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    Positioning system, lithographic apparatus and method
    63.
    发明授权
    Positioning system, lithographic apparatus and method 有权
    定位系统，光刻设备和方法

    公开(公告)号：US08482719B2

    公开(公告)日：2013-07-09

    申请号：US12830963

    申请日：2010-07-06

    申请人： Jan Van Eijk ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen

    发明人： Jan Van Eijk ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen

    IPC分类号： G03B27/58 ,  G03B27/32 ,  G03B27/62 ,  G03B27/42

    CPC分类号： G03B27/58 ,  G03F7/70716 ,  G03F7/70783

    摘要： A positioning system to position a movable object having a body, the positioning system includes an object position measurement system, an object actuator, and an object controller, wherein the positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object, the stiffener including; one or more sensors, wherein each sensor is arranged to determine a measurement signal representative of an internal strain or relative displacement in the body, one or more actuators, wherein each actuator is arranged to exert an actuation force on a part of the body, and at least one controller, configured to provide on the basis of the measurement signal of at least one of the sensors, an actuation signal to at least one of the actuators to increase the stiffness and/or to damp movements within the body.

    摘要翻译： 一种定位系统，用于定位具有主体的可移动物体，所述定位系统包括物体位置测量系统，物体致动器和物体控制器，其中所述定位系统还包括加强件，以增加刚度和/或阻尼相对运动 在物体的身体内，加强筋包括; 一个或多个传感器，其中每个传感器布置成确定表示体内的内部应变或相对位移的测量信号，一个或多个致动器，其中每个致动器布置成在身体的一部分上施加致动力，以及 至少一个控制器，被配置为基于所述传感器中的至少一个传感器的测量信号提供到所述致动器中的至少一个致动器的致动信号，以增加所述刚度和/或抑制所述主体内的运动。

    Stage system calibration method, stage system and lithographic apparatus comprising an encoder measurement system to measure position of stage system
    64.
    发明授权
    Stage system calibration method, stage system and lithographic apparatus comprising an encoder measurement system to measure position of stage system 有权
    舞台系统校准方法，舞台系统和光刻设备，包括测量舞台系统位置的编码器测量系统

    公开(公告)号：US08446567B2

    公开(公告)日：2013-05-21

    申请号：US12418089

    申请日：2009-04-03

    申请人： Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch

    发明人： Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70775 ,  G03F7/70516

    摘要： A calibration method to calibrate an encoder position measurement system of a stage, the encoder position measurement system including an encoder grid and at least two sensor heads cooperating with the encoder grid, each sensor head providing a sensor head output signal showing a position sensitivity in a horizontal and a vertical direction, the method including a) moving the stage such that the sensor heads are moved with respect to the encoder grid, or vice versa; b) during the moving, measuring the position of the stage with respect to the encoder grid by the two sensor heads; c) determining a vertical position data map from the sensor head output signals of the dual sensor heads; d) calculating a horizontal position data map from the vertical position data map; and e) calibrating the encoder position measurement system applying the calculated horizontal position data map.

    摘要翻译： 一种用于校准级的编码器位置测量系统的校准方法，编码器位置测量系统包括编码器网格和与编码器网格协作的至少两个传感器头，每个传感器头提供传感器头部输出信号，其中示出了位置灵敏度 水平和垂直方向，所述方法包括：a）移动所述台，使得所述传感器头相对于所述编码器格栅移动，反之亦然; b）在移动期间，通过两个传感器头测量相对于编码器网格的平台的位置; c）从双传感器头的传感器头输出信号确定垂直位置数据图; d）从垂直位置数据图计算水平位置数据图; 以及e）校准应用计算出的水平位置数据图的编码器位置测量系统。