LASER-ASSISTED ALIGNMENT OF MULTI-STATION FLEXOGRAPHIC PRINTING SYSTEM
    66.
    发明申请
    LASER-ASSISTED ALIGNMENT OF MULTI-STATION FLEXOGRAPHIC PRINTING SYSTEM 有权
    多站激光打印系统的激光辅助对准

    公开(公告)号:US20140290517A1

    公开(公告)日:2014-10-02

    申请号:US13851929

    申请日:2013-03-27

    申请人: Steven A. Miller

    发明人: Steven A. Miller

    IPC分类号: B41F27/00

    摘要: A multi-station flexographic printing system includes a plurality of flexographic printing stations. Each flexographic printing station includes a flexo master. Each flexo master comprises a Fresnel zone pattern in a unique position. A method of aligning a plurality of flexographic printing stations includes printing a Fresnel zone pattern on a substrate in a unique position for each flexographic printing station. Light is directed through the Fresnel zone patterns on the substrate. The light focused by the Fresnel zone patterns is captured with a sensor device.

    摘要翻译: 多台柔版印刷系统包括多个柔版印刷台。 每个柔版印刷机包括柔版印刷机。 每个柔印版主包括一个独特位置的菲涅尔区域图案。 对准多个柔性版印刷站的方法包括在每个柔性版印刷台的唯一位置上在基底上印刷菲涅耳区图案。 光通过基片上的菲涅尔区域图案。 由菲涅尔区域图案聚焦的光被传感器装置捕获。

    Methods of rejuvenating sputtering targets
    70.
    发明授权
    Methods of rejuvenating sputtering targets 有权
    振动溅射靶材的方法

    公开(公告)号:US08491959B2

    公开(公告)日:2013-07-23

    申请号:US13465475

    申请日:2012-05-07

    IPC分类号: B05D1/02

    摘要: In various embodiments, a sputtering target initially formed by ingot metallurgy or powder metallurgy and comprising a sputtering-target material is provided, the sputtering-target material (i) comprising a refractory metal, (ii) defining a recessed furrow therein, and (iii) having a first grain size and a first crystalline microstructure. A powder is spray-deposited within the furrow to form a layer therein, the layer (i) comprising the metal, (ii) having a second grain size finer than the first grain size, and (iii) having a second crystalline microstructure more random than the first crystalline microstructure. Spray-depositing the powder within the furrow forms a distinct boundary line between the layer and the sputtering-target material.

    摘要翻译: 在各种实施方案中,提供了最初通过铸锭冶金或粉末冶金形成并且包括溅射靶材料的溅射靶,其中包含难熔金属的溅射靶材料(i),(ii)在其中限定凹陷的沟槽,和(iii )具有第一晶粒尺寸和第一晶体微结构。 将粉末喷涂在沟槽内以在其中形成层,层(i)包含金属,(ii)具有比第一粒度更细的第二粒度,和(iii)具有更随机的第二结晶微结构 比第一个结晶微结构。 将粉末喷射沉积在沟槽内,在层和溅射靶材料之间形成明显的边界线。