  Toshinori Minowa

IPC分类号： G02B7/04 ,  G02B3/14 ,  G02B7/02 ,  G02B26/08 ,  G02B27/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  G02B15/14

CPC分类号： G03F7/70241 ,  G02B26/0875 ,  G02B27/0025 ,  G02B3/14 ,  G02B7/023 ,  G02B7/026 ,  G03F7/70825 ,  G03F7/70883

摘要： An optical component moving device having a driving portion and guiding portion, for moving an optical component, wherein the driving portion includes fluid enclosure system being expandable and contractible and the guiding portion includes a leaf spring.

摘要翻译： 一种具有用于移动光学部件的驱动部分和引导部分的光学部件移动装置，其中驱动部分包括可扩张和收缩的流体封闭系统，并且引导部分包括板簧。

公开(公告)号：US5822043A

公开(公告)日：1998-10-13

申请号：US335394

申请日：1994-11-03

申请人： Ryuichi Ebinuma

发明人： Ryuichi Ebinuma

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70358 ,  G03F9/70

摘要： An exposure method includes the steps of illuminating an original with exposure light having a size b with respect to a scan direction, and projecting a pattern of the illuminated original onto a substrate with a projection magnification N.sub.op, and scanning the original and the substrate In the scan direction at a speed ratio N.sub.st different from the projection magnification N.sub.op wherein the speed ratio N.sub.st corresponds to the ratio between the speed of the substrate and the speed of the original and, when the minimum linewidth of an image of the pattern with respect to the scan direction is denoted by .DELTA.l. a relation 0

摘要翻译： 曝光方法包括以相对于扫描方向具有尺寸b的曝光光照射原件的步骤，并且将投影放大率Nop将照射的原稿的图案投影到基板上，并扫描原件和基板在 扫描方向与投影倍率Nop不同的速度比Nst，其中速度比Nst对应于基板的速度与原稿的速度之间的比率，并且当图案相对于图案的图像的最小线宽 扫描方向由DELTA l表示。 满足关系0 <| Nop-Nst | xb

公开(公告)号：US5760802A

公开(公告)日：1998-06-02

申请号：US167196

申请日：1993-12-16

申请人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Yuji Chiba

发明人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Yuji Chiba

IPC分类号： B41J2/165 ,  B41J2/175 ,  B41J11/14 ,  B41J29/02 ,  B41J29/377 ,  G03G21/16 ,  H04N1/00

CPC分类号： B41J2/17523 ,  B41J11/14 ,  B41J2/1652 ,  B41J2/16585 ,  B41J2/1714 ,  B41J2/17513 ,  B41J2/1752 ,  B41J29/02 ,  B41J29/377 ,  G03G21/1628 ,  G03G21/1647 ,  G03G21/206 ,  H04N1/00525 ,  H04N1/00543 ,  H04N1/00554 ,  H04N1/00976 ,  G03G2221/1645 ,  G03G2221/1651 ,  G03G2221/1672 ,  G03G2221/1687

摘要： A recording apparatus is provided with an upper unit having a recording head for discharging ink for effecting recording on a recording medium in response to information, and at least a portion of the electric circuit of the apparatus, a lower unit having a platen for maintaining the recording medium in the recording station by the recording head, the lower unit capable of being spaced apart relative to the upper unit, and a conveying member for conveying the recording medium to the recording station. The upper unit and the lower unit are capable of being spaced apart and opened in the recording station by the recording head.

公开(公告)号：US5593800A

公开(公告)日：1997-01-14

申请号：US367856

申请日：1995-01-03

申请人： Hidehiko Fujioka ,  Noriyuki Nose ,  Ryuichi Ebinuma ,  Shinichi Hara ,  Hiroshi Maehara

发明人： Hidehiko Fujioka ,  Noriyuki Nose ,  Ryuichi Ebinuma ,  Shinichi Hara ,  Hiroshi Maehara

IPC分类号： G03F1/00 ,  G03F1/22 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70475 ,  G03F1/22 ,  G03F7/70358

摘要： A mask manufacturing method includes holding through a first stage a master reticle having a pattern, holding through a second stage a mask substrate, projecting an exposure beam to the pattern of the master reticle held by the first stage, and projecting the pattern onto the mask substrate held by the second stage at a predetermined reduction magnification, and scanning the first and second stages in a timed relation and at a predetermined speed ratio, whereby the pattern of the master reticle is transferred to the mask substrate.

摘要翻译： 掩模制造方法包括：通过第一阶段保持具有图案的主掩模版，通过第二阶段保持掩模基板，将曝光光束投射到由第一平台保持的主光栅的图案上，并将图案投影到掩模上 基板以预定的缩小倍率保持第二阶段，并以定时关系和预定的速度比扫描第一和第二阶段，从而将主标线的图案转印到掩模基板。

公开(公告)号：US5374829A

公开(公告)日：1994-12-20

申请号：US231785

申请日：1994-04-25

申请人： Eiji Sakamoto ,  Ryuichi Ebinuma ,  Shinichi Hara ,  Mitsuji Marumo

发明人： Eiji Sakamoto ,  Ryuichi Ebinuma ,  Shinichi Hara ,  Mitsuji Marumo

IPC分类号： C30B25/12 ,  C30B31/14 ,  H01L21/683 ,  H01J37/20

CPC分类号： C30B31/14 ,  C30B25/12 ,  H01L21/6838 ,  Y10T279/11

摘要： A wafer holding device of the vacuum attraction type includes a structural member having a protrusion for supporting a wafer and elastic members made of a material having an elasticity modulus smaller than that of the wafer and that of the structural member. The elastic members are distributed on a wafer attraction plane of the structural member.

摘要翻译： 真空吸引型的晶片保持装置包括具有用于支撑晶片的突起的结构构件和由具有比晶片的弹性模量小的结构构件的弹性模量的材料制成的弹性构件。 弹性构件分布在结构构件的晶片吸引面上。

公开(公告)号：US5347561A

公开(公告)日：1994-09-13

申请号：US168412

申请日：1993-12-17

申请人： Ryuichi Ebinuma

发明人： Ryuichi Ebinuma

IPC分类号： G21K5/04 ,  G03F7/20 ,  H01L21/027 ,  G21K5/00

CPC分类号： G03F7/70558 ,  G03F7/70808 ,  G03F7/70866

摘要： X-rays enter an airtight chamber through a beam duct, pass through a transmission window, and expose a wafer and mask disposed outside the airtight chamber. The wafer and mask are held by a wafer chuck and a mask holder, respectively. The mask holder includes a pressure sensor, which detects variations in the atmospheric pressure. An output from the pressure sensor is converted into a change in the intensity of the x-rays by an arithmetic unit, and is transmitted to a control unit, which controls a driving unit of a shutter. By thus controlling the moving speed of the shutter in accordance with variations in the atmospheric pressure, it is possible to prevent variations in the amount of x-ray exposure of the wafer.

摘要翻译： X射线通过射束通道进入气密室，通过透射窗，并露出设在气密室外部的晶片和掩模。 晶片和掩模分别由晶片卡盘和掩模支架保持。 面罩座包括检测大气压变化的压力传感器。 来自压力传感器的输出由运算单元转换为X射线强度的变化，并被传送到控制单元的控制单元。 通过根据大气压力的变化来控制快门的移动速度，可以防止晶片的x射线曝光量的变化。

公开(公告)号：US5285488A

公开(公告)日：1994-02-08

申请号：US974307

申请日：1992-11-10

申请人： Yutaka Watanabe ,  Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Shunichi Uzawa ,  Takao Kariya

发明人： Yutaka Watanabe ,  Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Shunichi Uzawa ,  Takao Kariya

IPC分类号： G03F7/20 ,  G21K5/00

CPC分类号： G03F7/702

摘要： An exposure apparatus includes an exposure beam source for projecting a beam flux for exposure, having a non-uniform intensity distribution, toward a range including an exposure zone, set with respect to a main body of the exposure apparatus; illuminance detectors disposed at least at two points inside the exposure beam flux but outside the exposure zone; and a detecting device for detecting a change in intensity of the exposure beam and a change in relative position of the exposure zone and the exposure beam flux, on the basis of detected illuminances at the two points.

摘要翻译： 曝光装置包括：曝光束源，用于将曝光用光束投射到具有相对于曝光装置的主体的曝光区域的范围内，具有不均匀的强度分布; 照度检测器至少设置在曝光光束内部的两个点处，但在曝光区域外; 以及检测装置，其基于两点处的检测到的照度，检测曝光光束的强度变化和曝光区域和曝光光束通量的相对位置的变化。

公开(公告)号：US5172402A

公开(公告)日：1992-12-15

申请号：US666649

申请日：1991-03-08

申请人： Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Hiroshi Kurosawa ,  Koji Uda ,  Takao Kariya ,  Shunichi Uzawa

发明人： Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Hiroshi Kurosawa ,  Koji Uda ,  Takao Kariya ,  Shunichi Uzawa

IPC分类号： G03F7/20

CPC分类号： G03F7/70008 ,  G03F7/702

摘要： An exposure method for manufacture of semiconductor devices, includes moving a shutter having an edge so that the edge is related to a predetermined exposure region; projecting an exposure beam to the edge of the shutter and to at least a portion of the exposure region; determining a position of a shadow of the edge of the shutter formed by the exposure beam with respect to a predetermined coordinate system related to movement of a movable chuck; adjusting the shutter in accordance with the determination; placing a substrate on the chuck; moving the chuck so that the substrate is related to the exposure region; and controlling the exposure of the substrate with the exposure beam through the shutter.

公开(公告)号：US5170418A

公开(公告)日：1992-12-08

申请号：US716970

申请日：1991-06-18

申请人： Ryuichi Ebinuma

发明人： Ryuichi Ebinuma

IPC分类号： G03F7/20 ,  H01L21/027 ,  H05G2/00

CPC分类号： G03F7/70008 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70858 ,  G03F7/70866

摘要： An X-ray exposure method and apparatus wherein an exposure chamber coupled with a synchrotron radiation device through a beam line receives synchrotron radiation through a window material provided on the beam line to execute an exposure process, a pressure sensor detects pressure in the exposure chamber, a cutoff valve is provided in a portion of the beam line between the window material and the synchrotron radiation device, and a bypass has a communication valve for communicating a portion of the beam line between the window material and the cutoff valve with a portion between the window material and the exposure chamber. In addition, a vacuum evacuating device effects evacuation of a portion of the beam line between the window material and the cutoff vlave, a pump valve is disposed in a conduit, coupling the beam line with the vacuum evacuating device, and a controller responds to a pressure detected by the pressure sensor so that, when the detected pressure represents a steady state lower than a predetermined pressure, the controller operates to open the cutoff valve and the pump valve and to close the communication valve and, when the detected pressure is higher than the predetermined pressure, the controller operates to close the cutoff valve and the pump valve and thereafter to open the communication valve.